KR970028849A - 감광성수지 조성물 및 이것을 사용한 패턴형성방법 - Google Patents
감광성수지 조성물 및 이것을 사용한 패턴형성방법 Download PDFInfo
- Publication number
- KR970028849A KR970028849A KR1019960053885A KR19960053885A KR970028849A KR 970028849 A KR970028849 A KR 970028849A KR 1019960053885 A KR1019960053885 A KR 1019960053885A KR 19960053885 A KR19960053885 A KR 19960053885A KR 970028849 A KR970028849 A KR 970028849A
- Authority
- KR
- South Korea
- Prior art keywords
- resin composition
- photosensitive resin
- poly
- carboxylic acid
- organic group
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP95-307123 | 1995-11-27 | ||
| JP7307123A JPH09146277A (ja) | 1995-11-27 | 1995-11-27 | 感光性樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970028849A true KR970028849A (ko) | 1997-06-24 |
Family
ID=17965315
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019960053885A KR970028849A (ko) | 1995-11-27 | 1996-11-14 | 감광성수지 조성물 및 이것을 사용한 패턴형성방법 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPH09146277A (ja) |
| KR (1) | KR970028849A (ja) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1196029C (zh) * | 1998-09-10 | 2005-04-06 | 东丽株式会社 | 正型放射感应性组合物 |
| JPWO2022059621A1 (ja) * | 2020-09-16 | 2022-03-24 | ||
| CN113667303B (zh) * | 2021-08-20 | 2023-09-29 | 杭州福斯特电子材料有限公司 | 一种树脂组合物及其应用 |
-
1995
- 1995-11-27 JP JP7307123A patent/JPH09146277A/ja active Pending
-
1996
- 1996-11-14 KR KR1019960053885A patent/KR970028849A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JPH09146277A (ja) | 1997-06-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Withdrawal due to no request for examination |