KR960704991A - 활성화된 연마 조성물(Activated polishing compositions) - Google Patents

활성화된 연마 조성물(Activated polishing compositions)

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Publication number
KR960704991A
KR960704991A KR1019960701019A KR19960701019A KR960704991A KR 960704991 A KR960704991 A KR 960704991A KR 1019960701019 A KR1019960701019 A KR 1019960701019A KR 19960701019 A KR19960701019 A KR 19960701019A KR 960704991 A KR960704991 A KR 960704991A
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KR
South Korea
Prior art keywords
cation
abrasive
composition
base
basic
Prior art date
Application number
KR1019960701019A
Other languages
English (en)
Other versions
KR100215939B1 (ko
Inventor
멜버른 쿡 리
비. 론키 스콧트
브랜칼레오니 그레고리
Original Assignee
윌리엄 디. 부딩거
로델, 인코포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 윌리엄 디. 부딩거, 로델, 인코포레이티드 filed Critical 윌리엄 디. 부딩거
Publication of KR960704991A publication Critical patent/KR960704991A/ko
Application granted granted Critical
Publication of KR100215939B1 publication Critical patent/KR100215939B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

산화물이 기본 연마제만을 사용하는 경우보다 높은 연마속도를 나타내는 제2양이온의 부가에 의해 기본 연마제가 활성화되는, 표면, 특히 집적 회로 연마에 적합한 활성화된 조성물을 제조하는 방법 및 이로부터 생성된 조성물이 기술되어 있다. 활성화는 pH가 활성화 양이온의 기본 연마제 표면으로의 흡착에 적합한 수준인 수성매질 속에서 주기적 충격 동안 기본 연마제로의 활성화 양이온의 화학적 흡착에 의해 수행된다.

Description

활성화된 연마 조성물(Activated polishing compositions)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (16)

  1. pH가 양이온의 기본 연마제 표면으로의 흡착에 적합한 수준인 수성 매질 속에서 기본 연마제와 양이온 함유 화합물을 주기적 충격에 노출시킴을 포함하여, 산화물이 기본 연마제만을 사용하는 경우보다는 높은 연마 속도를 나타내는 양이온의 기본 연마제 표면으로의 화학적 흡착에 의해서 기본 연마제를 활성화시키는, 물품연마에 적합한 조성물을 제조하는 방법.
  2. 제1항에 있어서, 기본 연마제와 양이온 함유 화합물을 공밀링함으로써 주기적 충격에 노출시키는 방법.
  3. 제2항에 있어서, 양이온 함유 화합물이 밀링 공정에 사용되는 밀링 연마제 속에 존재하는 방법.
  4. 제1항 내지 제3항 중의 어느 한 항에 있어서, 기본 연마제가 SiO2인 방법.
  5. 제1항 내지 제3항 중의 어느 한 항에 있어서, 양이온이 Ce4+인 방법.
  6. 제4항에 있어서, 양이온이 Ce4+인 방법.
  7. 제1항 내지 제3항 중의 어느 한 항에 있어서, 양이온이 Zr4+인 방법.
  8. 제4항에 있어서, 양이온이 Zr4+인 방법.
  9. 산화물이 기본 연마제만을 사용하는 경우보다는 높은 연마속도를 나타내는 양이온의 기본 연마제 표면으로의 화학적 흡착(이는 pH가 양이온의 기본 연마제 표면으로의 흡착에 적합한 수준인 수성 매질 속에서 기본 연마제와 양이온 함유 화합물을 주기적 충격에 노출시킴으로써 수행된다)에 의해 활성화된 기본 연마제를 포함하는, 물품 연마에 적합한 조성물.
  10. 제9항에 있어서, 기본 연마제와 양이온 함유 화합물을 공밀링시킴으로써 주기적 충격에 노출시키는, 물품 연마에 적합한 조성물.
  11. 제10항에 있어서, 양이온 함유 화합물이 밀링 공정에 사용되는 밀링 연마제 속에 존재하는, 물품 연마에 적합한 조성물.
  12. 제9항 내지 제11항 중의 어느 한 항에 있어서, 기본 연마제가 SiO2인, 물품 연마에 적합한 조성물.
  13. 제9항 내지 제11항 중의 어느 한 항에 있어서, 양이온이 Ce4+인 물품 연마에 적합한 조성물.
  14. 제12항에 있어서, 양이온이 Ce4+인, 물품 연마에 적합한 조성물.
  15. 제9항 내지 제11항 중의 어느 한 항에 있어서, 양이온이 Zr4+인, 물품 연마에 적합한 조성물.
  16. 제12항에 있어서, 양이온이 Zr4+인, 물품 연마에 적합한 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960701019A 1993-09-03 1994-09-02 활성화된 연마 조성물 KR100215939B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US8/116,322 1993-09-03
US08/116,322 US5382272A (en) 1993-09-03 1993-09-03 Activated polishing compositions
US08/116,322 1993-09-03
PCT/US1994/009845 WO1995006690A1 (en) 1993-09-03 1994-09-02 Activated polishing compositions

Publications (2)

Publication Number Publication Date
KR960704991A true KR960704991A (ko) 1996-10-09
KR100215939B1 KR100215939B1 (ko) 1999-08-16

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Country Status (9)

Country Link
US (2) US5382272A (ko)
EP (1) EP0717762B1 (ko)
JP (1) JP2857722B2 (ko)
KR (1) KR100215939B1 (ko)
CN (1) CN1042550C (ko)
DE (1) DE69427538T2 (ko)
MY (1) MY111131A (ko)
SG (1) SG43327A1 (ko)
WO (1) WO1995006690A1 (ko)

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Also Published As

Publication number Publication date
US5382272A (en) 1995-01-17
EP0717762A1 (en) 1996-06-26
CN1042550C (zh) 1999-03-17
US5480476A (en) 1996-01-02
KR100215939B1 (ko) 1999-08-16
DE69427538T2 (de) 2002-04-25
EP0717762B1 (en) 2001-06-20
MY111131A (en) 1999-08-30
WO1995006690A1 (en) 1995-03-09
CN1130392A (zh) 1996-09-04
EP0717762A4 (en) 1997-06-11
DE69427538D1 (de) 2001-07-26
JP2857722B2 (ja) 1999-02-17
SG43327A1 (en) 1997-10-17
JPH08512357A (ja) 1996-12-24

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