KR920703216A - 저온 플라즈마 공정에 의한 강철 기재의 피복 및 하도 방법 - Google Patents

저온 플라즈마 공정에 의한 강철 기재의 피복 및 하도 방법

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Publication number
KR920703216A
KR920703216A KR1019920701946A KR920701946A KR920703216A KR 920703216 A KR920703216 A KR 920703216A KR 1019920701946 A KR1019920701946 A KR 1019920701946A KR 920701946 A KR920701946 A KR 920701946A KR 920703216 A KR920703216 A KR 920703216A
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South Korea
Prior art keywords
organosilane
steel substrate
film
silane
thin film
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KR1019920701946A
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English (en)
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KR0143884B1 (ko
Inventor
알베르트 안토넬리 죠셉
린 탸우-진
덕주양
야쓰다 히로쯔구
Original Assignee
원본미기재
이. 아이. 듀퐁 드 네모아 앤드 캄파니
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Publication of KR920703216A publication Critical patent/KR920703216A/ko
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Publication of KR0143884B1 publication Critical patent/KR0143884B1/ko

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/142—Pretreatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/145—After-treatment
    • B05D3/147—Curing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/14—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2202/00—Metallic substrate
    • B05D2202/10—Metallic substrate based on Fe
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2451/00—Type of carrier, type of coating (Multilayers)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2518/00—Other type of polymers
    • B05D2518/10—Silicon-containing polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/50—Multilayers
    • B05D7/52—Two layers
    • B05D7/54—No clear coat specified
    • B05D7/542—No clear coat specified the two layers being cured or baked together

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음

Description

저온 플라즈마 공정에 의한 강철 기재의 피복 및 하도 방법
[도면의 간단한 설명]
제1도는 진공챔버, 전극, 전원 및 관련된 파이프 등을 나타내는 본 발명의 플라즈마 증착 시스템의 공정도이다.
제2도는 마그네트론이 장착된 애노드중의 하나를 나타내는 정면도이다, 제2a도는 제2도와 동일한 애노드의 측면도이다.
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (15)

  1. (a)1차로 강철기재를 반응성 또는 불활성 기체 플라즈마로 처리하고; (b)강철 기재상에 유기실란의 박막을 증착시키고; 이어서 (c)유기실란의 박막과 반응성이 있는 하도제 피막을 유기실란의 박막에 적용시킴을 포함하는, 강철 기재를 부식으로부터 보호하기 위한 강철 기재의 피복방법.
  2. 제1항에 있어서, 상기 (b) 단계에서 유기실란의 증착을 캐소드(cathode) 및 자기 강화기(magneticenhancement)를 가진 적어도 하나의 애노드(snode)를 갖는, DC 전력을 사용하는 진공 챔버(chamber)(진공챔버의 압력은 1.0 토르 미만이다)내에서 수행하고, 강철 기재를 캐소드로 만드는 방법.
  3. 제2항에 있어서, 상기 진공 챔버의 압력이 20밀리토르 내지 100 밀리토르인 방법.
  4. 제2항에 있어서, 상기 유기실란 막이 산소, 탄소, 인, 수소 또는 이들의 혼합물을 함유하며, 비닐 불포화기를 함유하거나 함유하지 않은 유기실란으로 부터 유도되는 방법.
  5. 제2항에 있어서, 상기 유기실란 막이 트리메틸실란, 디메틸실란, 테트라메틸실란, 헥사메틸디실록산, 트리메틸에톡시실란 및 메틸트리메톡시실란으로 이루어진 군에서 선택된 유기실란으로부터 유도되는 방법.
  6. 제2항에 있어서, 상기 강철 기재를 (a) 단계에서 반응성 기체 플라즈마로 처리하는 방법.
  7. 제6항에 있어서, 상기 반응성 기체 플라즈마가 산소인 방법.
  8. 제1항에 있어서, 상기 하도제 피막이 아크릴 실란, 폴리에스테르 실란, 폴리에스테르우레탄-실란, 맬라민/폴리에스테르, 맬라민/폴리에스테르우레탄, 에폭시/무수물, 에폭시/아민 및 폴리에스테르 우레탄으로 이루어진 군으로부터 선택되는 방법.
  9. 제8항에 있어서, 상기 하도제 피막이 실란을 또는 알콕시실란 작용기를 함유하는 방법.
  10. 제9항에 있어서, 상기 하도제 피막이 트리메톡시실란 그룹을 함유하는 방법.
  11. 제1항에 있어서, 유기실란 막과 하도제 피막 사이의 접착력을 향상시키기 위하여, 상기 (b) 단계와 (c) 단계 사이에서 유기실란의 박막을 후처리하여 유기실란 박막의 표면을 분극화시키는 방법.
  12. 제11항에 있어서, 상기 후처리 단계가 비중합성 기체를 사용하는 또다른 플라즈마 처리 단계를 포함하는 방법.
  13. 제12항에 있어서, 상기 비중합성 기체가 산송, 물, 이산화탄소 및 암모니아, 및 이들의 혼합물로 이루어진 군으로부터 선택되는 방법.
  14. 제12항에 있어서, 상기 이중합성 기체를 불활성 기체와 혼합하는 방법.
  15. 제11항에 있어서, 상기 후처리에 의해 유기실란 박막의 표면상에 하이드록시 그룹, 산 그룹 또는 염기그룹을 형성시키는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920701946A 1990-02-14 1990-11-09 저온 플라즈마 공정에 의한 강철 기재의 피복 및 하도 방법 KR0143884B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US480356 1990-02-14
US07/480,356 US4980196A (en) 1990-02-14 1990-02-14 Method of coating steel substrate using low temperature plasma processes and priming
US480,356 1990-02-14
PCT/US1990/006405 WO1991012092A1 (en) 1990-02-14 1990-11-09 Method of coating steel substrate using low temperature plasma processes and priming

Publications (2)

Publication Number Publication Date
KR920703216A true KR920703216A (ko) 1992-12-17
KR0143884B1 KR0143884B1 (ko) 1998-07-15

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Country Status (12)

Country Link
US (1) US4980196A (ko)
EP (1) EP0515373B1 (ko)
JP (1) JP2843670B2 (ko)
KR (1) KR0143884B1 (ko)
AU (1) AU652544B2 (ko)
BR (1) BR9007994A (ko)
CA (1) CA2035991C (ko)
DE (1) DE69030107T2 (ko)
ES (1) ES2098275T3 (ko)
MX (1) MX173224B (ko)
NZ (1) NZ237089A (ko)
WO (1) WO1991012092A1 (ko)

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EP0515373B1 (en) 1997-03-05
AU6721690A (en) 1991-09-03
AU652544B2 (en) 1994-09-01
EP0515373A1 (en) 1992-12-02
BR9007994A (pt) 1992-11-17
CA2035991A1 (en) 1991-08-15
DE69030107D1 (de) 1997-04-10
MX173224B (es) 1994-02-09
JP2843670B2 (ja) 1999-01-06
ES2098275T3 (es) 1997-05-01
EP0515373A4 (ko) 1995-01-18
NZ237089A (en) 1992-03-26
DE69030107T2 (de) 1997-08-28
KR0143884B1 (ko) 1998-07-15
US4980196A (en) 1990-12-25
CA2035991C (en) 2000-07-25
WO1991012092A1 (en) 1991-08-22
JPH05503876A (ja) 1993-06-24

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