KR920020734A - 고체촬상장치 - Google Patents

고체촬상장치 Download PDF

Info

Publication number
KR920020734A
KR920020734A KR1019920005678A KR920005678A KR920020734A KR 920020734 A KR920020734 A KR 920020734A KR 1019920005678 A KR1019920005678 A KR 1019920005678A KR 920005678 A KR920005678 A KR 920005678A KR 920020734 A KR920020734 A KR 920020734A
Authority
KR
South Korea
Prior art keywords
source electrode
imaging device
state imaging
solid state
vertical
Prior art date
Application number
KR1019920005678A
Other languages
English (en)
Inventor
마사하루 하마사끼
Original Assignee
오가 노리오
소니 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오가 노리오, 소니 가부시기가이샤 filed Critical 오가 노리오
Publication of KR920020734A publication Critical patent/KR920020734A/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14654Blooming suppression
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14609Pixel-elements with integrated switching, control, storage or amplification elements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
  • Picture Signal Circuits (AREA)

Abstract

내용 없음

Description

고체촬상장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본원 발명에 의한 고체촬상장치의 일실시예를 요부의 회로도.
제2도는 1유니트셀의 구조의 평면도.
제3도는 1유니트셀의 구조의 단면도.
제4도는 드레인영역(실선) 및 각 동작상태에 있어서의 게이트전극 바로 아래(파선)의 포텐셜분포도.
제5도는 동작설명을 위한 파형도.

Claims (1)

  1. 수평 및 수직방향으로 화소단위로 2차원적으로 배열된 복수개의 포트센서부의 각각이, 게이트전극이 수평선택선에, 소스전극이 수직신호선에 각각 접속된 수직선택 트랜지스터 및 이 수직선택 트랜지스터의 채널영역 아래에 배설된 광전변환소자로 이루어지고, 상기 소스전극 및 채널영역의 하부에 고농도불순물을 매입(埋入)하고, 상기 소스전극에 전압을 인가함으로써, 상기 광전변환소자로 광전변환된 신호전하를 리드세트하는 것을 특징으로 하는 고체촬상장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920005678A 1991-04-10 1992-04-06 고체촬상장치 KR920020734A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3106667A JPH04312082A (ja) 1991-04-10 1991-04-10 固体撮像装置
JP91-106667 1991-04-10

Publications (1)

Publication Number Publication Date
KR920020734A true KR920020734A (ko) 1992-11-21

Family

ID=14439432

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920005678A KR920020734A (ko) 1991-04-10 1992-04-06 고체촬상장치

Country Status (3)

Country Link
US (1) US5285091A (ko)
JP (1) JPH04312082A (ko)
KR (1) KR920020734A (ko)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5341008A (en) * 1993-09-21 1994-08-23 Texas Instruments Incorporated Bulk charge modulated device photocell with lateral charge drain
JPH0799298A (ja) * 1993-09-28 1995-04-11 Sony Corp 固体撮像素子及びその製造方法
JPH08250697A (ja) * 1995-03-10 1996-09-27 Sharp Corp 増幅型光電変換素子及びそれを用いた増幅型固体撮像装置
US6873362B1 (en) 1995-03-22 2005-03-29 Sony Corporation Scanning switch transistor for solid-state imaging device
JP3284816B2 (ja) * 1995-03-22 2002-05-20 ソニー株式会社 固体撮像装置
US5566044A (en) * 1995-05-10 1996-10-15 National Semiconductor Corporation Base capacitor coupled photosensor with emitter tunnel oxide for very wide dynamic range in a contactless imaging array
US5614744A (en) * 1995-08-04 1997-03-25 National Semiconductor Corporation CMOS-based, low leakage active pixel array with anti-blooming isolation
JPH0997894A (ja) * 1995-09-29 1997-04-08 Sanyo Electric Co Ltd 固体撮像素子の駆動方法
JPH09213921A (ja) * 1996-02-05 1997-08-15 Sharp Corp 増幅型固体撮像素子及び増幅型固体撮像装置
JPH09260627A (ja) * 1996-03-18 1997-10-03 Sharp Corp 増幅型固体撮像装置
US5786623A (en) * 1996-10-22 1998-07-28 Foveonics, Inc. Bipolar-based active pixel sensor cell with metal contact and increased capacitive coupling to the base region
US5760458A (en) * 1996-10-22 1998-06-02 Foveonics, Inc. Bipolar-based active pixel sensor cell with poly contact and increased capacitive coupling to the base region
US6005619A (en) * 1997-10-06 1999-12-21 Photobit Corporation Quantum efficiency improvements in active pixel sensors
DE19830179B4 (de) * 1998-07-06 2009-01-08 Institut für Mikroelektronik Stuttgart Stiftung des öffentlichen Rechts MOS-Transistor für eine Bildzelle
JP3829841B2 (ja) * 2003-11-26 2006-10-04 セイコーエプソン株式会社 固体撮像装置
US20080204578A1 (en) * 2007-02-23 2008-08-28 Labsphere, Inc. Image sensor dark correction method, apparatus, and system
US7763837B2 (en) * 2007-11-20 2010-07-27 Aptina Imaging Corporation Method and apparatus for controlling anti-blooming timing to reduce effects of dark current
US8471310B2 (en) * 2011-01-11 2013-06-25 Aptina Imaging Corporation Image sensor pixels with back-gate-modulated vertical transistor
US9843756B2 (en) * 2015-05-27 2017-12-12 Samsung Electronics Co., Ltd. Imaging devices, arrays of pixels receiving photocharges in bulk of select transistor, and methods

Also Published As

Publication number Publication date
JPH04312082A (ja) 1992-11-04
US5285091A (en) 1994-02-08

Similar Documents

Publication Publication Date Title
KR920020734A (ko) 고체촬상장치
KR920020735A (ko) 고체촬상장치
KR830006824A (ko) 고체촬상소자
GB1099770A (en) Improvements in or relating to detector array
GB1370449A (en) Sensing apparatus and arrays
KR940027509A (ko) 오버-플로우 드레인(ofd)구조를 가지는 전하결합소자형 고체촬상장치
GB1391934A (en) Arrangements comprising a solid state imaging device
KR970068511A (ko) 증폭형 고체촬상장치
KR870002668A (ko) 고체 촬상소자
KR950021737A (ko) 씨씨디(ccd)형 고체촬상소자
KR930001445A (ko) 고체촬상장치
KR960003651A (ko) 절연 게이트형 트랜지스터 및 고체 촬상 소자
KR920022541A (ko) Ccd 시프트레지스터
KR970054308A (ko) 고상 화상 형성 장치
CA1124843A (en) Solid-state imaging device
KR900002478A (ko) Ccd 영상기
KR880014678A (ko) 고체촬상장치
KR960036107A (ko) 고체촬상장치
JPS5575275A (en) Solid state image pickup device
KR950002053A (ko) 증폭형 고체촬상소자
KR830008400A (ko) 고체촬상 장치
KR920022540A (ko) Ccd 고체촬상소자
JPH0412068B2 (ko)
KR960026912A (ko) 고체 촬상 소자
KR930024467A (ko) 증폭형 고체 촬상장치

Legal Events

Date Code Title Description
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid