KR19980072530A - Structure of LCD and Manufacturing Method Thereof - Google Patents
Structure of LCD and Manufacturing Method Thereof Download PDFInfo
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- KR19980072530A KR19980072530A KR1019970007402A KR19970007402A KR19980072530A KR 19980072530 A KR19980072530 A KR 19980072530A KR 1019970007402 A KR1019970007402 A KR 1019970007402A KR 19970007402 A KR19970007402 A KR 19970007402A KR 19980072530 A KR19980072530 A KR 19980072530A
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 71
- 239000000758 substrate Substances 0.000 claims abstract description 58
- 239000011159 matrix material Substances 0.000 claims abstract description 48
- 238000000059 patterning Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 3
- 230000002265 prevention Effects 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 2
- 210000002858 crystal cell Anatomy 0.000 abstract description 22
- 230000009931 harmful effect Effects 0.000 description 5
- NMWSKOLWZZWHPL-UHFFFAOYSA-N 3-chlorobiphenyl Chemical compound ClC1=CC=CC(C=2C=CC=CC=2)=C1 NMWSKOLWZZWHPL-UHFFFAOYSA-N 0.000 description 2
- 101001082832 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) Pyruvate carboxylase 2 Proteins 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- BNPSSFBOAGDEEL-UHFFFAOYSA-N albuterol sulfate Chemical compound OS(O)(=O)=O.CC(C)(C)NCC(O)C1=CC=C(O)C(CO)=C1.CC(C)(C)NCC(O)C1=CC=C(O)C(CO)=C1 BNPSSFBOAGDEEL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 231100000826 degradation of vision Toxicity 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022475—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of indium tin oxide [ITO]
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- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- Liquid Crystal (AREA)
Abstract
본 발명의 액정표시장치는 투명기판 112위에 칼라필터 131과 블랙매트릭스 170이 소정의 패턴모양으로 형성되고, 상기 칼라필터와 블랙매트릭스 위에 EMI방지수단이 되는 도전막 300, 절연막 126, 공통전극 119가 연속적층되어 형성된다. 투명기판 111위에는 TFT l08과 화소전극 118이 서로 접촉되어 형성된다.In the liquid crystal display of the present invention, the color filter 131 and the black matrix 170 are formed in a predetermined pattern on the transparent substrate 112, and the conductive film 300, the insulating film 126, and the common electrode 119 are formed as EMI protection means on the color filter and the black matrix. It is formed by stacking continuously. The TFT 08 and the pixel electrode 118 are formed on the transparent substrate 111 in contact with each other.
상기와 같이 형성된 투명기판 111과 112가 서로 합착되고 상기 합착된 기판 사이에 액정 188이 주입되어 액정셀 103이 형성된다.The transparent substrates 111 and 112 formed as described above are bonded to each other, and the liquid crystal 188 is injected between the bonded substrates to form the liquid crystal cell 103.
상기 액정셀 103의 도전막 300은 소정의 직류전압이 인가되거나 접지된다.The conductive film 300 of the liquid crystal cell 103 is applied with a predetermined DC voltage or grounded.
특히, 상기 도전막 300은 상기 액정셀의 구동회로 및 액정셀 주변의 전자부품에서 발생하는 EMI 400을 차폐하는 역할을 한다.In particular, the conductive layer 300 serves to shield the EMI 400 generated from the driving circuit of the liquid crystal cell and the electronic components around the liquid crystal cell.
Description
액정표시장치는 사무실, 학교, 도서관, 각 가정에 이르기까지 거의 모든 곳에서 이용되고 있다.LCDs are used almost everywhere, from offices, schools, libraries, and even homes.
특히, 액정표시장치는 가볍고 얇아서 휴대성이 편리한 특징이 있는데, 구체적으로 응용분야의 몇가지 예를 들면 퍼스널컴퓨터, AV(audio visual), 모빌컴퓨터(mobile computer) 등의 휴대형 정보통신기기, 게임이나 시뮬레이션기기 등에서 많이 이용된다.In particular, the liquid crystal display device is light and thin, which is convenient for portability. Specifically, some examples of application fields include portable information communication devices such as personal computers, audio visual (AV), and mobile computers, games, and simulations. It is widely used in equipment.
상기와 같이 다양한 분야에서 이용되는 액정표시장치는 도 1과 같이 구동IC와 OP Amp 등의 전자부품 39가 구성된 PCB기판 2위에 액정셀 3 등이 포함되어 구성된다.As described above, the liquid crystal display device used in various fields includes a liquid crystal cell 3 and the like on a PCB substrate 2 composed of an electronic component 39 such as a driving IC and an OP amp as shown in FIG. 1.
상기 액정셀 3은 도 2, 도 3(도 2의 a-a선을 따라 절단한 단면도)의 구조를 하고 있다.The liquid crystal cell 3 has a structure of FIGS. 2 and 3 (cross section taken along the line a-a of FIG. 2).
투명기판 11위에 게이트버스라인 16과 데이터버스라인 15가 매트릭스상으로 형성되고, 상기 게이트버스라인과 데이터버스라인에 연결되는 TFT 8이 상기 게이트버스라인과 데이터버스라인의 교차점 부분에 형성되고, 상기 TFT와 연결되는 화소전극 18이 상기 게이트버스라인과 데이터버스라인으로 둘러싸인 영역에 형성된다.A gate bus line 16 and a data bus line 15 are formed in a matrix on the transparent substrate 11, and a TFT 8 connected to the gate bus line and the data bus line is formed at an intersection of the gate bus line and the data bus line. A pixel electrode 18 connected to the TFT is formed in an area surrounded by the gate bus line and the data bus line.
또, 투명기판 12위에 블랙매트릭스 70과 칼라필터 31(R, G, B) 등이 매트릭스상으로 형성되고, 상기 블랙매트릭스와 칼라필터층이 형성된 기판 위에 공통전극 19가 형성된다.Further, black matrix 70 and color filters 31 (R, G, B) and the like are formed on the transparent substrate 12 in a matrix form, and a common electrode 19 is formed on the substrate on which the black matrix and the color filter layer are formed.
상기와 같이 구성된 투명기판 11과 12가 대향되게 합착되고, 상기 합착된 공간에 액정 88이 주입되어 액정셀 3이 구성된다.The transparent substrates 11 and 12 configured as described above are opposed to each other, and the liquid crystal 88 is injected into the bonded space to form the liquid crystal cell 3.
상기 액정셀 3을 포함하는 액정표시장치는 공통전극 19에 소정의 전압을 인가하고 또, 각각의 TFT 8이 온(ON), 오프(OFF)되도록 콘트롤하여 액정 88을 구동함으로써 액정표시장치의 화면에 문자나 그림 등을 표시할 수 있다.The liquid crystal display including the liquid crystal cell 3 applies a predetermined voltage to the common electrode 19 and controls the TFT 8 to be turned on and off to drive the liquid crystal 88 to display the screen of the liquid crystal display. You can display text, pictures, and so on.
그런데, 상기 액정표시장치를 구동하면 PCB기판 2에 구성된 구동IC, OP Amp 등의 전자부품 39와 액정셀 3의 데이터버스라인 15 및 게이트버스라인 16 등의 구동회로에서 다른 전자기기와 마찬가지로 전자파간섭(이하 EMI : EIectromagnetic Interference라 칭한다) 400이 사방으로 일어난다.However, when the liquid crystal display device is driven, electromagnetic interference such as other electronic devices in the electronic component 39 such as the driving IC and the OP Amp configured in the PCB 2 and the driving circuits such as the data bus line 15 and the gate bus line 16 of the liquid crystal cell 3 (Hereinafter EMI: EIectromagnetic Interference) 400 occurs in all directions.
상기 EMI 400은 다른 전자기기 등의 기능에 영향을 미칠 수 있으며, 액정표시장치의 오동작을 일으킬 수 있다.The EMI 400 may affect the functions of other electronic devices and cause malfunction of the liquid crystal display.
특히, EMI 400은 인체에 유해한 영향을 미치는 것으로 보고 되고 있으며, 실제로 표시화면을 장시간 바라볼 때 시력의 저하 등이 발생하는 것도 상기 EMI의 영향때문이다.In particular, the EMI 400 has been reported to have a harmful effect on the human body, and in fact, the degradation of vision when viewing the display screen for a long time is due to the influence of the EMI.
상기 EMI는 화면의 싸이즈가 큰 대면적 액정표시장치에서 더 심하게 나타나고, 액정표시장치가 대면적화됨에 따라 EMI를 방지하기 위한 연구가 활발히 진행되고 있다.The EMI is more severe in large area LCDs with large screen sizes, and researches for preventing EMI have been actively conducted due to the large area of LCDs.
PCB기판 2에 도전성페인트나 도전성플레이트를 설치하고, 접지시키는 것도 EMI를 방지하기 위한 수단으로 제안된 것이며, 알루미늄호일을 이용하여 구동IC 등을 감싸는 것도 이에 해당한다.Installing a conductive paint or a conductive plate on the PCB 2 and grounding it has also been proposed as a means to prevent EMI, and this also includes wrapping the driving IC using aluminum foil.
본 발명은 EMI를 방지하기 위한 수단이 구비된 액정표시장치와 EMI를 방지하기위한 수단이 구비된 액정표시장치를 제조하는 것과 관련된 것으로써 특히, 액정표시장치의 투명기판 12에 상기 EMI를 방지하기 위한 수단이 구비되고, 상기 EMI를 방지하기 위한 수단이 구비된 투명기판 12의 구성방법에 관련된 것이다.The present invention relates to the manufacture of a liquid crystal display device having a means for preventing EMI and a liquid crystal display device having a means for preventing EMI, in particular, to prevent the EMI on the transparent substrate 12 of the liquid crystal display device. The present invention relates to a method for constructing a transparent substrate 12 provided with means for preventing the EMI.
본 발명은 상기 액정표시장치에서 발생하는 EMI를 차폐하여 액정표시장치의 오동작을 방지하고 인체에 미치는 유해전자파를 차단하는 것을 목적으로 한다.An object of the present invention is to shield EMI generated by the liquid crystal display device to prevent malfunction of the liquid crystal display device and to block harmful electromagnetic waves on the human body.
상기 목적을 위하여 본 발명은 도 4와 같이 EMI를 방지하기 위한 수단이 구비된다.To this end, the present invention is provided with means for preventing EMI as shown in FIG.
투명기판 112위에 블랙매트릭스 l70과 칼라필터 131을 형성하고, 상기 블랙매트릭스와 칼라필터 위에 EMI를 방지하기 위한 수단이 되는 도전막 300을 형성한다.A black matrix l70 and a color filter 131 are formed on the transparent substrate 112, and a conductive film 300 is formed on the black matrix and the color filter to prevent EMI.
상기 도전막 300위에 절연막 126을 형성하고, 상기 절연막 위에 공통전극 119를 형성한다.An insulating film 126 is formed on the conductive film 300, and a common electrode 119 is formed on the insulating film.
상기와 같이 투명기판 112에 도전막 300을 형성하여 액정표시장치를 구성한 후, 상기 도전막에 소정의 직류전압을 인가하거나 상기 도전막을 접지시킴으로써 EMI를 차폐하고, 방지한다.After the conductive film 300 is formed on the transparent substrate 112 to form a liquid crystal display device, EMI is shielded and prevented by applying a predetermined DC voltage to the conductive film or by grounding the conductive film.
특히, 상기 도전막 300은 액정표시장치의 전자부품과, 데이터버스라인과 게이트버스라인 등의 구동회로에서 방사되는 EMI를 표시화면쪽에서 차폐하기 때문에 사용자의 시력을 보호할 수 있고 사용자에게 미치는 유해전자파를 최소로 할 수 있다.In particular, since the conductive film 300 shields EMI emitted from electronic components of the liquid crystal display device and driving circuits such as data bus lines and gate bus lines on the display screen side, the user's eyesight can be protected and harmful electromagnetic waves affecting the user. Can be minimized.
또한, 상기 도전막 300에 소정의 직류전압을 인가하면 절연막 126을 사이에 두고 공통전극 119와 정전용량(capacitance)이 형성되는데 이 정전용량값을 수십pf 이하로 유지시키면 공통전극 119의 전압파형을 안정시키는 효과가 있다.In addition, when a predetermined DC voltage is applied to the conductive layer 300, a common electrode 119 and a capacitance are formed with the insulating layer 126 interposed therebetween. When the capacitance value is maintained below several tens of pf, the voltage waveform of the common electrode 119 is reduced. It has a stabilizing effect.
상기 도 4는 칼라필터와 블랙매트릭스 위에 별도의 도전막 300을 형성하여 EMI방지 수단으로 이용하고 있지만 도 5와 같이 별도의 도전막을 형성하지 않고, 도전성 블랙매트릭스 175에 소정의 직류전압을 인가하거나 접지시킴으로써 EMI를 방지하는 방법도 있다.In FIG. 4, a separate conductive film 300 is formed on the color filter and the black matrix to be used as an EMI prevention means. However, as shown in FIG. 5, a separate DC voltage is applied to the conductive black matrix 175 or grounded without forming a separate conductive film. There is also a way to prevent EMI.
도 1은 일반적인 액정표시장치의 입체도이고,1 is a three-dimensional view of a general liquid crystal display device,
도 2는 도 1의 액정셀 3의 투시도이고,FIG. 2 is a perspective view of the liquid crystal cell 3 of FIG. 1,
도 3은 도 2의 단면도이고,3 is a cross-sectional view of FIG. 2,
도 4, 도 5는 본 발명의 액정표시장치의 투명기판 112에 형성된 구조물의 단면도이고,4 and 5 are cross-sectional views of the structure formed on the transparent substrate 112 of the liquid crystal display of the present invention,
도 6은 본 발명의 액정표시장치의 액정셀의 단면도이다.6 is a cross-sectional view of a liquid crystal cell of the liquid crystal display device of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
2 : PCB기판. 3,103 : 액정셀.2: PCB board. 3,103: liquid crystal cell.
8,108 : TFT 11,12,111,112 : 투명기판.8,108 TFT 11,12,111,112 Transparent substrate.
15 : 데이터버스라인. 16 : 게이트버스라인.15: data bus line. 16: Gate bus line.
18,108 : 화소전극. 19,119 : 공통전극.18,108 pixel electrodes. 19,119: common electrode.
31(R,G,B),131(R,G,B) : 칼라필터. 70,170,175 : 블랙매트릭스.31 (R, G, B), 131 (R, G, B): color filter. 70,170,175: Black Matrix.
88,188 : 액정. 126 : 절연막.88,188 liquid crystal. 126: insulating film.
300 : 도전막. 400 : EMI.300: conductive film. 400: EMI.
상기와 같이 투명기판 112에 EMI를 방지하기 위한 수단이 구비되는 본 발명의 액정표시장치의 액정셀은 도 6과 같은 구조를 포함한다.As described above, the liquid crystal cell of the liquid crystal display device of the present invention having a means for preventing EMI on the transparent substrate 112 includes a structure as shown in FIG.
투명기판 111과, 상기 투명기판 111 위에 서로 연결되어 형성된 화소전극 118 및 스위칭소자인 TFT 108이 구성되어 있다.A transparent substrate 111, a pixel electrode 118 formed on the transparent substrate 111 and connected to each other, and a TFT 108 which is a switching element are configured.
상기 투명기판 112 위에 형성된 칼라필터 131 및 상기 칼라필터의 경계영역에 블랙매트릭스 170이 구성되어 있다.The color matrix 131 formed on the transparent substrate 112 and the black matrix 170 are formed in the boundary region of the color filter.
상기 칼라필터 131 및 블랙매트릭스 170위에 EMI를 방지하기 위한 수단이 되는 도전막 300이 구성되고, 상기 도전막 300위에 절연막 126과, 공통전극 119가 연속적층되어 구성된다.A conductive film 300 serving as a means for preventing EMI is formed on the color filter 131 and the black matrix 170, and an insulating film 126 and a common electrode 119 are sequentially stacked on the conductive film 300.
상기 도전막 300은 블랙매트릭스 170과 대략 같은 형상의 망(mesh)형으로 패터닝하여 구성할 수 있다.The conductive layer 300 may be formed by patterning a mesh having a shape substantially the same as that of the black matrix 170.
상기 화소전극 118이 포함되어 형성된 투명기판 111과, 상기 공통전극 119가 포함되어 형성된 투명기판 112가 서로 대향하도록 배치되고, 상기 대향된 기판 사이에 액정 188이 채워진다.The transparent substrate 111 including the pixel electrode 118 and the transparent substrate 112 including the common electrode 119 are disposed to face each other, and the liquid crystal 188 is filled between the opposite substrates.
상기와 같이 액정표시장치의 액정셀을 구성하고, 상기 투명기판 112에 형성된 도전막 300에 소정의 직류전압을 인가하거나 상기 도전막 300을 접지시킨다.The liquid crystal cell of the liquid crystal display device is configured as described above, and a predetermined DC voltage is applied to the conductive film 300 formed on the transparent substrate 112 or the conductive film 300 is grounded.
도전막 300은 액정셀 103의 구동회로(데이타버스라인 및 게이트버스라인) 또는 액정셀 103주위에 구비된 전자부품에서 방사하는 EMI를 액정표시장치의 표시화면의 정면 부분에서 차폐해 주기 때문에 유해 전자파로 부터 사용자를 보호할 수 있다.The conductive film 300 shields EMI emitted from the driving circuits (data bus lines and gate bus lines) of the liquid crystal cell 103 or electronic components provided around the liquid crystal cell 103 from the front portion of the display screen of the liquid crystal display device. You can protect your users from.
또, 상기 도 5에서 이미 언급한 것처럼 투명기판 112에 구비되는 EMI방지 수단을 블랙매트릭스가 겸하도록 구성할 수 있다.In addition, as mentioned above in FIG. 5, the black matrix may serve as an EMI protection means provided in the transparent substrate 112.
상기 구조의 액정표시장치는 실시예에서 상세히 설명한다.The liquid crystal display device having the above structure will be described in detail in the embodiment.
[실시예 1]Example 1
EMI 방지 수단이 구비된 본 발명의 액정셀의 구조를 나타내는 도 6을 참고하여 그 제조과정을 설명한다.The manufacturing process will be described with reference to FIG. 6, which shows the structure of the liquid crystal cell of the present invention equipped with an EMI protection means.
먼저 투명기판 111위에 ITO(Indium Tin Oxide)등으로 된 화소전극 118과 스위칭소자인 TFT l08을 서로 연결시켜 각각의 독립된 픽셀을 형성한다.First, each independent pixel is formed on the transparent substrate 111 by connecting the pixel electrode 118 made of indium tin oxide (ITO) or the like and the switching element TFT 08.
이어서 투명기판 112위에 불투명막을 형성하고, 상기 불투명막을 매트릭스상으로 패터닝하여 상기 블랙매트릭스 170을 형성한다.Subsequently, an opaque film is formed on the transparent substrate 112 and the opaque film is patterned into a matrix to form the black matrix 170.
상기 블랙매트릭스 170은 수지로 된 블랙레진이나 금속 등을 사용할 수 있다.The black matrix 170 may be a black resin or metal made of resin.
상기 매트릭스상의 블랙매트릭스 170이 형성된 투명기판 112 위에 상기 블랙매트릭스 170을 경계로 하는 각각의 칼라필터 131(R, G, B)을 형성한다.Each color filter 131 (R, G, B) bordering on the black matrix 170 is formed on the transparent substrate 112 on which the black matrix 170 on the matrix is formed.
상기 칼라필터 131과 블랙매트릭스 170이 형성된 기판 위에 EMI를 방지하기 위한 수단이 되는 ITO 등의 도전막 300을 형성한다.A conductive film 300 such as ITO, which is a means for preventing EMI, is formed on the substrate on which the color filter 131 and the black matrix 170 are formed.
상기 도전막 300은 상기 블랙매트릭스 170과 대략 같은 형상의 망(mesh)형으로 패터닝하여 형성할 수 있다.The conductive layer 300 may be formed by patterning a mesh having a shape substantially the same as that of the black matrix 170.
상기와 같이 형성된 도전막 300위에 SiNx, SiOx 등의 절연막 126을 형성한다.An insulating film 126 of SiNx, SiOx or the like is formed on the conductive film 300 formed as described above.
상기 절연막 126 위에 ITO 등으로 된 공통전극 119를 형성한다.A common electrode 119 made of ITO or the like is formed on the insulating layer 126.
상기와 같이 구성된 투명기판 111과 112를 서로 합착한 후 상가 합착에 의하여 형성된 공간에 액정 188을 주입하고, 봉합한다.After the transparent substrates 111 and 112 configured as described above are bonded to each other, the liquid crystal 188 is injected into the space formed by malleous bonding, and sealed.
상기와 같은 제조과정을 거쳐 완성된 액정표시장치의 도전막 300에 소정의 직류전압을 인가하거나, 상기 도전막 300을 접지시키면 상기 액정표시장치의 전자부품과 구동회로 등에서 방사하는 EMI 400을 상기 도전막 300에 의하여 차폐할 수 있다.Applying a predetermined DC voltage to the conductive film 300 of the liquid crystal display device completed through the above manufacturing process, or grounding the conductive film 300 conducts the EMI 400 radiated from the electronic component and the driving circuit of the liquid crystal display device. It can be shielded by the membrane 300.
특히, 상기 도전막 300에 소정의 직류전압을 인가하였을 때, 상기 도전막 300과 공통전극 119사이에 정전용량이 형성되고, 상기 정전용량값을 수십pf 이하가 되도록 조정하여 주면 공통전극 119의 전압파형이 안정된다.Particularly, when a predetermined DC voltage is applied to the conductive film 300, a capacitance is formed between the conductive film 300 and the common electrode 119, and the capacitance of the common electrode 119 is adjusted to be several tens of pf or less. The waveform is stable.
상기 공통전극 119의 전압파형이 안정되면 상기 제 1기판의 화소전극 118에 전압이 인가 되었을 때 액정의 구동이 왜곡되지 않는 효과가 있다.When the voltage waveform of the common electrode 119 is stabilized, the driving of the liquid crystal is not distorted when a voltage is applied to the pixel electrode 118 of the first substrate.
상기와 같이 EMI 400을 방지하기 위한 수단이 되는 절연막 300을 투명기판 112에 형성함으로써 공통전극 119의 전압파형을 안정시키고, 유해 전자파를 방지할 수 있다.As described above, the insulating film 300, which is a means for preventing the EMI 400, is formed on the transparent substrate 112 to stabilize the voltage waveform of the common electrode 119 and prevent harmful electromagnetic waves.
[실시예 2]Example 2
상기 EMI를 방지하기 위한 수단이 구비된 기판의 다른 구조를 나타내는 도 5를 참고하여 그 제조과정을 설명한다.The manufacturing process will be described with reference to FIG. 5, which shows another structure of a substrate provided with means for preventing EMI.
투명기판 112 위에 도전성 불투명막을 형성하고, 상기 불투명막을 매트릭스상으로 패터닝하여 도전성 블랙매트릭스 175를 형성한다.A conductive opaque film is formed on the transparent substrate 112 and the opaque film is patterned into a matrix to form a conductive black matrix 175.
상기 매트릭스상의 도전성 블랙매트릭스 175가 형성된 투명기판 112위에 상기블랙매트릭스 175를 경계로 하는 각각의 칼라필터 131(R, G, B)을 형성한다.Each color filter 131 (R, G, B) bordering on the black matrix 175 is formed on the transparent substrate 112 on which the conductive black matrix 175 on the matrix is formed.
상기 칼라필터 131과, 블랙매트릭스 175가 형성된 기판 위에 SiNx, SiOx 등의 절연막 126을 형성한다.An insulating film 126 such as SiNx or SiOx is formed on the color filter 131 and the substrate on which the black matrix 175 is formed.
상기 절연막 126위에 ITO 등으로 된 공통전극 119를 형성한다.A common electrode 119 made of ITO or the like is formed on the insulating film 126.
상기와 같이 투명기판 112를 구성하고, 상기 실시예 1과 동일한 방법을 거쳐 액정셀을 구성하면 EMI를 방지할 수 있는 액정표시장치가 된다.When the transparent substrate 112 is configured as described above, and the liquid crystal cell is configured through the same method as in the first embodiment, a liquid crystal display device capable of preventing EMI can be obtained.
본 발명의 액쟝표시장치는 투명기판 111에 TFT 108과 화소전극 118이 형성된다.In the liquid crystal display of the present invention, the TFT 108 and the pixel electrode 118 are formed on the transparent substrate 111.
또, 투명기판 112에 블랙매트릭스 170, 칼라필터 131을 형성하고, 상기 블랙매트릭스 170과 칼라필터 131위에 EMI를 방지하기 위한 수단이 되는 도전막 300이 형성된다.Further, a black matrix 170 and a color filter 131 are formed on the transparent substrate 112, and a conductive film 300 is formed on the black matrix 170 and the color filter 131 as a means for preventing EMI.
상기 도전막 300 위에는 절연막 126이 형성되고, 상기 절연막 126위에는 공통전극 119가 형성뒨다.An insulating film 126 is formed on the conductive film 300, and a common electrode 119 is formed on the insulating film 126.
상기와 같이 형성된 투명기판 111, 112는 서로 합착되고, 액정 188이 주입되어 액정셀이 구성된다.The transparent substrates 111 and 112 formed as described above are bonded to each other, and the liquid crystal 188 is injected to form a liquid crystal cell.
상기 액정셀은 EMI방지 수단 즉, 도전막 300에 소정의 직류전압이 인가되거나 접지된다.In the liquid crystal cell, a predetermined DC voltage is applied or grounded to the EMI preventing means, that is, the conductive layer 300.
상기 도전막 300은 액정셀의 구동회로인 게이트버스라인 및 데이터버스라인 또는 액정셀 주변에 구성되는 전자부품에서 발생하는 EMI를 액정표시장치의 표시화면 부분에서 차폐시켜 주기 때문에 상기 표시화면 앞에 위치하는 사용자에게 EMI 유해전자파가 미치지 않도록 한다.The conductive film 300 is located in front of the display screen because the conductive film 300 shields the EMI generated from the gate bus line and the data bus line, which are the driving circuits of the liquid crystal cell, or the electronic component around the liquid crystal cell in the display screen portion of the liquid crystal display device. Do not let EMI harmful electromagnetic waves to the user.
또한, 상기 도전막 300에 소정의 직류전압을 인가하였을 때 상기 도전막 300과 공통전극 119와의 사이에 정전용량이 형성되고, 이 정전용량값을 수십pf 이하로 조정하여 주면 상기 공통전극 119의 전압파형이 안정되기 때문에 액정의 구동이 왜곡되지 않아 표시품질이 향상된다.In addition, when a predetermined DC voltage is applied to the conductive film 300, a capacitance is formed between the conductive film 300 and the common electrode 119. When the capacitance is adjusted to tens of pf or less, the voltage of the common electrode 119 is adjusted. Since the waveform is stabilized, the driving of the liquid crystal is not distorted and the display quality is improved.
Claims (13)
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100691480B1 (en) * | 1998-11-18 | 2007-06-04 | 삼성전자주식회사 | LCD for noise prevention |
| US8248346B2 (en) | 2007-11-16 | 2012-08-21 | Samsung Mobile Display Co., Ltd. | Liquid crystal display and driving method thereof |
| KR101357835B1 (en) * | 2010-11-26 | 2014-02-05 | 인테그레이티드 디지털 테크놀로지스, 인코포레이티드 | Pixel array and display panel having the same |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20030037109A (en) * | 2001-11-02 | 2003-05-12 | 주식회사 두람하이테크 | Electromagnetic wave shielding case for display monitor |
| KR102008432B1 (en) * | 2018-01-04 | 2019-10-21 | 주식회사 휴디스텍 | LCD with a part of the polarizer removed |
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1997
- 1997-03-06 KR KR1019970007402A patent/KR100244446B1/en not_active IP Right Cessation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100691480B1 (en) * | 1998-11-18 | 2007-06-04 | 삼성전자주식회사 | LCD for noise prevention |
| US8248346B2 (en) | 2007-11-16 | 2012-08-21 | Samsung Mobile Display Co., Ltd. | Liquid crystal display and driving method thereof |
| KR101357835B1 (en) * | 2010-11-26 | 2014-02-05 | 인테그레이티드 디지털 테크놀로지스, 인코포레이티드 | Pixel array and display panel having the same |
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