KR101876873B1 - 플라즈마 처리 장치 - Google Patents

플라즈마 처리 장치 Download PDF

Info

Publication number
KR101876873B1
KR101876873B1 KR1020160090730A KR20160090730A KR101876873B1 KR 101876873 B1 KR101876873 B1 KR 101876873B1 KR 1020160090730 A KR1020160090730 A KR 1020160090730A KR 20160090730 A KR20160090730 A KR 20160090730A KR 101876873 B1 KR101876873 B1 KR 101876873B1
Authority
KR
South Korea
Prior art keywords
partial
processing
cover
window
insulating member
Prior art date
Application number
KR1020160090730A
Other languages
English (en)
Korean (ko)
Other versions
KR20170012058A (ko
Inventor
신고 데구치
토시히로 카사하라
요헤이 야마다
Original Assignee
도쿄엘렉트론가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도쿄엘렉트론가부시키가이샤 filed Critical 도쿄엘렉트론가부시키가이샤
Publication of KR20170012058A publication Critical patent/KR20170012058A/ko
Application granted granted Critical
Publication of KR101876873B1 publication Critical patent/KR101876873B1/ko

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020160090730A 2015-07-22 2016-07-18 플라즈마 처리 장치 KR101876873B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2015-144987 2015-07-22
JP2015144987A JP6593004B2 (ja) 2015-07-22 2015-07-22 プラズマ処理装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020180073504A Division KR20180079258A (ko) 2015-07-22 2018-06-26 플라즈마 처리 장치

Publications (2)

Publication Number Publication Date
KR20170012058A KR20170012058A (ko) 2017-02-02
KR101876873B1 true KR101876873B1 (ko) 2018-07-10

Family

ID=57877927

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020160090730A KR101876873B1 (ko) 2015-07-22 2016-07-18 플라즈마 처리 장치
KR1020180073504A KR20180079258A (ko) 2015-07-22 2018-06-26 플라즈마 처리 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020180073504A KR20180079258A (ko) 2015-07-22 2018-06-26 플라즈마 처리 장치

Country Status (4)

Country Link
JP (1) JP6593004B2 (ja)
KR (2) KR101876873B1 (ja)
CN (1) CN106373850B (ja)
TW (1) TWI703901B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6804392B2 (ja) * 2017-06-05 2020-12-23 東京エレクトロン株式会社 プラズマ処理装置及びガスシャワーヘッド
US11670490B2 (en) * 2017-09-29 2023-06-06 Taiwan Semiconductor Manufacturing Co., Ltd. Integrated circuit fabrication system with adjustable gas injector
KR102256691B1 (ko) * 2017-10-24 2021-05-26 세메스 주식회사 기판 처리 장치 및 방법
JP7008497B2 (ja) * 2017-12-22 2022-01-25 東京エレクトロン株式会社 基板処理装置および温度制御方法
KR101979222B1 (ko) * 2017-12-22 2019-05-17 인베니아 주식회사 플라즈마 발생 조립체 및 이를 갖는 기판 처리장치
JP7182916B2 (ja) 2018-06-26 2022-12-05 東京エレクトロン株式会社 プラズマ処理装置
JP7282646B2 (ja) * 2019-09-26 2023-05-29 株式会社アルバック 真空処理装置
CN112922935B (zh) * 2019-12-05 2023-06-30 中微半导体设备(上海)股份有限公司 连接结构和等离子体处理装置
TW202232564A (zh) 2020-10-15 2022-08-16 日商東京威力科創股份有限公司 緊固構造、電漿處理裝置以及緊固方法
JP7507663B2 (ja) 2020-11-17 2024-06-28 東京エレクトロン株式会社 締結構造と締結方法、及びプラズマ処理装置
JP2022114629A (ja) 2021-01-27 2022-08-08 東京エレクトロン株式会社 締結構造、プラズマ処理装置及び締結方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306042A (ja) * 2007-06-08 2008-12-18 Panasonic Corp プラズマ処理装置
KR20100020974A (ko) * 2007-06-11 2010-02-23 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 처리 방법
KR20110040807A (ko) * 2008-04-15 2011-04-20 도쿄엘렉트론가부시키가이샤 진공 용기 및 플라즈마 처리 장치
JP2013149377A (ja) * 2012-01-17 2013-08-01 Tokyo Electron Ltd プラズマ処理装置
KR20150009445A (ko) * 2013-07-16 2015-01-26 도쿄엘렉트론가부시키가이샤 유도 결합 플라스마 처리 장치

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101155121B1 (ko) * 2009-03-25 2012-06-11 도쿄엘렉트론가부시키가이샤 유도 결합 플라즈마 처리 장치의 커버 고정구 및 커버 고정 장치
JP5727281B2 (ja) * 2011-04-21 2015-06-03 東京エレクトロン株式会社 誘導結合プラズマ処理装置
JP2013191593A (ja) * 2012-03-12 2013-09-26 Tokyo Electron Ltd プラズマ処理装置
JP2014154684A (ja) * 2013-02-07 2014-08-25 Tokyo Electron Ltd 誘導結合プラズマ処理装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008306042A (ja) * 2007-06-08 2008-12-18 Panasonic Corp プラズマ処理装置
KR20100020974A (ko) * 2007-06-11 2010-02-23 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 처리 방법
KR20110040807A (ko) * 2008-04-15 2011-04-20 도쿄엘렉트론가부시키가이샤 진공 용기 및 플라즈마 처리 장치
JP2013149377A (ja) * 2012-01-17 2013-08-01 Tokyo Electron Ltd プラズマ処理装置
KR20150009445A (ko) * 2013-07-16 2015-01-26 도쿄엘렉트론가부시키가이샤 유도 결합 플라스마 처리 장치

Also Published As

Publication number Publication date
KR20170012058A (ko) 2017-02-02
CN106373850A (zh) 2017-02-01
TWI703901B (zh) 2020-09-01
TW201717710A (zh) 2017-05-16
JP6593004B2 (ja) 2019-10-23
KR20180079258A (ko) 2018-07-10
CN106373850B (zh) 2018-06-22
JP2017027775A (ja) 2017-02-02

Similar Documents

Publication Publication Date Title
KR101876873B1 (ko) 플라즈마 처리 장치
US11130142B2 (en) Showerhead having a detachable gas distribution plate
KR102121655B1 (ko) 플라즈마 처리 장치
KR101176745B1 (ko) 플라즈마 처리 장치
TWI772430B (zh) 電漿處理裝置及氣體噴淋頭
US9543121B2 (en) Inductively coupled plasma processing apparatus
KR20180069774A (ko) 유도 결합 플라스마 처리 장치
KR102071769B1 (ko) 플라즈마 처리 용기 및 플라즈마 처리 장치
TW202121567A (zh) 基板處理裝置及基板處理方法
JP2006253312A (ja) プラズマ処理装置
KR101755768B1 (ko) 플라즈마 처리 장치
TWI757506B (zh) 電漿處理裝置
KR20200001493A (ko) 플라스마 처리 장치
TW201901838A (zh) 閘閥裝置及基板處理系統
JP2023067033A (ja) 基板処理装置及び基板処理方法
JP2023095644A (ja) プラズマ処理装置、およびプラズマ処理装置の製造方法
KR20240027908A (ko) 기판 처리 장치

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant