MX14512A - Composicion fotopolimerizable y articulo que comprende la composicion. - Google Patents
Composicion fotopolimerizable y articulo que comprende la composicion.Info
- Publication number
- MX14512A MX14512A MX1451289A MX1451289A MX14512A MX 14512 A MX14512 A MX 14512A MX 1451289 A MX1451289 A MX 1451289A MX 1451289 A MX1451289 A MX 1451289A MX 14512 A MX14512 A MX 14512A
- Authority
- MX
- Mexico
- Prior art keywords
- composition
- article
- photopolymerizable
- photopolymerizable composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
- F02B—INTERNAL-COMBUSTION PISTON ENGINES; COMBUSTION ENGINES IN GENERAL
- F02B75/00—Other engines
- F02B75/02—Engines characterised by their cycles, e.g. six-stroke
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/147,446 US4791045A (en) | 1988-01-25 | 1988-01-25 | Photosensitizers and polymerizable compositions with mannich bases and iodonium salts |
Publications (1)
Publication Number | Publication Date |
---|---|
MX14512A true MX14512A (es) | 1994-01-31 |
Family
ID=22521598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX1451289A MX14512A (es) | 1988-01-25 | 1989-01-12 | Composicion fotopolimerizable y articulo que comprende la composicion. |
Country Status (7)
Country | Link |
---|---|
US (1) | US4791045A (es) |
EP (1) | EP0326249A3 (es) |
JP (1) | JPH023401A (es) |
KR (1) | KR890012191A (es) |
AU (1) | AU618773B2 (es) |
CA (1) | CA1331532C (es) |
MX (1) | MX14512A (es) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4921827A (en) * | 1988-11-23 | 1990-05-01 | Minnesota Mining And Manufacturing Company | Sensitized photoinitiator system for addition polymerization |
US5597677A (en) * | 1994-11-02 | 1997-01-28 | Minnesota Mining And Manufacturing Company | Photoimageable elements |
US5563023A (en) * | 1994-11-02 | 1996-10-08 | Minnesota Mining And Manufacturing Co. | Photoimageable elements |
WO2002079691A1 (en) | 2001-03-30 | 2002-10-10 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Materials, methods, and uses for photochemical generation of acids and/or radical species |
CN1730476B (zh) * | 2004-08-06 | 2011-04-06 | 中国医学科学院药物研究所 | 芳胺酮类化合物、其合成方法、含有其的药物组合物及用途 |
AU2013200229B2 (en) * | 2006-05-18 | 2014-11-27 | Pharmacyclics Llc | Intracellular kinase inhibitors |
MX2008014450A (es) | 2006-05-18 | 2009-03-09 | Mannkind Corp | Inhibidores de cinasa intracelular. |
JP6998769B2 (ja) * | 2015-10-01 | 2022-01-18 | 東洋合成工業株式会社 | ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法 |
DE102016123856A1 (de) | 2016-12-08 | 2018-06-14 | Endress + Hauser Wetzer Gmbh + Co. Kg | Verfahren zur in situ Kalibrierung eines Thermometers |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
US4072528A (en) * | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
US4072257A (en) * | 1976-02-17 | 1978-02-07 | Hall Robert Eugene | Load carrying apparatus |
JPS52102735A (en) * | 1976-02-24 | 1977-08-29 | Mita Industrial Co Ltd | Dry developing agent for electrostatography |
EP0003002B1 (de) * | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
US4351708A (en) * | 1980-02-29 | 1982-09-28 | Ciba-Geigy Corporation | Photochemically or thermally polymerizable mixtures |
GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
JPS57163377A (en) * | 1981-03-16 | 1982-10-07 | Nippon Kayaku Co Ltd | Dialkylthioxanthone compound, its preparation, and curing of photopolymerizable resin composition using it |
US4518676A (en) * | 1982-09-18 | 1985-05-21 | Ciba Geigy Corporation | Photopolymerizable compositions containing diaryliodosyl salts |
US4576975A (en) * | 1983-03-03 | 1986-03-18 | Minnesota Mining And Manufacturing Company | Water soluble Michler's ketone analogs in combined photoinitiator composition and polymerizable composition |
DE3463576D1 (en) * | 1983-03-03 | 1987-06-11 | Toray Industries | Radiation sensitive polymer composition |
US4792506A (en) * | 1986-09-19 | 1988-12-20 | Minnesota Mining And Manufacturing Company | Polymerizable compositions containing iodonium photoinitiators and photosensitizers therefor |
-
1988
- 1988-01-25 US US07/147,446 patent/US4791045A/en not_active Expired - Fee Related
- 1988-12-29 AU AU27567/88A patent/AU618773B2/en not_active Ceased
-
1989
- 1989-01-04 CA CA000587470A patent/CA1331532C/en not_active Expired - Fee Related
- 1989-01-12 EP EP89300283A patent/EP0326249A3/en not_active Ceased
- 1989-01-12 MX MX1451289A patent/MX14512A/es unknown
- 1989-01-24 KR KR1019890000710A patent/KR890012191A/ko not_active Application Discontinuation
- 1989-01-24 JP JP1014955A patent/JPH023401A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
KR890012191A (ko) | 1989-08-25 |
CA1331532C (en) | 1994-08-23 |
AU2756788A (en) | 1989-07-27 |
EP0326249A2 (en) | 1989-08-02 |
US4791045A (en) | 1988-12-13 |
AU618773B2 (en) | 1992-01-09 |
JPH023401A (ja) | 1990-01-09 |
EP0326249A3 (en) | 1990-01-31 |
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