KR970076065A - Method of manufacturing phase inversion mask - Google Patents
Method of manufacturing phase inversion mask Download PDFInfo
- Publication number
- KR970076065A KR970076065A KR1019960015567A KR19960015567A KR970076065A KR 970076065 A KR970076065 A KR 970076065A KR 1019960015567 A KR1019960015567 A KR 1019960015567A KR 19960015567 A KR19960015567 A KR 19960015567A KR 970076065 A KR970076065 A KR 970076065A
- Authority
- KR
- South Korea
- Prior art keywords
- spin
- glass
- photoresist pattern
- pattern
- phase inversion
- Prior art date
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- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
일정한 두께를 가지는 위상 반전 패턴을 가지는 위상 반전 마스크의 제조 방법을 제공하는 것이다. 본 발명은 투명한 기판의 전면에 스핀-온 글라스를 도포하는 단계와, 상기 스핀-온 글라스의 전면에 위상 반전 패턴을 형성하기 위한 포토레지스트 패턴을 형성하는 단계와, 상기 포토레지스트 패턴을 마스크로 사용하여 상기 스핀-온 글라스를 식각하는 단계와, 상기 포토레지스트 패턴의 전면에 크롬막을 증착하는 단계와, 상기 포토레지스트 패턴과 함께 상기 포토레지스트 패턴 위의 상기 크롬막을 제거하는 단계를 포함하는 위상 반전 마스크의 제조 방법이다. 따라서, 상기 위상 반전 패턴은 일정한 두께를 가지는 스핀-온 글라스로 형성되어 종래와 달리 위상이 변하는 문제를 방지할 수 있다.And a method of manufacturing a phase shift mask having a phase shift pattern having a constant thickness. The present invention provides a method of manufacturing a semiconductor device, comprising: applying a spin-on glass to a front surface of a transparent substrate; forming a photoresist pattern for forming a phase reversal pattern on the entire surface of the spin-on glass; Etching the spin-on glass, depositing a chromium film on the entire surface of the photoresist pattern, and removing the chromium film on the photoresist pattern together with the photoresist pattern. . Therefore, the phase inversion pattern is formed of a spin-on glass having a constant thickness, thereby preventing the phase change from being different from the conventional one.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 스핀-온 글라스를 이용하여 형성한 위상 반전 마스크를 보여주는 단면도이다.FIG. 1 is a cross-sectional view showing a phase inversion mask formed using a spin-on glass.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015567A KR970076065A (en) | 1996-05-11 | 1996-05-11 | Method of manufacturing phase inversion mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960015567A KR970076065A (en) | 1996-05-11 | 1996-05-11 | Method of manufacturing phase inversion mask |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970076065A true KR970076065A (en) | 1997-12-10 |
Family
ID=66219984
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960015567A KR970076065A (en) | 1996-05-11 | 1996-05-11 | Method of manufacturing phase inversion mask |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970076065A (en) |
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1996
- 1996-05-11 KR KR1019960015567A patent/KR970076065A/en not_active Application Discontinuation
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