KR950028641U - Reduced exposure device used in semiconductor device manufacturing - Google Patents

Reduced exposure device used in semiconductor device manufacturing

Info

Publication number
KR950028641U
KR950028641U KR2019940004658U KR19940004658U KR950028641U KR 950028641 U KR950028641 U KR 950028641U KR 2019940004658 U KR2019940004658 U KR 2019940004658U KR 19940004658 U KR19940004658 U KR 19940004658U KR 950028641 U KR950028641 U KR 950028641U
Authority
KR
South Korea
Prior art keywords
reduced exposure
semiconductor device
device used
device manufacturing
exposure device
Prior art date
Application number
KR2019940004658U
Other languages
Korean (ko)
Other versions
KR970007069Y1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR94004658U priority Critical patent/KR970007069Y1/en
Publication of KR950028641U publication Critical patent/KR950028641U/en
Application granted granted Critical
Publication of KR970007069Y1 publication Critical patent/KR970007069Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/701—Off-axis setting using an aperture

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
KR94004658U 1994-03-09 1994-03-09 Photolithography apparatus for a semiconductor KR970007069Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR94004658U KR970007069Y1 (en) 1994-03-09 1994-03-09 Photolithography apparatus for a semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR94004658U KR970007069Y1 (en) 1994-03-09 1994-03-09 Photolithography apparatus for a semiconductor

Publications (2)

Publication Number Publication Date
KR950028641U true KR950028641U (en) 1995-10-20
KR970007069Y1 KR970007069Y1 (en) 1997-07-15

Family

ID=19378622

Family Applications (1)

Application Number Title Priority Date Filing Date
KR94004658U KR970007069Y1 (en) 1994-03-09 1994-03-09 Photolithography apparatus for a semiconductor

Country Status (1)

Country Link
KR (1) KR970007069Y1 (en)

Also Published As

Publication number Publication date
KR970007069Y1 (en) 1997-07-15

Similar Documents

Publication Publication Date Title
KR960009110A (en) Semiconductor device and manufacturing method thereof
KR960012575A (en) Semiconductor device manufacturing method
DE69510834T2 (en) Semiconductor memory device
DE69521159D1 (en) Semiconductor memory device
KR960009107A (en) Semiconductor device and manufacturing method
DE69422901T2 (en) Semiconductor memory device
KR960015900A (en) Semiconductor device and manufacturing method thereof
KR960012574A (en) Semiconductor device manufacturing method
DE69512700D1 (en) Semiconductor memory device
DE59508581D1 (en) Semiconductor device
KR960012313A (en) Semiconductor device and manufacturing method thereof
DE69522789D1 (en) Semiconductor device
DE69501381D1 (en) SEMICONDUCTOR DEVICE
FI954241A (en) Semiconductor device manufacturing method
DE69513207T2 (en) Semiconductor device
DE69531121D1 (en) Integrated semiconductor device
DE69521066D1 (en) Semiconductor memory device
KR960012450A (en) Semiconductor device and manufacturing method thereof
KR960009084A (en) Semiconductor device
KR960011705A (en) Semiconductor memory device
KR950028657U (en) Reduced exposure device used in semiconductor device manufacturing
KR950028641U (en) Reduced exposure device used in semiconductor device manufacturing
KR950028644U (en) Reduced exposure apparatus used in semiconductor device manufacturing
KR950028642U (en) Reduced exposure apparatus used in semiconductor device manufacturing
KR960009225A (en) Semiconductor device

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20081027

Year of fee payment: 12

EXPY Expiration of term