KR20170108888A - Laminated sheet polishing method and apparatus performing the same - Google Patents

Laminated sheet polishing method and apparatus performing the same Download PDF

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Publication number
KR20170108888A
KR20170108888A KR1020170033913A KR20170033913A KR20170108888A KR 20170108888 A KR20170108888 A KR 20170108888A KR 1020170033913 A KR1020170033913 A KR 1020170033913A KR 20170033913 A KR20170033913 A KR 20170033913A KR 20170108888 A KR20170108888 A KR 20170108888A
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South Korea
Prior art keywords
polished
block
polishing
machining
stacking direction
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KR1020170033913A
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Korean (ko)
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KR101925616B1 (en
Inventor
강흥석
박명진
이종화
심민석
안덕근
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(주)이티에스
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Publication of KR20170108888A publication Critical patent/KR20170108888A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/005—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laminated sheet polishing method and a laminated sheet polishing apparatus for carrying out the same. More particularly, the present invention relates to a polishing method and apparatus for laminating and polishing a sheet to be polished.
The present invention is a laminated sheet polishing method for polishing a block to be polished (40) having a length (L), a width (W) and a height (H) by stacking a plurality of sheets to be polished (40) , A first machining step of grinding a side surface parallel to the stacking direction of the block to be polished (40) by a relative rotation about a rotation axis parallel to the stacking direction, and after the first machining step, And a second machining step of grinding the side surface of the second substrate (40) by a relative linear movement perpendicular to the stacking direction.

Description

[0001] The present invention relates to a method for polishing a laminated sheet and a method for polishing the same,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a laminated sheet polishing method and a laminated sheet polishing apparatus for carrying out the same. More particularly, the present invention relates to a polishing method and apparatus for laminating and polishing a sheet to be polished.

In general, electronic devices such as a smart phone, a notebook computer, and a PDA are equipped with a small-sized camera and a touch sensor. A small camera and a touch sensor provided in electronic devices are easily damaged by an impact, so that a thin glass is used as a cover glass.

On the other hand, the thin film glass must undergo a polishing process on the outer side and edges in order to be applied to the product. Conventionally, an abrasive process uses a method in which a person grinds thin glass individually one by one. However, such an individual polishing method has a problem that the productivity is low and the labor cost is increased.

In addition, since the dual camera module 11 is incorporated in the smart phone 1, the cover glass applied to the back of the smart phone or the like has a planar shape having a length longer than the width as shown in Fig.

In this case, since the planar shape is not symmetrical, there is a problem that it is difficult to perform side processing with a polishing method or a polishing apparatus that processes a cover glass having a square or circular planar shape.

It is an object of the present invention to provide a laminated sheet polishing method for automatically polishing a block to be polished in which a plurality of sheets to be polished are recognized, and a laminated sheet polishing apparatus for carrying out the method.

SUMMARY OF THE INVENTION The present invention has been made in order to achieve the above-mentioned object of the present invention, and it is an object of the present invention to provide a polishing apparatus and a polishing apparatus, in which a plurality of polishing target sheets (40) are stacked in a stacking direction in a height direction, (40) is polished by a relative rotation about a rotation axis parallel to the stacking direction, the side surface being parallel to the stacking direction of the block to be polished (40) And a second machining step of grinding the side surface of the block to be polished (40) by relative linear movement perpendicular to the direction of stacking after the first machining step A sheet polishing method is disclosed.

In the first machining step, the supplied polishing target block 40 is fixed and the side of the block to be polished 40 is moved to the first machining position provided with the first sidewall 124 for polishing by the relative rotation A second machining position moving step and a rotational machining step of rotating the grinding target block 40 about the rotation axis parallel to the stacking direction at the first machining position.

The first machining step may further include a distance adjusting step of adjusting a distance between the polishing target block 40 and the first sidelight 124 in accordance with the rotation of the polishing target block 40.

The second machining step includes a second machining step 224 for polishing the side of the block to be polished 40 by relative linear motion by fixing the polished target block 40 in the first machining step And a linear polishing step of polishing the side surface of the block to be polished 40 by a relative linear movement perpendicular to the stacking direction of the block to be polished 40. In this case,

The linear polishing step may include a linear reciprocating step of linearly reciprocating the block to be polished 40 along the longitudinal direction of the block to be polished 40 based on the second processing position.

The present invention relates to a laminated sheet polishing apparatus for polishing a target block (40) having a length (L), a width (W) and a height (H) by stacking a plurality of sheets to be polished (30) , A first machining portion (100) for grinding a side parallel to the stacking direction of the block to be polished (40) by a relative rotation about a rotation axis parallel to the stacking direction, and a second machining portion And a second machining unit 200 for polishing the side surface of the block to be polished 40 by relative linear motion perpendicular to the stacking direction.

The first processing part 100 includes a first jig part 110 for fixing the supplied block to be polished 40 and moving to a first processing position, 40 by a relative rotation around a rotational axis parallel to the stacking direction.

The first jig part 110 includes a first gripper 111 for fixing the block to be polished 40, a rotating shaft connected to the first gripper and rotating about the rotation axis, And a first jig moving part for moving the rotating shaft to the first machining position.

The first jig 110 may be provided with a distance adjusting unit that adjusts the distance between the polishing target block 40 and the first sidewall 120 according to the rotation of the polishing target block 40 by the rotating shaft. Means 130 may be included.

The distance adjusting means 130 includes a cam that is coupled to one side of the rotating shaft and rotates together with the rotation shaft in a state of being in contact with a fixing member 134 fixed to the side of the first side 120, And the plane shape of the cam member 132 may correspond to the plane shape of the block to be polished.

The first sidewall 120 includes a rotating shaft 122 parallel to the stacking direction of the block to be polished 40 fixed to the first jig 110 and a second rotating shaft 122 coupled to the rotating shaft 122, And may include a plurality of protruding brush fibers 124.

The second processing part 200 includes a second jig part 210 fixed to the block to be polished 40 supplied from the first processing part 100 and moved to a second processing position, And a second sidewall 220 for polishing the side surface of the block to be polished 40 by relative linear movement perpendicular to the lamination direction.

The second jig 210 includes a second gripper 211 for fixing the block to be polished 40 and a second gripper 211 for moving the second gripper 211 to the second machining position, And a second jig moving part that reciprocates linearly with respect to the center.

The second sidewall 220 includes a rotation shaft 222 parallel to the stacking direction of the block to be polished fixed to the second jig 210 and a second shaft 220 coupled to the rotation shaft 222, And may include a plurality of protruding brush fibers 224.

The laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention can polish the side surfaces of a plurality of polish target sheets by polishing the side surface of the polish target block in which a plurality of polish target sheets are laminated, have.

The laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention are advantageous in that the production cost can be reduced by reducing the labor cost by automating the polishing process for polishing the side surface of the block to be polished.

The laminated sheet polishing method and the laminated sheet polishing apparatus according to the present invention are characterized in that when the side of the block to be polished is machined by the relative rotation in the first machining step, the center of the block to be polished and the side By providing the distance adjusting means for adjusting the distance between the work and the work, there is an advantage that side processing can be performed also on the polishing target sheet having a length longer than the width.

A laminated sheet polishing method and a laminated sheet polishing apparatus according to the present invention are characterized by comprising a step of polishing a block to be polished in a state of being in contact with a side face of a block to be polished by a rotating shaft parallel to the stacking direction of the block to be polished, So that the advantage of being able to precisely process the side surface of the sheet to be polished without damaging the sheets to be polished is obtained even when the thicknesses of the sheets to be polished constituting the block to be polished are extremely thin have.

1 is a perspective view showing an electronic apparatus in which a laminated sheet polished in a laminated sheet polishing apparatus according to an embodiment of the present invention is applied as a cover glass of a camera module.
2A is a perspective view showing a target block to be polished in which a plurality of laminated sheets are stacked.
FIG. 2B is a perspective view showing a target block to be polished after external contouring as a target block of FIG. 2A. FIG.
2C is a plan view of the polishing target block of FIG. 2B. FIG.
3 is a schematic plan view showing a part of the constitution of a laminated sheet polishing apparatus according to an embodiment of the present invention.
Fig. 4 is a view showing the operation of the laminated sheet polishing apparatus of Fig. 3; Fig.
5 is an enlarged view showing, on an enlarged scale, a part of the constitution of the laminated sheet polishing apparatus of Fig.
Fig. 6 is a view for explaining the operating principle of the laminated sheet polishing apparatus of Fig. 3. Fig.
Fig. 7 is a schematic plan view showing another structural part of the laminated sheet polishing apparatus according to one embodiment of the present invention.
Fig. 8 is a view showing the operation of the laminated sheet polishing apparatus of Fig. 7; Fig.
9 is a perspective view showing a part of the constitution of a laminated sheet polishing apparatus according to an embodiment of the present invention.

Hereinafter, a laminated sheet polishing apparatus according to the present invention will be described with reference to the accompanying drawings.

The laminated sheet polishing apparatus according to the present invention is an apparatus for grinding a side surface of a block to be polished (40) in which a plurality of sheets to be polished (30) are laminated, wherein the polishing process is a polishing process such as roughing, finishing, But it is not limited to a specific processing step and includes all the steps necessary for processing the target sheet 30. [

For example, polishing by the above-described laminated sheet polishing apparatus is a step of polishing the edge, that is, the edge portion of the sheet 30 to be polished to remove a sharp portion, and can be expressed by a so-called chamfering process.

The polishing target sheet 30 may be a protective glass (cover glass) such as a tempered glass for protecting a lens of a camera module, a touch screen, or the like, and may be a sheet requiring a finishing process for removing a sharp portion on a side surface All members can be targets.

Particularly, the polishing target sheet 30 is useful for processing a thin sheet having a thickness of 0.3 mm or less.

The polishing target block 40 is a block formed by stacking the sheets 30 to be polished, as shown in FIGS. 2A to 2C, and various structures are possible according to the lamination structure of the sheets 30 to be polished.

Particularly, the polishing target block 40 is formed by dividing a laminated sheet in which large sheets to be planarly divided by a plurality of sheets to be polished 30 are laminated by using a cutting means such as a rotary cutting machine, ). ≪ / RTI >

The laminated sheet may include a protective sheet 10, a thin film, and a sheet 30 to be polished.

The laminated sheet may be formed in a structure in which a thin film and a sheet 30 to be polished are stacked alternately. At this time, the thin film and the sheet 30 to be polished can be bonded to each other through an adhesive.

Conventional laminated sheets have a problem in that a separate processing glass is laminated between the sheets 30 to be polished, and therefore, the thickness of the entire laminated sheets is thick and the layer intervals are uneven, resulting in a problem of low polishing efficiency.

On the contrary, the present invention can form the laminated sheet with a thin thickness by using a thin film instead of the processing glass in the laminated sheet (1), and the layer spacing can be uniformly formed, thereby improving the polishing efficiency.

The laminated sheet can form a sandwich structure by sandwiching the laminated thin film and the object sheet 30 between the upper and lower protective sheets. That is, the laminated sheet may include a protective sheet at the top and bottom of the laminate.

As shown in FIGS. 2A and 2B, the polishing target block 40 is formed by laminating a protective sheet on the upper and lower surfaces thereof, and a bonding sheet 30 for bonding the sheets 30 to be polished, Layer (at least one of an adhesive and a thin film) may be laminated.

The polishing target block 40 may be formed in a block shape having a length L, a width W and a height H as shown in Figs. 2A and 2B.

At this time, the planar shape of the block to be polished 40 may be various shapes such as a circle and a square depending on the use of the sheet 30 to be polished.

2A and 2B, the polishing target sheet 30 of the block to be polished 40 may have an elliptical or rectangular planar shape whose length L is longer than the width W have.

On the other hand, the contour block 40 to be polished through the cutting means can be contoured to the side surface in the stacking direction of the block to be polished 40 so as to be processed into a predetermined shape according to the application.

For example, the block to be polished 40 after the outline machining may have a rounded side edge as shown in Figs. 2B and 2C.

On the other hand, in the case of the block 40 to be polished in which the length L of the planar shape is longer than the width W, the side edges may be rounded to have an elliptical planar shape as shown in Fig. 2C.

Specifically, the planar shape of the block to be polished 40 corresponds to a pair of linear regions 31 and a width direction W corresponding to the longitudinal direction L and opposed to each other, and both ends of the linear portion are curved And a pair of curved regions 32 connecting the first and second curved regions.

It is preferable that chamfering of the side surface of the block to be polished 40 is further performed since sharp edges can be formed at each corner of the plurality of objects to be polished 30 laminated on the block to be polished 40 Do.

On the other hand, the apparatus for polishing a laminated sheet according to the present invention is characterized in that a polishing target block 40 having a length (L), a width (W) and a height (H) L) of the polishing target block 40, which is longer than the width W, of the polishing target block 40 is parallel to the stacking direction of the polishing target block 40 (including external shaping, chamfering, etc.).

2A to 9, the sheets to be polished 30 are stacked in the stacking direction in the height direction so as to have a length L, a width W and a height H, A polishing apparatus for polishing a surface of a polishing target block (40) having a polishing surface and a polishing surface, comprising: a first processing step of polishing a side surface parallel to a stacking direction of a polishing subject block (40) And a second machining portion 200 which is supplied with the polished target block 40 from the first machining portion 100 and polishes the side surface of the target block 40 by a relative linear movement can do.

The first machining portion 100 can be configured in various ways with a configuration in which the side parallel to the stacking direction of the block to be polished 40 is polished by a relative rotation around a rotation axis parallel to the stacking direction.

The first machining portion 100 can polish all or a part of the side surface parallel to the stacking direction of the block to be polished 40.

3, the first processing part 100 includes a first jig part 110 for fixing the supplied block to be polished 40 and moving to a first processing position, And a first sidewall 120 installed at the machining position and polishing the parallel side surface of the to-be-polished block 40 in the stacking direction by relative rotation around a rotation axis parallel to the stacking direction.

The first jig 110 may have various configurations by supporting a pair of opposing surfaces except the side to be polished of the block to be polished 40 and fixing the block 40 to be polished.

As an example, the first jig 110 may include a first gripper 111 for fixing the block to be polished 40 at a first predetermined fixed position, as shown in Figs. 3 and 4 have.

The first gripper 111 includes a pair of support members for supporting respective opposing surfaces of the block to be polished and a pair of support members for driving movement of at least one of the pair of support members for adjusting the distance between the pair of support members And a first gripper driver (not shown).

The first gripper driver may be configured as a pressure system such as hydraulic or pneumatic, but it is not limited thereto, and various drive systems can be applied as long as it can drive the movement of the support member.

At least one or more blocks 40 to be polished may be fixed between the pair of supporting members, but it is preferable that a plurality of blocks to be polished 40 are fixed for improvement of productivity.

The first jig includes a first polishing target block frame portion 150 supporting a plurality of blocks to be polished 40 before a plurality of polished blocks 40 are fixed between a pair of supporting members can do.

4 and 5, the first block to be polished 150 includes a plurality of blocks to be polished 40 arranged in a line along the stacking direction of the blocks to be polished 40 And a plurality of blocks to be polished 40 are fixed by a pair of support members and then removed.

The first jig 110 includes a rotating shaft coupled to the first gripper 111 and rotating about a rotational axis C1 parallel to the stacking direction of the block to be polished 40, And a rotation driving unit 112 for driving the driving unit.

The rotation driving unit 112 is configured to drive the rotation of the rotating shaft, and various configurations are possible.

For example, the rotation driving unit 112 may be configured as a belt and a driving pulley structure combined with a rotating shaft.

The first jig 110 includes a first gripper 111 for fixing the block to be polished 40 and a first gripper 111 for moving the rotary shaft from the first fixed position to a first processing position where the polishing process is performed. (Not shown).

The first jig moving part may be constituted by a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic pressure, but is not limited thereto.

The first jig moving unit may be configured to move the first gripper 111 and the rotating shaft between the first fixed position and the first machining position.

The first jig moving unit may further include a first gripper 111 and a guide unit (not shown) for guiding a moving path of the rotating shaft.

The first sidewall 120 is configured to polish a parallel side surface of the block to be polished 40 in the stacking direction by relative rotation about a rotation axis parallel to the stacking direction, Configuration is possible.

9, the first sidewall 120 includes a rotating shaft 122 parallel to the stacking direction of the block to be polished 40 fixed to the first jig 111, And may include a plurality of radially projecting brush fibers 124 coupled to the brush 122.

The first sidewall 120 may further include a rotation driving unit 126 for rotating the brush fibers 124 about the rotation axis 122. [

9, the brush fibers 124 may be provided along an outer circumferential surface of a cylindrical body portion 310 having a coupling hole 311 to which the rotary shaft 122 is coupled, .

The brush fibers 124 may be rubbed by relative rotation in a superimposed manner with a certain portion of the side surface of the block to be polished 40 moved to the first processing position.

The laminated sheet polishing apparatus according to the present invention polishes the side surface of the block to be polished 40 to the brush fibers 124 so that the object sheet 30 to be polished stacked on the block to be polished 40 is thin , 0.3 t or less), it is possible to perform machining (chamfering) on the side surface of the sheet 30 to be polished without damaging or chipping the side surface of the sheet 30 to be polished.

In addition, the first sidewall 120 may include abrasive grains 50 bonded or attached to the brush fibers 124, as shown in Fig.

The first processing unit 100 may further include an abrasive supplying unit 140 for supplying an abrasive containing abrasive grains 50 to the brush fibers 124.

The abrasive may correspond to a liquid comprising abrasive grains 50 or abrasive grains 50 that are used to perform a grinding process such as scraping or smoothing the surface of a metal or glass.

The abrasive may include at least one of cesium powder and ceramic powder, but is not limited thereto. The abrasive can finely shave or micro-fracture the side surface of the block to be polished 40. The micro fragments scraped from the side of the block to be polished 40 can be removed by the rotating brush fibers 124.

The first machining unit 100 further includes a polishing liquid supply unit (not shown) for supplying a polishing liquid to the first polishing pad 120 so that the side surface of the polishing target block 40 is smoothly polished . At this time, the abrasive liquid may be mixed with an abrasive with a liquid substance containing water or an oil component.

The abrasive supply part 140 and the abrasive liquid supply part (not shown) may be realized with a nozzle connected to the abrasive supply system for spraying the abrasive or abrasive liquid to the first side abutment 120.

The blend mixed with the abrasive or abrasive liquid supplied to the first sidewall 120 may be adhered to the brush fibers 124.

On the other hand, in the first machining unit 100 having the above-described configuration, it is preferable that the first fixed position is fixed at a predetermined position, but the first machining position does not mean the fixed specific position, 40 is conceptually defined as a position of the first gripper 111 that fixes the block 40 to be polished when machining of the polishing target block 40 is performed.

That is, the first machining position may vary depending on the machined portion or the degree of side machining in the side surface of the block to be polished 40.

Particularly when the target block 40 to be machined has a planar shape whose length L is longer than the width W as shown in Fig. 2B, Since the distance from the rotation center C1 to the processing target side is not maintained constant, as the polishing target block 40 fixed to the first gripper 111 rotates about the rotation center C1, 40 and the first sidewall 120 need to be adjusted.

6, the first jig 110 is rotated by the rotation driving unit 112 to rotate the polishing target block 40 and the first sidewall 120 And a distance adjusting unit 130 for adjusting the distance between the first and second lens groups.

The distance adjusting means 130 may adjust the distance between the polishing target block 40 and the first sidewall 40 in conjunction with the rotation of the polishing target block 40 by the rotation driving portion 112, And the distance between the first electrode 120 and the second electrode 120 is adjusted.

For example, the distance adjusting means 130 is coupled to one side of the rotating shaft of the first jig 110, and in contact with the fixing member 134 fixed to the first side 120, And a cam member 132 that rotates together with the rotation of the cam member 132.

Since the cam member 132 is coupled to one side of the rotating shaft of the first jig 110, the cam member 132 is moved toward the fixing member 134 by the first jig moving part, Can be rotated together.

The rotation center C1 of the cam member 132 may be coupled to one side of the rotary shaft so as to coincide with the rotation center C1 of the block to be polished 40 fixed to the first jig 110. [

The cam member 132 may be rotated while being held in contact with the fixing member 134 provided on the side of the first side 120 in the course of processing the block to be polished 40.

At this time, the cam member 132 can be held in contact with the fixing member 134 by being moved and pressed toward the fixing member 134 by the first jig moving part.

At this time, the fixing member 134 can be variously configured by fixing the side of the first side 120 to support the side surface of the cam member 132.

The fixing member 134 is preferably made of a metal material in order to minimize the friction generated between the cam members due to the rotation of the cam member 132 and minimize abrasion due to friction.

The fixing member 134 is preferably in line contact with the cam member to stably support the cam member 132 and minimize the friction surface.

The fixing member 134 may be installed at various positions if the first side is on the side of the base 120.

The plane shape of the cam member 132 may be configured to form a closed curve instead of a circular shape so that the distance between the polishing target block 40 and the first sidewall 120 can be adjusted in accordance with the rotation of the cam member 132. [ .

In one embodiment, the planar shape of the block to be polished 40 is a pair of linear regions 131 corresponding to the longitudinal direction and facing each other as shown in Fig. 2C, and corresponding to the width direction, and both ends of the linear region are curved The plane shape of the cam member 132 may be a shape corresponding to the plane shape of the block to be polished 40, as shown in Fig. 6 have.

At this time, the first jig moving part presses the first gripper 111 and the rotating shaft toward the first sidewall 120 with a predetermined pressing force so that the cam member 132 is brought into close contact with the fixing member 134 Is preferably maintained.

In this case, the center of rotation C1 of the block to be polished 40 can be moved between the imaginary lines L1 and L2 in the vertical direction, and accordingly, the center of rotation C1 of the block to be polished 40, The distance between the center of rotation C2 of the sidewall can be adjusted. Therefore, the present invention has an advantage that the machining can be performed automatically for the polishing target block 40 having the shape shown in Fig. 2B.

Concretely, only the curved region 32 excluding the straight line region 31 of the block to be polished 40 having the length L, the width W and the height H according to the rotation of the cam member 132 Can be processed.

The second processing unit 200 is configured to sequentially polish the side surface of the block to be polished 40 by the relative linear movement by receiving the polishing target block 40 polished in the first processing unit 100, Configuration is possible.

Here, the second machining portion 200 can process the side surface to be polished into a planar shape by polishing the side surface of the block to be polished 40 by relative linear movement.

That is, the second machining portion 200 is particularly useful for machining the linear region 31 of the sheet 30 to be polished shown in Figs. 2B and 2C.

Specifically, when the portion of the curved region 32 excluding the linear region 31 of the block to be polished 40 having the width W and the height H in the first processing portion 100 is machined, 2 The machining portion 200 can process the unprocessed side surface portion, that is, the straight line region 31, in the first machining portion 100.

7, the second processing part 200 includes a second jig part 210 which is moved to the second processing position by fixing the polishing target block 40 supplied from the first processing part 100, And a second sidelight 220 installed at the second machining position to polish the side surface of the block to be polished 40 by relative linear movement perpendicular to the stacking direction of the block to be polished 40 .

The second jig 210 includes a second gripper 211 for fixing the block to be polished 40 and a second gripper 211 for moving the second gripper 211 to a second machining position, And a second jig (not shown) to move the jig.

The second gripper 211 may be configured to fix the polishing target block 40 at a preset second fixed position and may have various configurations.

For example, the second gripper 211 may include a pair of support members for supporting a pair of opposing surfaces except the side surface of the block to be polished 40, and a pair of support members for adjusting the distance between the pair of support members And a second gripper driver (not shown) that drives movement of at least one of the pair of support members.

The second gripper driver may be configured as a pressure system such as hydraulic or pneumatic, but is not limited thereto, and various driving systems can be applied as long as it can drive the movement of the support member.

At least one or more blocks 40 to be polished may be fixed between the pair of supporting members, but it is preferable that a plurality of blocks to be polished 40 are fixed for improvement of productivity.

The second jig 210 includes a second polishing target block frame portion (not shown) that supports a plurality of blocks to be polished 40 before a plurality of blocks to be polished 40 are fixed between the pair of supporting members 250).

8, the second polishing target block frame portion 250 includes a plurality of blocks to be polished 40 arranged in a line in a direction perpendicular to the stacking direction of the blocks to be polished 40, A variety of configurations are possible.

The second polishing target block frame part 250 may have a protrusion 252 formed on the upper surface thereof to form a gap between the plurality of blocks to be polished 40.

In addition, it is preferable that the second polishing target block frame portion 250 is provided at a second fixing position.

The second jig moving unit is configured to move the second gripper fixing the block to be polished (40) to the second machining position at the second fixed position and process the polished block (40) by relative linear movement. This is possible.

By way of example, the second jig moving part may be constituted by a mechanical system such as a spring or a pressure system such as hydraulic / pneumatic.

The second jig moving unit moves the second gripper 211 between the second fixed position and the second machining position to start the machining process and moves the second gripper 211 between the second fixed position and the second machining position, And the second gripper 211 which fixes the second gripper 211 relative to the second gripper 211 in the direction perpendicular to the stacking direction around the second machining position.

The second jig moving part may further include a guide part (212) for guiding a moving path of the second gripper.

The second sidewall 220 is configured to polish the side surface of the polishing target block 40 at a second processing position by relative linear movement perpendicular to the stacking direction of the polishing target block 40, It is possible.

The second sidewall 220 is moved in a state that the polishing target block 40 is fixed to the second machining position when the second jig moving part linearly reciprocates about the second machining position in the direction perpendicular to the stacking direction It is desirable to install.

9, the second sidelight 220 includes a rotation axis 222 parallel to the stacking direction of the polishing target block 40 fixed to the second jig 210, And may include a plurality of radially projecting brush fibers 224 coupled to the brush 222.

The second sidewall 220 may further include a rotation driving unit 226 that rotates the brush fibers 224 at a rotation center M of the rotation axis 222.

The second sidelight 220 can be constructed in the same manner as the first sideload 120 described above, and the description thereof is omitted in the overlapping range.

2B and FIG. 2C, the second sidewall 220 may be formed so that the side surfaces corresponding to the pair of straight line regions 31 are sequentially and separately formed Can be processed.

When the second machining part 200 processes the side surfaces corresponding to the straight line area 31 of the polishing target block 40 by relative linear movement, the second side machining part 200 forms the target block Unintended bending can be formed in the linear region 31 of the machined block 40 that has been machined because the pressure applied to the side face of the machining target block 40 varies depending on the position (side surface portion).

There is a problem in that when the linear region 31 of the ablation target sheet 30 to be machined to be linearly formed is bent, the standard that can be installed in other members such as the smart phone 1 as shown in Fig. 1 can not be satisfied.

In one aspect, the above-mentioned problem is solved by taking into consideration that unintentional bending may be formed by the machining in the first machining portion 100 or the second machining portion 200, 2 can be resolved by contouring the block to be polished 40, which is performed before machining by the machining portion 200.

For example, when the side surface processing (chamfering) of the second processing part 200 produces a difference in processing depth with respect to the straight line area 31, the linear area 31 of the polishing target block 40 is concave It is possible to grind the straight line region 31 convexly at the time of outer contouring of the block to be polished 40 in order to prevent this.

That is, it is preferable that the straight line region 31 is formed so as to be protruded outward from the center portion, that is, convexly contoured, with respect to the edge portion with reference to the plane shape of the block to be polished 40.

Accordingly, the linear region 31 of the planar shape of the block to be polished 40, which is finally calculated through lateral machining (chamfering) by the second machining portion 200, is formed as close as possible .

In another aspect, the second machining portion 200 is preferably configured to adjust the depth of machining of the side surface of the block to be polished 40 during the machining process.

The second machining unit 200 may be configured such that the distance between the polishing target block 40 and the second sidewall 220 approaches the polishing target block 40 according to the machining position of the polishing target block 40, It is possible to adjust the depth of machining of the side surface of the block to be polished 40 by applying pressure to the second side surface finishing portion 220 by the pressing portion.

As another example, the second machining portion 200 may control the machining depth of the side surface of the block to be polished 40 by controlling the rotational speed of the second sidewall 220 in accordance with the machining portion of the block to be polished 40 Can be adjusted.

 In other words, the machining depth of the portion to be machined by the second machining portion 220 having a higher rotation speed on the side surface of the block to be polished 40 is machined by the second machining portion 220 having a relatively slow rotation speed It is possible to control the degree of machining according to the machined portion of the linear region 31 of the polishing target block 40 by using it. More specifically, the second machining portion 200 makes the rotation speed of the second sidewall 220 slower at the center side of the straight region 31, and the center side of the straight region 31 is deeper than the outer side Can be prevented.

As another example, the second machining portion 200 can adjust the side machining depth of the polishing target block 40 by controlling the machining time by the second side machining portion 220.

In other words, the machining depth of the area of the side surface of the polishing target block 40 where the machining time of the second machining target 220 is long is shorter than the machining depth of the machining time of the second machining target 220 It can be formed deeper. Specifically, the linear movement speed of the second gripper 211 by the second jig moving part of the second processing part 200 is made faster at the center side of the linear area 31, and the center side of the linear area 31 is located outside It is possible to prevent deeper machining.

An unexplained reference numeral 240 is an abrasive supply part to an abrasive solution supply part, and can be configured in the same manner as the first machining part.

The laminated sheet polishing method having the above-described configuration is a polishing method in which a plurality of polishing target sheets 30 are stacked in the stacking direction in the height direction to form a polishing target block 40 having a length L, a width W and a height H, A first machining step of grinding a side surface parallel to a stacking direction of a block to be polished (40) by relative rotation about a rotation axis parallel to the stacking direction; and a second machining step And a second machining step of polishing the side surface of the block to be polished 40 by relative linear movement perpendicular to the stacking direction.

The first machining step includes a step of fixing the supplied block to be polished (40) and moving the polished block (40) to a first machining position where the first machining position (120) 2 processing position shifting step and a rotation processing step of rotating the polishing target block 40 about the rotation axis parallel to the stacking direction at the first processing position.

At this time, the first machining step may further include a distance adjusting step of adjusting the distance between the polishing target block 40 and the first sidelight 120 according to the rotation of the polishing target block 40 .

The second machining step includes a second machining step of polishing the side surface of the block to be polished 40 by the relative linear movement by securing the polished target block 40 in the first machining step, And a linear polishing step of polishing the side surface of the block to be polished 40 by a relative linear movement perpendicular to the stacking direction of the block to be polished 40. In this case,

The linear polishing step may include a linear reciprocating step of linearly reciprocating the block to be polished 40 along the direction perpendicular to the stacking direction of the block to be polished 40 with reference to the second processing position.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It is to be understood that both the technical idea and the technical spirit of the invention are included in the scope of the present invention.

30: a polishing target sheet 40: a polishing target block
100: first processing part 200: second processing part

Claims (14)

A laminated sheet polishing method for polishing a target block (40) having a length (L), a width (W) and a height (H) by stacking a plurality of sheets to be polished (40)
A first machining step of grinding a side surface parallel to the stacking direction of the block to be polished (40) by relative rotation around a rotation axis parallel to the stacking direction;
And a second machining step of polishing the side surface of the block to be polished (40) by a relative linear movement perpendicular to the stacking direction after the first machining step. The method according to claim 1,
Wherein the first processing step comprises:
A second machining position moving step of fixing the supplied block to be polished 40 and moving the side of the block to be polished 40 to a first machining position provided with a first machining surface 124 for grinding by relative rotation; ,
And rotating the polishing target block (40) about the rotation axis parallel to the stacking direction at the first processing position. The method of claim 2,
Wherein the first processing step comprises:
Further comprising a distance adjusting step of adjusting a distance between the polishing target block (40) and the first sideline (124) in accordance with the rotation of the polishing target block (40). The method according to claim 1,
Wherein the second processing step comprises:
The polishing target block 40 is fixed in the first machining step to move the side surface of the block to be polished 40 to a second machining position provided with a second sidewall 224 for polishing by a relative linear movement A moving step,
And a linear polishing step of polishing the side surface of the block to be polished (40) by relative linear movement perpendicular to the stacking direction of the block to be polished (40). The method of claim 4,
Wherein the linear polishing step comprises:
And a linear reciprocating step of linearly reciprocating the polished block (40) along the longitudinal direction of the polished block (40) on the basis of the second machining position. A laminated sheet polishing apparatus for polishing a target block (40) having a length (L), a width (W) and a height (H) by stacking a plurality of sheets to be polished (30)
A first machining portion 100 for grinding the side surface parallel to the stacking direction of the block to be polished 40 by relative rotation about a rotation axis parallel to the stacking direction,
A second machining portion 200 that receives the polished target block 40 from the first machining portion 100 and polishes the side surface of the target block 40 by a relative linear motion perpendicular to the stacking direction, And a polishing pad for polishing the laminated sheet. The method of claim 6,
The first processing unit (100)
A first jig part 110 for fixing the supplied block to be polished 40 and moving to a first processing position,
And a first sidewall (120) which is provided at the first processing position and polishes the side parallel to the stacking direction of the block to be polished (40) by relative rotation about a rotation axis parallel to the stacking direction Wherein the polishing apparatus is a polishing apparatus. The method of claim 7,
The first jig (110)
A first gripper 111 for fixing the polishing target block 40,
A rotating shaft coupled to the first gripper and rotated about the rotating shaft,
And a first jig moving part for moving the first gripper (111) and the rotating shaft to the first processing position. The method of claim 8,
The first jig (110)
And a distance adjusting means (130) for adjusting the distance between the polishing target block (40) and the first sidewall (120) in accordance with the rotation of the polishing target block (40) by the rotating shaft Wherein said polishing apparatus is a polishing apparatus. The method of claim 9,
The distance adjusting means (130)
And a cam member 132 coupled to one side of the rotation shaft and rotating together with the rotation shaft in a state of being in contact with a fixing member 134 fixed to the first side 120,
And the plane shape of the cam member (132) corresponds to the plane shape of the block (40) to be polished. The method of claim 7,
The first sidewall 120 may be formed of a metal,
A rotating shaft 122 parallel to the stacking direction of the block to be polished 40 fixed to the first jig 110,
And a plurality of brush fibers (124) coupled to the rotating shaft (122) and projecting in a radial direction. The method of claim 6,
The second machining unit 200 includes:
A second jig part 210 fixed to the polishing target block 40 supplied from the first machining part 100 and moved to a second machining position,
And a second sidewall (220) provided at the second processing position for polishing the side surface of the block to be polished (40) by a relative linear movement perpendicular to the lamination direction. The method of claim 12,
The second jig (210)
A second gripper 211 for fixing the polishing target block 40,
And a second jig moving part for moving said second gripper (211) to said second machining position and linearly reciprocating about said second machining position. The method of claim 12,
The second sidelight 220,
A rotation axis 222 parallel to the stacking direction of the block to be polished 40 fixed to the second jig 210,
And a plurality of brush fibers (224) coupled to the rotating shaft (222) and radially projecting therefrom.
KR1020170033913A 2016-03-17 2017-03-17 Laminated sheet polishing method and apparatus performing the same KR101925616B1 (en)

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