KR200491953Y1 - 비전 정렬 - Google Patents
비전 정렬 Download PDFInfo
- Publication number
- KR200491953Y1 KR200491953Y1 KR2020150007057U KR20150007057U KR200491953Y1 KR 200491953 Y1 KR200491953 Y1 KR 200491953Y1 KR 2020150007057 U KR2020150007057 U KR 2020150007057U KR 20150007057 U KR20150007057 U KR 20150007057U KR 200491953 Y1 KR200491953 Y1 KR 200491953Y1
- Authority
- KR
- South Korea
- Prior art keywords
- mask
- light source
- alignment
- substrate
- visualization system
- Prior art date
Links
Images
Classifications
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- H01L51/56—
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- H01L51/0011—
-
- H01L2251/56—
Landscapes
- Engineering & Computer Science (AREA)
- Electroluminescent Light Sources (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201462074397P | 2014-11-03 | 2014-11-03 | |
US62/074,397 | 2014-11-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20160001545U KR20160001545U (ko) | 2016-05-11 |
KR200491953Y1 true KR200491953Y1 (ko) | 2020-07-07 |
Family
ID=55523826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2020150007057U KR200491953Y1 (ko) | 2014-11-03 | 2015-10-30 | 비전 정렬 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3203147U (ja) |
KR (1) | KR200491953Y1 (ja) |
CN (1) | CN205247063U (ja) |
TW (1) | TWM526177U (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019516867A (ja) * | 2016-05-24 | 2019-06-20 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 耐プラズマコーティングを有するシャドウマスク |
EP3361316A1 (de) * | 2017-02-14 | 2018-08-15 | VAT Holding AG | Pneumatische stifthubvorrichtung und pneumatischer hubzylinder |
KR102217879B1 (ko) * | 2018-03-14 | 2021-02-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판을 프로세싱하기 위한 방법, 진공 프로세싱을 위한 장치, 및 진공 프로세싱 시스템 |
KR102620156B1 (ko) * | 2018-10-30 | 2023-12-29 | 캐논 톡키 가부시키가이샤 | 밀착도 확인 장치, 밀착도 확인 방법, 및 이를 이용한 성막 장치, 성막 방법, 전자 디바이스의 제조방법 |
CN112575287B (zh) * | 2019-09-29 | 2022-02-18 | 上海微电子装备(集团)股份有限公司 | 掩模对准装置和掩模对准方法 |
CN113466259B (zh) * | 2020-03-31 | 2023-02-17 | 上海微电子装备(集团)股份有限公司 | 金属掩模检测装置、光源标定方法及装置和维护标定方法 |
TWI832091B (zh) * | 2020-10-09 | 2024-02-11 | 瑞士商巴柏斯特麥克斯合資公司 | 板材處理單元和用於評估對齊的方法 |
US11393698B2 (en) * | 2020-12-18 | 2022-07-19 | STATS ChipPAC Pte. Ltd. | Mask design for improved attach position |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004037248A (ja) * | 2002-07-03 | 2004-02-05 | Sumitomo Metal Mining Co Ltd | 検査装置および貫通孔の検査方法 |
KR100712953B1 (ko) * | 2006-06-16 | 2007-05-02 | 두산디앤디 주식회사 | 기판 얼라인장치 및 이를 이용한 기판얼라인방법 |
-
2015
- 2015-10-21 TW TW104216816U patent/TWM526177U/zh not_active IP Right Cessation
- 2015-10-30 KR KR2020150007057U patent/KR200491953Y1/ko active IP Right Grant
- 2015-11-02 JP JP2015005585U patent/JP3203147U/ja active Active
- 2015-11-03 CN CN201520867955.7U patent/CN205247063U/zh active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004037248A (ja) * | 2002-07-03 | 2004-02-05 | Sumitomo Metal Mining Co Ltd | 検査装置および貫通孔の検査方法 |
KR100712953B1 (ko) * | 2006-06-16 | 2007-05-02 | 두산디앤디 주식회사 | 기판 얼라인장치 및 이를 이용한 기판얼라인방법 |
Also Published As
Publication number | Publication date |
---|---|
JP3203147U (ja) | 2016-03-17 |
CN205247063U (zh) | 2016-05-18 |
TWM526177U (zh) | 2016-07-21 |
KR20160001545U (ko) | 2016-05-11 |
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