KR101666742B1 - Imaging lens structure, method of forming the same and optical imaging system including the same - Google Patents

Imaging lens structure, method of forming the same and optical imaging system including the same Download PDF

Info

Publication number
KR101666742B1
KR101666742B1 KR1020150045163A KR20150045163A KR101666742B1 KR 101666742 B1 KR101666742 B1 KR 101666742B1 KR 1020150045163 A KR1020150045163 A KR 1020150045163A KR 20150045163 A KR20150045163 A KR 20150045163A KR 101666742 B1 KR101666742 B1 KR 101666742B1
Authority
KR
South Korea
Prior art keywords
layer
field
light
imaging lens
lens structure
Prior art date
Application number
KR1020150045163A
Other languages
Korean (ko)
Other versions
KR20160117776A (en
Inventor
이헌
조중연
Original Assignee
고려대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 고려대학교 산학협력단 filed Critical 고려대학교 산학협력단
Priority to KR1020150045163A priority Critical patent/KR101666742B1/en
Publication of KR20160117776A publication Critical patent/KR20160117776A/en
Application granted granted Critical
Publication of KR101666742B1 publication Critical patent/KR101666742B1/en

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S19/00—Satellite radio beacon positioning systems; Determining position, velocity or attitude using signals transmitted by such systems
    • G01S19/01—Satellite radio beacon positioning systems transmitting time-stamped messages, e.g. GPS [Global Positioning System], GLONASS [Global Orbiting Navigation Satellite System] or GALILEO
    • G01S19/13—Receivers
    • G01S19/20—Integrity monitoring, fault detection or fault isolation of space segment

Landscapes

  • Engineering & Computer Science (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computer Security & Cryptography (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The imaging lens structure is formed on the transparent substrate and the transparent substrate. The near-field amplification layer is formed of dispersed metal nanoparticles to amplify the near-field light generated from the specimen. The imaging lens structure is formed to cover the near- A near-field moving layer capable of moving light, and a light-transmitting layer pattern provided on an upper portion of the near-field moving layer to selectively transmit light.

Description

TECHNICAL FIELD [0001] The present invention relates to an imaging lens structure, a method of forming the same, and an optical imaging system including the imaging lens structure.

The present invention relates to an imaging lens structure, a method of forming the same, and an optical imaging system including the imaging lens structure. More particularly, the present invention relates to an imaging lens structure capable of observing an ultrafine structure that can not be observed with a conventional optical lens, And to an optical imaging system comprising the imaging lens structure.

In general, conventional optical imaging devices, including lenses using light refraction, can not focus precisely for ultra-microstructures that are less than half a wavelength in size due to resolution limitations due to diffraction limitations of light. In a light microscope, which is a typical optical imaging system, it is impossible to observe an observation object and a specific substance under 200 nm with the naked eye due to the diffraction limit of light.

Specifically, the conventional objective lens can not capture the near field light having ultrafine structure information, and only the far field light is captured and imaged. Therefore, It becomes necessary to recognize two objects which are close to each other at a distance of not more than a wavelength (i.e., 200 nm or less) as an object.

Since the near-field light has the characteristic of an evanescent wave, it exists only in the vicinity of the interface of the observation object or near the interface, and decreases rapidly as it goes away from the observation object. Therefore, in order to visualize the ultrafine structure at half wavelength or less, it is required to amplify and capture the near-field light.

Near-field scanning optical microscopy (NSOM) has been used as a conventional technique for imaging ultrafine structures.

Specifically, a near-scanning optical microscope is used in which a probe having a size smaller than the wavelength (about 100 nm) is brought close to the observation object very closely to the wavelength (about 100 nm) and scanned in the X and Y directions, It is a device that can capture ultra fine structure by collecting light with probe.

Such a near-scanning optical microscope has the merit of being capable of precisely imaging ultramicrostructure by overcoming the diffraction limit of light, but (i) the measurement speed is very slow because of the use of the micro probe injection, (ii) There is a limitation that only local area imaging is possible. Furthermore, (iii) the method of using a near-scanning optical microscope is very complicated and completely different from a conventional optical system, and thus it is not applicable to various industrial fields.

On the other hand, a meta-material is a material made of a periodic arrangement of a meta atom designed as a metal or a dielectric material, and is a new concept material having properties that do not exist in nature such as ultrahigh refractive index and negative refractive index.

It is believed that if an imaging lens structure is realized by using a material having a refractive index of 10 or more or a material having a negative refractive index by using such a meta-material, it is possible to solve the technical obstacles in all fields that are restricted in the performance improvement by the diffraction limit Various studies on metamaterials have been actively conducted.

In particular, in order to observe the ultrafine structure of the specimen, the imaging lens structure should be adhered to the specimen as closely as possible. In other words, the near-field sharply disappears as it moves away from the specimen. Therefore, in order to capture the near-field, the metamaterial lens should be closely attached to a level of 1/3 or less of the wavelength of light used in the specimen. Therefore, it is difficult to closely adhere closely to the specimen to be observed with a meta material formed on a substrate of an inorganic base.

Korean Patent Publication No. 2012-0123746 discloses a prior art document of the present application.

It is an object of the present invention to provide an imaging lens structure that can be easily attached to a sample surface to amplify a near field.

It is an object of the present invention to provide a method of forming the imaging lens structure.

It is also an object of the present invention to provide an optical imaging system capable of observing an ultrafine structure that can not be observed with a conventional optical system by using the imaging lens structure.

An imaging lens structure according to embodiments of the present invention includes a transparent substrate, a near-field amplification layer formed on the transparent substrate and amplifying near-field light generated from the specimen, the dispersed metal nanoparticles being formed on the transparent substrate, A near-field moving layer formed to cover the near-field amplification layer and capable of moving the near-field light, and a light transmission layer pattern provided on the near-field moving layer to selectively transmit light.

In one embodiment of the present invention, the near-field amplification layer may have a thickness ranging from 10 to 50 nm.

In one embodiment of the present invention, the near-field moving layer may include metal oxide particles having an average diameter of nano-size. Here, the metal oxide particles may have an average diameter in the range of 50 to 500 nm.

In one embodiment of the present invention, the near-field mobile layer may have a scattering degree of 90% or more at a wavelength band of a visible light region.

In one embodiment of the present invention, the near-field mobile layer may have a surface flatness (RMS) of 10 nm or less.

In an embodiment of the present invention, a passivation layer interposed between the near-field moving layer and the light-transmitting layer may be additionally formed to prevent the specimen from flowing into the near-field moving layer.

Here, the passivation layer may include a self-assembled monolayer having super-hydrophobicity. In addition, the self-assembled monolayer may have a thickness ranging from 1 to 3 nm. Meanwhile, the self-assembled monolayer may include a silane-based material.

In the method of forming an imaging lens structure according to embodiments of the present invention, a near-field amplification layer formed on a transparent substrate and composed of dispersed metal nanoparticles to amplify near-field light generated from a specimen is formed, A near-field moving layer capable of moving the near-field light is formed on the transparent substrate so as to cover the near-field amplification layer. Then, a light transmitting layer pattern is formed on the near-field moving layer to selectively transmit light.

In one embodiment of the present invention, the near-field amplification layer is formed by forming a metal thin film on the transparent substrate and then performing a heat treatment process on the metal thin film to aggregate metal atoms contained in the metal thin film .

In one embodiment of the present invention, the near-field moving layer is formed by coating a solution in which nanoparticles are dispersed on the transparent substrate so as to cover the near-field amplification layer to form a pre-coating layer on the transparent substrate, Into a coating film having a planarized upper surface through a pressurizing thermal curing step of pressing the preliminary coating film to a mold.

In one embodiment of the present invention, the pressure hardening step of pressing the pre-coating film to the mold may be performed at a pressure ranging from 1 to 20 bar and a temperature ranging from 20 to 120 ° C.

In an embodiment of the present invention, a passivation layer interposed between the near-field moving layer and the light-transmitting layer may be additionally formed to prevent the specimen from flowing into the near-field moving layer.

Here, the passivation layer may be formed of a self-assembled monolayer having a super-hydrophobic property on the near-field mobile layer. In addition, the self-assembled monolayer may include a silane-based material.

An optical imaging system according to embodiments of the present invention includes a laser device, a beam splitter that reflects a part of the light emitted from the laser device, a wavefront that converts the light reflected from the beam splitter into a customized light pattern having a specific pattern An SLM (Spatial Light Modulator), an objective lens disposed in the center of the beam splitter and facing the wavefront adjuster, an objective lens through which the customized light pattern passes, an optical system arranged to face the objective lens, And a detector arranged to face the beam splitter and to detect imaging information generated from the specimen to be observed, the imaging lens structure being positioned above the specimen to be observed so that the customized light pattern is irradiated,

The imaging lens structure corresponds to any one of the embodiments of the imaging lens structure described above.

The imaging lens structure according to embodiments of the present invention can be closely attached to the specimen by providing a planarized near-field moving layer, so that the near-field of the ultra-fine structure can be easily amplified. Specifically, since the near-field mobile layer has a structure in which various lattice structures are mixed or disordered structures are repeated, it is possible to scatter near-field in a large area. Thus, the broadband near-field light can be effectively amplified.

Also, when the imaging lens structure is applied to an optical imaging system, ultrafine structures that can not be observed with conventional optical systems can be observed.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a side view for explaining an imaging lens structure according to an embodiment of the present invention; FIG.
FIGS. 2A to 2F are cross-sectional views illustrating a method of forming an imaging lens structure according to an exemplary embodiment of the present invention.
3 is a block diagram illustrating an optical imaging system according to an embodiment of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. In the accompanying drawings, the sizes and the quantities of objects are shown enlarged or reduced from the actual size for the sake of clarity of the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprise", "comprising", and the like are intended to specify that there is a feature, step, function, element, or combination of features disclosed in the specification, Quot; or " an " or < / RTI > combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

Imaging lens structure

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a side view for explaining an imaging lens structure according to an embodiment of the present invention; FIG.

1, an imaging lens structure 100 according to an exemplary embodiment of the present invention includes a transparent substrate 10, a near-field amplification layer 120, a near-field migration layer 130, and a light transmission layer pattern 140 do.

The transparent substrate 110 is made of a light-transmitting material capable of transmitting light. The transparent substrate 110 may be, for example, a polymer substrate. Alternatively, the transparent substrate 110 may be made of glass, quartz, or sapphire.

The near-field amplification layer 120 is formed on the transparent substrate 110. The near-field amplification layer 120 is composed of dispersed metal nanoparticles. The near-field amplification layer 120 is provided to amplify the near-field light generated from the specimen.

The near-field amplification layer 120 may be formed of a metal nanoparticle, a metal oxide, a nanoparticle, or a graphene.

The near-field amplification layer 120 may have a thickness ranging from 10 to 50 nm. Also, the nanoparticles constituting the near-field amplification layer 120 may have an average diameter in the range of 10 to 100 nm. The nanoparticles may be formed at a period in the range of 50 to 200 nm. Accordingly, when the imaging lens structure 100 approaches the specimen, the intensity of the near-field light can be increased by amplifying the near-field light generated from the specimen.

The near-field moving layer 130 is formed on the transparent substrate 110 so as to cover the near-field amplification layer. The near-field moving layer 130 is provided to move the near-field light.

The near-field moving layer 130 may include metal oxide particles having an average diameter of nano-size. The metal oxide particles may include at least one of ZnO, ZrO 2 , TiO 2 , ITO, and SnO 2 . In addition, the metal oxide particles may have an average diameter in the range of 50 to 500 nm.

Meanwhile, the near-field-moving layer 130 may have a surface flatness (RMS) of 10 nm or less. As a result, the imaging lens structure 100 is brought into close contact with the specimen as close as possible to the extinction of the near-field light generated from the specimen.

The near-field moving layer 130 is provided to have a scattering degree of 90% or more in light having a wavelength band in the visible light region. As a result, the near-field light incident on the near-field moving layer 130 can be scattered without disappearing.

The light-transmitting layer pattern 140 is provided on the near-field moving layer 130. The light transmitting layer pattern 140 may have a light transmitting hole to selectively transmit light generated from the specimen. The light-transmitting hole may have a diameter ranging from 10 to 100 mu m.

The light transmitting layer pattern 150 may be formed of a metal material such as aluminum, chrome, silver, or the like.

Accordingly, the imaging lens structure 100 having the near-field amplification layer 120 and the near-field moving layer 130 can effectively suppress the extinction of the near-field light by amplifying and moving the near-field light. As a result, when the imaging lens structure 100 is applied to an optical imaging system, the ultra-fine structure of the specimen can be imaged by using near-field light.

Further, as the near-field moving layer 130 has a surface flatness (RMS) of 10 nm or less, it can be attached as close to the specimen as possible to the imaging lens structure 100. Thus, the extinction of the near-field light generated from the specimen can be suppressed.

The imaging lens structure 100 according to an embodiment of the present invention may further include a passivation layer 150.

The passivation layer 150 is interposed between the near-field moving layer 120 and the light-transmitting layer pattern 140. The passivation layer 150 may prevent the specimen from flowing into the near-field moving layer 130. Thus, contamination or damage of the imaging lens structure 100 can be suppressed.

For example, the passivation layer 150 may include a self-assembled monolayer having super-hydrophobicity. When the specimen is a liquid bio-sample, the passivation layer 150 can effectively prevent the fluid contained in the liquid bio-sample from flowing into the near-field motion layer 130.

In this case, the self-assembled monolayer may have a thickness ranging from 1 to 3 nm. In addition, the self-assembled monolayer may include a silane (silane) -based material.

Method of forming an imaging lens structure

FIGS. 2A to 2F are cross-sectional views illustrating a method of forming an imaging lens structure according to an exemplary embodiment of the present invention.

Referring to FIG. 2A, a transparent substrate 110 is prepared, and a metal thin film 125 is formed on the transparent substrate 110. The metal thin film 125 may be converted into a near-field amplification layer 120 (see FIG.

The metal thin film 125 may be formed by processes such as E-beam evaporation, sputtering, nanoparticle coating, and chemical vapor deposition.

Referring to FIG. 2B, a heat treatment process is performed on the surface of the metal thin film 125 to cause agglomeration of metal particles. Thereby forming a near-field amplification layer 120 for amplifying the near-field light generated in the specimen. The near-field layer sputtering layer 120 formed through the coagulation may have a thickness ranging from 10 to 50 nm. In addition, the average diameter of the particles forming the near-field amplification layer 120 may be 10 to 100 nm and the period may be 50 to 200 nm.

Referring to FIG. 2C, the near-field moving layer 130 is formed on the transparent substrate 110 so as to cover the near-field amplification layer 120.

The near-field moving layer 130 may be formed by coating a solution in which metal oxide nanoparticles are dispersed for near-field movement to form a pre-coating layer (not shown), and then curing the pre-coating layer.

The preliminary coating layer may be formed by a doctor blading process. The coating layer may include at least one of ZnO, ZrO 2, TiO 2, ITO, and SnO 2.

Alternatively, the pre-coating layer may be formed through a spin coating process or a drop coating process.

Also, air holes or silicon oxide (SiO 2) are inserted into the preliminary coating layer, and the coating layer may have an inverse opal structure.

Subsequently, when the mold (not shown) is brought into contact with the surface of the preliminary coating film, a pressurizing heat curing process is performed. Preferably, the mold is a silicon substrate having a very high flatness or an elastomeric mold replicated therefrom. In this case, the surface of the preliminary coating layer can be flattened by pressurization at a pressure of 5 to 20 bar in the pressure thermal curing process. Also, the preliminary coating layer is heated to about 50 to 200 DEG C, and the preliminary coating layer is cured to convert the preliminary coating layer into a coating layer having a planarized upper surface. The coating film having the planarized upper surface corresponds to the proximity movement layer 130 by separating the contact mold from the coating layer.

Referring to FIG. 2D, When the specimen corresponds to the bio sample, the liquid contained in the specimen may penetrate into the near-field moving layer 130 and may be difficult to perform smooth imaging. In order to solve this problem, a passivation layer 150 may be additionally formed to cover the near-field-moving layer 130.

For example, the passivation layer 150 may comprise a self-assembled monolayer film layer having super-hydrophobicity. In this case, the passivation layer 150 may be formed through a wet process or a dry process. The passivation layer 150 may have a thickness of 2 nm or less.

Referring to FIG. 2D, a light transmitting layer pattern 140 is formed on the near-field moving layer 130. Also, when the passivation layer 150 is formed, the light transmission layer pattern 140 may be formed on the passivation layer 150.

The light transmitting layer pattern 160 may be formed by forming a metal layer (not shown) and partially etching the metal layer through a photomask etching process. As a result, the light transmitting layer pattern 160 may have a light transmitting hole capable of selectively transmitting light.

Optical imaging system

3 is a block diagram illustrating an optical imaging system according to an embodiment of the present invention.

Hereinafter, with reference to FIG. 3, an optical imaging system 200 using a meta-material structure film according to an embodiment of the present invention will be described in detail.

An optical imaging system 200 using a meta-material structure film according to an exemplary embodiment of the present invention includes a laser device 210, a beam splitter 215, a spatial light modulator (SLM) 220, A lens 225, an objective lens 230, an imaging lens structure 100, and a detector 240.

The laser device 210 serves to irradiate a desired kind of light, and a He-Ne laser device can be used. Note that the wavelength of light need not be limited, and lasers of different wavelengths may be used.

The light irradiated from the laser device 210 is partially reflected through the beam splitter 215 and is then introduced into the wavefront controller 220.

The wavefront controller 220 converts the light emitted from the laser device 210 into a customized light pattern (1, 2, 3, ...) so as to have a specific pattern. The converted customized light pattern passes through the optical lens 225 and the objective lens 230.

Light passing through the objective lens 230 is irradiated to the specimen 10 through the imaging lens structure 100 located on the specimen 10 to be observed. At this time, the imaging lens structure 100 is attached as close to the specimen 10 as possible, and moves and amplifies the near-field generated from the specimen. The objective lens 230 collects new light having information of the near field and the far field of the specimen 10.

The detector 240 images the microstructure by detecting the imaging information (1 ", 2 ", 3 ", ...) generated from the specimen 10 to be observed. 10) and the information of the near field and the far field.

The optical imaging system 200 according to an embodiment of the present invention irradiates the specimen 10 with a plurality of customized light patterns (1, 2, 3, ...) through the imaging lens structure 100, (1), (2), (3), and so on scattered from the structure 100 and transmits the scattered near-field and far-field light to the detector 240 to implement accurate imaging of the ultrafine structure.

That is, the near-field and far-field imaging information (1), (2), (3), ... scattered from the customized light patterns (1, And by analyzing the imaging information of these multiple pairs, accurate imaging of the ultrafine structure can be performed.

As described above, the optical imaging system 200 using the meta-material structure film according to an embodiment of the present invention includes an imaging lens structure having a near-field amplification layer and a near-field moving layer. At this time, since the elastic moving layer has a structure in which various lattice structures are mixed or disordered structures are repeated, it is possible to scatter the near field in a large area. Thus, the broadband near-field light can be effectively amplified. As a result, the optical imaging system can effectively observe ultra-fine structures that can not be observed with conventional optical systems.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the appended claims. It will be understood that the present invention can be changed.

Claims (18)

A transparent substrate;
A near-field amplification layer formed on the transparent substrate and configured to disperse the metal nanoparticles to amplify near-field light generated from the specimen;
A near-field moving layer formed on the transparent substrate so as to cover the near-field amplification layer and capable of moving the near-field light; And
And a light transmitting layer pattern provided on the near-field moving layer to selectively transmit light. 2. The imaging lens structure of claim 1, wherein the near-field amplification layer has a thickness in the range of 10 to 50 nm. The imaging lens structure of claim 1, wherein the near-field moving layer comprises metal oxide particles having a nanoscale average diameter. 4. An imaging lens structure according to claim 3, wherein said metal oxide particles have an average diameter in the range of 50 to 500 nm. The imaging lens structure according to claim 1, wherein the near-field moving layer has a scattering degree of 90% or more at a wavelength band of a visible light region. 2. The imaging lens structure of claim 1, wherein the near-field moving layer has a surface flatness (RMS) of 10 nm or less. The imaging lens structure according to claim 1, further comprising a passivation layer interposed between the near-field moving layer and the light transmitting layer, the passivation layer suppressing the introduction of the sample into the near-field moving layer. 8. The imaging lens structure of claim 7, wherein the passivation layer comprises a self-assembled monolayer having super-hydrophobicity. The imaging lens structure of claim 8, wherein the self-assembled monolayer has a thickness in the range of 1 to 3 nm. The imaging lens structure of claim 8, wherein the self-assembled monolayer comprises a silane-based material. Forming a near-field amplification layer on the transparent substrate, the near-field amplification layer comprising dispersed metal nanoparticles to amplify near-field light generated from the specimen;
Forming a near-field moving layer capable of moving the near-field light to cover the near-field amplification layer on the transparent substrate; and
And forming a light transmitting layer pattern on the upper portion of the near-field moving layer to selectively transmit light. 12. The method of claim 11, wherein forming the near-
Forming a metal thin film on the transparent substrate; And
And performing a heat treatment process on the metal thin film to aggregate the metal atoms contained in the metal thin film. 12. The method of claim 11, wherein forming the near-
Forming a preliminary coating layer on the transparent substrate by coating a solution of nanoparticles dispersed on the transparent substrate so as to cover the near-field amplification layer;
And converting the preliminary coating film into a coating film having a planarized upper surface through a pressure thermal curing step of pressing the preliminary coating film with a mold. 14. The method of claim 13, wherein the pressure hardening step of pressing the pre-coating film to the mold is performed at a pressure ranging from 1 to 20 bar and a temperature ranging from 20 to 120 ° C. 12. The imaging lens structure according to claim 11, further comprising a step of forming a passivation layer interposed between the near-field moving layer and the light transmitting layer, the passivation layer suppressing the introduction of the sample into the near- / RTI > 16. The method of claim 15, wherein forming the passivation layer comprises forming a self-assembled monolayer having super-hydrophobicity on the near-field moving layer. 17. The method of claim 16, wherein the self-assembled monolayer comprises a silane-based material. Laser device;
A beam splitter for reflecting a part of light emitted from the laser device;
A spatial light modulator (SLM) for converting the light reflected from the beam splitter into a customized light pattern having a specific pattern;
An objective lens disposed in the center of the beam splitter and facing the wavefront controller, through which the customized light pattern passes;
An imaging lens structure disposed to face the objective lens and positioned above the specimen to be observed so that the customized light pattern passed through the objective lens is irradiated; And
And a detector arranged to face the beam splitter and to detect imaging information generated from the specimen to be observed,
Wherein the imaging lens structure is made of any one of claims 1 to 10.
KR1020150045163A 2015-03-31 2015-03-31 Imaging lens structure, method of forming the same and optical imaging system including the same KR101666742B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020150045163A KR101666742B1 (en) 2015-03-31 2015-03-31 Imaging lens structure, method of forming the same and optical imaging system including the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020150045163A KR101666742B1 (en) 2015-03-31 2015-03-31 Imaging lens structure, method of forming the same and optical imaging system including the same

Publications (2)

Publication Number Publication Date
KR20160117776A KR20160117776A (en) 2016-10-11
KR101666742B1 true KR101666742B1 (en) 2016-10-18

Family

ID=57162135

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150045163A KR101666742B1 (en) 2015-03-31 2015-03-31 Imaging lens structure, method of forming the same and optical imaging system including the same

Country Status (1)

Country Link
KR (1) KR101666742B1 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001338430A (en) 2000-05-25 2001-12-07 Minolta Co Ltd Method for manufacturing proximity field light generating element and method for regulating this element
JP2011053531A (en) 2009-09-03 2011-03-17 Toshiba Corp Near-field optical waveguide device, method of manufacturing the same, and near-field light modulator
JP2012189651A (en) 2011-03-08 2012-10-04 Univ Of Tokyo Polarization conversion plate, and polarization conversion method
KR101472682B1 (en) 2013-07-23 2014-12-15 고려대학교 산학협력단 Methode for preparing metamaterial, metamaterial film prepared by the same and super-resolution imaging system using the the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001338430A (en) 2000-05-25 2001-12-07 Minolta Co Ltd Method for manufacturing proximity field light generating element and method for regulating this element
JP2011053531A (en) 2009-09-03 2011-03-17 Toshiba Corp Near-field optical waveguide device, method of manufacturing the same, and near-field light modulator
JP2012189651A (en) 2011-03-08 2012-10-04 Univ Of Tokyo Polarization conversion plate, and polarization conversion method
KR101472682B1 (en) 2013-07-23 2014-12-15 고려대학교 산학협력단 Methode for preparing metamaterial, metamaterial film prepared by the same and super-resolution imaging system using the the same

Also Published As

Publication number Publication date
KR20160117776A (en) 2016-10-11

Similar Documents

Publication Publication Date Title
Chen et al. Microsphere enhanced optical imaging and patterning: From physics to applications
KR101472682B1 (en) Methode for preparing metamaterial, metamaterial film prepared by the same and super-resolution imaging system using the the same
Li et al. Single-cell biomagnifier for optical nanoscopes and nanotweezers
Allen et al. Super‐resolution microscopy by movable thin‐films with embedded microspheres: resolution analysis
Zhu et al. All-dielectric concentration of electromagnetic fields at the nanoscale: the role of photonic nanojets
Wang et al. Three-dimensional super-resolution morphology by near-field assisted white-light interferometry
Yan et al. Microsphere-coupled scanning laser confocal nanoscope for sub-diffraction-limited imaging at 25 nm lateral resolution in the visible spectrum
Ctistis et al. Optical transmission through hexagonal arrays of subwavelength holes in thin metal films
EP3387368B1 (en) Properties of a surface and subsurface structures with white light interferometry using photonic jets
Roxworthy et al. Reconfigurable nanoantennas using electron-beam manipulation
US11543306B2 (en) Ultra-sensitive, mechanically-responsive optical metasurfaces via strain amplification
EP2140298A2 (en) Concept for detecting images with sub-wavelength resolution
Samadi et al. Hexagonal arrays of gold triangles as plasmonic tweezers
Liu et al. Characterization of photonic nanojets in dielectric microdisks
Gu et al. Subsurface nano-imaging with self-assembled spherical cap optical nanoscopy
Choi et al. Design methodology for a confocal imaging system using an objective microlens array with an increased working distance
KR20150137890A (en) Near field lens and imaging apparatus including the same
Tang et al. Nanoscale probing of thermal, stress, and optical fields under near-field laser heating
KR101666742B1 (en) Imaging lens structure, method of forming the same and optical imaging system including the same
US8879147B2 (en) Methods and apparatus for scanning microscopy using one or more Fresnel zone plates
Ueno et al. Nano-structured materials in plasmonics and photonics
Guo et al. Imaging of sub-surface nanostructures by dielectric planer cavity coupled microsphere lens
US20090116024A1 (en) Method for obtaining a high resolution image
US9706928B2 (en) Dynamic optical head and imaging device using flexible nano film optical structure
Hahn et al. Nanofabrication of plasmonic structures on insulating substrates by resist-on-metal bilayer lift-off

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20191001

Year of fee payment: 4