KR20160072584A - Touch screen substrate and manufacturing method of the same - Google Patents

Touch screen substrate and manufacturing method of the same Download PDF

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Publication number
KR20160072584A
KR20160072584A KR1020140180392A KR20140180392A KR20160072584A KR 20160072584 A KR20160072584 A KR 20160072584A KR 1020140180392 A KR1020140180392 A KR 1020140180392A KR 20140180392 A KR20140180392 A KR 20140180392A KR 20160072584 A KR20160072584 A KR 20160072584A
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South Korea
Prior art keywords
electrode layer
layer
touch screen
substrate
blackening
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KR1020140180392A
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Korean (ko)
Inventor
단성백
황진수
박효진
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주식회사 아모센스
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Priority to KR1020140180392A priority Critical patent/KR20160072584A/en
Publication of KR20160072584A publication Critical patent/KR20160072584A/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)

Abstract

The present invention relates to a touch screen substrate and a manufacturing method thereof. The touch screen includes: a substrate; an electrode layer formed on one surface of the substrate; and a blackening layer formed on top of the electrode layer. The blackening layer is AION. Therefore, the touch screen substrate can reduce reflectivity of the electrode layer and minimize visibility and a moire phenomenon, caused by the reflectivity of the electrode layer.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a touch screen substrate,

The present invention relates to a touch screen substrate and a manufacturing method thereof.

In recent years, various element technologies have been emerging one after another in accordance with the era of high informationization using the keyword "multimedia". Particularly, a flat panel display (FPD) is used as a display device, and a touch screen panel (TSP) is used on the flat panel display device as an operation and input device.

The principle of the touch screen substrate is optical, ultrasonic, capacitive and resistive type according to the use, and it is not damaged even if it is used violently in public facilities such as a station and a library. In a car navigation system, A thin and lightweight electrostatic capacity type is used in a strong manner and a portable terminal.

[0003] A capacitive type touch screen substrate is the most widely used liquid crystal display device requiring a thin film type, and a typical touch screen substrate is formed of a substrate, a seed layer, a blackening layer, and a conductive layer.

The blackening layer may be a metal oxide, a metal sulfide or a metal oxide containing one or more metals selected from Cu, Zn, Ni, Co, Ti, Mn, Fe, Cr, Nb, Ru, Cd, And a metal compound. However, there is a problem that the antireflection effect is insignificant, and visibility and moire phenomenon are generated.

Accordingly, Korean Patent Laid-Open No. 10-2013-0033538 (published on Apr. 04, 2013) discloses a method of manufacturing a transparent electrode film, comprising: forming a metal layer by sputtering a metal layer on a transparent PET film; Laminating the surface of the PET film layer on which the metal layer is formed with a negative PR layer, and forming a very fine metal pattern using a mask film or a mask glass and an exposure / development facility; And removing the metal layer except the pattern portion of the PET film on which the ultrafine pattern is formed by chemical chasing and finally removing the exposed PR layer with a PR stripper.

Thus, although the prior art provides a blackening layer, the manufacturing process is complicated.

Korean Patent Publication No. 10-2013-0033538

The present invention provides a touch screen substrate and a method of manufacturing the same that can reduce the reflectance of the electrode layer and minimize the visibility and moire phenomenon by forming a blackening layer on one surface of the electrode layer It has its purpose.

The present invention provides a touch screen substrate and a method of manufacturing the same that can reduce the reflectance of the electrode layer and minimize the visibility and moire phenomenon by forming a blackening layer on one surface of the electrode layer It has its purpose.

As described above, the touch screen substrate according to the present invention can reduce the reflectance of the electrode layer by forming a blackening layer on one surface of the electrode layer, and minimize the visibility and moire phenomenon due to the reflectance of the electrode layer.

In addition, in the method of manufacturing a touch screen substrate, since the blackening layer of AlON is formed on one surface of the electrode layer, additional drying is unnecessary due to the reflectance of the electrode layer, thereby simplifying the manufacturing process.

1 shows a touch screen substrate according to the present invention.
2 illustrates a method of manufacturing a touch screen substrate according to the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims.

First, a touch screen substrate according to an embodiment of the present invention will be described.

1 shows a touch screen substrate according to the present invention.

Referring to FIG. 1, a touch screen substrate 100 according to the present invention includes a substrate 110, an electrode layer 120, and a blackening layer 130.

The substrate 110 can be any substrate conventionally used in the field of touch screen substrates. Representative examples include polystyrene (PS), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN), polyimide (PI), polytetrafluoroethylene (PTFE) ), Fluorinated ethylene propylene (FEP), perfluoroalkoxy (PFA), ethylene-tetrafluoroethylene copolymer (ETFE), polyvinylidene fluoride (PVDF), ethylene-chlorotrifluoroethylene copolymer (ECTFE) Polychlorotrifluoroethylene (PCTFE), and a combination thereof. Since polyethylene terephthalate (PET) and polyimide (PI) are excellent in insulation, heat resistance, and bending resistance, and are flexible, less deformed in dimension and resistant to heat, polyethylene terephthalate (PET) Is preferably used.

At this time, the thickness of the substrate 110 varies depending on the application and is not particularly limited, but is preferably 10 to 150 mu m, more preferably 25 to 50 mu m. At this time, when the thickness of the substrate 110 is less than 10 mu m, it is difficult to support or handle the conductor circuit. On the contrary, when the thickness of the substrate 110 exceeds 150 mu m, the flexibility is low.

The electrode layer 120 is a layer for electrical conduction and may be located on one side of the substrate 110

At this time, the electrode layer 120 may be formed of a metal such as Al, Fe, Co, Ni, Cu, Zn, Ru, Pd, ), Tin (Sn), platinum (Pt), gold (Au), and combinations thereof. Of these, aluminum (Al) is preferable to use aluminum (Al) because of its excellent electrical conductivity and excellent etching solubility.

 At this time, the electrode layer 120 may be formed on the adhesive layer in the form of a metal foil or may be formed directly by vacuum deposition, PVD, CVD, dry plating, or the like.

At this time, the thickness of the electrode layer 120 may be 0.01 to 1 占 퐉. When the thickness of the electrode layer 120 is less than 0.01 탆, the thickness of the electrode layer 120 is greater than 1 탆, the thickness of the touch screen substrate becomes thick, and the pattern of the electrode layer 120 is collapsed. A problem may arise.

The blackening layer 130 refers to a black metal oxide, a metal nitride, and a metal oxynitride composite material, and may be located on one side of the electrode layer 120. The blackening layer 130 may be formed on the upper or lower portion of the electrode layer 120 to minimize the reflectance.

At this time, the blackening is usually performed by blending (light diffusion) or blackening (light absorption) the surface of the metal layer using an acid, an alkali or the like in order to lower the visibility of the circuit and increase the visibility of the screen, And is used as a method for increasing the degree of absorption. For example, when a blackening layer is formed on a metal mesh for shielding electromagnetic waves generated in a PDP, the reflection of light from the electromagnetic wave shielding metal is suppressed, and the display image of the display can be visually recognized with high contrast.

The blackening layer 130 may be formed of a black-based material capable of suppressing the reflectivity of the electrode layer 120, and may preferably be formed of AlON having excellent antireflection effect. More specifically, a blackening layer formed of AlON can be formed using N 2 or O 2 on the electrode layer formed of aluminum (Al). Therefore, it is possible to improve the visibility of the electrode layer formed of aluminum (Al) or the like having high reflectance and to minimize the moiré phenomenon.

The reflectance of the blackening layer 120 formed of the above-described material is preferably 1 to 20%, more preferably 1 to 10%. When the reflectance of the composite layer 120 is more than 20%, sparkling and starburst phenomenon due to the specific luster of the metal and high reflectance may occur.

Also, the blackening layer 130 may have a thickness of 10 nm to 1000 nm. If the thickness of the blackening layer 130 is less than 10 nm, the antireflection effect and adhesion effect may be insufficient. On the other hand, when the thickness of the blackening layer 130 is more than 1000 nm, it is difficult to make the touch screen substrate thin.

Accordingly, the touch screen substrate according to the present invention can minimize the visibility and the moiré phenomenon by forming the blackening layer, which functions as an anti-reflection, on one surface of the electrode layer formed of aluminum.

Next, a manufacturing method of a touch screen substrate will be described.

2 illustrates a method of manufacturing a touch screen substrate according to the present invention.

Referring to FIG. 2, a method of manufacturing a touch screen substrate according to the present invention includes: forming an electrode layer on a substrate; Forming a blackening layer on the electrode layer; And forming a pattern on the electrode layer and the blackening layer using an exposure / development facility, wherein the blackening layer may be AlON.

In the step of forming the electrode layer on the substrate, the electrode layer may be formed on the substrate subjected to the pretreatment process such as degreasing and cleaning. At this time, the electrode layer can be formed by a conventional vacuum deposition method, and the vacuum deposition method includes chemical vapor deposition (CVD) using a chemical method and physical vapor deposition (PVD) using a physical method. PVD includes sputtering, ion plating, thermal deposition, ion beam deposition, and laser deposition.

CVD using a chemical method is a method in which a substance to be deposited on a substrate is injected as a gas in a gaseous state rather than a solid state, and is deposited on the substrate in a reaction chamber through high temperature decomposition or high temperature chemical reaction. This method is excellent in adhesion and can be uniformly deposited on a complex substrate, and deposition of a high purity substance is easy. In addition, localized deposition can be performed by selecting a desired region on a substrate of a specific type. However, for a smooth reaction, 500? Or more, which may cause problems in the physical properties of the substrate and the metal.

Vacuum deposition is a method of dissolving and evaporating a material and depositing the material on the object to be processed. The evaporation method of the evaporation material includes resistance heating, electron beam heating, ion beam heating, laser heating, and high frequency induction heating. It is mainly used well. Vacuum deposition is the most excellent method in terms of high-speed film formation, but it has a problem that adhesion is too low.

Sputtering is a technique of depositing a thin film on the surface of a substrate by bombarding a metal plate with an inert element such as argon and causing metal molecules to protrude therefrom. Sputtering is a technique superior in adhesion of a thin film rather than a vacuum deposition, but has a problem in forming a high-speed film by a technique of the lowest deposition rate.

Ion plating is a method in which a gas such as argon is injected into a vacuum chamber to cause a plasma in a vacuum state to ionize a deposition material and a gas to deposit the material to be deposited with a high energy. Since the evaporated particles are deposited with high energy, the deposition rate is high and adhesion is good. Generally, a film formed by ion plating has an adhesion of 50 to 100 times higher than that of conventional vacuum deposition or wet plating, and a uniform compound film can be easily obtained due to the activation effect by discharge.

Next, in the step of forming the blackening layer on the electrode layer, a blackening layer is formed on one surface of the electrode layer.

The blackening layer may be formed to a thickness of 0.1 to 5 占 퐉 by electrospinning, carbon black printing, wet oxidation or the like.

At this time, the blackening layer is characterized in that it is easy to dry due to the reflection characteristic of the electrode layer formed of aluminum (Al). Therefore, since the blackening layer does not require near infrared ray drying or the like, the manufacturing process can be simplified.

Finally, forming a pattern using an exposure / development facility for the electrode layer and the blackening layer forms a fine pattern on the electrode layer and the blackening layer formed on one surface of the substrate. The electrode layer other than the pattern is also removed by this exposure / development process.

The fine pattern formation is not particularly limited in the present invention, and a known process may be used.

For example, a positive or negative photoresist can be applied and then etched through a dry etching process using a reactive gas or a wet etch process using a chemical. have.

Dry etching can be performed by plasma etching, reactive ion etching (RIE), magnetically enhanced RIE (MERIE), reactive ion beam etching, and high density plasma (HDP). The etching process is used.

Wet etch of the composition of the etching solution in accordance with CH 3 COOH, HNO 3, HF , BHF, NH 4 F, H 3 PO 4, may be carried out using the etching solution consisting of an aqueous solution, such as KI, wherein the electrode layer and the material of the blackening layer , Concentration, temperature, treatment time, and the like.

In addition, the fine pattern formation can be performed sequentially or simultaneously with the electrode layer and the blackening layer, and an appropriate etching process can be selected according to the material of each layer.

Therefore, since the touch screen substrate manufactured according to the manufacturing method of the present invention forms a blackening layer formed of AlON on the electrode layer, the drying process is easy due to the reflection characteristic of aluminum (Al), so that the near infrared ray drying process can be excluded The manufacturing process can be simplified.

The touch screen panel may be applied to various types of touch screen panels. The touch screen panel may include an OLED display panel, a liquid crystal display (LCD), a cathode ray tube (CRT) The present invention can be applied to a display device such as a PDP. More specifically, the touch screen panel is used not only in portable electronic devices such as a mobile phone, a personal digital assistant (PDA), a navigation device, a digital camera, a portable multimedia player (PMP), and a notebook computer, but also a TV, a refrigerator, a microwave oven, Of personal computers, automobiles, industrial equipment, medical equipment, and the like.

Hereinafter, the present invention will be described in more detail with reference to the following examples. However, it should be understood that the present invention is not limited thereto.

≪ Example 1 >

On the polyethylene terephthalate (PET) substrate, 0.5 탆 thick Al was sputtered to form an electrode layer, and a 50 nm thick AlON was sputtered on the electrode layer to form a blackening layer. Thereafter, a pattern was formed on the electrode layer and the blackening layer through an exposure / development process.

≪ Example 2 >

A touch screen substrate was prepared in the same manner as in Example 1 except that the thickness of the blackening layer was 500 nm.

≪ Comparative Example 1 &

A touch screen substrate was prepared in the same manner as in Example 1 except that CrO was used as the blackening layer.

≪ Comparative Example 2 &

A touch screen substrate was prepared in the same manner as in Example 1 except that the thickness of the blackening layer was 0.1 nm.

≪ Comparative Example 3 &

A touch screen substrate was prepared in the same manner as in Example 1, except that the thickness of the blackening layer was 1500 nm.

<Experimental Example>

The analyzes according to Examples 1 and 2 and Comparative Examples 1 to 3 are shown in the following table.

1) Reflectance measurement

The reflectance of each of Examples 1 and 2 and Comparative Examples 1 to 3 was measured. At this time, the reflectance was measured at the wavelength of visible light (500 nm), and the reflectance of each was observed by a spectroscope. The reflectance measurement results are shown in Table 1 below.

Visible light wavelength (500nm) Example 1 9% Example 2 13% Comparative Example 1 23% Comparative Example 2 21% Comparative Example 3 27%

As shown in Table 1, in the case of Examples 1 and 2 in which a blackening layer having a thickness of 0.5 μm was formed according to the present invention, the average reflectance was about 11%, indicating that the antireflection effect was excellent have.

However, in the case of Comparative Example 1 in which the material of the blackening layer was CrO, the reflectance was 23%, and in the case of Comparative Example 2 in which the thickness of the blackening layer was 0.1 nm, the reflectance was 21% 3, the reflectance is 27%. Therefore, in Comparative Examples 1 to 3, the average reflectance was 24%, indicating that the antireflection effect was insignificant.

2) Adhesion test

The adhesion test was carried out using a 3M # 610 Tape Adhesion Test to measure the adhesion to the film on the top of the film. The results of the adhesion test are shown in Table 2 below.

Adhesion test (number / 100) Example 1 100/100 Example 2 100/100 Comparative Example 1 90/100 Comparative Example 2 85/100 Comparative Example 3 90/100

As shown in Table 2, in Examples 1 and 2 in which a blackening layer having a thickness of 0.5 μm was formed according to the present invention, the adhesion was excellent.

However, it can be seen that the adhesion is poor in Comparative Example 1 in which the material of the blackening layer is CrO, Comparative Example 2 in which the thickness of the blackening layer is 0.1 nm, and Comparative Example 3 in which the thickness of the blackening layer is 1500 nm.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It is to be understood that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

100: touch screen substrate
110: substrate
120: electrode layer
130: Blackening layer

Claims (9)

Board;
An electrode layer formed on one surface of the substrate; And
And a blackening layer formed on one surface of the electrode layer,
Wherein the blackening layer is AlON. The method according to claim 1,
Wherein the electrode layer comprises one material selected from the group consisting of Al, Fe, Co, Ni, Cu, Pd, Ag, Sn, Pt, Au and combinations thereof. The method according to claim 1,
Wherein the electrode layer is made of Al. The method according to claim 1,
Wherein the blackening layer is formed on the upper or lower portion of the electrode layer. The method according to claim 1,
Wherein the blackening layer has a reflectance of 1 to 20%. The method according to claim 1,
Wherein the blackening layer has a thickness of 10 to 1000 nm. The method according to claim 1,
Wherein the electrode layer has a thickness of 0.1 to 1 占 퐉. Forming an electrode layer on a substrate;
Forming a blackening layer on the electrode layer; And
Forming a pattern using the exposure / development facility for the electrode layer and the blackening layer,
The method of claim 1, wherein the blackening layer is AlON. A touch screen panel comprising the touch screen substrate of claim 1.
KR1020140180392A 2014-12-15 2014-12-15 Touch screen substrate and manufacturing method of the same KR20160072584A (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130033538A (en) 2011-09-27 2013-04-04 나경록 Method for manufacturing transparent electrode film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20130033538A (en) 2011-09-27 2013-04-04 나경록 Method for manufacturing transparent electrode film

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