KR960042203A - Phase inversion mask and manufacturing method thereof - Google Patents
Phase inversion mask and manufacturing method thereof Download PDFInfo
- Publication number
- KR960042203A KR960042203A KR1019950014334A KR19950014334A KR960042203A KR 960042203 A KR960042203 A KR 960042203A KR 1019950014334 A KR1019950014334 A KR 1019950014334A KR 19950014334 A KR19950014334 A KR 19950014334A KR 960042203 A KR960042203 A KR 960042203A
- Authority
- KR
- South Korea
- Prior art keywords
- film
- mask
- etching
- forming
- high reflectance
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
마스크의 정렬키 영역의 반사율을 증가시킨 위상반전 마스크와 그 제조방법에 관하여 개시한다. 본 발명의 위상반전 마스크는 마스크 기판상에 패턴형성 영역과 비패턴형성 영역을 갖는 위상반전 마스크에 있어서, 상기 비패턴형성 영역의 소정부분에 고반사율막을 갖는 정렬키 패턴을 구비한다. 본 발명에 의하면, 위상반전 마스크의 정렬키 영역을 고반사율막으로 형성하여, 이에 따라 정렬키 영역이 고반사율을 가직 되어 스텝퍼에서의 정렬이 용이하다.Disclosed are a phase inversion mask and a method of manufacturing the same in which the reflectance of the alignment key region of the mask is increased. The phase shift mask according to the present invention has a phase shift mask having a pattern formation region and a non-pattern formation region on a mask substrate, and includes an alignment key pattern having a high reflectivity film at a predetermined portion of the non-pattern formation region. According to the present invention, the alignment key region of the phase inversion mask is formed of a high reflectivity film, whereby the alignment key region has a high reflectance, so that alignment at the stepper is easy.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제4도는 본 발명에 따른 위상반전 마스크의 단면도이다.4 is a cross-sectional view of a phase inversion mask according to the present invention.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950014334A KR0165402B1 (en) | 1995-05-31 | 1995-05-31 | Phase shift mask and its manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950014334A KR0165402B1 (en) | 1995-05-31 | 1995-05-31 | Phase shift mask and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960042203A true KR960042203A (en) | 1996-12-21 |
KR0165402B1 KR0165402B1 (en) | 1999-03-20 |
Family
ID=19416226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950014334A KR0165402B1 (en) | 1995-05-31 | 1995-05-31 | Phase shift mask and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0165402B1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4587837B2 (en) * | 2005-02-18 | 2010-11-24 | Hoya株式会社 | Gray tone mask manufacturing method and gray tone mask |
-
1995
- 1995-05-31 KR KR1019950014334A patent/KR0165402B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0165402B1 (en) | 1999-03-20 |
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Payment date: 20060830 Year of fee payment: 9 |
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