KR102383518B9 - 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치 - Google Patents

흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치

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Publication number
KR102383518B9
KR102383518B9 KR1020180014365A KR20180014365A KR102383518B9 KR 102383518 B9 KR102383518 B9 KR 102383518B9 KR 1020180014365 A KR1020180014365 A KR 1020180014365A KR 20180014365 A KR20180014365 A KR 20180014365A KR 102383518 B9 KR102383518 B9 KR 102383518B9
Authority
KR
South Korea
Prior art keywords
light emitting
display device
resin composition
image display
emitting diode
Prior art date
Application number
KR1020180014365A
Other languages
English (en)
Other versions
KR102383518B1 (ko
KR20190094797A (ko
Inventor
박슬기
이재을
김훈식
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020180014365A priority Critical patent/KR102383518B1/ko
Publication of KR20190094797A publication Critical patent/KR20190094797A/ko
Application granted granted Critical
Publication of KR102383518B1 publication Critical patent/KR102383518B1/ko
Publication of KR102383518B9 publication Critical patent/KR102383518B9/ko

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
KR1020180014365A 2018-02-06 2018-02-06 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치 KR102383518B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020180014365A KR102383518B1 (ko) 2018-02-06 2018-02-06 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020180014365A KR102383518B1 (ko) 2018-02-06 2018-02-06 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치

Publications (3)

Publication Number Publication Date
KR20190094797A KR20190094797A (ko) 2019-08-14
KR102383518B1 KR102383518B1 (ko) 2022-04-06
KR102383518B9 true KR102383518B9 (ko) 2024-06-20

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Family Applications (1)

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KR1020180014365A KR102383518B1 (ko) 2018-02-06 2018-02-06 흑색 감광성 수지 조성물, 이를 이용하여 제조된 화소정의막, 유기발광소자 및 화상 표시 장치

Country Status (1)

Country Link
KR (1) KR102383518B1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230164671A (ko) 2021-03-31 2023-12-04 미쯔비시 케미컬 주식회사 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치
JPWO2022210497A1 (ko) 2021-03-31 2022-10-06
KR102607463B1 (ko) * 2022-08-14 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607464B1 (ko) * 2022-08-19 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607465B1 (ko) * 2022-09-14 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607466B1 (ko) * 2022-10-06 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607467B1 (ko) * 2022-11-04 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607468B1 (ko) * 2022-11-15 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607469B1 (ko) * 2022-11-30 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607470B1 (ko) * 2022-12-29 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법
KR102607471B1 (ko) * 2023-02-03 2023-11-29 덕산네오룩스 주식회사 화소정의층의 제조 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5270113B2 (ja) * 2007-06-06 2013-08-21 新日鉄住金化学株式会社 ブラックレジスト用感光性樹脂組成物及びこれを用いた遮光膜並びにカラーフィルター
KR20130021128A (ko) * 2011-08-22 2013-03-05 성균관대학교산학협력단 흑색 감광성 수지 조성물 및 이를 구비한 화상표시장치
KR20150072581A (ko) 2013-12-20 2015-06-30 주식회사 이그잭스 폴리실록산을 함유한 감광성 수지 조성물
JP6318699B2 (ja) * 2014-02-27 2018-05-09 凸版印刷株式会社 黒色感光性樹脂組成物、ブラックマトリクス、ブラックマトリクス基板、カラーフィルタ、液晶表示装置及び有機エレクトロルミネッセンス表示装置
CN108027561B (zh) * 2015-09-30 2021-10-08 东丽株式会社 负型感光性树脂组合物、固化膜、具备固化膜的元件及显示装置、以及其制造方法

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Publication number Publication date
KR102383518B1 (ko) 2022-04-06
KR20190094797A (ko) 2019-08-14

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E701 Decision to grant or registration of patent right
Z072 Maintenance of patent after cancellation proceedings: certified copy of decision transmitted [new post grant opposition system as of 20170301]
Z131 Decision taken on request for patent cancellation [new post grant opposition system as of 20170301]
G170 Re-publication after modification of scope of protection [patent]