KR20190005459A - Etching compositions and etching method using the same - Google Patents
Etching compositions and etching method using the same Download PDFInfo
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- KR20190005459A KR20190005459A KR1020170086139A KR20170086139A KR20190005459A KR 20190005459 A KR20190005459 A KR 20190005459A KR 1020170086139 A KR1020170086139 A KR 1020170086139A KR 20170086139 A KR20170086139 A KR 20170086139A KR 20190005459 A KR20190005459 A KR 20190005459A
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- fluorine
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- phosphoric acid
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- 238000005530 etching Methods 0.000 title claims abstract description 96
- 239000000203 mixture Substances 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims abstract description 33
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 25
- 239000011737 fluorine Substances 0.000 claims abstract description 25
- 150000001875 compounds Chemical class 0.000 claims abstract description 20
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 239000001257 hydrogen Substances 0.000 claims abstract description 10
- 239000000126 substance Substances 0.000 claims abstract description 10
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 9
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims abstract 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 62
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 31
- -1 N, N'-diethyl-1,1-difluoro-N, N'-dimethylmethanediamine Chemical compound 0.000 claims description 16
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 16
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 16
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 8
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims description 7
- 239000000654 additive Substances 0.000 claims description 5
- MGDCBOKBTJIJBT-UHFFFAOYSA-N 2,2-difluoro-1,3-dimethylimidazolidine Chemical compound CN1CCN(C)C1(F)F MGDCBOKBTJIJBT-UHFFFAOYSA-N 0.000 claims description 3
- BECUVKGRMKHUON-UHFFFAOYSA-N 1,1-difluoro-n,n,n',n'-tetramethylmethanediamine Chemical compound CN(C)C(F)(F)N(C)C BECUVKGRMKHUON-UHFFFAOYSA-N 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 11
- 125000000217 alkyl group Chemical group 0.000 abstract description 6
- 125000000753 cycloalkyl group Chemical group 0.000 abstract description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 150000004767 nitrides Chemical class 0.000 description 9
- 125000001424 substituent group Chemical group 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- DDPCCLZKQGMFFP-UHFFFAOYSA-N 2,2-difluoro-1,3-dimethyl-1,3-diazinane Chemical compound CN1CCCN(C)C1(F)F DDPCCLZKQGMFFP-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229910017855 NH 4 F Inorganic materials 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- KGWNTHHPMKEAIK-UHFFFAOYSA-N trifluoro(phenyl)silane Chemical compound F[Si](F)(F)C1=CC=CC=C1 KGWNTHHPMKEAIK-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 0 *C(N(*)*)(N(*)I)I Chemical compound *C(N(*)*)(N(*)I)I 0.000 description 1
- ATSPXGYWICMAMX-UHFFFAOYSA-N FC(F)(F)[Si](C(F)(F)F)(F)F Chemical compound FC(F)(F)[Si](C(F)(F)F)(F)F ATSPXGYWICMAMX-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003352 sequestering agent Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- RSKHNOFGQRATRE-UHFFFAOYSA-N trifluoromethylsilicon Chemical compound FC(F)(F)[Si] RSKHNOFGQRATRE-UHFFFAOYSA-N 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Abstract
Description
본 발명은 식각 조성물 및 이를 이용한 식각 방법에 관한 것이며, 보다 상세하게는 고온에서 안정적인 식각 속도를 유지하기 위한 화합물을 포함하는 식각 조성물 및 이 식각 조성물을 이용한 식각 방법에 관한 것이다. The present invention relates to an etching composition and an etching method using the same, and more particularly, to an etching composition comprising a compound for maintaining a stable etching rate at a high temperature and an etching method using the etching composition.
반도체 제조 공정에 있어서, 실리콘 산화막(SiO2) 등의 산화막 및 실리콘 질화막(SiNx) 등의 질화막은 대표적인 절연막으로 각각 단독으로, 또는 1층 이상의 막들이 교대로 적층되어 사용된다. 상기 실리콘 질화막은 실리콘 산화막, 폴리 실리콘막, 실리콘 웨이퍼 표면 등과 접촉하는 구조로CVD (Chemical vapor deposition) 공정을 통해서 증착되며, 이는 건식 식각 및 습식 식각을 통해서 제거되는데, 인산(phosphoric acid)을 이용한 습식 식각이 널리 이용되고 있다. In the semiconductor manufacturing process, an oxide film such as a silicon oxide film (SiO 2 ) and a nitride film such as a silicon nitride film (SiN x ) are used as representative insulating films, respectively, or one or more films are alternately laminated. The silicon nitride film is deposited through a CVD (Chemical Vapor Deposition) process in a structure in contact with a silicon oxide film, a polysilicon film, or a silicon wafer surface. The silicon nitride film is removed by dry etching and wet etching. Etching is widely used.
상기 실리콘 질화막을 제거하기 위한 습식 식각 공정에서는 일반적으로 인산과 탈이온수(deionized water)의 혼합물이 사용되고 있다. 상기 탈이온수는 식각율 감소 및 산화막에 대한 식각 선택성의 변화를 방지하기 위하여 첨가되는 것이나, 공급되는 탈이온수의 양의 미세한 변화에도 질화막 식각 제거 공정에 불량이 발생하는 문제가 있다. 또한, 인산은 강산으로서 부식성을 가지고 있어 취급에 어려움이 있다. In the wet etching process for removing the silicon nitride film, a mixture of phosphoric acid and deionized water is generally used. The deionized water is added in order to prevent the decrease of the etching rate and the change of the etching selectivity to the oxide film, but there is also a problem that the nitriding film etching process is defective even when the amount of the supplied deionized water is changed. In addition, phosphoric acid is corrosive as a strong acid, which makes handling difficult.
이를 해결하기 위하여, 종래에는 인산(H3PO4)에 불산(HF) 또는 질산(HNO3) 등을 포함하는 식각 조성물을 이용하여 질화막을 제거하는 기술이 공지되었으나, 오히려 산화막의 식각 속도 증가로 질화막과 산화막의 식각 선택비를 저해시키는 문제가 나타나게 된다.In order to solve this problem, there has been known a technique for removing a nitride film by using an etching composition containing phosphoric acid (HF) or nitric acid (HNO 3 ) as a phosphoric acid (H 3 PO 4 ). However, The etching selectivity ratio between the nitride film and the oxide film is inhibited.
일반적으로 식각 속도를 올리기 위해 반도체 식각 조성물에는 불소이온이 포함되는데, 이를 위하여 불화수소(HF), 불화암모늄(NH4F), 중불화암모늄(NH4HF2) 등을 사용한다. 인산에 원하는 양의 불소이온을 넣어서 알맞은 온도에 도달이 되면 웨이퍼를 집어넣고 식각을 하게 된다.Generally, fluorine ions are contained in a semiconductor etching composition to increase the etching rate. For this purpose, hydrogen fluoride (HF), ammonium fluoride (NH 4 F), ammonium fluoride (NH 4 HF 2 ) and the like are used. When the desired amount of fluorine ions is added to the phosphoric acid and the temperature is reached, the wafer is put in and etched.
이 경우 상기 불소이온은 고온에서 안정성이 떨어지는 문제점이 있다. 인산 식각 조성물은 150 내지 185의 고온 공정에서 사용되는데, 물의 분자들이 수소결합을 통하여 불산의 증발을 막아 주기는 하나, 약 90를 넘어가는 순간 암모니아와 불산으로 분해되어 증발이 일어난다. 따라서, 온도가 올라갈수록, 불소이온의 농도가 낮아져, 식각 조성물의 조성이 계속 변화하게 되어 식각 속도가 저하되고 동시에 선택비도 현저히 줄어드는 문제점이 있다. In this case, the fluorine ion has a problem of poor stability at a high temperature. The phosphoric acid etching composition is used in a high temperature process of 150 to 185. The molecules of water prevent hydrogen fluoride vaporization through hydrogen bonding, but decompose into ammonia and hydrofluoric acid at a moment when it exceeds about 90 and evaporate. Therefore, as the temperature is raised, the concentration of fluorine ions is lowered, and the composition of the etching composition is continuously changed, so that the etching rate is lowered, and at the same time, the selection ratio is significantly reduced.
따라서, 고온에서 수행되는 식각 공정에서도 식각 속도가 안정적으로 유지되고 선택비가 저하되지 않는 새로운 식각 조성물이 요구되고 있는 실정이므로, 본 발명은 고온에서 수행되는 식각 공정에서 식각 속도가 안정적으로 유지되고 선택비가 저하되지 않는 식각 조성물을 제공하고자 한다. Therefore, a new etch composition that maintains the etching rate stably and does not deteriorate the selectivity even in an etching process performed at a high temperature is desired. Accordingly, the present invention provides a novel etchant composition that maintains an etch rate in a stable etching process performed at a high temperature, To provide an etch composition that is not degraded.
또한 본 발명은 상기 식각 조성물을 이용한 식각 방법을 제공하고자 한다. The present invention also provides an etching method using the etching composition.
본 발명은 인산 및 하기 화학식 1로 표시되는 화합물을 포함하는 식각 조성물을 제공한다. The present invention provides an etching composition comprising phosphoric acid and a compound represented by the following formula (1).
[화학식 1][Chemical Formula 1]
상기 화학식 1에서,In Formula 1,
X1 및 X2는 각각 독립적으로 플루오르, 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기로 이루어진 군에서 선택되고,X 1 and X 2 is independently selected from the group consisting of fluorine, hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
X1 및 X2 중 적어도 하나는 플루오르이며, At least one of X < 1 > and X < 2 > is fluorine,
R1 내지 R4는 각각 독립적으로 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기로 이루어진 군에서 선택되고,R 1 to R 4 are each independently selected from the group consisting of hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
R1 내지 R4 중 적어도 하나는 C1~C10의 알킬기이며,At least one of R 1 to R 4 is a C 1 to C 10 alkyl group,
R2 및 R3는 서로 결합하여 5원 내지 8원고리를 형성할 수 있다.R 2 and R 3 may combine with each other to form a 5-to 8-membered ring.
본 발명은 상기 식각 조성물을 이용한 식각 방법을 제공한다.The present invention provides an etching method using the etching composition.
본 발명은 인산에 상기 화학식 1로 표시되는 화합물을 첨가 한 식각 조성물을 제공함으로써, 고온에서 불소이온을 천천히 방출함으로 불소이온의 농도가 긴 시간 동안 유지 될 수 있게 한다. The present invention provides a etching composition to which a compound represented by the above formula (1) is added in phosphoric acid, thereby slowly releasing fluorine ions at a high temperature, so that the concentration of fluorine ions can be maintained for a long time.
또한 본 발명은 인산에 상기 화학식 1로 표시되는 화합물을 첨가 한 식각 조성물을 제공함으로써, 고온에서 수행되는 식각 공정에서도 식각 속도가 안정적으로 유지되고 질화막/산화막 선택비가 높고, 질화막의 빠른 식각과 산화막의 식각 억제 효율이 뛰어난 식각 조성물을 제공한다. The present invention also provides an etching composition to which phosphoric acid is added in which the compound represented by the formula (1) is added. Thus, even in an etching process performed at a high temperature, the etching rate is stably maintained, the selection ratio of the nitride film / oxide film is high, An etching composition excellent in etching inhibition efficiency is provided.
이하, 본 발명에 대하여 상세하게 설명하도록 한다. Hereinafter, the present invention will be described in detail.
본 발명은 이하에서 개시되는 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 구현 가능하다. The present invention is not limited to the embodiments described below, but can be embodied in various other forms.
아래 열거된 정의는 본 발명을 기술하기 위해 사용된 다양한 용어들의 정의이다. 이들 정의는 달리 제한되지 않는 한, 단지 특정한 실시예를 설명하기 위해 사용된 것으로, 본 발명을 한정하려는 의도가 아니다. The definitions listed below are definitions of various terms used to describe the present invention. These definitions are used to describe only specific embodiments, unless otherwise limited, and are not intended to limit the invention.
본 발명에서의 용어 “알킬”은 특별한 언급이 없는 한 탄소수 1 내지 10개의 직쇄 또는 측쇄의 포화 탄화수소에서 유래되는 1가의 치환기이며, 직쇄 또는 측쇄 알킬기는 이의 주쇄에 10개 이하(예를 들어, C1-C10의 직쇄, C3-C10의 측쇄), 바람직하게는 4개 이하, 보다 바람직하게는 3개 이하의 탄소 원자를 가진다. “알킬”의 예로는 메틸, 에틸, 프로필, 이소프로필, 부틸, 이소부틸, sec-부틸, tert-부틸, 펜틸, 헥실 등이 있으나, 이에 한정되지 않는다.The term " alkyl " in the present invention is a monovalent substituent group derived from a linear or branched saturated hydrocarbon having 1 to 10 carbon atoms unless otherwise specified, and the linear or branched alkyl group has 10 or fewer (for example, C C 1 -C 10 straight chain, C 3 -C 10 branched chain), preferably not more than 4, more preferably not more than 3 carbon atoms. Examples of "alkyl" include, but are not limited to, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl,
본 발명에서의 용어 “시클로알킬”은 탄소수 3 내지 10개의 모노사이클릭 또는 폴리사이클릭 비-방향족 탄화수소로부터 유래된 1가의 치환기를 의미한다. 이러한 시클로알킬의 예로는 시클로프로필, 시클로펜틸, 시클로헥실, 바이시클로[2.1.1]헥실, 바이시클로[2.2.1]헵틸 등이 있으나 이에 한정되지 않으며, 바람직한 시클로알킬은 이의 고리 구조에 3,4,5,6 또는 7개의 탄소원자를 가진다. The term " cycloalkyl " in the present invention means a monovalent substituent derived from a monocyclic or polycyclic non-aromatic hydrocarbon having 3 to 10 carbon atoms. Examples of such cycloalkyl include, but are not limited to, cyclopropyl, cyclopentyl, cyclohexyl, bicyclo [2.1.1] hexyl and bicyclo [2.2.1] heptyl, 4, 5, 6 or 7 carbon atoms.
본 발명에서의 용어“아릴”은 특별한 언급이 없는 한 단독 고리 또는 2 이상의 고리가 조합된, 탄소수 6 내지 20개의 방향족 탄화수소로부터 유래된 1가의 치환기를 의미한다. 또한, 2 이상의 고리가 서로 축합되어 있고, 고리 형성 원자로서 탄소만을 포함(예를 들어, 탄소수는 8 내지 20개일 수 있음)하고, 분자 전체가 비-방향족성(non-aromacity)를 갖는 1가 치환기도 포함될 수 있다. 이러한 아릴의 예로는 페닐, 나프틸, 페난트릴, 안트릴, 플루오레닐 등이 있으나, 이에 한정되지 않는다. The term " aryl " in the present invention means a monovalent substituent derived from a C 6 -C 20 aromatic hydrocarbon having a single ring or a combination of two or more rings, unless otherwise specified. Further, it is preferable that two or more rings are condensed with each other and only carbon atoms are contained as ring-forming atoms (for example, the number of carbon atoms may be from 8 to 20), and a monovalent group having a non-aromacity throughout the molecule Substituents may also be included. Examples of such aryl include, but are not limited to, phenyl, naphthyl, phenanthryl, anthryl, fluorenyl, and the like.
본 발명에서 치환기에서 *는 결합이 이루어지는 부분을 의미한다. In the present invention, * in the substituent means a moiety in which a bond is formed.
본 발명은 인산 및 하기 화학식 1로 표시되는 화합물을 포함하는 식각 조성물을 제공한다: The present invention provides an etching composition comprising phosphoric acid and a compound represented by the following formula:
[화학식 1] [Chemical Formula 1]
상기 화학식 1에서,In Formula 1,
X1 및 X2는 각각 독립적으로 플루오르, 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기 로 이루어진 군에서 선택되고,X 1 and X 2 is independently selected from the group consisting of fluorine, hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
X1 및 X2는 적어도 하나가 플루오르이며, X < 1 > and X < 2 > are fluorine,
R1 내지 R4는 각각 독립적으로 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기 로 이루어진 군에서 선택되고,R 1 to R 4 are each independently selected from the group consisting of hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
R1 내지 R4는 적어도 하나는 C1~C10의 알킬기이며,At least one of R 1 to R 4 is a C 1 to C 10 alkyl group,
R2 및 R3는 서로 결합하여 고리를 형성할 수 있다.R 2 and R 3 may combine with each other to form a ring.
본 발명은 고온의 식각 공정에서 불소이온의 농도가 유지되므로, 식각 조성물의 조성을 일정하게 유지하게 하여 시간이 지날수록 식각 속도가 떨어지는 것을 방지하고 높은 선택비를 유지하게 한다.Since the concentration of fluorine ions is maintained in a high temperature etching process, the composition of the etching composition is kept constant, thereby preventing the etching rate from being lowered and maintaining a high selectivity over time.
본 발명의 일 구현예에서, X1 및 X2는 모두 플루오르인, 식각 조성물일 수 있다.In one embodiment of the invention, X 1 and X 2 are both fluorine, which may be an etching composition.
본 발명의 일 구현예에서, R1 내지 R4는 각각 독립적으로 모두 C1~C10의 알킬기인, 식각 조성물일 수 있다.In one embodiment of the present invention, R 1 to R 4 are each independently a C 1 to C 10 alkyl group, which may be an etching composition.
본 발명의 바람직한 한 구현예에 따르면, R1 내지 R4는 각각 독립적으로 메틸기, 에틸기, 프로필기, 부틸기 및 펜틸기 이루어진 군에서 선택될 수 있다.According to a preferred embodiment of the present invention, R 1 to R 4 each independently may be selected from the group consisting of a methyl group, an ethyl group, a propyl group, a butyl group and a pentyl group.
본 발명에서 R2 및 R3는 서로 결합하여 5원 내지 8원고리를 형성할 수 있으며, 바람직하게는 5원 및 6원고리를 형성 할 수 있다.In the present invention, R 2 and R 3 may combine with each other to form a 5-membered to 8-membered ring, preferably a 5-membered or 6-membered ring.
본 발명의 일 구현예에서, X1 및 X2는 모두 플루오르이고, R1 내지 R4는 각각 독립적으로 모두 C1~C5의 알킬기이며, R2 및 R3이 서로 결합하여 5원 내지 6원고리를 형성하는, 식각 조성물일 수 있다.In one embodiment of the present invention, X 1 and X 2 are both fluorine, R 1 to R 4 are each independently a C 1 to C 5 alkyl group, R 2 and R 3 are bonded to each other to form a 5- to 6- May be an etchant composition that forms a ring.
본 발명의 다른 실시예에 따르면 본 발명은 인산 및 하기 화학식 2 또는 3으로 표시되는 화합물을 포함하는 식각 조성물을 제공할 수 있다.According to another embodiment of the present invention, the present invention can provide an etching composition comprising phosphoric acid and a compound represented by the following general formula (2) or (3).
[화학식 2] (2)
[화학식 3] (3)
상기 화학식 2 또는 3에서,In the general formula (2) or (3)
R5 내지 R9는 각각 독립적으로 플루오르, C6~C20의 아릴기 및 트라이플루오르메틸기로 이루어진 군에서 선택되고,R 5 to R 9 are each independently selected from the group consisting of fluorine, a C 6 to C 20 aryl group and a trifluoromethyl group,
R5 내지 R8은 하나 이상의 플루오르, 및 하나 이상의 C6~C20의 아릴기 또는 트라이플루오르메틸기를 가진다. R 5 to R 8 have at least one fluorine, and at least one C 6 to C 20 aryl or trifluoromethyl group.
본 발명의 일 구현예에서, 화학식 2 또는 3의 R5 내지 R9는 각각 독립적으로 플루오르, 트라이플루오르메틸기 및 하기 화학식 4로 표시되는 치환기로 이루어진 군에서 선택되고, R5 내지 R8은 하나 이상의 플루오르, 및 하나 이상의 트라이플루오르메틸기 또는 하기 화학식 4로 표시되는 치환기를 가지는, 식각 조성물일 수 있다.In one embodiment, the chemical formula of 2 or 3 R 5 to R 9 are each independently selected from fluoro, tri-fluoro methyl group and to the group consisting of substituents represented by the formula 4, R 5 to R 8 is one or more Fluorine, and at least one trifluormethyl group or a substituent represented by the following formula (4).
[화학식 4][Chemical Formula 4]
상기 화학식 4에서,In Formula 4,
n는 0 내지 5의 정수이며, R10은 각각 독립적으로 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기로 이루어진 군에서 선택된다. n is an integer from 0 to 5, and each R 10 is independently selected from the group consisting of hydrogen, a C 1 to C 10 alkyl group, and a C 3 to C 10 cycloalkyl group.
본 발명의 일 구현예에서, 상기 화학식 4에서, n는 0 내지 5의 정수이며, R10는 C1~C5의 알킬기인, 식각 조성물일 수 있다.In one embodiment of the present invention, in Formula 4, n is an integer from 0 to 5, and R 10 is a C 1 to C 5 alkyl group.
본 발명의 바람직한 한 구현예에 따르면, R10은 메틸기, 에틸기, 프로필기, 부틸기 및 펜틸기 이루어진 군에서 선택될 수 있다.According to a preferred embodiment of the present invention, R 10 may be selected from the group consisting of a methyl group, an ethyl group, a propyl group, a butyl group and a pentyl group.
본 발명의 일 구현예에서, 상기 화학식 1 내지 3으로 표시되는 화합물은 2,2-다이플루오로-1,3-다이메틸이미다졸리딘, 1,1-다이플루오로-N, N, N', N'-테트라메틸메탄다이아민, 2,2-다이플루오로-1,3-다이메틸헥사하이드로피리미딘, N, N'-다이에틸-1,1-다이플루오로-N, N'-다이메틸메탄다이아민, 디플루오로트리페닐실리케이트(Ⅳ), 트리플루오로디페닐실리케이트(Ⅳ), 트리플루오로(페닐)실란, 디플루오로비스(트리플루오로메틸)실란 및 이들의 조합으로 이루어진 군으로부터 선택되는, 식각 조성물일 수 있다.In one embodiment of the present invention, the compounds represented by Chemical Formulas 1 to 3 are selected from the group consisting of 2,2-difluoro-1,3-dimethylimidazolidine, 1,1-difluoro-N, N, N N, N'-diethyl-1,1-difluoro-N, N'-tetramethylmethanediamine, 2,2-difluoro-1,3-dimethylhexahydropyrimidine, (Trifluoromethyl) silane, difluoroarylphosphonium silicate, difluorotriphenyl silicate (IV), trifluorodiphenyl silicate (IV), trifluoro (phenyl) silane, difluorobis Lt; RTI ID = 0.0 > etch < / RTI > composition.
본 발명의 일 구현예에서, 인산을 80 내지 90 중량%, 화학식 1 내지 3으로 표시되는 화합물을 0.1 내지 10 중량%로 포함하는 식각 조성물일 수 있다.In one embodiment of the present invention, it may be an etching composition comprising 80 to 90% by weight of phosphoric acid and 0.1 to 10% by weight of a compound represented by the general formulas (1) to (3).
상기 식각 조성물은, 상기 인산을 80 내지 90 중량%, 바람직하게는 85 내지 90 중량%, 더욱 바람직하게는 85 내지 89 중량%로 포함할 수 있다.The etching composition may contain 80 to 90 wt%, preferably 85 to 90 wt%, and more preferably 85 to 89 wt% of the phosphoric acid.
상기 인산을 80 중량% 미만으로 포함하는 경우, 이물질이 발생하거나 실리콘 질화막 식각 속도가 저하되어 질화막이 용이하게 제거되지 않을 우려가 있다.When the phosphoric acid is contained in an amount of less than 80 wt%, there is a fear that a foreign substance is generated or the etching rate of the silicon nitride film is lowered and the nitride film is not easily removed.
또한, 상기 인산을 90 중량%를 초과하여 포함하는 경우, 인산의 농도가 지나치게 높아져 식각 효과가 더디게 된다. If the phosphoric acid is contained in an amount of more than 90% by weight, the concentration of phosphoric acid becomes too high and the etching effect becomes slow.
상기 식각 조성물은, 상기 화학식 1 내지 3으로 표시되는 화합물을 0.1 내지 10 중량%, 바람직하게는 1 내지 8 중량%, 더욱 바람직하게는 3 내지 6 중량%로 포함할 수 있다.The etching composition may contain 0.1 to 10% by weight, preferably 1 to 8% by weight, more preferably 3 to 6% by weight of the compounds represented by the above formulas (1) to (3).
상기 화학식 1 내지 3으로 표시되는 화합물을 0.1 미만으로 투입되는 경우, 실리콘 질화막 식각 속도가 향상되지 않거나, 고온에서 식각 공정의 안정성이 유지되지 않아 이물질 발생의 우려가 있다.When the compound represented by the above general formulas (1) to (3) is added in an amount less than 0.1, the etching rate of the silicon nitride film is not improved or the stability of the etching process is not maintained at a high temperature.
또한, 상기 화학식 1로 표시되는 화합물이 10 중량%를 초과하여 투입되는 경우, 오히려 산화막의 식각 속도 증가로 질화막과 산화막의 식각 선택비를 저해시키는 문제가 나타나게 된다.When the compound represented by the above formula (1) is added in an amount exceeding 10% by weight, the etch rate of the oxide film increases and the etching selectivity of the nitride film and the oxide film is inhibited.
본 발명은 고온의 식각 공정에서 불소이온의 농도를 긴 시간 유지하기 때문에, 공정 시간이 진행됨에 따라 식각 조성물의 조성이 변하지 않는다. 따라서, 상기 범위로 인산 및 화학식 1 내지 3으로 표시되는 화합물을 포함하는 경우 식각 조성물은 반도체 공정시 적정 수준의 고온 안정성을 유지하면서도 높은 실리콘 산화막/질화막 선택비 및 향상된 실리콘 질화막 식각 속도를 구현할 수 있어 안정적인 식각 공정을 가능하게 한다.Since the present invention maintains the concentration of fluorine ions for a long time in a high temperature etching process, the composition of the etching composition does not change as the processing time progresses. Accordingly, when the phosphoric acid and the compound represented by the general formulas (1) to (3) are included in the above range, the etching composition can realize a high silicon oxide / nitride film selectivity and an improved silicon nitride film etching rate while maintaining an appropriate high- Thereby enabling a stable etching process.
본 발명의 일 구현예에서, 100 내지 300의 온도에서 상기 식각 조성물의 실리콘 질화막의 식각 속도는 20 내지 150Å/min 이며, 실리콘 산화막의 식각 속도는 0.2 내지 10Å/min인, 식각 조성물일 수 있다.In one embodiment of the present invention, the etch rate of the silicon nitride film of the etch composition at a temperature of 100 to 300 may be 20 to 150 A / min, and the etch rate of the silicon oxide film may be 0.2 to 10 A / min.
본 발명의 일 구현예에서, 100 내지 300의 온도에서 상기 식각 조성물의 실리콘 질화막/산화막 선택비는 5 이상인, 식각 조성물일 수 있다.In one embodiment of the present invention, the silicon nitride / oxide etch selectivity of the etch composition at a temperature of 100 to 300 may be an etchant composition of 5 or greater.
상기 식각 조성물은 다음과 같이 제조할 수 있다.The etching composition can be prepared as follows.
상기 화학식 1 내지 3으로 표시되는 화합물을 인산에 첨가한다. 첨가되는 불소이온의 농도는 10 PPM 내지 50000 PPM까지 가능하나 바람직하게는 100 PPM 내지 10000PPM이다.The compounds represented by the above formulas (1) to (3) are added to phosphoric acid. The concentration of fluorine ions added is from 10 PPM to 50000 PPM, but preferably from 100 PPM to 10000 PPM.
상기 식각 조성물을 상온에서 10분 내지 3시간을 섞는데 바람직하게는 30분 내지 1시간 이다. 그 뒤 인산을 끓이는데 100내지 300가 가능하나 바람직하게는 130 내지 200 이다The etching composition is mixed at room temperature for 10 minutes to 3 hours, preferably 30 minutes to 1 hour. Thereafter, 100 to 300 is possible for boiling phosphoric acid, preferably 130 to 200
본 발명의 일 구현예에서, 식각 속도 향상을 위한 기타 첨가제가 추가로 포함되는 것을 특징으로 하는, 식각 조성물일 수 있다.In one embodiment of the present invention, it may be an etchant composition, characterized by further comprising other additives for improving the etch rate.
상기 기타 첨가제는 식각 성능을 향상시키기 위하여 당업계에서 통상적으로 사용되는 임의의 첨가제를 말하는데, 계면활성제, 금속 이온 봉쇄제, 부식 방지제 등이 있다.The above-mentioned other additives include any additives commonly used in the art to improve the etching performance, including surfactants, metal ion sequestrants, and corrosion inhibitors.
특히, 식각 속도 향상을 위한 기타 첨가제가 포함되는 경우, 상기 화학식 1로 표시되는 화합물을 0.5 중량% 이상 포함되는 것이 고선택비 구현 측면에서 바람직하다.In particular, when other additives for improving the etching rate are included, it is preferable from the viewpoint of high selectivity that the compound represented by the formula (1) is contained in an amount of 0.5 wt% or more.
본 발명은 상기 식각 조성물을 이용하여 실리콘 산화막에 대하여 실리콘 질화막을 선택적으로 식각하는 단계를 포함하는 식각 방법 일 수 있다.The present invention may be an etching method including a step of selectively etching a silicon nitride film to a silicon oxide film using the etching composition.
본 발명은 상기 식각 조성물을 이용하여 수행되는 식각 공정을 포함하는 반도체 소자의 제조 방법일 수 있다.The present invention may be a method of manufacturing a semiconductor device including an etching process performed using the etching composition.
본 발명은 상기 식각 공정은 실리콘 산화막에 대하여 실리콘 질화막을 선택적으로 식각하는 것이며, 100 내지 300의 온도에서 수행되는 것인 반도체 소자의 제조 방법 일 수 있다.The present invention is a method for manufacturing a semiconductor device, wherein the etching process selectively etches a silicon nitride film to a silicon oxide film, and is performed at a temperature of 100 to 300.
이하에서는 본 발명의 구체적인 실시예들을 제시한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며 여기에서 설명하는 실험예에 한정되지 않는다.Hereinafter, specific embodiments of the present invention will be described. The present invention may, however, be embodied in many different forms and should not be construed as limited to the exemplary embodiments set forth herein.
실험예Experimental Example
실시예Example 1 내지 8: 1 to 8: 식각Etching 조성물의 제조 Preparation of composition
초기 불소이온의 농도가 500PPM이 되도록 인산에 상기 화학식 1 내지 3으로 표시되는 화합물을 첨가하여 식각 조성물을 제조하였다.The compound represented by the above Chemical Formulas 1 to 3 was added to phosphoric acid so that the initial fluorine ion concentration was 500 PPM to prepare an etching composition.
실시예 1 내지 8 및 비교예 1에 따른 식각 조성물은 [표 1]과 같다.The etching compositions according to Examples 1 to 8 and Comparative Example 1 are shown in [Table 1].
+ 2,2-다이플루오로-1,3-다이메틸이미다졸리딘 (0.025중량%)Phosphoric acid (85 wt% aqueous solution)
+ 2,2-Difluoro-1,3-dimethylimidazolidine (0.025% by weight)
+ 1,1-다이플루오로-N, N, N', N'-테트라메틸메탄다이아민 (0.025중량%)Phosphoric acid (-85 wt% aqueous solution)
(0.025% by weight) of 1,1-difluoro-N, N, N ', N'-
+ 2,2-다이플루오로-1,3-다이메틸헥사하이드로피리미딘 (0.025중량%)Phosphoric acid (85 wt% aqueous solution)
+ 2,2-Difluoro-1,3-dimethylhexahydropyrimidine (0.025% by weight)
+ N, N'-다이에틸-1,1-다이플루오로-N, N'-다이메틸메탄다이아민 (0.025중량%)Phosphoric acid (85 wt% aqueous solution)
+, N'-diethyl-l, l-difluoro-N, N'-dimethylmethanediamine (0.025%
+ 디플루오로트리페닐실리케이트(Ⅳ)(0.025중량%)Phosphoric acid (85 wt% aqueous solution)
+ Difluorotriphenyl silicate (IV) (0.025% by weight)
+ 트리플루오로디페닐실리케이트(Ⅳ)(0.017중량%)Phosphoric acid (85 wt% aqueous solution)
+ Trifluoro diphenyl silicate (IV) (0.017% by weight)
+ 트리플루오로(페닐)실란(0.017중량%)Phosphoric acid (85 wt% aqueous solution)
+ ≪ / RTI > trifluoro (phenyl) silane (0.017 wt.%)
+ 디플루오로비스(트리플루오로메틸)실란(0.025중량%)Phosphoric acid (85 wt% aqueous solution)
+ Difluorobis (trifluoromethyl) silane (0.025% by weight)
+ 불화 암모늄 (0.05중량%)Phosphoric acid (90 wt% aqueous solution)
+ Ammonium fluoride (0.05% by weight)
[물성 측정] [Measurement of physical properties]
상기 실시예 및 비교예에 따라 제조된 식각 조성물을 온도를 달리하면서, 시간의 경과에 따른 불소이온의 농도를 측정하였다. The etch compositions prepared according to the above Examples and Comparative Examples were measured for fluoride ion concentration over time with different temperatures.
그 결과값은 하기 [표 2]와 같다. The results are shown in Table 2 below.
상기 [표2]에 나타난 바와 같이, 실시예 1내지 8의 식각 조성물은 고온에서도 불소이온이 높은 농도로 유지되고 있음을 알 수 있다. As shown in Table 2, it can be seen that the etching compositions of Examples 1 to 8 are maintained at a high concentration of fluorine ions even at a high temperature.
이에 반해 비교예 1의 식각 조성물은 시간에 따라 불소이온의 농도가 급격하게 줄어가는 것을 볼 수 있다. 또한 고온에서 매우 불안정하여 불소이온의 농도가 일정하게 유지되지 않는 것을 알 수 있다. On the contrary, in the etching composition of Comparative Example 1, the concentration of fluorine ions sharply decreases with time. Also, it can be seen that the concentration of fluorine ion is not kept constant because it is very unstable at high temperature.
[식각 속도 측정] [Measurement of etching rate]
상기 실험예 및 비교예에 따라 제조된 식각 조성물을 식각 온도를 달리하면서 실리콘 질화막 기판을 넣어 식각을 진행하였다. The etching compositions prepared according to the above Experimental Examples and Comparative Examples were etched by inserting silicon nitride film substrates at different etching temperatures.
실리콘 질화막은 식각 조성물에 넣기 전 평탄화 작업을 진행하였으며, 평탄화작업은 50질량% 불산을 200:1로 희석한 후 희석 불산에 30초간 담가 진행하였다. The silicon nitride film was planarized before being put into the etching composition, and the planarization process was performed by immersing the substrate in a diluted hydrofluoric acid for 30 seconds after diluting 50% by mass of hydrofluoric acid with 200: 1.
식각 속도는 엘립소미트리(Nano-View, SE MG-1000; Ellipsometery)를 이용하여 실리콘 질화막을 300초 동안 식각한 후, 양 막의 식각 전의 두께와 식각 후의 두께의 차이를 식각 시간(분)으로 나누어 산출하였다.The etching rate was determined by etching the silicon nitride film for 300 seconds using a Nano-View (SE MG-1000; Ellipsometry), dividing the difference between the thickness before etching and the thickness after etching by the etching time Respectively.
하기 표3에 시간에 따른 식각 속도의 결과값을 나타내었다. Table 3 shows the results of etch rate with time.
(H)Heating time
(H)
(질화막/ 산화막)Selection ratio
(Nitride film / oxide film)
상기 [표3]에 나타난 바와 같이 실시예 1내지 4의 식각 조성물은 질화막의 식각 속도가 증가하고 산화막의 식각 속도가 억제함을 알 수 있다. As shown in Table 3, it can be seen that the etching compositions of Examples 1 to 4 increase the etching rate of the nitride film and suppress the etching rate of the oxide film.
이는 본 발명에 따른 식각 조성물의 고온 안정성을 나타내는 것으로, 고온의 식각 공정에서 본 발명의 효과를 확인할 수 있었다. This indicates high temperature stability of the etching composition according to the present invention, and the effect of the present invention can be confirmed in a high temperature etching process.
이에 반해, 비교예 1및 2는 고온에서 가열 시간의 차이에 따라 질화막 식각 속도의 차이(%)도 매우 큰 바, 고온에서 불안정하여 식각 조성물의 농도가 일정하게 유지되지 않는 것을 나타낸다. On the contrary, in Comparative Examples 1 and 2, the difference (%) of the etching rate of the nitride film was very large according to the difference in the heating time at a high temperature, and it was unstable at a high temperature, indicating that the concentration of the etching composition was not maintained constant.
Claims (8)
하기 화학식 1로 표시되는 화합물;
을 포함하는, 식각 조성물:
[화학식 1]
상기 화학식 1에서,
X1 및 X2는 각각 독립적으로 플루오르, 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기로 이루어진 군에서 선택되고,
X1 및 X2 중 적어도 하나는 플루오르이며,
R1 내지 R4는 각각 독립적으로 수소, C1~C10의 알킬기 및 C3~C10의 시클로알킬기로 이루어진 군에서 선택되고,
R1 내지 R4 중 적어도 하나는 C1~C10의 알킬기이며,
R2 및 R3는 서로 결합하여 5원 내지 8원고리를 형성할 수 있다.
Phosphoric acid; And
A compound represented by Formula 1 below;
Wherein the etching composition comprises:
[Chemical Formula 1]
In Formula 1,
X 1 and X 2 is independently selected from the group consisting of fluorine, hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
At least one of X < 1 > and X < 2 > is fluorine,
R 1 to R 4 are each independently selected from the group consisting of hydrogen, a C 1 to C 10 alkyl group and a C 3 to C 10 cycloalkyl group,
At least one of R 1 to R 4 is a C 1 to C 10 alkyl group,
R 2 and R 3 may combine with each other to form a 5-to 8-membered ring.
X1 및 X2는 모두 플루오르인, 식각 조성물.
The method according to claim 1,
X < 1 > and X < 2 > are both fluorine.
R1 내지 R4는 각각 독립적으로 모두 C1~C10의 알킬기인, 식각 조성물.
The method according to claim 1,
And R 1 to R 4 are each independently a C 1 to C 10 alkyl group.
X1 및 X2는 모두 플루오르이고, R1 내지 R4는 각각 독립적으로 모두 C1~C5의 알킬기이며, R2 및 R3이 서로 결합하여 5원 내지 6원고리를 형성하는, 식각 조성물.
The method according to claim 1,
X 1 and X 2 are both fluorine, R 1 to R 4 are each independently a C 1 to C 5 alkyl group, and R 2 and R 3 are bonded to each other to form a 5-to 6-membered ring. .
상기 화합물은 2,2-다이플루오로-1,3-다이메틸이미다졸리딘, 1,1-다이플루오로-N, N, N', N'-테트라메틸메탄다이아민, 2,2-다이플루오로-1,3-다이메틸헥사하이드로피리미딘, N, N'-다이에틸-1,1-다이플루오로-N, N'-다이메틸메탄다이아민 및 이들의 조합으로 이루어진 군으로부터 선택되는, 식각 조성물.
The method according to claim 1,
The compound is selected from the group consisting of 2,2-difluoro-1,3-dimethylimidazolidine, 1,1-difluoro-N, N, N ', N'-tetramethylmethanediamine, 2,2- N, N'-dimethylmethanediamine, N, N'-diethyl-1,1-difluoro-N, N'-dimethylmethanediamine and combinations thereof. Lt; / RTI >
인산을 80 내지 90중량%,
화학식 1로 표시되는 화합물을 0.1 내지 10중량%,
로 포함하는, 식각 조성물.
The method according to claim 1,
80 to 90% by weight of phosphoric acid,
0.1 to 10% by weight of the compound represented by the formula (1)
≪ / RTI >
식각 속도 향상을 위한 첨가제가 추가로 포함되는 것을 특징으로 하는, 식각 조성물.
The method of claim 1, wherein
Wherein an additive for improving the etching rate is further included.
A method of etching comprising: selectively etching a silicon nitride film on a silicon oxide film using the etching composition according to claim 1;
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| US11781066B2 (en) | 2019-10-09 | 2023-10-10 | Entegris, Inc. | Wet etching composition and method |
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