KR900016490A - 금속재의 표면을 착색하기 위한 방법과 그 방법의 사용에 의해서 얻어진 제품 - Google Patents

금속재의 표면을 착색하기 위한 방법과 그 방법의 사용에 의해서 얻어진 제품 Download PDF

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Publication number
KR900016490A
KR900016490A KR1019900005442A KR900005442A KR900016490A KR 900016490 A KR900016490 A KR 900016490A KR 1019900005442 A KR1019900005442 A KR 1019900005442A KR 900005442 A KR900005442 A KR 900005442A KR 900016490 A KR900016490 A KR 900016490A
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KR
South Korea
Prior art keywords
colored
raw material
metal article
thin film
low temperature
Prior art date
Application number
KR1019900005442A
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English (en)
Inventor
데 게리스 피엘레
Original Assignee
원본미기재
우시놀 사시롤(소시에테 아노님)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR8908085A external-priority patent/FR2648478B1/fr
Application filed by 원본미기재, 우시놀 사시롤(소시에테 아노님) filed Critical 원본미기재
Publication of KR900016490A publication Critical patent/KR900016490A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C23C8/38—Treatment of ferrous surfaces

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

내용 없음.

Description

금속재의 표면을 착색하기 위한 방법과 사용에 의해서 얻어진 제품
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (10)

  1. 금속재가 그 분자가 산소 원자들을 함유하고 있는 하나 이상의 가스를 함유하고 있는 분위기에서 그 산화물이 착색될 재료상에 용착되고져 하는 원소들을 함유하는 원재료와 접촉된 저온 플라즈마를 사용하여 표면처리를 받게되며, 상기 원재료는 착색될 재료에 대해서 음극화되어 있는 것을 특징으로 하는, 재료의 표면에 제어된 두께의 산화물 박막을 만들어 내어서 금속재의 표면을 착색하기 위한 방법.
  2. 제1항에 있어서, 저온 플라즈마가 양극과 음극사이의 전기 발광 방전에 의해서 산출되고, 음극은 원료재로 구성되는 것을 특징으로 하는 방법.
  3. 제2항에 있어서, 양극이 착색될 재료로 구성되는 것을 특징으로 하는 방법.
  4. 제1항 내지 3항중 어느 하나에 있어서, 가스가 산소, 오존, 공기, 산화질소, 수증기와 천연가스와의 그 혼합물로 부터 선정되는 것을 특징으로 하는 방법.
  5. 제2항 또는 3항에 있어서, 그것이 200내지 5000V의 전압에서 작용되는 것을 특징으로 하는 방법.
  6. 제2, 3 또는 5항중 어느 하나에 있어서, 1내지 100mA/㎠의 양극 전루밀도가 수립되어 있는 것을 특징으로 하는 방법.
  7. 제1항 내지 6항 중 어느 하나에 있어서, 원재료와 착색될 재료사이에 1내지 50㎜의 거리가 유지되어 있는 것을 특징으로 하는 방법.
  8. 그 분자가 산소 원자들을 함유하고 있는 하나 이상의 가스를 함유하고 있는 분위기에서 그 산화물이 착색될 재료상에 융착되고져 하는 원소들을 함유히는 원재료와 접촉된 저온 플라즈마에 착색될 재료를 노출시켜서 산화물 박막을 형성하며, 상기 원재료는 착색될 재료에 대해서 음극화되어 있는 것을 특징으로 하는, 산화물의 박막에 의해서 표면이 착색된 금속제품.
  9. 제8항에 있어서, 금속제품이 평판 또는 시이트로 구성되는 것을 특징으로 하는 금속제품.
  10. 제8항 또는 9항에 있어서, 금속제품이 스테인레스 강으로 만들어 지는 것을 특징으로 하는 금속제품.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019900005442A 1989-04-18 1990-04-18 금속재의 표면을 착색하기 위한 방법과 그 방법의 사용에 의해서 얻어진 제품 KR900016490A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
FR8905430 1989-04-18
FR89.05430 1989-04-18
FR89.08085 1989-06-15
FR8908085A FR2648478B1 (fr) 1989-06-15 1989-06-15 Procede de coloration de la surface de materiaux metalliques et produits obtenus par sa mise en oeuvre

Publications (1)

Publication Number Publication Date
KR900016490A true KR900016490A (ko) 1990-11-13

Family

ID=26227287

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900005442A KR900016490A (ko) 1989-04-18 1990-04-18 금속재의 표면을 착색하기 위한 방법과 그 방법의 사용에 의해서 얻어진 제품

Country Status (16)

Country Link
EP (1) EP0394159A1 (ko)
JP (1) JPH02294467A (ko)
KR (1) KR900016490A (ko)
CN (1) CN1046566A (ko)
AU (1) AU624701B2 (ko)
BR (1) BR9001790A (ko)
CA (1) CA2014692A1 (ko)
CS (1) CS189390A2 (ko)
ES (1) ES2019822A6 (ko)
FI (1) FI901942A0 (ko)
HU (1) HU902471D0 (ko)
PL (1) PL162520B1 (ko)
PT (1) PT93784A (ko)
RO (1) RO107134B1 (ko)
RU (1) RU2022054C1 (ko)
YU (1) YU47143B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102472560B1 (ko) * 2022-05-23 2022-11-29 김태영 플라즈마 처리를 이용한 착색 스테인리스 스틸의 제조 방법

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2662708B1 (fr) * 1990-06-05 1992-08-07 Ugine Aciers Dispositif de traitement superficiel d'une bande d'un materiau metallique en defilement par plasma basse temperature.
FR2741361B3 (fr) * 1995-11-22 1998-04-17 Balzers Hochvakuum Procede pour traitement thermochimique de surface par immersion dans un plasma, installation pour ce procede, utilisations et pieces obtenues
AU713054B2 (en) * 1996-03-27 1999-11-25 Ethicon Inc. Process for blackening surgical needles
CN105671513A (zh) * 2016-02-25 2016-06-15 深圳市众诚达应用材料科技有限公司 一种新型的真空彩色镀膜工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA972710A (en) * 1970-05-20 1975-08-12 George S. Lubicz Glow discharge technique for the preparation of electrophotographic plates
JPS533977A (en) * 1976-07-01 1978-01-14 Nippon Telegr & Teleph Corp <Ntt> Production of magnetic film
JPS60204626A (ja) * 1984-03-30 1985-10-16 Anelva Corp 酸化鉄薄膜の形成方法および装置
DE3854977T3 (de) * 1987-03-14 2002-11-21 Sumitomo Electric Industries Verfahren zur Abscheidung eines supraleitenden dünnen Filmes
US4806221A (en) * 1987-03-26 1989-02-21 Ppg Industries, Inc. Sputtered films of bismuth/tin oxide
CA1333270C (en) * 1987-03-26 1994-11-29 Ppg Industries Ohio, Inc. Sputtered titanium oxynitride films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102472560B1 (ko) * 2022-05-23 2022-11-29 김태영 플라즈마 처리를 이용한 착색 스테인리스 스틸의 제조 방법
WO2023229275A1 (ko) * 2022-05-23 2023-11-30 김태영 플라즈마 처리를 이용한 착색 스테인리스 스틸의 제조 방법

Also Published As

Publication number Publication date
PL162520B1 (en) 1993-12-31
CA2014692A1 (fr) 1990-10-18
AU5320290A (en) 1990-10-25
PT93784A (pt) 1991-01-08
JPH02294467A (ja) 1990-12-05
RU2022054C1 (ru) 1994-10-30
BR9001790A (pt) 1991-06-11
YU72090A (en) 1991-08-31
YU47143B (sh) 1995-01-31
AU624701B2 (en) 1992-06-18
HU902471D0 (en) 1990-08-28
ES2019822A6 (es) 1991-07-01
RO107134B1 (ro) 1993-09-30
EP0394159A1 (fr) 1990-10-24
CN1046566A (zh) 1990-10-31
CS189390A2 (en) 1991-08-13
FI901942A0 (fi) 1990-04-18

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