KR20210035210A - 마킹 장치, 마킹 방법, 편광판의 제조 방법 및 편광판 - Google Patents

마킹 장치, 마킹 방법, 편광판의 제조 방법 및 편광판 Download PDF

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Publication number
KR20210035210A
KR20210035210A KR1020217004117A KR20217004117A KR20210035210A KR 20210035210 A KR20210035210 A KR 20210035210A KR 1020217004117 A KR1020217004117 A KR 1020217004117A KR 20217004117 A KR20217004117 A KR 20217004117A KR 20210035210 A KR20210035210 A KR 20210035210A
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KR
South Korea
Prior art keywords
polarizing plate
polarizing
laser
marking
film
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KR1020217004117A
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English (en)
Korean (ko)
Inventor
마사노리 시모코시
류타 츠카다
Original Assignee
닛뽄 가야쿠 가부시키가이샤
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Application filed by 닛뽄 가야쿠 가부시키가이샤 filed Critical 닛뽄 가야쿠 가부시키가이샤
Publication of KR20210035210A publication Critical patent/KR20210035210A/ko

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3025Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3033Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/888Marking defects

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Textile Engineering (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Polarising Elements (AREA)
  • Laser Beam Processing (AREA)
  • Ink Jet (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
KR1020217004117A 2018-07-30 2019-07-19 마킹 장치, 마킹 방법, 편광판의 제조 방법 및 편광판 KR20210035210A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2018-142365 2018-07-30
JP2018142365 2018-07-30
PCT/JP2019/028397 WO2020026843A1 (ja) 2018-07-30 2019-07-19 マーキング装置、マーキング方法、偏光板の製造方法および偏光板

Publications (1)

Publication Number Publication Date
KR20210035210A true KR20210035210A (ko) 2021-03-31

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020217004117A KR20210035210A (ko) 2018-07-30 2019-07-19 마킹 장치, 마킹 방법, 편광판의 제조 방법 및 편광판

Country Status (5)

Country Link
JP (1) JP7299219B2 (ja)
KR (1) KR20210035210A (ja)
CN (1) CN112740083B (ja)
TW (1) TWI816846B (ja)
WO (1) WO2020026843A1 (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011257343A (ja) 2010-06-11 2011-12-22 Asahi Kasei E-Materials Corp フィルム用欠陥マーキング装置及び欠陥マーキング方法

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JP2003344301A (ja) * 2002-05-31 2003-12-03 Sumitomo Chem Co Ltd 偏光フィルムの検査方法および検査装置
JP2003344302A (ja) * 2002-05-31 2003-12-03 Sumitomo Chem Co Ltd 偏光フィルムの検査法および検査装置
JP2004045930A (ja) * 2002-07-15 2004-02-12 Masatoshi Kita マーキング方法
US7719646B2 (en) * 2002-11-15 2010-05-18 Sharp Kabushiki Kaisha Liquid crystal display device
US20050277710A1 (en) * 2004-06-14 2005-12-15 Joyce Richard P Tagged resin, method of making a tagged resin, and articles made therefrom
JP2008175940A (ja) * 2007-01-17 2008-07-31 Sekisui Chem Co Ltd 光学フィルムの欠陥のマーキング方法
JP4539664B2 (ja) * 2007-02-28 2010-09-08 株式会社日立製作所 情報再生方法
JP2009244064A (ja) * 2008-03-31 2009-10-22 Sumitomo Chemical Co Ltd 偏光フィルムの検査方法
KR100981306B1 (ko) * 2008-12-02 2010-09-10 참엔지니어링(주) 편광을 이용한 액정표시패널의 리페어 방법
JP2010262265A (ja) * 2009-04-10 2010-11-18 Nitto Denko Corp 光学フィルムロール原反、およびそれを用いた画像表示装置の製造方法
JP5474869B2 (ja) * 2010-09-03 2014-04-16 日東電工株式会社 偏光膜を有する積層体ストリップロールの製造方法
JP5579574B2 (ja) * 2010-11-01 2014-08-27 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
US9454241B2 (en) * 2010-11-12 2016-09-27 3M Innovative Properties Company Interactive polarization-preserving projection display
CN103885231B (zh) * 2014-03-11 2016-04-20 京东方科技集团股份有限公司 显示面板标记装置和显示面板标记方法
CN107933137B (zh) * 2014-03-26 2020-06-05 凸版印刷株式会社 防伪介质
JP6749894B2 (ja) * 2015-04-09 2020-09-02 住友化学株式会社 積層光学フィルムの欠陥検査方法、光学フィルムの欠陥検査方法及び積層光学フィルムの製造方法
WO2016194874A1 (ja) * 2015-06-05 2016-12-08 住友化学株式会社 光透過性フィルムの欠陥検査方法、直線偏光子フィルムの製造方法及び偏光板の製造方法
JP6784540B2 (ja) * 2015-09-30 2020-11-11 日東電工株式会社 偏光板の検査方法および検査装置
KR102033697B1 (ko) * 2016-04-01 2019-10-17 주식회사 엘지화학 광학 필름 마킹 시스템 및 광학 필름 마킹 방법
US10082470B2 (en) * 2016-09-27 2018-09-25 Kla-Tencor Corporation Defect marking for semiconductor wafer inspection

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011257343A (ja) 2010-06-11 2011-12-22 Asahi Kasei E-Materials Corp フィルム用欠陥マーキング装置及び欠陥マーキング方法

Also Published As

Publication number Publication date
CN112740083B (zh) 2023-03-14
CN112740083A (zh) 2021-04-30
JP7299219B2 (ja) 2023-06-27
TW202014739A (zh) 2020-04-16
JPWO2020026843A1 (ja) 2021-08-05
TWI816846B (zh) 2023-10-01
WO2020026843A1 (ja) 2020-02-06

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