KR20000002998A - Apparatus of cleaning lcd glass - Google Patents
Apparatus of cleaning lcd glass Download PDFInfo
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- KR20000002998A KR20000002998A KR1019980024056A KR19980024056A KR20000002998A KR 20000002998 A KR20000002998 A KR 20000002998A KR 1019980024056 A KR1019980024056 A KR 1019980024056A KR 19980024056 A KR19980024056 A KR 19980024056A KR 20000002998 A KR20000002998 A KR 20000002998A
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- cleaning
- lcd glass
- cleaning liquid
- lcd
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
Abstract
Description
본 발명은 LCD 글래스 세정장치에 관한 것으로, 더욱 상세하게는 세정 챔버중 LCD 글래스의 상부에 LCD 글래스와 평행하고 세정액 분사 방향은 LCD 패널에 대하여 수직 방향을 갖는 세정액 수직 분사노즐을 설치하고, 세정 챔버의 측면에 LCD 글래스에 대하여 수직으로 설치됨과 동시에 회전하면서 세정액을 분사하는 회전 세정액 분사 노즐을 구비하여 세정력을 향상시킨 LCD 글래스 세정장치에 관한 것이다.The present invention relates to an LCD glass cleaning device, and more particularly, a cleaning liquid vertical spray nozzle having a liquid crystal spraying direction parallel to the LCD glass and having a vertical direction with respect to the LCD panel is installed on the upper portion of the LCD glass. And a rotating cleaning liquid spray nozzle which is installed vertically with respect to the LCD glass and rotates and sprays the cleaning liquid while rotating on the side of the LCD glass.
일반적으로 LCD 글래스의 상면에는 반도체 소자 제조 공정과 유사한 공정에 의하여 화소에는 액정을 배열시키기 위한 스위칭 소자인 박막트랜지스터가 형성된다.In general, a thin film transistor, which is a switching element for arranging liquid crystals, is formed on a pixel by a process similar to a semiconductor device manufacturing process on an upper surface of an LCD glass.
이 박막트랜지스터를 형성하기 위해서는 LCD 글래스상에 포토레지스트 도포-현상-식각-현상액 세정의 과정을 반복적으로 수행하여야 한다.In order to form this thin film transistor, the process of applying photoresist-developing-etching-developer on the LCD glass should be repeatedly performed.
물론, 이와 같은 공정은 박막트랜지스터 이외에도 공통전극인 ITO 전극을 형성할 때에도 동일하게 수행된다.Of course, the same process is performed when forming the ITO electrode as a common electrode in addition to the thin film transistor.
이와 같은 박막트랜지스터를 형성함에 있어 식각 공정 후 필수적으로 수행되는 현상액 세정 공정은 현상액 분사 방법에 있어서 다시 딥(dip) 방식과, 퍼들 방식과, 샤워 방식 등이 있다.The developer cleaning process which is essentially performed after the etching process in forming the thin film transistor includes a dip method, a puddle method, a shower method, and the like in the developer injection method.
딥 방식은 LCD 글래스를 세정액에 담궈 세정을 진행하는 방식이고, 퍼들 방식은 세정액을 LCD 글래스에 떨어뜨려 세정을 수행하는 방식이고, 샤워 방식은 세정액을 일정시간 LCD 글래스에 일정 압력으로 분사하는 방식을 말한다.The dip method is a method of cleaning by dipping the LCD glass in the cleaning liquid. The puddle method is a method of cleaning by dropping the cleaning liquid into the LCD glass. The shower method is a method of spraying the cleaning liquid on the LCD glass at a predetermined pressure. Say.
첨부된 도면을 참조하면 분사 방식 세정장치(10)는 세정 챔버(1)와, 챔버(1)의 상부에 세정액을 공급하는 세정액 공급관(2)과, 세정액 공급관(2)의 단부와 연통되어 세정액을 균일한 압력으로 분사하는 분사관(3)과, 분사관(3)에 형성되어 있는 분사 노즐을 포함하고 있다.Referring to the accompanying drawings, the spray type cleaning apparatus 10 communicates with the cleaning chamber 1, the cleaning liquid supply pipe 2 for supplying the cleaning liquid to the upper part of the chamber 1, and the end of the cleaning liquid supply pipe 2. And a spray nozzle formed in the spray tube 3 for spraying at a uniform pressure.
또한, 분사 방식 세정장치(10)는 분사 노즐보다 하부에 위치하고 있는 LCD 글래스(4)가 놓여짐과 동시에 이송되도록 글래스 이송 롤러(5)가 설치된다.In addition, the glass cleaning roller 5 is installed in the spray type cleaning apparatus 10 so that the LCD glass 4 positioned below the spray nozzle is placed and conveyed at the same time.
한편, 분사 방식 세정장치(10)에는 분사 노즐에 의하여 LCD 글래스(4)로 분사된 세정액을 배출하기 위하여 LCD 글래스(4)의 저면에는 세정액 배출구(6)가 형성되어야 한다.On the other hand, in the spray type cleaning apparatus 10, in order to discharge the cleaning liquid sprayed to the LCD glass 4 by the spray nozzle, the cleaning liquid outlet 6 should be formed on the bottom of the LCD glass 4.
세정액 배출구(6)에 형성된 세정액은 펌프(미도시) 및 필터(미도시)에 의하여 여과된 후, 세정액 공급부(7)으로 재공급된다.The cleaning liquid formed in the cleaning liquid discharge port 6 is filtered by a pump (not shown) and a filter (not shown), and then is again supplied to the cleaning liquid supply part 7.
그러나, 종래 분사 방식 세정장치에는 한번에 6 매 내지 10 매의 LCD 글래스가 동시에 투입되어 LCD 글래스의 상부에서 LCD 글래스의 하부로 분사되는 세정액에 의하여 균일한 세정이 어려운 문제점이 있다.However, the conventional spray type cleaning apparatus has a problem in that uniform cleaning is difficult due to the cleaning liquid sprayed from the upper portion of the LCD glass to the lower portion of the LCD glass by adding 6 to 10 LCD glasses at a time.
따라서, 본 발명은 이와 같은 종래 문제점을 감안한 것으로써, 본 발명의 목적은 LCD 글래스의 상부에서 LCD 글래스로 세정액을 분사함과 동시에 LCD 글래스와 LCD 글래스 사이에도 세정액이 원할하게 공급되도록 LCD 글래스의 측면에서 세정액을 공급하여 세정 효율이 증대되도록 함에 있다.Accordingly, the present invention has been made in view of such a conventional problem, and an object of the present invention is to spray the cleaning liquid onto the LCD glass from the top of the LCD glass and at the same time the cleaning liquid is smoothly supplied between the LCD glass and the LCD glass. In order to increase the cleaning efficiency by supplying the cleaning liquid.
도 1은 종래 LCD 글래스 세정장치를 도시한 단면도.1 is a cross-sectional view showing a conventional LCD glass cleaning device.
도 2는 본 발명에 의한 LCD 글래스 세정장치를 도시한 사시도.Figure 2 is a perspective view of the LCD glass cleaning apparatus according to the present invention.
이와 같은 본 발명의 목적을 달성하기 위한 LCD 글래스 세정장치는 세정이 진행되는 세정 챔버와, 세정 챔버로 투입된 LCD 글래스의 상부에서 LCD 글래스 방향을 갖도록 세정액을 분사시키는 제 1 세정액 공급 유닛과, 세정 챔버의 측면에 설치되어 상기 LCD 글래스와 평행한 방향으로 세정액을 분사시키는 제 2 세정액 공급 유닛을 포함하는 것을 특징으로 한다.In order to achieve the object of the present invention, an LCD glass cleaning apparatus includes a cleaning chamber in which cleaning is performed, a first cleaning liquid supply unit for injecting a cleaning liquid to have an LCD glass direction from an upper portion of the LCD glass introduced into the cleaning chamber, and a cleaning chamber. And a second cleaning liquid supply unit installed at a side surface of the second glass, and configured to spray the cleaning liquid in a direction parallel to the LCD glass.
이하, 본 발명 LCD 글래스 세정장치를 첨부된 도면을 참조하여 설명하면 다음과 같다.Hereinafter, the LCD glass cleaning device of the present invention will be described with reference to the accompanying drawings.
본 발명에 의한 LCD 글래스 세정장치(100)는 전체적으로 보아 세정이 진행되는 세정 챔버(110)와, 세정액 수직 분사 유닛(120)과, 세정액 회전 분사 유닛(130)으로 구성된다.LCD glass cleaning apparatus 100 according to the present invention is composed of a cleaning chamber 110, the cleaning liquid vertical injection unit 120, and the cleaning liquid rotary injection unit 130, the cleaning proceeds as a whole.
세정 챔버(110)는 상면이 개구된 육면체 형상으로 세정 챔버(110)의 하부에는 세정액 배출구(160)가 형성된다.The cleaning chamber 110 has a hexahedron shape with an upper surface opened, and a cleaning liquid discharge port 160 is formed at a lower portion of the cleaning chamber 110.
이와 같은 세정 챔버(110)의 상면에는 세정액 수직 분사 유닛(120)이 설치된다.The cleaning liquid vertical injection unit 120 is installed on the upper surface of the cleaning chamber 110.
세정액 수직 분사 유닛(120)은 세정액 공급관(122)과, 세정액 공급관(122)에 형성된 다수개의 세정액 분사 노즐(125)로 구성된다.The cleaning liquid vertical injection unit 120 includes a cleaning liquid supply pipe 122 and a plurality of cleaning liquid injection nozzles 125 formed in the cleaning liquid supply pipe 122.
세정액 공급관(122)에는 세정액 공급부(130)가 연통되어 세정액이 공급되는데, 세정액 공급부(130)와 세정 챔버(110)의 세정액 배출구(160)는 연결 배관(미도시)에 의하여 연결되며, 연결 배관에는 필터(미도시)와, 펌프(미도시)가 설치된다.The cleaning liquid supply unit 130 is connected to the cleaning liquid supply pipe 122 so that the cleaning liquid is supplied. The cleaning liquid supply unit 130 and the cleaning liquid outlet 160 of the cleaning chamber 110 are connected by a connection pipe (not shown). A filter (not shown) and a pump (not shown) are installed in the chamber.
한편, 세정 챔버(110)의 측면에는 세정액 회전 분사 유닛(130)이 설치된다.On the other hand, the cleaning liquid rotating injection unit 130 is installed on the side of the cleaning chamber 110.
세정액 회전 분사 유닛(130)은 세정 챔버(110)의 측면에 설치됨과 동시에 측면에 평행하게 수직으로 설치된다.The cleaning liquid rotary injection unit 130 is installed at the side of the cleaning chamber 110 and at the same time perpendicular to the side.
이와 같이 세정 챔버(110)에 설치된 세정액 회전 분사 유닛(130)은 세정액 공급관 2 개가 서로 직각이 되도록 교차시킨 상태에서 각각의 세정액 공급관(135)에 설치된 분사 노즐(136)로 구성된다.Thus, the cleaning liquid rotational injection unit 130 installed in the cleaning chamber 110 is composed of the injection nozzle 136 provided in each of the cleaning liquid supply pipe 135 in a state in which the two cleaning liquid supply pipes cross each other at right angles.
교차된 세정액 공급관(135)중 교차된 부분에는 모터(138)의 회전축(139)이 결합되어 모터(138)에 의하여 세정액 공급관(135)은 소정 분당 회전수로 회전되어 세정액 공급부(130)로부터 공급된 세정액은 세정액 회전 분사 유닛(130)과, 세정액 수직 분사 유닛(120)으로 각각 공급됨과 동시에 세정액 회전 분사 유닛(130)의 모터(138)는 회전되면서 LCD 글래스(140)에 부착된 미세 파티클 또는 식각액을 클리닝한다.The rotating shaft 139 of the motor 138 is coupled to the intersected portion of the cleaning liquid supply pipe 135 that is crossed, and the cleaning liquid supply pipe 135 is rotated at a predetermined rotational speed by the motor 138 to be supplied from the cleaning liquid supply unit 130. The cleaning liquid is supplied to the cleaning liquid rotary spray unit 130 and the cleaning liquid vertical spray unit 120, and at the same time, the motor 138 of the cleaning liquid rotary spray unit 130 is rotated, and the fine particles attached to the LCD glass 140 or the like. Clean the etchant.
이때, 세정액 공급관(135)은 회전됨으로 세정액 공급관(135)이 회전한 상태에서도 세정액 공급관(135)으로 항상 세정액이 공급되도록 한다.At this time, the cleaning solution supply pipe 135 is rotated so that the cleaning solution is always supplied to the cleaning solution supply pipe 135 even when the cleaning solution supply pipe 135 is rotated.
이상에서 상세하게 설명한 바와 같이 LCD 글래스의 상부에서 LCD 글래스 쪽으로 세정액을 분사함과 동시에 LCD 글래스에 대하여 수직된 방향으로부터 세정액을 LCD 글래스로 공급하여 세정액의 LCD 글래스의 세정력을 향상시키는 효과가 있다.As described in detail above, the cleaning liquid is sprayed from the upper portion of the LCD glass toward the LCD glass, and the cleaning liquid is supplied to the LCD glass from a direction perpendicular to the LCD glass, thereby improving the cleaning power of the LCD glass.
Claims (2)
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KR1019980024056A KR20000002998A (en) | 1998-06-25 | 1998-06-25 | Apparatus of cleaning lcd glass |
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KR1019980024056A KR20000002998A (en) | 1998-06-25 | 1998-06-25 | Apparatus of cleaning lcd glass |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101033122B1 (en) * | 2004-06-29 | 2011-05-11 | 엘지디스플레이 주식회사 | substrate cleaning apparatus for liquid crystal display device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR900008636A (en) * | 1988-11-11 | 1990-06-04 | 아오이 죠이치 | Semiconductor Substrate Etching Equipment |
JPH06291102A (en) * | 1993-03-30 | 1994-10-18 | Nippon Steel Corp | Cleaning equipment for substrate |
JPH08148418A (en) * | 1994-11-25 | 1996-06-07 | Fujitsu Ltd | Board processor |
KR100274078B1 (en) * | 1993-03-31 | 2000-12-15 | 이데이 노부유끼 | Sustrate cleansing method and apparatus thereof |
-
1998
- 1998-06-25 KR KR1019980024056A patent/KR20000002998A/en not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR900008636A (en) * | 1988-11-11 | 1990-06-04 | 아오이 죠이치 | Semiconductor Substrate Etching Equipment |
JPH06291102A (en) * | 1993-03-30 | 1994-10-18 | Nippon Steel Corp | Cleaning equipment for substrate |
KR100274078B1 (en) * | 1993-03-31 | 2000-12-15 | 이데이 노부유끼 | Sustrate cleansing method and apparatus thereof |
JPH08148418A (en) * | 1994-11-25 | 1996-06-07 | Fujitsu Ltd | Board processor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101033122B1 (en) * | 2004-06-29 | 2011-05-11 | 엘지디스플레이 주식회사 | substrate cleaning apparatus for liquid crystal display device |
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