KR970052179A - Electron Beam Evaporation Thin Film Manufacturing Equipment - Google Patents

Electron Beam Evaporation Thin Film Manufacturing Equipment Download PDF

Info

Publication number
KR970052179A
KR970052179A KR1019950056912A KR19950056912A KR970052179A KR 970052179 A KR970052179 A KR 970052179A KR 1019950056912 A KR1019950056912 A KR 1019950056912A KR 19950056912 A KR19950056912 A KR 19950056912A KR 970052179 A KR970052179 A KR 970052179A
Authority
KR
South Korea
Prior art keywords
electron beam
beam evaporation
thin film
evaporation source
vacuum chamber
Prior art date
Application number
KR1019950056912A
Other languages
Korean (ko)
Inventor
문환구
Original Assignee
이우복
사단법인 고등기술연구원 연구조합
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 이우복, 사단법인 고등기술연구원 연구조합 filed Critical 이우복
Priority to KR1019950056912A priority Critical patent/KR970052179A/en
Publication of KR970052179A publication Critical patent/KR970052179A/en

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

본 발명은 기판이 장착되는 위치에 상관없이 균일한 두께의 박막을 제조하기 위하여 상부가 반원구인 진공챔버 내부 상부에 설치되어 있는 반원구의 기판홀더와, 상기 진공챔버의 한쪽에 설치되어 있는 중기 차단덮개가 설치된 회전축과, 상기 진공챔버 하부의 중앙으로 상호 이동이 가능하도록 설치되어 있는 제1전자빔 증발원과 제2전자빔 증발원과, 상기 증발원 상부 설치되어 있는 전자빔 증발원 가림박으로 이루어진 전자빔 증발 박막 제조장치를 제공한다.The present invention is a semi-circular substrate holder which is installed in the upper part of the vacuum chamber, the upper half of the semi-circle in order to produce a thin film of a uniform thickness irrespective of the position where the substrate is mounted, and the medium-term shielding cover is provided on one side of the vacuum chamber Provided is an electron beam evaporation thin film manufacturing apparatus consisting of a rotating shaft is installed, the first electron beam evaporation source and the second electron beam evaporation source is installed so as to be movable to the center of the lower portion of the vacuum chamber, and the electron beam evaporation source shielding foil is installed above the evaporation source. do.

Description

전자빔 증발 박막 제조장치Electron Beam Evaporation Thin Film Manufacturing Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명에 따른 전자빔 증발 박막 제조장치를 나타낸 단면도.2 is a cross-sectional view showing an electron beam evaporation thin film manufacturing apparatus according to the present invention.

Claims (1)

상부가 반원구인 진공챔버 내부 상부에 설치되어 있는 반원구의 기판홀더와, 상기 진공챔버의 하부에는 증발되는 증기를 차단하는 증기차단 덮개의 회전축을 중심으로 양쪽에 설치되어 있는 제1, 제2전자빔 증발원과, 상기 증발원 상부에 설치되어 있는 전자빔 증발원 가림막을 포함하는 전자빔 증발 박막 제조장치에 있어서, 상기 증기차단 덮개가 설치된 회전축이 진공챔버의 한쪽에 설치되어 있고, 전자빔 증발원과 제2전자빔 증발원은 진공챔버 하부의 중앙으로 상호 이동이 가능하도록 설치되어 있는 것을 특징으로 하는 전자빔 증발박막 제조장치.First and second electron beam evaporation sources provided on both sides of the semi-circular substrate holder in the upper half of the vacuum chamber, and the lower portion of the vacuum chamber, respectively, around the rotation axis of the vapor blocking cover that blocks evaporated vapor. And an electron beam evaporation thin film manufacturing apparatus including an electron beam evaporation source masking film provided above the evaporation source, wherein a rotation shaft provided with the vapor blocking cover is provided on one side of the vacuum chamber, and the electron beam evaporation source and the second electron beam evaporation source are vacuum chambers. Electron beam evaporation thin film manufacturing apparatus, characterized in that installed so as to be movable to the center of the lower portion. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950056912A 1995-12-26 1995-12-26 Electron Beam Evaporation Thin Film Manufacturing Equipment KR970052179A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950056912A KR970052179A (en) 1995-12-26 1995-12-26 Electron Beam Evaporation Thin Film Manufacturing Equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950056912A KR970052179A (en) 1995-12-26 1995-12-26 Electron Beam Evaporation Thin Film Manufacturing Equipment

Publications (1)

Publication Number Publication Date
KR970052179A true KR970052179A (en) 1997-07-29

Family

ID=66617219

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950056912A KR970052179A (en) 1995-12-26 1995-12-26 Electron Beam Evaporation Thin Film Manufacturing Equipment

Country Status (1)

Country Link
KR (1) KR970052179A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020057040A (en) * 2000-12-30 2002-07-11 현대엘씨디주식회사 Method for manufacturing orgarnic electroluminescent display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020057040A (en) * 2000-12-30 2002-07-11 현대엘씨디주식회사 Method for manufacturing orgarnic electroluminescent display

Similar Documents

Publication Publication Date Title
KR910003141A (en) Laser sputtering device
DK1160351T3 (en) Covered multibrand evaporator source assembly
EP0385475A3 (en) Method of forming a transparent conductive film
MY104370A (en) Method for pure ion plating using magnetic fields.
KR920000963A (en) Thin film forming equipment
KR910001911A (en) Film Forming Apparatus and Method
KR970070241A (en) Plasma etching electrode
KR960031759A (en) Braided vibration damping device for axial turbomachinery
KR970052179A (en) Electron Beam Evaporation Thin Film Manufacturing Equipment
SE8004612L (en) CENTRIFUGAL Separator Built-in Device
KR890013680A (en) Capacitor
ES2161080T3 (en) Ceramic evaporation shuttle
KR970072345A (en) Substrate Cooling Device and Semiconductor Manufacturing Equipment
GB1116857A (en) Improvements in and relating to thermal vapour deposition of mixtures of substances in vacuo
JPS56121629A (en) Film forming method
KR910016962A (en) Plasma Chemical Vapor Deposition of TiN
SU796932A1 (en) Switching device
JPS6443915A (en) Manufacture of superconductive material
KR920001657A (en) Ion implanter
KR910019097A (en) Ion Source Device
KR910009952A (en) Evaporator for vacuum deposition using electron beam
KR930014810A (en) Laser evaporation apparatus for high temperature superconducting thin film
JPS5763675A (en) Wristwatch case with diamond coating and its production
KR920001767A (en) Semiconductor device
KR910016043A (en) Electron beam Excitation ion source

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination