KR20160116481A

KR20160116481A - Exposure apparatus

Info

Publication number: KR20160116481A
Application number: KR1020150044242A
Authority: KR
Inventors: 도진영; 정종엽; 이석진; 이인하
Original assignee: 주식회사 아바코
Priority date: 2015-03-30
Filing date: 2015-03-30
Publication date: 2016-10-10
Also published as: WO2016159592A3; WO2016159592A2; KR101691570B1

Abstract

The exposure apparatus according to the present invention is provided with a light transmissive tube which is located on one side of a substrate to be exposed and is rotatable and which is provided along the outer circumferential surface of the tube or tube and has a mask on the outer circumferential surface, And a plurality of light filtering members spaced apart from each other and extending in a direction in which the substrate is disposed, the light filtering members being spaced apart from each other in a direction in which the substrate extends, , proceed irradiation of the emitted light, from the light path, the optical filter member and the interfering light was absorbed by the optical filter member, of the radiation from the lamp light, a plurality of slits spaced apart from the space between the plurality of optical filter member And irradiates the tube toward the tube .
Therefore, according to the embodiment of the present invention, it is possible to prevent or minimize the light irradiated to the substrate from exceeding the allowable angle with respect to the outer surface of the tube. Therefore, it is possible to prevent the occurrence of defects in the pattern due to the exposure reaction of the non-exposed region of the substrate, and to form a precise pattern.

Description

Exposure apparatus

The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus capable of improving patterning accuracy.

In forming a pattern on an FPC substrate using a flexible film as a substrate, a roll-to-roll exposure apparatus is used in which a substrate is adhered to the outer circumferential surface of a rotating circular tube, and the substrate is moved while exposing it .

In a roll to roll exposure apparatus, a lamp that emits light is provided inside a transparent tube, and a mask is attached to an outer peripheral surface of the tube. The substrate is wound on a first roller located on one side of the tube, exposed to close contact with the outer peripheral surface of the tube, and then moved and rewound to the second roller located on the other side of the tube.

In order to form a pattern, a plurality of regions (hereinafter, exposure regions) in which light should be irradiated and a plurality of regions where light should not be irradiated (hereinafter, non-exposure regions) The arrangement and shape of the openings of the mask are determined in accordance with the arrangement and shape of the exposure region and the plurality of non-exposure regions.

On the other hand, light is emitted radially from the lamp, with some light directed in the direction in which the substrate is located, and some light directed in a direction in which the substrate is not located. Then, when light is irradiated onto the upper surface of the substrate through the mask, an exposure reaction process is performed in which the photosensitive paint reacts with the region. Some of the light passing through the opening of the mask is irradiated to the exposure area of the substrate, but some light is irradiated to the non-exposure area located adjacent to the exposure area.

This is because it depends on the advancing direction or incidence angle of the light emitted from the lamp 320 installed on the center axis of the tube and is different from a direction crossing the extending direction of the tube 310 The light is irradiated from the lamp 320 to be perpendicular to the tangent of the outer circumferential surface of the tube 310 (i.e., A, C in FIG. 3). 2). In the extending direction of the tube 310 (that is, the cross-sectional direction taken along the line B-B 'in FIG. 2), a direction not perpendicular to the inner circumferential surface or the outer circumferential surface of the tube 310, 310 or the outer circumferential surface thereof. When the light traveling in this way passes through the opening M11 of the mask M, the non-exposure area S20 of the substrate S, which does not require exposure, is irradiated.

In accordance with the traveling direction of the light, light is irradiated not only in an area where a reaction is required, that is, in an exposure area but also in a non-exposure area that does not require a reaction. In order to solve such a problem, conventionally, an optical lens, a mirror or the like is provided on the optical path and a method of adjusting the light so as to be perpendicular to the substrate is used. However, in order to configure the exposure apparatus to include the optical lens and the mirror, a lot of manufacturing costs are required. In addition, in exposure using a circular tube, even when a lens, a mirror, or the like is applied, the problem is still that the light can not be irradiated perpendicularly to the substrate. Further, since exposure is performed in an extremely narrow region because an optical lens, a mirror, or the like is used, there is a problem that the exposure time is long to satisfy the exposure amount for forming a pattern, and the productivity is lowered accordingly.

Korean Patent No. 10-0381855

The present invention provides an exposure apparatus capable of preventing or minimizing light from being irradiated to a non-exposed region on a substrate.

An exposure apparatus according to the present invention includes: a transparent translucent tube which is disposed on one side of a substrate to be exposed and is optically transparent; A mask installed along an outer circumferential surface of the tube and having the substrate adhered to an outer circumferential surface thereof; A lamp that extends in a direction corresponding to the tube and is installed inside the tube and emits light for exposure; And a plurality of optical filtering members extending in a direction in which the substrate is located in the tube and spaced apart from each other in a direction in which the lamp extends, And a light filtering unit that absorbs light that is interfered with the light filtering member and irradiates the light toward the tube through a plurality of slits that are spaced spaces between the plurality of light filtering members among the light emitted from the lamp do.

Each of the plurality of optical filtering members extends from a position of the lamp in a direction in which the substrate is located, and each of the plurality of optical filtering members is installed to be perpendicular to a region facing the tube.

Each of the plurality of slits extends in the tube from a position of the lamp in a direction in which the substrate is located, and each of the plurality of slits is installed perpendicular to a region facing the tube.

The tube has a cylindrical shape, and one surface of the plurality of light filtering members facing the substrate is a curved surface having a curvature corresponding to the tube.

Wherein each of the optical filtering parts extends in a direction in which the plurality of optical filtering members or the plurality of slits are arranged and is provided at one side and the other side of the plurality of optical filtering members to close one side and the other side of the plurality of slits, And a pair of light shielding members for shielding the light incident on the filtering unit from being irradiated to the outside of the optical filtering unit.

The light filtering member and the light blocking member include graphite.

And a light absorbing member which is formed to extend in a direction corresponding to the lamp and surrounds the lamp at a position facing the light filtering unit and absorbs light emitted toward the outside of the light filtering unit.

The light absorbing member includes graphite.

And a cooling member installed inside the tube, accommodating the lamp, the light absorbing member, and the light filtering unit, and circulating the refrigerant therein to cool the lamp, the light absorbing member, and the optical filtering unit .

In the present invention, by providing the light filtering portion in the direction in which the light is irradiated to the substrate, it is possible to prevent or minimize the irradiation of the substrate with light exceeding the allowable angle with respect to the outer surface of the tube. Therefore, it is possible to prevent the occurrence of defects in the pattern due to the exposure reaction of the non-exposed region of the substrate, and to form a precise pattern.

Further, according to the present invention, it is possible to prevent or minimize light from being irradiated to a non-exposure area without applying an optical lens, a mirror, or the like in the past, and the exposure area is wider than in the prior art using lenses, mirrors, Is improved.

1 is a view showing an exposure apparatus according to an embodiment of the present invention;
Fig. 2 is a perspective view showing a three-dimensional drawing showing an exposure unit composed of a tube equipped with a mask on its outer peripheral surface and a lamp provided inside the tube
Fig. 3 is a schematic view for explaining irradiation of light in a direction intersecting the extension direction of the tube and the lamp, that is, in a direction cut along the line A-A 'in Fig. 2
4 is a schematic view for explaining the light in the extending direction of the tube and the lamp, that is, the irradiation of light in the cross-sectional direction cut along the line B-B 'in Fig. 2
5 is an enlarged schematic view of an area "F" in Fig. 4 in order to explain the irradiation of light in the cross-sectional direction along the line B-B '
6 is a perspective view of a three-dimensional perspective view showing an exposure unit according to an embodiment of the present invention.
7 is a sectional stereoscopic view taken along line D-D '
8 is a cross-sectional view taken along the line E-E 'in Fig. 6
9 is a sectional view taken along line D-D '
Fig. 10 is a perspective view showing a stereoscopic view showing an enlarged view of a part of a lamp, a light filtering part and a light absorbing member according to an embodiment of the present invention
11 is a diagram schematically illustrating the progress of light by the light filtering unit in the extending direction of the tube in the exposure apparatus according to the embodiment of the present invention
FIG. 12 is a diagram schematically illustrating the progress of light by the light filtering unit and the light absorbing member in the direction crossing the extending direction of the tube in the exposure apparatus according to the embodiment of the present invention

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know.

1 is a view showing an exposure apparatus according to an embodiment of the present invention. 2 is a three-dimensional view showing an exposure unit composed of a tube equipped with a mask on its outer peripheral surface and a lamp installed inside the tube. Fig. 3 is a schematic view for explaining the irradiation of light in the direction intersecting the extending direction of the tube and the lamp, that is, the direction cut along the line A-A 'in Fig. 4 is a schematic view for explaining the light in the extending direction of the tube and the lamp, that is, the irradiation of light in the cross-sectional direction cut along the line B-B 'in Fig. 5 is an enlarged schematic view of the area "F" in Fig. 4 in order to explain in detail the irradiation of light in the cross-sectional direction taken along line B-B 'in Fig. 6 is a three-dimensional perspective view showing an exposure unit according to an embodiment of the present invention. FIG. 7 is a cut perspective view of a cut section taken along line D-D 'of FIG. 8 is a sectional view taken along the line E-E 'in Fig. 9 is a sectional view taken along the line D-D 'in Fig. 10 is an enlarged perspective view of a lamp, an optical filtering unit, and a light absorbing member according to an embodiment of the present invention. 11 is a diagram schematically illustrating progress of light by a light filtering unit in the direction of extension of a tube in an exposure apparatus according to an embodiment of the present invention. 12 is a diagram schematically illustrating the progress of light by the light filtering unit and the light absorbing member in a direction intersecting the extending direction of the tube in the exposure apparatus according to the embodiment of the present invention.

Referring to FIGS. 1 and 6 to 10, an exposure apparatus according to an embodiment of the present invention is a roll-to-roll exposure means. Such an exposure apparatus is provided with an exposure unit 300 having a lamp 320 which is rotatably supported by a substrate S to be exposed and supported on an outer circumferential surface and an exposure unit 300, A first roller 100a which is located at one side of the exposure unit 300 and in which the substrate S is wound and which rotates to provide the substrate S to the exposure unit 300; A second roller 100b which is located on the other side of the exposure unit 300 and rewinds and recovers the substrate S exposed in the exposure unit 300 by a rotation operation, The substrate S is fixed to the outer peripheral surface of the exposure unit 300 while being supported between the unit 300 and the lower surface of the substrate S (the opposite surface of the upper surface of the substrate S to be exposed) A second roller 100b positioned between the second roller 100b and the exposure unit 300 and supporting the rear surface of the substrate S, (S) includes a second position roller (200b) such that the fixed, in close contact with the outer circumferential surface of the exposure unit 300.

The substrate S is a film of a flexible material, and may be a film made of at least one of PVC and epoxy, for example. On one side of the substrate S, a photo-resist is coated, and more specifically, a photosensitive coating that reacts with ultraviolet (UV) is coated. Hereinafter, a photosensitive paint is coated, one surface of a substrate S to be exposed is referred to as an upper surface, and the opposite surface to the upper surface is referred to as a lower surface.

Hereinafter, the exposure apparatus of the present invention will be described in detail.

The first roller 100a and the second roller 100b are spaced apart from each other with the exposure unit 300 interposed therebetween to expose the substrate S while supporting the substrate S with tension, Moves in the process direction. That is, the exposure unit 300 is positioned between the first roller 100a and the second roller 100b to move the substrate S to the exposure unit 300, S).

More specifically, the first roller 100a is a means for providing or moving the substrate S to the exposure unit 300. The first roller 100a is provided on the outer circumferential surface of the substrate S in a state in which one end of the substrate S is fixed to the first roller 100a The substrate S is wound. The substrate S wound on the first roller 100a is released by the rotation of the first and second rollers 100a and 100b and moves in the direction in which the exposure unit 300 is positioned. The second roller 100b is means for recovering the exposed substrate S from the exposure unit 300. The other end of the substrate S is fixed to the second roller 100b, The area of the substrate S passing through the exposure unit 300 is sequentially wound on the second roller 100b by the rotation of the two rollers 100a and 100b. In order to move the substrate S, the first roller 100a and the second roller 100b rotate in the same direction. For example, the first roller 100a and the second roller 100b rotate clockwise , The tube 310 of the exposure unit 300 described later rotates in the counterclockwise direction opposite to the first roller 100a and the second roller 100b.

The first position roller 200a is installed to support the lower surface of the substrate S between the first roller 100a and the exposure unit 300. [ The first position roller 200a is located adjacent to the outer circumferential surface of the exposure unit 300 and moves so that the substrate S passes between the first position roller 200a and the exposure unit 300, The roller 200a is closely attached to the outer peripheral surface of the exposure unit 300 so that the substrate S is brought into close contact with the outer peripheral surface of the exposure unit 300. [

The second position roller 200b is installed to support the lower surface of the substrate S between the second roller 100b and the exposure unit 300. [ At this time, the second position roller 200b is positioned adjacent to the outer peripheral surface of the exposure unit 300, and is positioned to face the first position roller 200a. That is, the first position roller 200a and the second position roller 200b are positioned symmetrically with respect to each other. The second position roller 200b is closely attached to the outer circumferential surface of the exposure unit 300 so that the substrate S is conveyed to the second position roller 200b and the exposure unit 300, So as to be brought into close contact with the outer peripheral surface of the exposure unit 300.

The exposure unit 300 irradiates light such as ultraviolet (UV) onto the upper surface of the substrate S coated with the photosensitive paint. The exposure unit 300 is disposed between the first position roller 200a and the second position roller 200b and includes a rotatable tube 310 and a mask M enclosing the outer circumferential surface of the tube 310 A lamp 320 that extends in a direction corresponding to the tube 310 and is installed inside the tube 310 and emits light for exposure (for example, ultraviolet (UV)), A light filtering unit 340 installed at one side of the lamp 320 to filter the light emitted from the lamp 320 according to the irradiation direction and irradiate the light to the tube 310, And a light absorbing member 330 installed to surround the lamp 320 at a position facing the optical filtering unit 340 and absorbing light. The exposure unit 300 has a shape having an inner space and is installed inside the tube 310 to receive the lamp 320, the light absorbing member 330 and the optical filtering unit 340 therein, And a cooling member 350 into which refrigerant flows and refrigerant is discharged to the other side.

Each of the tube 310 and the cooling member 350 is made of a material capable of transmitting light, for example, quartz, but is not limited thereto and various materials capable of transmitting light can be applied.

The tube 310 has a cylindrical shape having an inner space, and the tube 310 according to the embodiment has a circular shape in cross section. A mask M is attached to the outer circumferential surface of the tube 310. The mask M is means for selectively passing or transmitting the light emitted from the lamp 320 to be irradiated to the substrate S. The mask M according to the embodiment has a plurality of openings M11 spaced from each other And a plurality of other openings M11 are arranged in a direction intersecting the extending direction of the tube 310 so that the mask M has a lattice pattern opening M11, Pattern. Of course, the pattern of the mask M is not limited to the above-described lattice pattern, but may be variously changed depending on the pattern shape to be formed on the substrate S.

The upper surface of the substrate S is previously provided with a plurality of regions (hereinafter, exposure region S10) for which exposure is required and a plurality of regions where light is not irradiated (hereinafter, a non-exposure region S20) The arrangement and shape of the opening M11 of the mask M are determined in accordance with the arrangement and shape of the exposure area S10 of the exposure area S20 and the plurality of non-exposure areas S20.

The lamp 320 is formed inside the tube 310 by extending in a direction corresponding to the tube 310 by means of emitting light that reacts with the photosensitive paint, for example, ultraviolet rays (UV).

Meanwhile, the lamp 320 is installed at the center of the inside of the tube 310, and the light emitted from the lamp 320 is transmitted through the tube 320. A mask M is attached to the outer circumferential surface of the tube 320, and the substrate S moves so as to be in close contact with the mask M. The light emitted from the lamp 320 in the direction in which the substrate S is irradiated passes through the tube 310 and passes through the opening M11 of the mask M and is then irradiated onto the substrate S, It does not react with the paint or irradiate the outside of the opening M11, that is, the closed area, and is not irradiated on the substrate S.

2 to 5, a direction intersecting the extension direction of the lamp 320 or the tube 310, that is, the direction of the arrow A-A 'in FIG. 2, (See Fig. 3), the light is irradiated in a direction perpendicular to the inner or outer peripheral surface of the tube 310. [0064] The light passing through the opening M11 of the mask M among the light thus irradiated is irradiated to the exposure area S10 of the substrate S (Fig. 3A), and the opening M11 of the mask M Light which can not pass through is not shielded by the mask M and is not irradiated onto the substrate S (Fig. 3C).

2, the light that passes through the tube 310 and passes through the opening M11 of the mask M is also transmitted through the tube 310 in the extending direction of the lamp 320 or the tube 310, (FIGS. 4 and 5A and 5B) and light shielded by the mask M (FIGS. 4 and 5C). 2 and 3) (see FIGS. 4 and 5), part of the light emitted from the lamp 320 is incident on the inner peripheral surface of the tube 310 Or at least a part of the light is irradiated in a direction perpendicular to the inner circumferential surface or the outer circumferential surface of the tube 310 or in a direction perpendicular to the circumferential surface of the tube 310, Or in an oblique direction. At this time, of the light passing through the opening M11 of the mask M, light traveling in a direction perpendicular to the inner circumferential surface or the outer circumferential surface of the tube 310 is irradiated to the exposure area S10 (see Figs. 4 and 5A The light travels diagonally or obliquely with respect to the inner circumferential surface or the outer circumferential surface of the tube 310 and passes through the opening M11 of the mask M so that the light passes through the non- S20) (Fig. 4 and Fig. 5B).

In other words, when the light is irradiated in a direction that allows the light to pass through the opening M11 of the mask, the angle formed by the light and the outer peripheral region of the tube 310 on the path of the light, It is more likely that the one light is irradiated to the exposure area S10 of the substrate S after passing through the opening M11 of the mask M11 as the light is closer to the vertical or 90 degrees, The non-exposure area S10 of the exposure area S is likely to be irradiated. The light that has moved diagonally or obliquely with respect to the inner circumferential surface or the outer circumferential surface of the tube 310 and has passed through the opening M11 of the mask M is transferred between the exposure area S10 of the substrate S and the non- To the non-exposure area S20.

The reason why the light is irradiated to the non-exposure area is that the tube 310 is in a cylindrical shape and the lamp 320 is installed along the extending direction at the center of the tube 310 to cross the extension direction of the tube 310 The tube 310 is irradiated with light so as to be perpendicular to the tangent of the inner circumferential surface or the outer circumferential surface of the tube 310 from the lamp 320 in the direction (direction of the cross section cut along the line A-A ' (The cross-sectional direction cut along the line B-B 'in Fig. 2), diagonally or obliquely irradiated light exists on the inner circumferential surface or the outer circumferential surface of the tube 310. [

Light is irradiated not only in the area where the reaction is required, that is, in the exposure area S10 but also in the non-exposure area S20 that does not require the reaction, or between the exposure area S10 and the non-exposure area S20 The light is irradiated to the boundary region of the non-exposure region S20 so that the light penetrates into the non-exposure region S20, and the reaction occurs in the region where the exposure reaction is not required.

In order to solve such a problem, an optical lens, a mirror, and the like are provided on the optical pathway as described in the related art, which causes increase in manufacturing cost. In the exposure using the circular tube 310, It is still difficult to irradiate light perpendicular to the substrate S even if a lens, a mirror or the like is applied. Since exposure is performed in an extremely narrow area by using a lens, a mirror, or the like, there is a problem that the exposure time is long in order to satisfy the exposure amount for forming the pattern, and the productivity is lowered accordingly.

Therefore, in order to prevent or minimize the irradiation of light to the non-exposure area S20 of the substrate S between the tube 310 on which the substrate S contacts the lamp 320 and the outer surface of the lamp S, 340 are installed.

7 to 12, the optical filtering unit 340 includes a plurality of optical filtering members 341 extended in the vertical direction and arranged in the extending direction of the lamps 320 and spaced apart from each other, A slit 342 through which the light passes and a plurality of light filtering members 341 or a plurality of slits 342 are arranged in the space between the light filtering member 341 and the other light filtering member 341, And a pair of light shielding members 343 provided on one side and the other side of the plurality of light filtering members 341 and closing one side and the other side of the plurality of slits 342.

The light filtering member 341 according to the embodiment may be graphite capable of absorbing light, but may be various materials capable of absorbing ultraviolet (UV) light.

The plurality of light filtering members 341 are spaced apart from one another so as to be aligned in the extending direction of the tube 310 and each light filtering member 341 is provided to be perpendicular to the facing surface of the tube 310. The plurality of slits 342 are also perpendicular to the facing surface of the tube 310. That is, the angle formed by the extension line of the light filtering member 341 extending toward the inner circumferential surface or the outer circumferential surface of the tube 310 and the opposing surface of the tube 310 corresponding to or opposed to the light filtering member 341 Vertical. The lower surface of the light filtering member 341 opposite to the tube 310 has a curvature corresponding to a direction intersecting the extending direction of the tube 310 ), And the upper surface of the light filtering member 341 facing the lamp 320 is curved in a direction intersecting the extending direction of the lamp 320 (in the direction of EE 'in FIG. 6) Is a concave curved surface. Accordingly, the optical filtering member 341 according to the embodiment of the present invention has a fan shape having a predetermined area.

6) of the tube 310 in the exposure apparatus having the optical filtering unit 340 as described above, the non-exposure area S20 of the substrate S is irradiated with light, Is prevented from being moved by the light filtering member 341, thereby preventing light from being irradiated to the non-exposure area S20 of the substrate S. [ Part of the light emitted from the lamp 320 and moved to the lower opening of the slit 342 passes through the opening M11 of the mask M and passes through the opening M11 of the mask M One light is irradiated to the exposure area of the substrate S (Fig. 11A). Further, another part of the light irradiated toward the substrate S is irradiated to the outside of the opening M11 of the mask M to be shielded (Fig. 11C). On the other hand, when the light emitted through the lamp 320 interferes with the light filtering member 341 on the irradiation progress path, the light is absorbed by the light filtering member 341 (FIG. 11B) It can not penetrate. A part of light irradiated from the lamp 432 toward the substrate S is not incident on the slit 342 but directly interferes with the light filtering member 341 and is absorbed. As another example, even if light is incident into one slit 342, then when the light filtering member 341 is located on the path of the light, it is absorbed by the light filtering member 341, can not do it.

On the other hand, depending on the width of the slit 342 and the length of the slit 342, the angle of the light passing through the slit 342 and the opening M11 of the mask M and irradiating the exposure area of the substrate S is changed . In other words, depending on the distance between the light filtering members 341 and the length of the light filtering member 341, the light passing through the slits 342 and the opening M11 of the mask M, The angle of the irradiable light changes in the exposure area S10. (The distance between the light filtering members 341 and the length of the light filtering member 341) in accordance with the width of the slit 342 and the length of the slit 342 in the exposure area S10 of the substrate S The irradiated or irradiable light has an angle of 90 ° ± M °. In other words, the angle of the light passing through the slit 342 with the line of extension of the light in the traveling direction and the tangential line of the outer circumferential surface of the tube 310 is 90 ° or about 90 °, And is irradiated to the exposure area S10 of the substrate S when passing through the opening M11. Here, when the angle of the light passing through the slit 342 and irradiating the exposure area S10 of the substrate S is called an allowable angle, the allowable angle is, for example, 90 占占 5 占. The width of the slit 342 and the length of the slit 342 need to be varied according to the diameter of the tube 310 and the allowable angle varies depending on the width of the slit 342 and the length of the slit 342. [

Each of the pair of light shielding members 343 extends in a direction in which a plurality of light filtering members 341 or a plurality of slits 342 are arranged so as to shield the plurality of slits 342. Here, one light blocking member 343 is located at one side of a plurality of light filtering members 341 or a plurality of slits 342 arranged in one direction, and the other light blocking member 343 is located at one side of the plurality of light filtering members 341 341) or a plurality of slits (342). That is, the pair of light shielding members 343 close one side and the other side of the plurality of slits 342, thereby blocking the light incident on the slit 342 from moving outside the optical filtering unit 340. In other words, the pair of light shielding members 343 serve to limit the area irradiated with light toward the substrate S within the tube 310. For example, when the light blocking member 343 is not provided, the light (E in FIG. 12) incident on the slit 342 does not move in the exit direction, but moves to one side or the other open side of the slit 342 (E 'in FIG. 12), the light is emitted to the outside of the optical filtering unit 340. However, by arranging the light blocking member 343 so as to close one side and the other side of the plurality of slits 342, the light E moving to one side or the other side of the slit 342 is blocked by the light blocking member 343 And the movement thereof is blocked.

The light blocking member 343 according to the embodiment is in the form of a plate and may be graphite capable of absorbing light, but may be various materials capable of absorbing ultraviolet (UV) light. Further, each of the pair of light shielding members 343 is connected to the light absorbing member 330. One light blocking member 343 is connected to one end of the light absorbing member 330 and the other light blocking member 343 is provided to be connected to the other end of the light absorbing member 330, The members 343 are arranged to face each other. Of course, the light shielding member 343 may not be connected to the light absorbing member 330 but may be installed alone.

The light absorbing member 330 may be disposed on the inner surface of the cooling member 350 so as to surround the lamp 320 without the optical filtering unit 340 Lt; / RTI > The light absorbing member 330 extends in a direction corresponding to the lamp 320 and has a predetermined space for accommodating the lamp 320 therein. More specifically, the light absorbing member 330 has a hollow shape in which the cross-sectional shape of the light filtering unit 340 is opened, and the lamp 320 is accommodated inside the light absorbing member 330. Of course, the shape of the light absorbing member 330 may be changed in various forms such that the shape of the light absorbing member 330 is extended in the extension direction of the lamp 320 and surrounds the periphery of the lamp 320 where the light filtering unit 340 is not installed . In addition, the light absorbing member 330 according to the embodiment is made of graphite, but not limited thereto, and various materials capable of absorbing ultraviolet rays (UV) can be applied. The light absorbing member 330 absorbs light not directed to the optical filtering unit 340. That is, among the light emitted from the lamp 320, the light irradiated to the region except for the optical filtering unit 340 without being directed toward the optical filtering unit 340 passes through the light absorbing member 340 disposed outside the optical filtering unit 340, (G in Fig. 12).

The cooling member 350 extends in a direction corresponding to the lamp 320 and is installed in the tube 310. A lamp 320, a light absorbing member 330, and a light filtering unit 340 are installed inside the tube 310 do. One side of the cooling member 350 is provided with an inlet 351 through which the refrigerant flows and an outlet 352 through which the refrigerant is discharged is provided on the other side. The cooling member 350 is cooled by the refrigerant introduced into the cooling member 350 through the inlet 351 so that the lamp 320, the light absorbing member 330, and the optical filtering unit 340 And cooled. Then, the refrigerant is discharged toward the discharge port 352 again.

The refrigerant may be in the form of gas or liquid. At this time, since the light absorbing member 330 and the light filtering unit 340 may be oxidizing substances such as graphite, an inert gas without oxygen component is used to prevent oxidation. In order to prevent the oxidation of the light absorbing member 330 and the optical filtering unit 340, ultrapure water (DI WATER) is used in the cooling member 350 without air, ). It is also preferable that the pressure for injecting the DI water is larger than the discharge pressure.

Hereinafter, an exposure method using an exposure apparatus according to an embodiment of the present invention will be described with reference to Figs. 1 and 6 to 12. Fig.

First, a substrate S is coated with a photosensitive paint, one end of the substrate S is fixed to the first roller 100a, the other end is fixed to the second roller 100b, and the first roller 100a The upper surface area of the substrate S positioned between the second rollers 100b is brought into close contact with the mask M provided on the outer circumferential surface of the tube 310 to hold the substrate S while maintaining the tension. Thereafter, the first roller 100a is rotated in the direction in which the exposure unit 300 is positioned, for example, clockwise, and the second roller 100b is rotated in the opposite direction to the position of the exposure unit 300, that is, clockwise , The tube 310 of the exposure unit 300 rotates in the opposite direction to the first and second rollers 100a and 100b. The substrate S wound on the first roller 100a is brought into close contact with the mask M by the rotation of the first and second rollers 100a and 100b and the tube 310, Is exposed by the exposure unit 300, and then is rewound on the second roller 100b.

In this way, the lamp 320 is operated while moving the substrate S to perform exposure. At this time, among the light emitted from the lamp 320, the light that is not positioned on the optical filtering unit 340 or the substrate S, or is emitted in the direction in which the light absorbing member 330 is located, (G in Fig. 12). The light emitted from the lamp 320 in the direction in which the optical filtering unit 340 is disposed passes through the slit 342 of the optical filtering unit 340 or is absorbed by the optical filtering member 341 , And is absorbed by the light blocking member 343. More specifically, of the light traveling in the direction in which the substrate S is located, light advancing in the direction of extension of each slit 342 passes through the slit 342, and during the movement of the light filtering member 341, Is absorbed by the light filtering member 341. [ A part of the light passing through the slit 342 passes through the opening M11 of the mask M and is irradiated to the exposure area S10 of the substrate S while the other part is shielded by the mask M do. In other words, of the light emitted from the lamp 320, the light within the allowable angle passes through the slit 342, the tube 310, and the cooling member 350, and then passes through the opening M11 of the mask M , The light is irradiated to the exposure area S10 of the substrate S. [ On the other hand, out of the light emitted from the lamp 320, light that deviates from the allowable angle is absorbed and shielded by the light filtering member 341 on the irradiation path. At this time, even if the opening M11 of the mask M exists on the light path of the light deviated from the allowable angle, if the light filtering member 341 is positioned on the path of the light, And is not irradiated toward the opening M11 of the mask M.

In the present invention, by providing the optical filtering unit 340, the substrate S can be prevented from being irradiated with light exceeding the allowable angle with respect to the inner circumferential surface or the outer circumferential surface of the tube 310. Therefore, it is possible to prevent light from being irradiated onto the non-exposure area S20 of the substrate S. [ Particularly, in the opening M11 of the mask M, light passes through the region corresponding to the boundary between the exposure region S10 of the substrate S and the non-exposure region S20 and penetrates into the non-exposure region S20 It is possible to prevent or minimize the occurrence of defects in the pattern, and to form a precise pattern.

In addition, since lenses and mirrors are not additionally provided as in the prior art, exposure can be performed over a wider area than in the prior art, shortening the exposure process time, and improving productivity.

100a, 100b: Rollers 200a, 200b: Position rollers
300: exposure unit 310: tube
320: lamp 330: light absorbing member
340: optical filtering unit 341: light filtering member
342: slit

Claims

A translucent translucent tube located on one side of a substrate to be exposed,
A mask installed along an outer circumferential surface of the tube and having the substrate adhered to an outer circumferential surface thereof;
A lamp that extends in a direction corresponding to the tube and is installed inside the tube and emits light for exposure;
And a plurality of optical filtering members extending in a direction in which the substrate is located in the tube and spaced apart from each other in a direction in which the lamp extends, A light filtering unit for absorbing light that is interfered with the light filtering member and passing through a plurality of slits that are spaced apart from each other among the light emitted from the lamps and directed toward the tube;
.

The method according to claim 1,
Each of the plurality of optical filtering members extending from a position of the lamp inside the tube in a direction in which the substrate is located,
And each of the plurality of optical filtering members is provided so as to be perpendicular to a region facing the tube.

The method according to claim 1,
Each of the plurality of slits extending from a position of the lamp inside the tube in a direction in which the substrate is located,
Wherein each of the plurality of slits is perpendicular to a region facing the tube.

The method of claim 2,
The tube has a cylindrical shape,
Wherein one surface of the plurality of optical filtering members facing the substrate is a curved surface having a curvature corresponding to the tube.

The method of claim 2,
Wherein each of the optical filtering parts extends in a direction in which the plurality of optical filtering members or the plurality of slits are arranged and is provided at one side and the other side of the plurality of optical filtering members to close one side and the other side of the plurality of slits, And a pair of light shielding members for blocking the light incident on the filtering unit from being irradiated to the outside of the optical filtering unit.

The method of claim 5,
Wherein the light filtering member and the light shielding member comprise graphite.

The method according to any one of claims 1 to 6,
And a light absorbing member which is formed to extend in a direction corresponding to the lamp and surrounds the lamp at a position facing the light filtering unit and absorbs light emitted toward the outside of the light filtering unit.

The method of claim 7,
Wherein the light absorbing member comprises graphite.

The method of claim 7,
A light absorbing member and a cooling member for cooling the lamp, the light absorbing member, and the light filtering member, wherein the lamp, the light absorbing member, and the optical filtering member are accommodated in the tube, Exposure apparatus.