KR940023546U - Wafer photoresist baking device - Google Patents

Wafer photoresist baking device

Info

Publication number
KR940023546U
KR940023546U KR2019930003541U KR930003541U KR940023546U KR 940023546 U KR940023546 U KR 940023546U KR 2019930003541 U KR2019930003541 U KR 2019930003541U KR 930003541 U KR930003541 U KR 930003541U KR 940023546 U KR940023546 U KR 940023546U
Authority
KR
South Korea
Prior art keywords
baking device
photoresist baking
wafer photoresist
wafer
photoresist
Prior art date
Application number
KR2019930003541U
Other languages
Korean (ko)
Other versions
KR200141160Y1 (en
Inventor
신동욱
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019930003541U priority Critical patent/KR200141160Y1/en
Publication of KR940023546U publication Critical patent/KR940023546U/en
Application granted granted Critical
Publication of KR200141160Y1 publication Critical patent/KR200141160Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019930003541U 1993-03-11 1993-03-11 Wafer photo-resister bake apparatus KR200141160Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930003541U KR200141160Y1 (en) 1993-03-11 1993-03-11 Wafer photo-resister bake apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930003541U KR200141160Y1 (en) 1993-03-11 1993-03-11 Wafer photo-resister bake apparatus

Publications (2)

Publication Number Publication Date
KR940023546U true KR940023546U (en) 1994-10-22
KR200141160Y1 KR200141160Y1 (en) 1999-04-15

Family

ID=19351888

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930003541U KR200141160Y1 (en) 1993-03-11 1993-03-11 Wafer photo-resister bake apparatus

Country Status (1)

Country Link
KR (1) KR200141160Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100246338B1 (en) * 1997-03-28 2000-03-15 김영환 Bake oven for semiconductor package

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100246338B1 (en) * 1997-03-28 2000-03-15 김영환 Bake oven for semiconductor package

Also Published As

Publication number Publication date
KR200141160Y1 (en) 1999-04-15

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