KR101118239B1 - 약액 공급용 펌프 유닛 - Google Patents
약액 공급용 펌프 유닛 Download PDFInfo
- Publication number
- KR101118239B1 KR101118239B1 KR1020077008115A KR20077008115A KR101118239B1 KR 101118239 B1 KR101118239 B1 KR 101118239B1 KR 1020077008115 A KR1020077008115 A KR 1020077008115A KR 20077008115 A KR20077008115 A KR 20077008115A KR 101118239 B1 KR101118239 B1 KR 101118239B1
- Authority
- KR
- South Korea
- Prior art keywords
- pump
- discharge
- valve
- flow path
- suction
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 121
- 239000000126 substance Substances 0.000 title claims abstract description 83
- 238000007599 discharging Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000011144 upstream manufacturing Methods 0.000 claims description 5
- 238000007789 sealing Methods 0.000 claims 1
- 230000014759 maintenance of location Effects 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 8
- 230000007774 longterm Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000008155 medical solution Substances 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000004308 accommodation Effects 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B53/00—Component parts, details or accessories not provided for in, or of interest apart from, groups F04B1/00 - F04B23/00 or F04B39/00 - F04B47/00
- F04B53/06—Venting
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
- F04B43/06—Pumps having fluid drive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Reciprocating Pumps (AREA)
- Details Of Reciprocating Pumps (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (9)
- 약액의 배출흡입을 행하는 펌프실을 가지는 펌프와, 상기 펌프실과 연통하여 상기 펌프실로 상기 약액을 흡입하는 흡입통로의 개폐를 행하기 위한 흡입측 개폐밸브와, 상기 펌프실과 연통하여 상기 펌프실로부터 상기 약액을 배출하는 배출통로의 개폐를 행하기 위한 배출측 개폐밸브를 가지는 약액 공급용 펌프 유닛에 있어서,상기 흡입통로 및 상기 배출통로를 함께 직선 상태로 하여 동일 직선상에 배치하고, 상기 펌프, 상기 흡입측 개폐밸브 및 상기 배출측 개폐밸브를 일체적으로 설치하며,상기 흡입측 개폐밸브를 일체적으로 설치한 흡입측 유로 부재와, 상기 배출측 개폐밸브를 일체적으로 설치한 배출측 유로 부재를 구비하고,상기 펌프가 가지는 펌프 하우징은, 내부에 상기 펌프실의 일부를 구성하는 다이어프램을 구비한 박형의 편평 형상을 하며,상기 흡입측 유로 부재 및 상기 배출측 유로 부재는, 함께 봉 형상을 하고, 싱기 다이어프램이 넓어지는 방향에 따라서 각각 배치되며,상기 흡입측 개폐밸브 및 상기 배출측 개폐밸브는, 상기 흡입측 유로 부재 및 상기 배출측 유로 부재에 대하여 직교하는 방향에, 또한 상기 다이어프램이 넓어지는 방향에 따르도록 각각 설치되어 있는 것을 특징으로 하는 약액 공급용 펌프 유닛.
- 제1항에 있어서,상기 펌프 하우징과 상기 각 유로 부재와의 사이에는, 양 부재 사이의 간극에서 상기 펌프 하우징과 각 유로 부재의 내부통로 안의 약액이 누출되지 않도록 봉인하는 실 링이 개재되며,상기 실 링의 내주면은, 상기 실 링의 상류 쪽 및 하류 쪽의 내부통로의 내주면과 매끈하게 연속하는 형상으로 형성되어 있는 것을 특징으로 하는 약액 공급용 펌프 유닛.
- 제1항 또는 제2항에 있어서,상기 각 밸브의 적어도 하나는 작동 에어를 공급 및 배출시키도록 동작하며, 상기 작동 에어를 제어하는 전공 레귤레이터의 적어도 하나를 일체적으로 설치하는 것을 특징으로 하는 약액 공급용 펌프 유닛.
- 제1항 또는 제2항에 있어서,상기 배출측 개폐밸브의 하류 쪽에, 상기 배출통로 안의 상기 약액을 소정량 인입하는 석 백(suckback) 밸브를 일체적으로 설치하는 것을 특징으로 하는 약액 공급용 펌프 유닛.
- 제4항에 있어서,상기 각 밸브의 적어도 하나는 작동 에어를 공급 및 배출시키도록 동작하며, 그 작동 에어를 제어하는 전공 레귤레이터의 적어도 하나를 일체적으로 설치하는 것을 특징으로 하는 약액 공급용 펌프 유닛.
- 삭제
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Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004264423A JP4723218B2 (ja) | 2004-09-10 | 2004-09-10 | 薬液供給用ポンプユニット |
JPJP-P-2004-00264423 | 2004-09-10 | ||
PCT/JP2005/013920 WO2006027909A1 (ja) | 2004-09-10 | 2005-07-29 | 薬液供給用ポンプユニット |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070114693A KR20070114693A (ko) | 2007-12-04 |
KR101118239B1 true KR101118239B1 (ko) | 2012-03-16 |
Family
ID=36036202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077008115A KR101118239B1 (ko) | 2004-09-10 | 2005-07-29 | 약액 공급용 펌프 유닛 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070258837A1 (ko) |
JP (1) | JP4723218B2 (ko) |
KR (1) | KR101118239B1 (ko) |
CN (1) | CN100562664C (ko) |
WO (1) | WO2006027909A1 (ko) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4526350B2 (ja) * | 2004-10-29 | 2010-08-18 | シーケーディ株式会社 | 薬液供給用ポンプ |
WO2006048980A1 (ja) | 2004-11-01 | 2006-05-11 | Ckd Corporation | 薬液供給用ポンプ |
JP5352324B2 (ja) * | 2009-04-08 | 2013-11-27 | Ckd株式会社 | 液体吐出用ポンプシステム |
JP5439579B2 (ja) * | 2012-02-27 | 2014-03-12 | 東京エレクトロン株式会社 | 液処理装置及び液処理方法 |
KR101444705B1 (ko) | 2014-01-29 | 2014-09-26 | (주)유니테코 | 방사성 의약품 분배장치 |
US9605669B2 (en) * | 2014-03-19 | 2017-03-28 | Graco Fluid Handling (A) Inc. | Multi-port metering pump assembly and related methods |
KR101686565B1 (ko) * | 2015-05-13 | 2016-12-28 | 세메스 주식회사 | 액 공급 유닛 및 이를 포함하는 기판 처리 장치 |
JP6576217B2 (ja) * | 2015-11-10 | 2019-09-18 | 株式会社Screenホールディングス | 処理液供給装置および処理液供給装置の制御方法 |
JP6920133B2 (ja) * | 2017-08-23 | 2021-08-18 | 株式会社Screenホールディングス | 処理液供給装置 |
KR20240056581A (ko) | 2021-12-17 | 2024-04-30 | 시케이디 가부시키가이샤 | 다이어프램 및 약액 제어 장치 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51107504A (ja) | 1975-03-18 | 1976-09-24 | Ajinomoto Kk | Ofukudohonpu |
JP2000130656A (ja) * | 1998-10-22 | 2000-05-12 | Nitto Kohki Co Ltd | パッキンとこれを組込んだ管継手 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2843050A (en) * | 1954-02-15 | 1958-07-15 | Lyndus E Harper | Diaphragm sludge or chemical pump |
US3302953A (en) * | 1963-02-25 | 1967-02-07 | Clarence O Glasgow | Gasket ring and conduit coupling |
US5088515A (en) * | 1989-05-01 | 1992-02-18 | Kamen Dean L | Valve system with removable fluid interface |
DE3827489C1 (ko) * | 1988-08-12 | 1989-10-12 | Gruenbeck Wasseraufbereitung Gmbh, 8884 Hoechstaedt, De | |
US5154589A (en) * | 1990-11-09 | 1992-10-13 | National Instrument Company | Metering pump |
JP3380594B2 (ja) * | 1992-10-14 | 2003-02-24 | エーザイ株式会社 | 薬液の送液ポンプとこれを用いる薬液の充填用送液装置 |
JPH0663878U (ja) * | 1993-02-10 | 1994-09-09 | 東京特殊電線株式会社 | ダイヤフラムポンプ |
US5378122A (en) * | 1993-02-16 | 1995-01-03 | Wilden Pump & Engineering Co. | Air driven diaphragm pump |
JPH07324680A (ja) * | 1994-05-30 | 1995-12-12 | Hitachi Ltd | 流動体供給方法および装置 |
JPH08285125A (ja) * | 1995-04-12 | 1996-11-01 | Koganei Corp | 弁装置および弁装置を有する薬液供給装置 |
US5566983A (en) * | 1995-08-21 | 1996-10-22 | Eaton Corporation | Fluid interface |
JPH09151854A (ja) * | 1995-11-29 | 1997-06-10 | Hitachi Ltd | 薬液供給装置 |
KR100252224B1 (ko) * | 1997-09-26 | 2000-06-01 | 윤종용 | 반도체장치 제조설비의 포토레지스트 셕크백장치 |
-
2004
- 2004-09-10 JP JP2004264423A patent/JP4723218B2/ja active Active
-
2005
- 2005-07-29 KR KR1020077008115A patent/KR101118239B1/ko active IP Right Grant
- 2005-07-29 CN CNB2005800289947A patent/CN100562664C/zh not_active Expired - Fee Related
- 2005-07-29 US US11/662,019 patent/US20070258837A1/en not_active Abandoned
- 2005-07-29 WO PCT/JP2005/013920 patent/WO2006027909A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51107504A (ja) | 1975-03-18 | 1976-09-24 | Ajinomoto Kk | Ofukudohonpu |
JP2000130656A (ja) * | 1998-10-22 | 2000-05-12 | Nitto Kohki Co Ltd | パッキンとこれを組込んだ管継手 |
Also Published As
Publication number | Publication date |
---|---|
KR20070114693A (ko) | 2007-12-04 |
US20070258837A1 (en) | 2007-11-08 |
JP4723218B2 (ja) | 2011-07-13 |
WO2006027909A1 (ja) | 2006-03-16 |
CN100562664C (zh) | 2009-11-25 |
CN101023269A (zh) | 2007-08-22 |
JP2006077712A (ja) | 2006-03-23 |
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