KR102545393B1 - 제1 보호막 형성용 시트 - Google Patents
제1 보호막 형성용 시트 Download PDFInfo
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- KR102545393B1 KR102545393B1 KR1020187013196A KR20187013196A KR102545393B1 KR 102545393 B1 KR102545393 B1 KR 102545393B1 KR 1020187013196 A KR1020187013196 A KR 1020187013196A KR 20187013196 A KR20187013196 A KR 20187013196A KR 102545393 B1 KR102545393 B1 KR 102545393B1
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- South Korea
- Prior art keywords
- meth
- acrylate
- resin layer
- forming
- group
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- 230000001681 protective effect Effects 0.000 title claims abstract description 141
- 239000010410 layer Substances 0.000 claims abstract description 513
- 229920005989 resin Polymers 0.000 claims abstract description 379
- 239000011347 resin Substances 0.000 claims abstract description 379
- 239000004820 Pressure-sensitive adhesive Substances 0.000 claims abstract description 194
- 239000011229 interlayer Substances 0.000 claims abstract description 82
- 239000004065 semiconductor Substances 0.000 claims abstract description 33
- 229910000679 solder Inorganic materials 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims description 32
- 238000003475 lamination Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 abstract description 34
- 238000010030 laminating Methods 0.000 abstract description 11
- 239000000203 mixture Substances 0.000 description 297
- 229940048053 acrylate Drugs 0.000 description 259
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 233
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- 125000000524 functional group Chemical group 0.000 description 68
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- 238000000034 method Methods 0.000 description 40
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- 125000003277 amino group Chemical group 0.000 description 39
- 239000000654 additive Substances 0.000 description 38
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- 229920000178 Acrylic resin Polymers 0.000 description 36
- 239000003999 initiator Substances 0.000 description 36
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- 239000002585 base Substances 0.000 description 26
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- 238000000576 coating method Methods 0.000 description 19
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- 238000006243 chemical reaction Methods 0.000 description 18
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- 125000001931 aliphatic group Chemical group 0.000 description 16
- 238000001035 drying Methods 0.000 description 16
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
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- 230000015572 biosynthetic process Effects 0.000 description 15
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- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 11
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 11
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- 125000004432 carbon atom Chemical group C* 0.000 description 9
- RJLZSKYNYLYCNY-UHFFFAOYSA-N ethyl carbamate;isocyanic acid Chemical group N=C=O.CCOC(N)=O RJLZSKYNYLYCNY-UHFFFAOYSA-N 0.000 description 9
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- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 8
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 8
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- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 7
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- 238000010438 heat treatment Methods 0.000 description 7
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- 229910003475 inorganic filler Inorganic materials 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
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- 239000007787 solid Substances 0.000 description 7
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
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- 150000001298 alcohols Chemical class 0.000 description 6
- 150000001991 dicarboxylic acids Chemical class 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- 125000000623 heterocyclic group Chemical group 0.000 description 6
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
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- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 5
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 5
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
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- 125000004122 cyclic group Chemical group 0.000 description 5
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 5
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- 230000001678 irradiating effect Effects 0.000 description 5
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 5
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 5
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
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- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 5
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- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 4
- 150000008064 anhydrides Chemical class 0.000 description 4
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 4
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- 125000005442 diisocyanate group Chemical group 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
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- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 4
- 125000002960 margaryl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
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- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
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- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
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- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 3
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- 239000005058 Isophorone diisocyanate Substances 0.000 description 3
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- 238000007865 diluting Methods 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical class C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
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- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
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- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 3
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 3
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
- H01L23/3128—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/293—Organic, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
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- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
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- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
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JP2015217110 | 2015-11-04 | ||
JPJP-P-2015-217110 | 2015-11-04 | ||
PCT/JP2016/082543 WO2017078052A1 (ja) | 2015-11-04 | 2016-11-02 | 第1保護膜形成用シート |
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KR20180079340A KR20180079340A (ko) | 2018-07-10 |
KR102545393B1 true KR102545393B1 (ko) | 2023-06-19 |
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KR1020187013196A KR102545393B1 (ko) | 2015-11-04 | 2016-11-02 | 제1 보호막 형성용 시트 |
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JP (1) | JP6230761B2 (ja) |
KR (1) | KR102545393B1 (ja) |
CN (1) | CN108140585B (ja) |
PH (1) | PH12018500851A1 (ja) |
SG (1) | SG11201803250TA (ja) |
TW (1) | TWI704996B (ja) |
WO (1) | WO2017078052A1 (ja) |
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WO2019013589A1 (ko) * | 2017-07-13 | 2019-01-17 | 두성산업 주식회사 | 반도체 고정용 자성 테이프 |
TWI786209B (zh) * | 2017-10-27 | 2022-12-11 | 日商琳得科股份有限公司 | 保護膜形成用複合片及半導體晶片的製造方法 |
KR102594248B1 (ko) * | 2017-11-17 | 2023-10-25 | 린텍 가부시키가이샤 | 제1 보호막이 형성된 반도체 칩, 제1 보호막이 형성된 반도체 칩의 제조 방법, 및 반도체 칩 제1 보호막 적층체의 평가 방법 |
CN112789334B (zh) * | 2018-10-02 | 2023-04-07 | 琳得科株式会社 | 层叠体及固化密封体的制造方法 |
JP7266953B2 (ja) * | 2019-08-07 | 2023-05-01 | 株式会社ディスコ | 保護部材形成方法及び保護部材形成装置 |
JP7323734B1 (ja) * | 2022-01-12 | 2023-08-08 | リンテック株式会社 | 第1保護膜形成用シート、半導体装置の製造方法、及びシートの使用 |
Citations (4)
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JP2012169482A (ja) | 2011-02-15 | 2012-09-06 | Nitto Denko Corp | 保護層形成用フィルム |
JP2012169484A (ja) * | 2011-02-15 | 2012-09-06 | Nitto Denko Corp | 半導体装置の製造方法 |
JP2014129537A (ja) * | 2014-01-29 | 2014-07-10 | Lintec Corp | チップ用保護膜形成用シートおよび保護膜付半導体チップの製造方法 |
WO2014157426A1 (ja) * | 2013-03-27 | 2014-10-02 | リンテック株式会社 | 保護膜形成用複合シート |
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JP4170839B2 (ja) | 2003-07-11 | 2008-10-22 | 日東電工株式会社 | 積層シート |
JP4443962B2 (ja) * | 2004-03-17 | 2010-03-31 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP4776188B2 (ja) * | 2004-08-03 | 2011-09-21 | 古河電気工業株式会社 | 半導体装置製造方法およびウエハ加工用テープ |
JP2012074623A (ja) * | 2010-09-29 | 2012-04-12 | Sekisui Chem Co Ltd | 半導体加工用接着フィルム及び半導体チップ実装体の製造方法 |
KR101919547B1 (ko) * | 2011-12-26 | 2018-11-16 | 린텍 코포레이션 | 보호막 형성층을 갖는 다이싱 시트 및 칩의 제조 방법 |
JP5242830B1 (ja) * | 2012-07-06 | 2013-07-24 | 古河電気工業株式会社 | 半導体ウェハ表面保護用粘着テープおよび半導体ウェハの製造方法 |
CN104837942B (zh) * | 2012-12-14 | 2017-04-26 | 琳得科株式会社 | 保护膜形成用膜 |
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2016
- 2016-11-02 WO PCT/JP2016/082543 patent/WO2017078052A1/ja active Application Filing
- 2016-11-02 TW TW105135523A patent/TWI704996B/zh active
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JP2012169482A (ja) | 2011-02-15 | 2012-09-06 | Nitto Denko Corp | 保護層形成用フィルム |
JP2012169484A (ja) * | 2011-02-15 | 2012-09-06 | Nitto Denko Corp | 半導体装置の製造方法 |
WO2014157426A1 (ja) * | 2013-03-27 | 2014-10-02 | リンテック株式会社 | 保護膜形成用複合シート |
JP2014129537A (ja) * | 2014-01-29 | 2014-07-10 | Lintec Corp | チップ用保護膜形成用シートおよび保護膜付半導体チップの製造方法 |
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Publication number | Publication date |
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KR20180079340A (ko) | 2018-07-10 |
WO2017078052A1 (ja) | 2017-05-11 |
JPWO2017078052A1 (ja) | 2017-12-07 |
JP6230761B2 (ja) | 2017-11-15 |
CN108140585A (zh) | 2018-06-08 |
PH12018500851B1 (en) | 2018-11-05 |
TW201738089A (zh) | 2017-11-01 |
PH12018500851A1 (en) | 2018-11-05 |
SG11201803250TA (en) | 2018-05-30 |
TWI704996B (zh) | 2020-09-21 |
CN108140585B (zh) | 2021-06-08 |
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