KR20200040385A - Gasket for shower head - Google Patents

Gasket for shower head Download PDF

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Publication number
KR20200040385A
KR20200040385A KR1020180120186A KR20180120186A KR20200040385A KR 20200040385 A KR20200040385 A KR 20200040385A KR 1020180120186 A KR1020180120186 A KR 1020180120186A KR 20180120186 A KR20180120186 A KR 20180120186A KR 20200040385 A KR20200040385 A KR 20200040385A
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KR
South Korea
Prior art keywords
shower head
gasket
adhesive layer
layer
coupled
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KR1020180120186A
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Korean (ko)
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이상묘
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(주) 일하하이텍
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Priority to KR1020180120186A priority Critical patent/KR20200040385A/en
Publication of KR20200040385A publication Critical patent/KR20200040385A/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J15/00—Sealings
    • F16J15/02—Sealings between relatively-stationary surfaces
    • F16J15/06—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
    • F16J15/08—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces with exclusively metal packing
    • F16J15/0818—Flat gaskets
    • F16J15/0825—Flat gaskets laminated

Abstract

The present invention relates to a gasket used for a shower head in a semiconductor chamber. More specifically, the present invention relates to the gasket for a shower head comprising: a core material layer made of a metal material; a silicon layer coupled to one side of the core material layer; a thermal diffusion layer coupled to the other side of the core material layer; and an adhesive layer coupled to the outside of the thermal diffusion layer. According to the present invention, since it is easy to seat a new gasket in the correct position when the new gasket is seated on the shower head by the adhesive layer bonded to the outside of the silicon layer, the sealing of the shower head is properly performed and fast and precise replacement of the gasket becomes possible.

Description

샤워 헤드용 가스켓 {Gasket for shower head}Gasket for shower head}

본 발명은 가스켓에 관한 것으로, 보다 구체적으로는 반도체 챔버에 사용되는 샤워 헤드용 가스켓에 관한 것이다. The present invention relates to a gasket, and more particularly, to a gasket for a shower head used in a semiconductor chamber.

일반적으로, 반도체 소자를 제조하는 반도체 공정은 박막을 증착하는 증착 공정과 증착된 박막을 패터닝하는 식각 공정 등이 있으며, 증착 공정과 식각 공정을 수회 반복하는 과정을 통해 반도체 소자가 완성된다.In general, semiconductor processes for manufacturing semiconductor devices include a deposition process for depositing a thin film and an etching process for patterning the deposited thin film, and the semiconductor device is completed through a process of repeating the deposition process and the etching process several times.

특히 박막을 패터닝하는 식각 공정은 반도체 소자의 집적도가 증가함에 따라 보다 미세한 패턴 형성을 위해 플라즈마를 이용한 식각 공정이 주로 이용되고 있다. 플라즈마를 이용한 반도체 공정 장치는 플라즈마를 형성하는 방법에 따라 분류될 수 있는데, 용량 결합형 플라즈마(Capacitive Coupled Plasma) 타입과 유도 결합형 플라즈마(Inductive Cupled Plasma) 타입 등이 있다.Particularly, as the degree of integration of semiconductor devices increases, an etching process using plasma is mainly used for the etching process of patterning a thin film. The semiconductor processing apparatus using plasma may be classified according to a method of forming a plasma, and there are a capacitively coupled plasma type and an inductively coupled plasma type.

플라즈마 공정 장치는 두 개의 전극에 각각 RF 파워를 제공하여 챔버 내부에 배치된 기판의 상부에 전계를 형성한다. 챔버 내부로 분사된 가스는 RF 전계에 의해서 플라즈마 상태로 여기되고, 이러한 플라즈마에서 나오는 이온과 전자를 이용하여 기판에 박막을 증착하거나 식각한다.The plasma processing apparatus provides RF power to each of the two electrodes to form an electric field on top of the substrate disposed inside the chamber. The gas injected into the chamber is excited in a plasma state by an RF electric field, and a thin film is deposited or etched on a substrate using ions and electrons emitted from the plasma.

플라즈마 공정 장치는 가스를 기판에 균일하게 분사하기 위한 샤워 헤드를 구비한다. 샤워 헤드는 가스를 분사하는 다수의 분사홀을 구비하고, 기판이 안착되는 기판 지지부재의 상부에 배치된다.The plasma processing apparatus includes a shower head for uniformly spraying gas onto the substrate. The shower head has a plurality of injection holes for injecting gas, and is disposed on an upper portion of the substrate support member on which the substrate is mounted.

도 1 및 도 2는 종래의 샤워 헤드 및 가스켓을 나타낸 사진이다.1 and 2 are pictures showing a conventional shower head and gasket.

도 1 및 도 2를 참조하면, 샤워 헤드(SH)에는 기밀성을 유지하기 위한 가스켓(G)이 구비된다. 도 1에 도시된 것처럼 샤워 헤드(SH)에는 가스켓(G)이 안착되는 부분(P)이 있다.1 and 2, the shower head SH is provided with a gasket G for maintaining airtightness. 1, the shower head SH has a portion P on which the gasket G is seated.

더 구체적으로는 도 2에 도시된 것처럼 샤워 헤드(SH)에는 가스켓(G) 결합용 돌출부(P1)이 있고, 거기에 가스켓(G)의 홀(H)이 결합된다. More specifically, as shown in FIG. 2, the shower head SH has a protrusion P1 for coupling the gasket G, and a hole H of the gasket G is coupled thereto.

이러한 샤워 헤드용 가스켓(G)은 필요에 따라 교체가 요구되며, 교체시 고정 볼트 등을 풀고 가스켓(G)을 교체하게 되는데 새로운 가스켓(G)을 샤워 헤드(SH)에 안착할 때 가스켓(G) 결합용 돌출부(P1)와 가스켓(G)의 홀(H)의 유격이 발생하여 정확한 위치에 안착시키는 것이 어려운 문제점이 있다. The gasket (G) for the shower head is required to be replaced as necessary, and when replacing, the fixing bolts, etc. are loosened and the gasket (G) is replaced. When the new gasket (G) is mounted on the shower head (SH), the gasket (G) ) There is a problem in that it is difficult to settle in the correct position because the clearance between the coupling protrusion P1 and the hole H of the gasket G occurs.

한국등록실용 20-0478781 (2015.11.09)Korea Registered Utility 20-0478781 (2015.11.09)

본 발명의 목적은 새로운 가스켓을 샤워 헤드에 안착할 때 정확한 위치에 안착시키는 것이 용이한 샤워 헤드용 가스켓을 제공하는 것이다. An object of the present invention is to provide a gasket for a shower head that is easy to seat in the correct position when the new gasket is seated on the shower head.

위와 같은 목적을 달성하기 위하여, 본 발명의 실시예에 따른 샤워 헤드용 가스켓은 반도체 챔버의 샤워 헤드에 사용되는 가스켓으로서, 금속 재질의 심재층; 상기 심재층의 일측면에 결합되는 실리콘층; 상기 심재층의 타측면에 결합되는 열확산층; 및 상기 열확산층의 외측에 결합되는 점착층을 포함한다.In order to achieve the above object, the gasket for a shower head according to an embodiment of the present invention is a gasket used in the shower head of the semiconductor chamber, a metal core material layer; A silicon layer coupled to one side of the core material layer; A thermal diffusion layer coupled to the other side of the core layer; And an adhesive layer coupled to the outside of the thermal diffusion layer.

여기서, 상기 열확산층은, 그래파이트 재질을 포함할 수 있다.Here, the thermal diffusion layer may include a graphite material.

아울러, 상기 점착층은, 샤워 헤드에 임시 고정 후 20분 내지 30분 후에 휘발될 수 있다.In addition, the adhesive layer may be volatilized 20 to 30 minutes after temporary fixing to the shower head.

또한, 상기 점착층은, 샤워 헤드에 RF가 인가되면 휘발될 수 있다.In addition, the adhesive layer may be volatilized when RF is applied to the shower head.

나아가, 상기 점착층은, 외측에 이형지를 더 구비하여 이형지에서 이탈된 후 10분 내지 20분 후에 휘발될 수 있다.Furthermore, the adhesive layer may further be provided with a release paper on the outside and volatilize 10 to 20 minutes after being separated from the release paper.

더욱이, 상기 점착층은, 임시 고정이 가능할 수 있다.Moreover, the adhesive layer may be temporarily fixed.

또한, 상기 점착층은, 저점도 점착성분을 포함할 수 있다.Further, the adhesive layer may include a low-viscosity adhesive component.

게다가, 상기 점착층은, 액체 상태이고, 상기 샤워 헤드에 안착하기 직전에 도포될 수 있다. In addition, the adhesive layer is in a liquid state and can be applied just before seating on the shower head.

본 발명의 실시예에 따른 샤워 헤드용 가스켓에 의하면, According to the gasket for a shower head according to an embodiment of the present invention,

첫째, 실리콘층의 외측에 결합되는 점착층에 의해 새로운 가스켓을 샤워 헤드에 안착할 때 정확한 위치에 안착시키는 것이 용이해지므로 샤워 헤드의 실링이 제대로 되고, 가스켓 교체가 빠르고 정확하게 가능해진다.First, because the adhesive layer coupled to the outside of the silicon layer makes it easy to seat the new gasket in the correct position when seated on the shower head, the sealing of the shower head is properly performed, and the gasket replacement is quickly and accurately possible.

둘째, 열확산층이 그래파이트 재질을 포함하여 샤워 헤드의 열확산을 도모할 수 있다.Second, the thermal diffusion layer can include a graphite material to promote thermal diffusion of the shower head.

셋째, 점착층이 샤워 헤드에 임시 고정 후 휘발되어 점착층에 의한 부작용을 방지할 수 있다.Third, the adhesive layer is temporarily fixed to the shower head and then volatilized to prevent side effects caused by the adhesive layer.

넷째, 점착층이 임시 고정이 가능하여 샤워 헤드에 안착이 잘못되었을 경우, 재안착의 조절이 가능하다. Fourth, it is possible to temporarily adjust the re-seating if the adhesive layer is temporarily fixed so that the seating of the shower head is wrong.

도 1 및 도 2는 종래의 샤워 헤드 및 가스켓을 나타낸 사진이다.
도 3은 본 발명의 실시에에 따른 샤워 헤드용 가스켓의 분해 단면도이다.
도 4는 본 발명의 실시에에 따른 샤워 헤드용 가스켓의 사진이다.1 and 2 are pictures showing a conventional shower head and gasket.
3 is an exploded cross-sectional view of a gasket for a shower head according to an embodiment of the present invention.
4 is a photo of a gasket for a shower head according to an embodiment of the present invention.

이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예들을 상세히 설명한다. 이 때, 첨부된 도면에서 동일한 구성 요소는 가능한 동일한 부호로 나타내고 있음에 유의한다. 또한, 본 발명의 요지를 흐리게 할 수 있는 공지 기능 및 구성에 대한 상세한 설명은 생략할 것이다. 마찬가지 이유로 첨부 도면에 있어서 일부 구성요소는 과장되거나 생략되거나 개략적으로 도시되었다. Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. Note that, in this case, in the accompanying drawings, the same components are denoted by the same reference numerals as possible. In addition, detailed descriptions of well-known functions and configurations that may obscure the subject matter of the present invention will be omitted. For the same reason, some components in the accompanying drawings are exaggerated, omitted, or schematically illustrated.

도 3은 본 발명의 실시에에 따른 샤워 헤드용 가스켓의 분해 단면도, 도 4는 본 발명의 실시에에 따른 샤워 헤드용 가스켓의 사진이다.3 is an exploded cross-sectional view of a gasket for a shower head according to an embodiment of the present invention, and FIG. 4 is a photo of a gasket for a shower head according to an embodiment of the present invention.

도 3을 참조하면, 샤워 헤드용 가스켓(100)은 반도체 챔버의 샤워 헤드에 사용되는 가스켓으로서, 심재층(110), 실리콘층(120), 열확산층(130) 및 점착층(140)을 포함한다.Referring to FIG. 3, the gasket 100 for a shower head is a gasket used for a shower head in a semiconductor chamber, and includes a core layer 110, a silicon layer 120, a heat diffusion layer 130, and an adhesive layer 140. do.

심재층(110)은 금속 재질로서 알루미늄 등이 사용될 수 있다. The core material 110 may be made of aluminum or the like as a metal material.

실리콘층(120)은 실리콘 재질로서 심재층(110)의 일측면에 결합되며, 열확산층(130)은 심재층(120)의 타측면에 결합되고 그래파이트 재질을 포함할 수 있다. 열확산층(130)이 그래파이트 재질을 포함하여 샤워 헤드의 열확산을 도모할 수 있다.The silicon layer 120 is a silicon material and is coupled to one side of the core material layer 110, and the heat diffusion layer 130 is coupled to the other side of the core material layer 120 and may include a graphite material. The thermal diffusion layer 130 may include a graphite material to promote thermal diffusion of the shower head.

점착층(140)은 열확산층(130)의 외측에 결합된다. 점착층(140)에 의해 새로운 가스켓을 샤워 헤드에 안착할 때 정확한 위치에 안착시키는 것이 용이해지므로 샤워 헤드의 실링이 제대로 되고, 가스켓 교체가 빠르고 정확하게 가능해진다. The adhesive layer 140 is coupled to the outside of the heat diffusion layer 130. When the new gasket is seated on the shower head by the adhesive layer 140, it is easy to seat the gasket at the correct position, so that the sealing of the shower head is properly performed, and the gasket can be replaced quickly and accurately.

점착층(140)은 샤워 헤드에 임시 고정 후 20분 내지 30분 후에 휘발될 수 있다. The adhesive layer 140 may volatilize 20 to 30 minutes after temporary fixing to the shower head.

또한, 점착층(140)은 샤워 헤드에 RF가 인가되면 휘발될 수 있으며, 점착층(140)은 외측에 이형지(150)를 선택적으로 더 구비하여 이형지(150)에서 이탈된 후 10분 내지 20분 후에 휘발될 수 있다.In addition, the adhesive layer 140 may be volatilized when RF is applied to the shower head, and the adhesive layer 140 is further provided with a release paper 150 on the outside to be separated from the release paper 150 for 10 minutes to 20 minutes. It can volatilize in minutes.

점착층(140)은 임시 고정이 가능할 수 있다. 점착층(140)이 샤워 헤드에 임시 고정 후 휘발되어 점착층(140)에 의한 부작용을 방지할 수 있다.The adhesive layer 140 may be temporarily fixed. The adhesive layer 140 may be volatilized after being temporarily fixed to the shower head to prevent side effects caused by the adhesive layer 140.

다른 예로서 점착층(140)은 저점도 점착성분을 포함할 수 있다.As another example, the adhesive layer 140 may include a low-viscosity adhesive component.

점착층(140)은 액체 상태이고, 상기 샤워 헤드에 안착하기 직전에 도포될 수 있다.The adhesive layer 140 is in a liquid state and may be applied immediately before being seated on the shower head.

이렇게, 점착층(140)이 임시 고정이 가능하여 샤워 헤드에 안착이 잘못되었을 경우, 재안착의 조절이 가능하다. In this way, when the adhesive layer 140 is temporarily fixed and the seating on the shower head is wrong, it is possible to control the re-seating.

도 4를 참조하면, 샤워 헤드용 가스켓(100)은 필요에 따라 외측 가스켓(100A), 중간 가스켓(100B) 및 내측 가스켓(100C)을 구비할 수 있으며, 각각에는 홀(H)이 형성되어 샤워 헤드와의 1차 위치 마커로 활용된다. 4, the gasket 100 for the shower head may be provided with an outer gasket (100A), an intermediate gasket (100B) and an inner gasket (100C), if necessary, each having a hole (H) is formed shower It is used as a primary position marker with the head.

한편, 본 명세서와 도면에 개시된 본 발명의 실시예들은 본 발명의 기술 내용을 쉽게 설명하고 본 발명의 이해를 돕기 위해 특정 예를 제시한 것일 뿐이며, 본 발명의 범위를 한정하고자 하는 것은 아니다. 여기에 개시된 실시예들 이외에도 본 발명의 기술적 사상에 바탕을 둔 다른 변형예들이 실시 가능하다는 것은 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에게 자명한 것이다. On the other hand, the embodiments of the present invention disclosed in this specification and the drawings are merely to provide a specific example to easily explain the technical content of the present invention and to understand the present invention, and are not intended to limit the scope of the present invention. It is obvious to those skilled in the art to which the present invention pertains that other modifications based on the technical spirit of the present invention can be implemented in addition to the embodiments disclosed herein.

100...샤워 헤드용 가스켓
110...심재층
120...실리콘층
130...열확산층
140...점착층
150...이형지100 ... gasket for shower head
110 ... heartwood
120 ... silicon layer
130 ... heat diffusion layer
140 ... adhesive layer
150 ...

Claims (8)

반도체 챔버의 샤워 헤드에 사용되는 가스켓으로서,
금속 재질의 심재층;
상기 심재층의 일측면에 결합되는 실리콘층;
상기 심재층의 타측면에 결합되는 열확산층; 및
상기 열확산층의 외측에 결합되는 점착층을 포함하는 샤워 헤드용 가스켓.A gasket used for a shower head in a semiconductor chamber,
A metal core layer;
A silicon layer coupled to one side of the core material layer;
A thermal diffusion layer coupled to the other side of the core layer; And
Gasket for a shower head comprising an adhesive layer coupled to the outside of the heat diffusion layer. 청구항 1에 있어서,
상기 열확산층은,
그래파이트 재질을 포함하는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 1,
The thermal diffusion layer,
Gasket for a shower head, characterized in that it comprises a graphite material. 청구항 1에 있어서,
상기 점착층은,
샤워 헤드에 임시 고정 후 20분 내지 30분 후에 휘발되는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 1,
The adhesive layer,
Gasket for a shower head, characterized in that it volatilizes 20 to 30 minutes after temporary fixing to the shower head. 청구항 3에 있어서,
상기 점착층은,
샤워 헤드에 RF가 인가되면 휘발되는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 3,
The adhesive layer,
Gasket for a shower head, characterized in that it is volatilized when RF is applied to the shower head. 청구항 1에 있어서,
상기 점착층은,
외측에 이형지를 더 구비하여 이형지에서 이탈된 후 20분 내지 30분 후에 휘발되는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 1,
The adhesive layer,
A gasket for a shower head further comprising a release paper on the outside, and volatilized 20 to 30 minutes after being separated from the release paper. 청구항 1에 있어서,
상기 점착층은,
임시 고정이 가능한 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 1,
The adhesive layer,
Gasket for a shower head, characterized in that it can be temporarily fixed. 청구항 6에 있어서,
상기 점착층은,
저점도 점착성분을 포함하는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 6,
The adhesive layer,
Gasket for a shower head, characterized in that it comprises a low viscosity adhesive component. 청구항 1에 있어서,
상기 점착층은,
액체 상태이고, 상기 샤워 헤드에 안착하기 직전에 도포되는 것을 특징으로 하는 샤워 헤드용 가스켓.The method according to claim 1,
The adhesive layer,
Gasket for a shower head, characterized in that it is in a liquid state and is applied immediately before being seated on the shower head.
KR1020180120186A 2018-10-10 2018-10-10 Gasket for shower head KR20200040385A (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200478781Y1 (en) 2010-09-03 2015-11-13 램 리써치 코포레이션 Showerhead electrode

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200478781Y1 (en) 2010-09-03 2015-11-13 램 리써치 코포레이션 Showerhead electrode

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