KR20100128527A - Apparatus for processing substrate - Google Patents
Apparatus for processing substrate Download PDFInfo
- Publication number
- KR20100128527A KR20100128527A KR1020090046967A KR20090046967A KR20100128527A KR 20100128527 A KR20100128527 A KR 20100128527A KR 1020090046967 A KR1020090046967 A KR 1020090046967A KR 20090046967 A KR20090046967 A KR 20090046967A KR 20100128527 A KR20100128527 A KR 20100128527A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- processing
- loading
- unloading
- unit
- Prior art date
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/52—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices
- B65G47/68—Devices for transferring articles or materials between conveyors i.e. discharging or feeding devices adapted to receive articles arriving in one layer from one conveyor lane and to transfer them in individual layers to more than one conveyor lane or to one broader conveyor lane, or vice versa, e.g. combining the flows of articles conveyed by more than one conveyor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus, comprising: a processing unit for transferring and processing a first substrate in a first direction; and a first substrate provided on the processing unit and supplied from the outside in a direction opposite to the first direction A loading and unloading unit which is transferred in a second direction and positioned to take out the processed first substrate to the outside, and moves the first substrate which is transferred through the loading and unloading unit downward to supply the processing unit A first vertical transfer portion having a lifting portion, and a buffer portion for processing the second substrate to be processed next to the first substrate on the upper side of the first vertical transfer portion. The present invention having such a configuration has a loading and unloading portion on top of the processing portion where the substrate is processed, and includes a first vertical transfer portion for supplying the substrate loaded on the loading and unloading portion to the processing portion, and the first vertical In the sending section, when the substrate is supplied to the processing section, a buffer section is provided to allow the substrate to be processed next to be waited on the upper side of the first vertical transfer section. have.
Description
The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus that can reduce the process waiting time by using a simple structure of the substrate processing apparatus having the same loading position and unloading position of the substrate.
In general, a flat panel display manufacturing process, such as the deposition of a thin film, the formation of a mask, the etching, etc. are selectively repeated on a large glass substrate to manufacture the devices required. In the process of such a process, a cleaning process is performed to remove foreign substances from the substrate before, after, or before and after the process.
In order to shorten the overall manufacturing process time, it is necessary to minimize the moving distance of the substrate. For this purpose, a device is used to withdraw a substrate from a cassette including a plurality of substrates using a single transfer robot, and then perform a specific process again. There is a need to load and unload substrates in sequence over and over.
That is, the substrate taken out from the cassette is supplied to the first processing apparatus using a single transfer robot, the substrate which has been processed by the first processing apparatus is again supplied to the second processing apparatus, and then the process is performed at the second processing apparatus. A method of storing the finished substrate back in the cassette has been proposed.
In such a manufacturing method, the following items are required for each process equipment.
First, the substrate loading position and the unloading position of each processing apparatus should be the same. This is because the processing of the loading and unloading positions is very difficult because the loading and unloading of the substrate has to be repeated using a single transfer robot with the cassette and the multiple processing equipment.
In addition, it is necessary to shorten the residence time of the substrate in each processing apparatus.
This is because the process of repeating the loading and unloading of the substrate into the cassette and the multiple processing apparatuses using a single transfer robot is a shortening of the process waiting time. This can be done to prevent the process waiting time from increasing.
In addition, it is necessary to reduce the volume of each process unit and simplify the configuration.
This is to solve the problem that the size of the equipment is increased by increasing the size of the assembly of the transfer robot, cassette, and a plurality of processing devices forming a system when using a complex and large equipment.
In order to satisfy all of these conditions, development of an apparatus for processing a substrate is required. Until now, substrate processing apparatuses have a process waiting substrate and a substrate waiting for processing in order to reduce the process waiting time. To use complex devices,
In the case of using a simple structure, it is difficult to develop a substrate processing apparatus that satisfies all of the above requirements, such as a relatively longer process waiting time.
The problem to be solved by the present invention in view of the above problems is to provide a substrate processing apparatus that can reduce the waiting time for substrate processing while using a simple structure in a substrate processing apparatus having the same loading and unloading positions.
In addition, another object of the present invention is to provide a substrate processing apparatus that can reduce the process waiting time by introducing a buffer structure of a simple structure, the substrate in the process standby state can be maintained in a stable state.
According to an aspect of the present invention, there is provided a substrate processing apparatus including a processing unit configured to transfer and process a first substrate in a first direction, and the first substrate positioned at an upper portion of the processing unit and supplied from the outside to the first direction. A loading and unloading unit for transferring the processed first substrate to the outside and a downward movement of the first substrate transferred through the loading and unloading unit. And a first vertical transfer portion having a lifting portion to be supplied to the processing portion, and a buffer portion for processing the second substrate to be processed next to the first substrate on the upper side of the first vertical transfer portion.
The present invention has a first vertical transfer portion for placing a loading and unloading portion on top of a processing portion in which a substrate is processed, and for supplying a substrate loaded in the loading and unloading portion to a processing portion, wherein the substrate is disposed at the first vertical transfer portion. When the substrate to be supplied to the processing unit is supplied with a buffer to wait for the next processing on the upper side of the first vertical transfer portion, there is an effect that can reduce the process waiting time of the substrate while using a simple structure.
In addition, when the substrate is waiting in the buffer unit to prevent the deflection on the substrate to have a more stable standby state, there is an effect that can improve the reliability of the device.
Hereinafter, the configuration and operation of the preferred embodiment of the present invention configured as described above in detail.
1 is a configuration diagram of a preferred embodiment of the substrate processing apparatus of the present invention.
Referring to FIG. 1, a preferred embodiment of the substrate processing apparatus of the present invention includes a
Hereinafter, the configuration and operation of a preferred embodiment of the substrate processing apparatus of the present invention configured as described above will be described in more detail.
First, the
The
That is, the
The loading and unloading
In addition, the
In this way, the loading and
When the substrate enters the loading and unloading
After the transfer robot moves, the
The first
In addition, the
After the
2 is a side configuration diagram showing an embodiment of the
Referring to FIGS. 2 and 3, the
That is, when the
At this time, when the edge is supported by the first and
In view of this, when the substrate 1 'is supported by the first and
4 is a configuration diagram of one embodiment of the
Referring to FIG. 4, one embodiment of the
That is, when the substrate 1 'is supplied to the
In the above configuration, the rollers provided on the
The
It is also possible to use a roller instead of the
5 is another exemplary configuration diagram of the
Referring to FIG. 5, another embodiment of the
The
The rotating
When moved downward, interference is prevented when the substrate 1 'is moved downward by the elevating
Thus, according to the present invention, the
In addition, the
Subsequently, the
1 is a configuration diagram of a preferred embodiment of the substrate processing apparatus of the present invention.
FIG. 2 is a side view illustrating an exemplary configuration of the buffer unit and the lifting unit in FIG. 1.
3 is a detailed configuration diagram of the buffer unit in FIG. 1.
FIG. 4 is a diagram illustrating an embodiment of the third support unit of FIG. 3.
5 is another embodiment of the third support in FIG.
* Description of the symbols for the main parts of the drawings *
10: processing
20: loading and unloading part 22: door part
23: lift pin 30: The first vertical conveying part
32: lift 40: second vertical transfer section
50: buffer part 51: first support part
52: second support 53: third support
54: servo cylinder 55: sliding support shaft
56: flexible contact 57: rotary shaft
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090046967A KR20100128527A (en) | 2009-05-28 | 2009-05-28 | Apparatus for processing substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090046967A KR20100128527A (en) | 2009-05-28 | 2009-05-28 | Apparatus for processing substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100128527A true KR20100128527A (en) | 2010-12-08 |
Family
ID=43505392
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090046967A KR20100128527A (en) | 2009-05-28 | 2009-05-28 | Apparatus for processing substrate |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20100128527A (en) |
-
2009
- 2009-05-28 KR KR1020090046967A patent/KR20100128527A/en not_active Application Discontinuation
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E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |