KR100911421B1 - 몰드를 이용한 컬러필터 형성방법과 이를 포함한액정표시장치 제조방법 - Google Patents
몰드를 이용한 컬러필터 형성방법과 이를 포함한액정표시장치 제조방법 Download PDFInfo
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- KR100911421B1 KR100911421B1 KR1020030031316A KR20030031316A KR100911421B1 KR 100911421 B1 KR100911421 B1 KR 100911421B1 KR 1020030031316 A KR1020030031316 A KR 1020030031316A KR 20030031316 A KR20030031316 A KR 20030031316A KR 100911421 B1 KR100911421 B1 KR 100911421B1
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- Prior art keywords
- color filter
- pattern
- mold
- color
- substrate
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- 238000000034 method Methods 0.000 title claims abstract description 81
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 65
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 49
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 49
- 230000008569 process Effects 0.000 claims abstract description 42
- 229920005989 resin Polymers 0.000 claims abstract description 38
- 239000011347 resin Substances 0.000 claims abstract description 38
- 239000011159 matrix material Substances 0.000 claims description 14
- -1 polydimethylsiloxane Polymers 0.000 claims description 4
- 239000003086 colorant Substances 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 abstract description 30
- 230000008901 benefit Effects 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 3
- 238000007796 conventional method Methods 0.000 abstract description 2
- 235000013870 dimethyl polysiloxane Nutrition 0.000 abstract 4
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 abstract 4
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 1
- 239000010409 thin film Substances 0.000 description 7
- 239000000049 pigment Substances 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- 238000002174 soft lithography Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 238000004043 dyeing Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
Abstract
Description
Claims (10)
- 기판 상에 제 1 컬러와 제 2 컬러와 제 3 컬러를 표현하는 다수의 제 1, 제2, 제 3 컬러화소를 정의하는 단계와;상기 기판 상에, 상기 제 1 컬러화소에 대응하여 패턴이 형성된 제 1 몰드를 부착하고, 상기 패턴에 제 1 컬러수지를 충진하여, 제 1 컬러필터패턴을 형성하는 단계와;상기 기판 상에, 상기 제 1 및 제 2 컬러화소에 대응하여 패턴이 형성된 제 2 몰드를 부착하고, 상기 패턴에 제 2 컬러수지를 충진하여, 제 2 컬러필터패턴을 형성하는 단계와;상기 기판 상에 상기 다수의 제 1 , 제 2. 제 3 컬러화소에 대응하여 패턴이 형성된 제 3 몰드를 부착하고, 상기 패턴에 제 3 컬러수지를 충진하여, 제 3 컬러필터패턴을 형성하는 단계를 포함하는 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1, 제 2, 제 3 컬러수지는 상기 제 1 , 제 2 , 제 3 몰드에 구성된 패턴의 일측 개방부로부터 패턴 내부로 충진되는 단계를 포함하는 컬러필터 제조방법.
- 제 2 항에 있어서,상기 제 1 , 제 2 , 제 3 컬러필터 패턴을 형성하는 공정시, 상기 패턴에 충진된 제 1, 제 2, 제 3 컬러수지를 자외선 또는 열로 경화한 후, 상기 몰드를 상기 기판으로부터 제거하는 단계를 더욱 포함하는 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1 , 제 2, 제 3 몰드는 PDMS(polydimethylsiloxane)으로 형성된 PDMS몰드인 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 2 몰드는 상기 기판에 부착될 때, 상기 패턴 내부에 상기 제 1 컬러필터 패턴을 포함하여 부착되는 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 3 몰드는 상기 기판에 부착될 때, 상기 패턴 내부에 상기 제 1 및 제 2 컬러필터 패턴을 포함하여 부착되는 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1 , 제 2 , 제 3 컬러필터 패턴은 일 방향으로 연장된 막대형상으로 형성된 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1 , 제 2 제 3 컬러필터 패턴상에 블랙매트릭스를 형성하는 단계를 더욱 포함하는 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1, 제 2, 제 3 컬러필터 패턴은 적색과 녹색과 청색 중 각각 하나에 대응되는 색상인 컬러필터 제조방법.
- 제 1 항에 있어서,상기 제 1, 제 2 , 제 3 컬러필터 패턴은 곡선 또는 꺽임 형상으로 형성된 컬러필터 제조방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020030031316A KR100911421B1 (ko) | 2003-05-16 | 2003-05-16 | 몰드를 이용한 컬러필터 형성방법과 이를 포함한액정표시장치 제조방법 |
US10/840,240 US8012385B2 (en) | 2003-05-16 | 2004-05-07 | Method of forming color filter layer and method of fabricating liquid crystal display device using the same |
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KR1020030031316A KR100911421B1 (ko) | 2003-05-16 | 2003-05-16 | 몰드를 이용한 컬러필터 형성방법과 이를 포함한액정표시장치 제조방법 |
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KR20040098965A KR20040098965A (ko) | 2004-11-26 |
KR100911421B1 true KR100911421B1 (ko) | 2009-08-11 |
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KR1020030031316A KR100911421B1 (ko) | 2003-05-16 | 2003-05-16 | 몰드를 이용한 컬러필터 형성방법과 이를 포함한액정표시장치 제조방법 |
Country Status (2)
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US (1) | US8012385B2 (ko) |
KR (1) | KR100911421B1 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7785504B2 (en) * | 2004-11-11 | 2010-08-31 | Lg Display Co., Ltd. | Thin film patterning apparatus and method of fabricating color filter array substrate using the same |
US7438947B2 (en) * | 2004-11-30 | 2008-10-21 | Tpo Displays Corp. | Color filter process |
KR101117987B1 (ko) * | 2005-06-07 | 2012-03-06 | 엘지디스플레이 주식회사 | 평판표시소자의 제조장치 및 방법 |
US20070216048A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Manufacturing optical elements |
US20070216049A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Method and tool for manufacturing optical elements |
US20070216047A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Manufacturing an optical element |
US20070216046A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Manufacturing miniature structured elements with tool incorporating spacer elements |
US20100072640A1 (en) * | 2006-06-09 | 2010-03-25 | Heptagon Oy | Manufacturing a replication tool, sub-master or replica |
KR100832298B1 (ko) * | 2006-06-29 | 2008-05-26 | 엘지디스플레이 주식회사 | 패턴 형성용 레지스트와 이를 이용한 소프트몰드 제조방법 |
DE102006058817B4 (de) * | 2006-06-30 | 2017-04-27 | Lg Display Co., Ltd. | Verfahren zur Herstellung eines Substrates mit einer ebenen Schicht |
DE502007005337D1 (de) | 2007-03-21 | 2010-11-25 | Thallner Erich | Verfahren und Vorrichtung zur Erzeugung einer nanostrukturierten Scheibe |
CN102385084B (zh) * | 2011-10-25 | 2013-07-24 | 深圳市华星光电技术有限公司 | 彩色滤光板的制作模具及制作方法 |
WO2013066296A1 (en) | 2011-10-31 | 2013-05-10 | Hewlett-Packard Development Company, L.P. | Method of fabricating a color filter array using a multilevel structure |
CN106959549A (zh) * | 2017-05-17 | 2017-07-18 | 京东方科技集团股份有限公司 | 色阻结构、滤光组件、显示装置以及色阻结构的制备方法 |
CN213092066U (zh) * | 2020-03-04 | 2021-04-30 | 京东方科技集团股份有限公司 | 彩膜基板和显示面板 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06281926A (ja) * | 1993-03-29 | 1994-10-07 | Fujitsu Ltd | 液晶表示板用カラーフィルタの形成方法 |
JPH10160925A (ja) | 1996-11-28 | 1998-06-19 | Canon Inc | カラーフィルター |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1494064B1 (en) * | 1996-10-30 | 2006-04-12 | Seiko Epson Corporation | Color filter |
KR100679521B1 (ko) * | 2000-02-18 | 2007-02-07 | 엘지.필립스 엘시디 주식회사 | 액정표시장치 제조방법 |
TWI233499B (en) * | 2003-06-16 | 2005-06-01 | Polyoptocom Corp | An innovative fabrication method for color filter |
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- 2003-05-16 KR KR1020030031316A patent/KR100911421B1/ko active IP Right Grant
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2004
- 2004-05-07 US US10/840,240 patent/US8012385B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06281926A (ja) * | 1993-03-29 | 1994-10-07 | Fujitsu Ltd | 液晶表示板用カラーフィルタの形成方法 |
JPH10160925A (ja) | 1996-11-28 | 1998-06-19 | Canon Inc | カラーフィルター |
Also Published As
Publication number | Publication date |
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US20040229140A1 (en) | 2004-11-18 |
US8012385B2 (en) | 2011-09-06 |
KR20040098965A (ko) | 2004-11-26 |
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