KR960002655A - Semiconductor manufacturing method - Google Patents
Semiconductor manufacturing method Download PDFInfo
- Publication number
- KR960002655A KR960002655A KR1019940012906A KR19940012906A KR960002655A KR 960002655 A KR960002655 A KR 960002655A KR 1019940012906 A KR1019940012906 A KR 1019940012906A KR 19940012906 A KR19940012906 A KR 19940012906A KR 960002655 A KR960002655 A KR 960002655A
- Authority
- KR
- South Korea
- Prior art keywords
- insulating film
- semiconductor manufacturing
- planarizing
- etching
- present
- Prior art date
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- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Abstract
본 발명은 토포로지를 갖는 절연막을 식각하여 서로 다른 단차를 갖는 예정된 부위를 오픈 시키는 공정과 상기 절연막을 평탄화시키는 공정이 병행되는 반도체 제조 방법에 있어서; 예정된 부위의 절연막을 제거하는 단계를 실시한 이후에 절연막을 평탄화 시키는 것을 특징으로 하는 반도체 제조 방법에 관한 것으로, 절연막 식각시 하부 증착막의 손상을 방지하는 등 소자의 신뢰도 및 제조 수율을 향상 시키는 효과가 있다.The present invention relates to a semiconductor manufacturing method comprising etching a insulating film having a topology and opening predetermined portions having different steps, and flattening the insulating film; The present invention relates to a semiconductor manufacturing method comprising the step of planarizing an insulating film after the step of removing the insulating film of a predetermined portion, and the effect of improving the reliability and manufacturing yield of the device, such as preventing damage to the lower deposition film during etching of the insulating film. .
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2D도는 본 발명의 일실시예에 따른 비아홀 형성 공정도.2D is a process diagram for forming a via hole according to an embodiment of the present invention.
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940012906A KR960002655A (en) | 1994-06-08 | 1994-06-08 | Semiconductor manufacturing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019940012906A KR960002655A (en) | 1994-06-08 | 1994-06-08 | Semiconductor manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR960002655A true KR960002655A (en) | 1996-01-26 |
Family
ID=66685618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019940012906A KR960002655A (en) | 1994-06-08 | 1994-06-08 | Semiconductor manufacturing method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR960002655A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100462538B1 (en) * | 2002-11-14 | 2004-12-17 | 주식회사 유상실업 | Crease Dyeing Finishing of Fabric |
-
1994
- 1994-06-08 KR KR1019940012906A patent/KR960002655A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100462538B1 (en) * | 2002-11-14 | 2004-12-17 | 주식회사 유상실업 | Crease Dyeing Finishing of Fabric |
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