KR20130038696A - Layout of cigs layer forming equipmnet - Google Patents

Layout of cigs layer forming equipmnet Download PDF

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KR20130038696A
KR20130038696A KR1020110103195A KR20110103195A KR20130038696A KR 20130038696 A KR20130038696 A KR 20130038696A KR 1020110103195 A KR1020110103195 A KR 1020110103195A KR 20110103195 A KR20110103195 A KR 20110103195A KR 20130038696 A KR20130038696 A KR 20130038696A
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boat
layer forming
cigs layer
group
forming apparatus
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이경호
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주식회사 테라세미콘
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    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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Abstract

PURPOSE: A layout for a CIGS layer forming apparatus is provided to reduce an installation using a boat transfer robot for moving the CIGS layer forming apparatus. CONSTITUTION: A CIGS layer forming apparatus group(100) includes CIGS layer forming apparatuses(100a-100d) arranged in a row. A boat group(200) includes a boat(200a) having untreated substrates and a boat(200b,200c,200d) having treated substrates. A boat transfer robot(310) is installed between the CIGS layer forming apparatus group and the boat group. The boat transfer robot moves the boat having the untreated substrates to the lower part of a wall(120) via one side of a frame(110). A cassette(400) having the untreated substrates is positioned on one side of the boat group.

Description

ＣＩＧＳ층 형성 설비의 레이아웃 {LAYOUT OF CIGS LAYER FORMING EQUIPMNET}Layout of CIS layer forming equipment {LAYOUT OF CIGS LAYER FORMING EQUIPMNET}

본 발명은 박막형 태양전지의 CIGS층 형성 설비의 레이아웃에 관한 것이다.The present invention relates to a layout of a CIGS layer forming facility of a thin film solar cell.

오늘날, 고갈되어 가는 화석 연료에 대한 의존도를 줄이기 위해, 고갈될 염려가 없을 뿐만 아니라 친환경적인 태양에너지를 활용하는 태양전지(Solar Cell)에 대한 연구 개발이 활발히 진행 중이다.Today, in order to reduce the dependence on depleted fossil fuels, research and development on active solar cells that utilize not only the risk of depletion but also use environmentally friendly solar energy are in progress.

이러한 연구 개발의 일환으로, 태양광의 흡수율이 높고, 태양광 또는 방사선에 대한 열화 현상이 적으며, 박막화가 가능하고, 제작상 재료비를 절감할 수 있는 CIGS{Cu(In1-xGax)Se2} 층이 형성된 박막형 태양전지가 개발되었다.As part of this research and development, CIGS {Cu (In1-xGax) Se 2 } layer which has high absorption rate of solar light, little degradation of sunlight or radiation, thin film and low material cost. The formed thin film solar cell has been developed.

박막형 태양전지는 유리 등의 기판, 기판 상에 형성된 금속층으로 이루어진 (+)극인 전극층, 전극층 상에 형성되며 광을 흡수하는 p형의 CIGS층, CIGS층 상에 형성된 n형의 버퍼층 및 버퍼층 상에 형성된 (-)극인 투명 전극층을 포함하는 다층 적층 구조이다.Thin-film solar cells include a substrate such as glass, an electrode layer which is a positive electrode made of a metal layer formed on the substrate, a p-type CIGS layer formed on the electrode layer to absorb light, an n-type buffer layer and a buffer layer formed on the CIGS layer. It is a multilayer laminated structure containing the transparent electrode layer which is the formed (-) pole.

그리하여, 수광부인 투명 전극층을 통하여 태양광이 입사되면, p-n 접합 부근에서는 대략 1.04 eV 의 밴드갭 에너지를 갖는 여기된 한 쌍의 전자 및 정공이 생성된다. 그리고, 여기된 전자와 정공은 확산에 의해 p-n 접합부에 도달하고, 접합부의 내부 전계에 의해 전자가 n 영역에, 정공이 p 영역에 집합하여 분리된다.Thus, when sunlight enters through the transparent electrode layer serving as the light receiving portion, a pair of excited electrons and holes having a bandgap energy of approximately 1.04 eV are generated near the p-n junction. The excited electrons and holes reach the p-n junction by diffusion, and electrons are collected in the n region and holes are separated in the p region by the internal electric field of the junction.

그러면, n 영역은 마이너스로 대전되고, p 영역은 플러스로 대전되며, 각 영역에 형성된 전극 간에는 전위차가 생긴다. 그리고, 전위차를 기전력으로 하여 각 전극 사이를 도선으로 연결하면 광전류가 얻어진다. 이것이 태양전지의 원리이다.Then, the n region is negatively charged, the p region is positively charged, and a potential difference occurs between the electrodes formed in each region. A photocurrent is obtained when the potential difference is used as an electromotive force and the respective electrodes are connected by a lead wire. This is the principle of solar cells.

박막형 태양전지의 CIGS층을 형성하는 방법은, 기판에 형성된 전극층 상에 Cu/Ga, Cu/In 또는 Cu-Ga/In 중의 어느 하나로 이루어진 전구물질(前購物質, Precursor)을 형성하고, 전구물질을 스퍼터링 등의 방법으로 적층 구조의 전구체막으로 형성한 다음, 전구체막을 셀렌화(Selenization)하여 CIGS층을 형성한다.In the method for forming the CIGS layer of the thin-film solar cell, a precursor made of any one of Cu / Ga, Cu / In, or Cu-Ga / In is formed on an electrode layer formed on a substrate, and the precursor is formed. Is formed into a precursor film having a laminated structure by sputtering or the like, and then the precursor film is selenized to form a CIGS layer.

그리고, 전구체막을 셀렌화하는 방법은 전구체막이 형성된 기판을 밀폐된 챔버에 로딩시키고, 챔버를 불활성가스로 치환한 다음, 챔버에 처리가스인 셀렌화 수소(H2Se)을 도입한 후, 챔버를 일정 온도로 승온시켜 일정 시간 유지하면, 셀렌화된 CIGS층이 형성된다.In the method of selenizing the precursor film, the substrate on which the precursor film is formed is loaded into a closed chamber, the chamber is replaced with an inert gas, and hydrogen selenide (H 2 Se), which is a processing gas, is introduced into the chamber, and then the chamber is opened. When the temperature is raised to a constant temperature and maintained for a certain time, a selenized CIGS layer is formed.

종래의 CIGS층 형성장치는 기판이 처리되는 공간인 챔버를 형성하는 벽체, 상기 벽체의 일측면에 설치되어 상기 챔버를 개폐하는 도어를 포함한다. 그리고, 상기 기판은 복수개가 보트에 적재 보관된 상태로 상기 챔버로 로딩 또는 상기 챔버로부터 언로딩된다. 즉, 로봇아암으로 상기 보트를 지지하여, 상기 보트를 상기 챔버에 로딩하면 상기 기판이 상기 챔버에 로딩되고, 상기 보트를 상기 챔버로부터 언로딩하면 상기 기판이 상기 챔버로부터 언로딩된다.The conventional CIGS layer forming apparatus includes a wall forming a chamber which is a space where a substrate is processed, and a door installed at one side of the wall to open and close the chamber. The substrate is loaded into the chamber or unloaded from the chamber while a plurality of substrates are stored in a boat. That is, the boat is supported by the robot arm, and when the boat is loaded into the chamber, the substrate is loaded into the chamber, and when the boat is unloaded from the chamber, the substrate is unloaded from the chamber.

상기와 같은 종래의 CIGS층 형성장치는 상기 벽체의 일측면에 상기 도어가 설치되므로, 복수개의 CIGS층 형성장치를 연속적으로 배치하고, 하나의 로봇으로 상기 보트를 상기 챔버에 로딩 또는 상기 챔버로부터 언로딩하고자 할 때, 상기 로봇이 상기 도어의 간섭을 받는다. 이로 인해, 복수개의 CIGS층 형성장치를 연속적으로 배치하기가 어렵고, CIGS층 형성장치의 개수와 대응되게 상기 로봇을 마련하여야 하므로, 설치공간이 넓어지고 원가가 상승하는 단점이 있었다.In the conventional CIGS layer forming apparatus as described above, since the door is installed on one side of the wall, a plurality of CIGS layer forming apparatuses are continuously disposed, and the boat is loaded into the chamber by one robot or is removed from the chamber. When loading, the robot is subject to interference of the door. For this reason, it is difficult to continuously arrange a plurality of CIGS layer forming apparatuses, and the robot has to be provided to correspond to the number of CIGS layer forming apparatuses, thereby increasing the installation space and increasing costs.

CIGS층 형성장치와 관련된 선행기술은 한국공개특허공보 10-2010-0075336호 등에 개시되어 있다.Prior art related to the CIGS layer forming apparatus is disclosed in Korea Patent Publication No. 10-2010-0075336.

본 발명은 상기와 같은 종래 기술의 문제점을 해소하기 위하여 안출된 것으로, 본 발명의 목적은 설치공간을 줄일 수 있고, 원가를 절감할 수 있는 CIGS층 형성 설비의 레이아웃을 제공함에 있다.The present invention has been made to solve the problems of the prior art as described above, an object of the present invention is to provide a layout of the CIGS layer forming equipment that can reduce the installation space, the cost can be reduced.

상기 목적을 달성하기 위한 본 발명에 따른 CIGS층 형성 설비의 레이아웃은, 하면을 통하여 미처리된 기판이 로딩 또는 처리된 기판이 언로딩되는 챔버를 가지는 CIGS층 형성장치가 연속적으로 복수개 배치된 CIGS층 형성장치군(群); 미처리된 기판이 정렬된 보트와 상기 CIGS층 형성장치에서 처리된 기판이 정렬된 보트가 복수개 연속적으로 배치되어 상기 CIGS층 형성장치군(群)과 대향하는 보트군(群); 상기 보트군과 상기 CIGS층 형성장치군 사이에 위치되어 상기 보트군 중 미처리된 기판이 정렬된 상기 보트를 상기 CIGS층 형성장치의 하측 부위로 이송시키거나, 상기 CIGS층 형성장치에서 기판이 처리되면 상기 CIGS층 형성장치 하측으로 언로딩된 상기 보트를 상기 보트군 중의 소정 위치로 이송시키는 보트 이송로봇을 포함하며, 상기 보트는 상기 챔버의 하측에서 승강하며, 기판은 상기 보트에 적재 보관되어 상기 챔버에 로딩되거나, 상기 챔버로부터 언로딩된다.The layout of the CIGS layer forming equipment according to the present invention for achieving the above object, CIGS layer forming apparatus having a plurality of CIGS layer forming apparatus having a chamber in which an untreated substrate is loaded or unloaded substrate is unloaded through the lower surface is formed continuously Device group; A boat group in which a plurality of boats in which unprocessed substrates are aligned and a boat in which substrates processed in the CIGS layer forming apparatus are arranged in succession are disposed to face the CIGS layer forming apparatus group; When the boat located between the boat group and the CIGS layer forming apparatus group and the unprocessed substrate of the boat group is aligned is transferred to the lower portion of the CIGS layer forming apparatus, or the substrate is processed in the CIGS layer forming apparatus. And a boat transport robot for transporting the boat unloaded under the CIGS layer forming apparatus to a predetermined position in the boat group, wherein the boat is lifted from the lower side of the chamber, and the substrate is loaded and stored in the boat. Loaded into or unloaded from the chamber.

본 발명에 따른 CIGS층 형성 설비의 레이아웃은, 기판이 적재 보관된 보트가, 보트 이송로봇에 지지되어, CIGS층 형성장치의 프레임을 통하여 벽체의 하측으로 이송되고, 벽체의 하측으로부터 프레임의 외측으로 이송된다. 그리고, 보트는 보트 이송로봇의 간섭 없이 승강하면서 챔버에 로딩되거나, 챔버로부터 언로딩된다. 그러므로, 하나의 보트 이송로봇을 이용하여 보트를 CIGS층 형성장치군의 CIGS층 형성장치로 이송하고, CIGS층 형성장치군의 CIGS층 형성장치로부터 이송할 수 있다. 따라서, CIGS층 형성장치군, 보트군 및 보트 이송로봇을 포함하는 CIGS층 형성 설비를 설치하기 위한 공간이 감소되고, 원가가 절감되는 효과가 있다.In the layout of the CIGS layer forming equipment according to the present invention, the boat on which the substrate is stored is supported by the boat transport robot, and is transported to the lower side of the wall through the frame of the CIGS layer forming apparatus, and from the lower side of the wall to the outer side of the frame. Transferred. Then, the boat is loaded into or unloaded from the chamber while lifting up without interference of the boat transport robot. Therefore, the boat can be transferred to the CIGS layer forming apparatus of the CIGS layer forming apparatus group and from the CIGS layer forming apparatus of the CIGS layer forming apparatus group using one boat transfer robot. Therefore, the space for installing the CIGS layer forming apparatus including the CIGS layer forming apparatus group, the boat group, and the boat transport robot is reduced, and the cost is reduced.

도 1은 본 발명의 일 실시예에 따른 CIGS층 형성장치의 사시도.
도 2는 도 1에 도시된 CIGS층 형성장치의 도어가 하강한 상태를 보인 사시도.
도 3은 도 2의 개략 정면도.
도 4는 본 발명의 일 실시예에 따른 CIGS층 형성 설비의 레이아웃을 보인 평면도.1 is a perspective view of a CIGS layer forming apparatus according to an embodiment of the present invention.
Figure 2 is a perspective view showing a state in which the door of the CIGS layer forming apparatus shown in Figure 1 is lowered.
3 is a schematic front view of FIG. 2;
Figure 4 is a plan view showing the layout of the CIGS layer forming equipment according to an embodiment of the present invention.

후술하는 본 발명에 대한 상세한 설명은, 본 발명이 실시될 수 있는 특정 실시예를 예시하여 도시한 첨부 도면을 참조한다. 이들 실시예는 당업자가 본 발명을 실시할 수 있도록 충분히 상세하게 설명된다. 본 발명의 다양한 실시예는 상호 다르지만 상호 배타적일 필요는 없음이 이해되어야 한다. 예를 들어, 여기에 기재되어 있는 특정 형상, 특정 구조 및 특성은 일 실시예와 관련하여 본 발명의 정신 및 범위를 벗어나지 않으면서 다른 실시예로 구현될 수 있다. 또한, 각각의 개시된 실시예 내의 개별 구성요소의 위치 또는 배치는 본 발명의 정신 및 범위를 벗어나지 않으면서 변경될 수 있음이 이해되어야 한다. 따라서, 후술하는 상세한 설명은 한정적인 의미가 아니며, 본 발명의 범위는, 적절하게 설명된다면, 그 청구항들이 주장하는 것과 균등한 모든 범위와 더불어 첨부된 청구항에 의해서만 한정된다. 도면에 도시된 실시예들의 길이, 면적, 두께 및 형태는, 편의상, 과장되어 표현될 수도 있다.DETAILED DESCRIPTION OF THE INVENTION The following detailed description of the invention refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. It should be understood that the various embodiments of the present invention are mutually exclusive, but need not be mutually exclusive. For example, certain features, specific structures, and features described herein may be implemented in other embodiments without departing from the spirit and scope of the invention in connection with one embodiment. It is also to be understood that the position or arrangement of the individual components within each disclosed embodiment may be varied without departing from the spirit and scope of the invention. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled. The length, area, thickness, and shape of the embodiments shown in the drawings may be exaggerated for convenience.

이하, 첨부된 도면을 참조하여 본 발명의 일 실시예에 따른 CIGS층 형성 설비의 레이아웃을 상세히 설명한다.Hereinafter, with reference to the accompanying drawings will be described in detail the layout of the CIGS layer forming equipment according to an embodiment of the present invention.

먼저, 본 발명의 일 실시예에 따른 CIGS층 형성장치를 도 1 및 도 2를 참조하여 설명한다. 도 1은 본 발명의 일 실시예에 따른 CIGS층 형성장치의 사시도이고, 도 2는 도 1에 도시된 CIGS층 형성장치의 도어가 하강한 상태를 보인 사시도이며, 도 3은 도 2의 개략 정면도이다.First, a CIGS layer forming apparatus according to an embodiment of the present invention will be described with reference to FIGS. 1 and 2. 1 is a perspective view of a CIGS layer forming apparatus according to an embodiment of the present invention, Figure 2 is a perspective view showing a state that the door of the CIGS layer forming apparatus shown in Figure 1 is lowered, Figure 3 is a schematic front view of FIG. to be.

도시된 바와 같이, 본 실시예에 따른 CIGS층 형성장치(100a)는 프레임(110), 프레임(110)의 상면에 설치되며 유리 등의 기판(50)이 로딩되어 처리되는 챔버(미도시)를 제공하는 스테인리스 스틸로 형성된 벽체(壁體)(120)를 포함한다.As shown, the CIGS layer forming apparatus 100a according to the present embodiment is provided with a chamber (not shown) installed on the frame 110 and the upper surface of the frame 110 and on which a substrate 50 such as glass is loaded and processed. Wall 120 formed of stainless steel provided.

벽체(120)의 하면에는 출입구(미도시)가 형성되고, 상기 출입구는 벽체(120)의 하측에 승강가능하게 설치된 도어(130)(도 3 참조)에 의하여 개폐된다. 즉, 도어(130)에 의하여, 상기 챔버는 개폐된다.An entrance (not shown) is formed on a lower surface of the wall 120, and the entrance and the exit is opened and closed by a door 130 (see FIG. 3) provided to be elevated on and under the wall 120. That is, the chamber 130 is opened and closed by the door 130.

도어(130)는 프레임(110)에 지지되어 승강가능하게 설치된 승강브라켓(113)에 의하여 승강하며, 승강브라켓(113)은 모터와 연결링크와 복수의 기어 및 볼스크류 등을 포함하는 동력전달수단(115)에 의하여 승강한다.The door 130 is lifted up and down by the lifting bracket 113 supported and supported by the frame 110, and the lifting bracket 113 is a power transmission means including a motor, a connecting link, a plurality of gears and ballscrews, and the like. It climbs by 115.

도어(130)의 상면측 및 벽체(120)의 내부에는 복수의 히터(미도시)가 각각 설치된다. 상기 히터는 기판(50)을 처리하기 위하여 상기 챔버로 유입된 분위기 가스를 소정 온도로 가열한다. 도어(130)의 상면측에 설치된 상기 히터는 도어(130)와 함께 승강한다.A plurality of heaters (not shown) are respectively installed in the upper surface side of the door 130 and the inside of the wall 120. The heater heats the atmospheric gas introduced into the chamber to a predetermined temperature in order to process the substrate 50. The heater installed on the upper surface side of the door 130 is raised and lowered together with the door 130.

도어(130)의 상면측에는 보트(200a)(도 3 참조)가 탑재되는데, 보트(200a)에는 복수의 기판(50)이 상호 간격을 가지면서 기립된 형태로 적재 보관된다. 따라서, 기판(50)은 보트(200a)에 의하여 상기 챔버에 로딩되고, 상기 챔버로부터 언로딩되며, 보트(200a)에 적재 보관된 상태로 상기 챔버에서 처리된다.A boat 200a (see FIG. 3) is mounted on an upper surface side of the door 130, and the plurality of substrates 50 are stacked and stored in an upright form with a space therebetween. Thus, the substrate 50 is loaded into the chamber by the boat 200a, unloaded from the chamber, and processed in the chamber while stored in the boat 200a.

전극층과 Cu/Ga, Cu/In 또는 Cu-Ga/In 중의 어느 하나로 이루어진 전구물질(前購物質, Precursor)에 의한 전구체막이 형성된 기판(50)을 보트(200a)에 지지시킨 다음, 보트(200a)를 도어(130)의 상면측에 탑재 지지시킨다. 그 후, 승강브라켓(113)을 상승시키면, 보트(200a)가 상기 챔버에 위치되고, 도어(130)에 의하여 상기 챔버는 밀폐된다. 이러한 상태에서, 상기 챔버에 질소 가스를 유입한 다음, 셀렌화 가스(H2Se)를 주입하여 소정 온도에서 CIGS층을 형성하고, CIGS층 형성한 다음에는 또 다른 소정 온도에서 황화 가스(H2S)를 주입하여 기판(50)을 처리한다.The boat 200a is supported by the substrate 50 on which the precursor layer formed of a precursor layer made of an electrode layer and any one of Cu / Ga, Cu / In, or Cu-Ga / In is formed. ) Is mounted and supported on the upper surface side of the door 130. Thereafter, when the lifting bracket 113 is raised, the boat 200a is positioned in the chamber, and the chamber is closed by the door 130. In this state, nitrogen gas is introduced into the chamber, and then selenide gas (H 2 Se) is injected to form a CIGS layer at a predetermined temperature, and after forming the CIGS layer, a sulfide gas (H 2) is formed at another predetermined temperature. S) is injected to process the substrate 50.

본 실시예에 따른 CIGS층 형성 설비의 레이아웃은 복수개의 CIGS층 형성장치(100a)를 연속적으로 배치하고, 하나의 보트 이송로봇(310)(도 4 참조)을 이용하여 보트(200a)를 CIGS층 형성장치(100a)로 이송하거나, 보트(200a)를 CIGS층 형성장치(100a)로부터 이송한다.In the layout of the CIGS layer forming equipment according to the present embodiment, a plurality of CIGS layer forming apparatuses 100a are continuously arranged, and the boat 200a is CIGS layer using one boat transfer robot 310 (see FIG. 4). The boat 200a is transferred to the forming apparatus 100a or the boat 200a is transferred from the CIGS layer forming apparatus 100a.

본 실시예에 따른 CIGS층 형성 설비의 레이아웃에 대하여 도 3 및 도 4를 참조하여 설명한다. 도 4는 본 발명의 일 실시예에 따른 CIGS층 형성 설비의 레이아웃을 보인 평면도이다.The layout of the CIGS layer forming equipment according to the present embodiment will be described with reference to FIGS. 3 and 4. Figure 4 is a plan view showing the layout of the CIGS layer forming equipment according to an embodiment of the present invention.

도시된 바와 같이, 복수개의 CIGS층 형성장치(100a, 100b, 100c, 100d)가 연속적으로 배치되어 군(群)을 이루는 CIGS층 형성장치군(100)이 마련된다. 그리고, 미처리된 기판(50)이 정렬된 보트(200a)와 CIGS층 형성장치(100a, 100b, 100c, 100d)에서 처리된 기판(50)이 정렬된 보트(200b, 200c, 200d)가 복수개 연속적으로 배치되어 군(群)을 이루며 CIGS층 형성장치군(200)과 대향하는 보트군(200)이 마련된다.As illustrated, a plurality of CIGS layer forming apparatus groups 100 are arranged so that a plurality of CIGS layer forming apparatuses 100a, 100b, 100c, and 100d are continuously arranged to form a group. In addition, a plurality of boats 200a, 200c, and 200d in which the untreated substrate 50 is aligned and the substrates 50 processed by the CIGS layer forming apparatuses 100a, 100b, 100c, and 100d are arranged in succession. Arranged to form a group (군) is provided with a boat group 200 facing the CIGS layer forming apparatus group 200.

그리고, CIGS층 형성장치군(100)과 보트군(200) 사이에는 보트 이송로봇(310)이 설치된다.In addition, a boat transfer robot 310 is installed between the CIGS layer forming apparatus group 100 and the boat group 200.

보트 이송로봇(310)은 보트군(200) 중 미처리된 기판(50)이 정렬된 보트(200a)를 CIGS층 형성장치(100a, 100b, 100c, 100d)의 프레임(110)의 일측면을 통하여 벽체(120)의 하측 부위로 이송시킨다. 즉, 보트 이송로봇(310)은 하강한 CIGS층 형성장치(100a, 100b, 100c, 100d)의 도어(130)의 상면에 보트(200a)를 탑재시키고, 보트(200a)는 도어(130)에 의하여 상승하여 상기 챔버에 로딩된다.The boat transfer robot 310 passes through the boat 200a in which the unprocessed substrate 50 of the boat group 200 is aligned through one side of the frame 110 of the CIGS layer forming apparatus 100a, 100b, 100c, 100d. The lower portion of the wall 120 is transferred. That is, the boat transfer robot 310 mounts the boat 200a on the upper surface of the door 130 of the descending CIGS layer forming apparatus 100a, 100b, 100c, 100d, and the boat 200a is mounted on the door 130. Is raised and loaded into the chamber.

그리고, 보트 이송로봇(310)은 CIGS층 형성장치(100a, 100b, 100c, 100d)에서 처리된 기판(50)이 적재 보관된 보트(200b, 200c, 200d)를 보트군(200) 중의 소정 위치로 이송시킨다. 즉, 기판(50)은 보트(200a, 200b, 200c, 200d)에 적재 보관된 상태로 CIGS층 형성장치(100a, 100b, 100c, 100d)에서 처리되고, 기판(50)의 처리가 완료되면 도어(130)가 하강하여 보트(200a, 200b, 200c, 200d)를 하강시킨다. 그러면, 보트 이송로봇(310)이 하강한 보트(200a, 200b, 200c, 200d)를 보트군(200) 중의 소정 위치로 이송시킨다.In addition, the boat transfer robot 310 places the boats 200b, 200c, and 200d on which the substrate 50 processed by the CIGS layer forming apparatuses 100a, 100b, 100c, and 100d are stored in a predetermined position in the boat group 200. Transfer to. That is, the substrate 50 is processed in the CIGS layer forming apparatuses 100a, 100b, 100c, and 100d while being loaded and stored in the boats 200a, 200b, 200c, and 200d, and when the processing of the substrate 50 is completed, the door 130 descends to lower the boats 200a, 200b, 200c, and 200d. Then, the boat transfer robot 310 transfers the boats 200a, 200b, 200c, and 200d that are lowered to a predetermined position in the boat group 200.

즉, 보트군(200) 중의 보트(200a)는 기판(50)의 처리를 위해 대기하는 것이고, 보트(200b, 200c, 200d)는 처리된 기판(50)을 냉각시키면서 대기하는 것이다.That is, the boat 200a in the boat group 200 waits for the process of the board | substrate 50, and the boats 200b, 200c, and 200d wait for cooling the processed board | substrate 50. FIG.

본 실시예에 따른 CIGS층 형성 설비의 레이아웃은 기판(50)이 적재 보관된 보트(200a, 200b, 200c, 200d)가, 보트 이송로봇(310)에 지지되어, CIGS층 형성장치(100a, 100b, 100c, 100d)의 프레임(110)의 일측면을 통하여 벽체(120)의 하측으로 이송되고, 벽체(120)의 하측으로부터 프레임(110)의 외측으로 이송된다. 그리고, 보트(200a, 200b, 200c, 200d)는 보트 이송로봇(310)의 간섭 없이 승강하면서 상기 챔버에 로딩되거나, 상기 챔버로부터 언로딩된다. 그러므로, 하나의 보트 이송로봇(310)을 이용하여 보트(200a)를 CIGS층 형성장치(100a, 100b, 100c, 100d)로 이송하고, 보트(200a, 200b, 200c, 200d)를 CIGS층 형성장치(100a, 100b, 100c, 100d)로부터 이송할 수 있다. 따라서, CIGS층 형성장치군(100), 보트군(200) 및 보트 이송로봇(310)을 포함하는 CIGS층 형성 설비를 설치하기 위한 공간을 줄일 수 있고, 원가가 절감된다.In the layout of the CIGS layer forming equipment according to the present embodiment, the boats 200a, 200b, 200c, and 200d on which the substrate 50 is stored are supported by the boat transfer robot 310, and the CIGS layer forming apparatuses 100a and 100b. , 100c and 100d are transferred to the lower side of the wall 120 through one side surface of the frame 110, and are transported to the outside of the frame 110 from the lower side of the wall 120. The boats 200a, 200b, 200c, and 200d are loaded into the chamber or unloaded from the chamber while being lifted without interference of the boat transport robot 310. Therefore, the boat 200a is transferred to the CIGS layer forming apparatuses 100a, 100b, 100c, and 100d using one boat transfer robot 310, and the boats 200a, 200b, 200c, 200d are transferred to the CIGS layer forming apparatus. It can transfer from (100a, 100b, 100c, 100d). Therefore, the space for installing the CIGS layer forming apparatus including the CIGS layer forming apparatus group 100, the boat group 200, and the boat transfer robot 310 can be reduced, and the cost can be reduced.

보트군(200)의 일측에는 미처리된 기판(50)이 적재 보관된 카세트(400)가 복수개 위치되고, 보트군(200)의 또 다른 일측에는 카세트(400)에 보관된 기판(50)이 정렬되어 보관될 빈 보트(200g)가 위치된다. 그리고, 카세트(400)와 빈 보트(200g) 사이에는 카세트(400)에 보관된 기판(50)을 빈 보트(200g)로 이송하여 정렬하는 기판 이송로봇(330)이 설치된다.On one side of the boat group 200, a plurality of cassettes 400, in which unprocessed substrates 50 are stored, are placed, and on the other side of the boat group 200, the substrates 50 stored in the cassette 400 are aligned. The empty boat 200g to be stored is located. In addition, a substrate transfer robot 330 is installed between the cassette 400 and the empty boat 200g to transfer the substrate 50 stored in the cassette 400 to the empty boat 200g.

기판 이송로봇(330)에 의하여 빈 보트(200g)에 기판(50)이 정렬되면, 보트(200g)는 보트군(200)의 소정 위치로 수동 또는 자동으로 이송된다. 즉, 보트(200g)는 보트군(200)의 보트(200a)의 위치로 이송된다.When the substrate 50 is aligned with the empty boat 200g by the substrate transfer robot 330, the boat 200g is manually or automatically transferred to a predetermined position of the boat group 200. That is, the boat 200g is transferred to the position of the boat 200a of the boat group 200.

본 발명은 상술한 바와 같이 바람직한 실시예를 예로 들어 도시하여 설명하였으나, 상기 실시예에 한정되지 아니하며 본 발명의 정신을 벗어나지 않는 범위 내에서 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자에 의해 다양한 변형과 변경이 가능하다. 그러한 변형예 및 변경예는 본 발명과 첨부된 특허청구범위의 범위 내에 속하는 것으로 보아야 한다.Although the present invention has been described with reference to preferred embodiments as described above by way of example, it is not limited to the above embodiments and should be made by those skilled in the art without departing from the spirit of the present invention. Many variations and modifications are possible. Such modifications and variations are intended to fall within the scope of the invention and the appended claims.

100: CIGS층 형성장치군
100a ～ 100d: CIGS층 형성장치
200: 보트군
200a ～ 200d: 보트
310: 보트 이송로봇100: CIGS layer forming device group
100a to 100d: CIGS layer forming device
200: boat group
200a-200d: boat
310: boat transport robot

Claims (5)

하면을 통하여 미처리된 기판이 로딩 또는 처리된 기판이 언로딩되는 챔버를 가지는 CIGS층 형성장치가 연속적으로 복수개 배치된 CIGS층 형성장치군(群);
미처리된 기판이 정렬된 보트와 상기 CIGS층 형성장치에서 처리된 기판이 정렬된 보트가 복수개 연속적으로 배치되어 상기 CIGS층 형성장치군(群)과 대향하는 보트군(群);
상기 보트군과 상기 CIGS층 형성장치군 사이에 위치되어 상기 보트군 중 미처리된 기판이 정렬된 상기 보트를 상기 CIGS층 형성장치의 하측 부위로 이송시키거나, 상기 CIGS층 형성장치에서 기판이 처리되면 상기 CIGS층 형성장치 하측으로 언로딩된 상기 보트를 상기 보트군 중의 소정 위치로 이송시키는 보트 이송로봇을 포함하며,
상기 보트는 상기 챔버의 하측에서 승강하며, 기판은 상기 보트에 적재 보관되어 상기 챔버에 로딩되거나, 상기 챔버로부터 언로딩되는 것을 특징으로 하는 CIGS층 형성 설비의 레이아웃.A group of CIGS layer forming apparatuses in which a plurality of CIGS layer forming apparatuses having a chamber in which an unprocessed substrate is loaded or processed are unloaded through a lower surface thereof are continuously arranged;
A boat group in which a plurality of boats in which unprocessed substrates are aligned and a boat in which substrates processed in the CIGS layer forming apparatus are arranged in succession are disposed to face the CIGS layer forming apparatus group;
When the boat located between the boat group and the CIGS layer forming apparatus group and the unprocessed substrate of the boat group is aligned is transferred to the lower portion of the CIGS layer forming apparatus, or the substrate is processed in the CIGS layer forming apparatus. And a boat transfer robot for transferring the boat unloaded to the lower side of the CIGS layer forming apparatus to a predetermined position in the boat group.
And the boat is lifted below the chamber, and the substrate is loaded and stored in the boat and loaded into or unloaded from the chamber. 제1항에 있어서,
상기 CIGS층 형성장치는 일측면으로 상기 보트가 출입하는 프레임, 상기 프레임의 상면에 설치되고 내부에 상기 챔버가 형성되며 하면에는 출입구가 형성된 벽체(壁體), 상기 벽체의 하측에 승강가능하게 설치되어 상기 출입구를 개폐하며 상기 보트를 지지하여 승강시키는 도어를 포함하는 것을 특징으로 하는 CIGS층 형성 설비의 레이아웃.The method of claim 1,
The CIGS layer forming apparatus is a frame into which the boat enters and exits from one side, a wall is formed on the upper surface of the frame, and a chamber is formed therein, and a wall is formed on the lower surface thereof, and the lower side of the wall is installed to be able to lift and lower the wall. And a door configured to open and close the doorway and to support the boat to move up and down. 제2항에 있어서,
상기 보트 이송로봇은 상기 보트를 상기 도어의 상면에 탑재하거나, 상기 도어에 탑재된 상기 보트를 상기 보트군 중의 소정 위치로 이송하는 것을 특징으로 하는 CIGS층 형성 설비의 레이아웃.The method of claim 2,
And the boat transfer robot mounts the boat on an upper surface of the door, or transfers the boat mounted on the door to a predetermined position in the boat group. 제3항에 있어서,
상기 보트군의 일측에는 미처리된 기판이 적재 보관된 카세트가 복수개 위치되고,
상기 보트군의 또 다른 일측에는 상기 카세트에 보관된 기판이 정렬되어 보관될 빈 보트가 위치되며,
상기 카세트와 상기 빈 보트 사이에는 상기 카세트에 보관된 기판을 상기 빈 보트로 이송하여 정렬하는 기판 이송로봇이 설치된 것을 특징으로 하는 CIGS층 형성 설비의 레이아웃.The method of claim 3,
On one side of the boat group, a plurality of cassettes in which untreated substrates are stored are placed,
On the other side of the boat group is located an empty boat in which the substrate stored in the cassette is arranged and stored,
The layout of the CIGS layer forming equipment, characterized in that between the cassette and the empty boat is installed a substrate transfer robot for transporting and aligning the substrate stored in the cassette to the empty boat. 제4항에 있어서,
상기 기판 이송로봇에 의하여 기판이 정렬된 상기 보트는 상기 보트군의 소정 위치로 이송되는 것을 특징으로 하는 CIGS층 형성 설비의 레이아웃.5. The method of claim 4,
Layout of the CIGS layer forming equipment, characterized in that the boat is aligned with the substrate by the substrate transfer robot is transferred to a predetermined position of the boat group.
KR1020110103195A 2011-10-10 2011-10-10 Layout of cigs layer forming equipmnet KR101284117B1 (en)

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