KR100806810B1 - 노광기 - Google Patents
노광기 Download PDFInfo
- Publication number
- KR100806810B1 KR100806810B1 KR1020020013189A KR20020013189A KR100806810B1 KR 100806810 B1 KR100806810 B1 KR 100806810B1 KR 1020020013189 A KR1020020013189 A KR 1020020013189A KR 20020013189 A KR20020013189 A KR 20020013189A KR 100806810 B1 KR100806810 B1 KR 100806810B1
- Authority
- KR
- South Korea
- Prior art keywords
- plastic substrate
- mask
- slit
- roller
- ultraviolet light
- Prior art date
Links
Images
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/48—Flattening arrangements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (4)
- 자외선 광을 출사하여 플라스틱 기판 상에 도포된 포토 레지스트를 감광시키기 위한 광원과,상기 광원에서 출사된 자외선 광을 일방향으로 조사시키기 위한 슬릿과,상기 슬릿을 통과한 광으로 상기 포토 레지스트를 실루엣 패턴하기 위한 마스크와,상기 마스크를 통과한 광의 경로를 변경하고 상기 플라스틱 기판 상에 초점을 맞추기 위한 광학계와,상기 플라스틱 기판을 지지하고 상기 마스크의 이동에 따라 상기 플라스틱 기판을 평탄하게 이동시키기 위한 롤러를 포함하는 것을 특징으로 하는 노광기.
- 제 1 항에 있어서, 상기 광학계는 상기 광원, 슬릿 및 마스크를 통하여 조사된 자외선 광의 경로를 변경하기 위한 복수개의 반사경과 상기 롤러의 곡면에 따른 상기 플라스틱 기판 상에 초점을 맞추기 위한 오목렌즈를 포함하는 것을 특징으로 하는 노광기.
- 제 1 항에 있어서,상기 플라스틱 기판을 평탄하게 하기 위한 복수 개의 보조 롤러를 더 포함하는 것을 특징으로 하는 노광기.
- 제 1 항에 있어서, 상기 마스크의 스캔속도와 상기 롤러의 회전속도가 일치 하는 것을 특징으로 하는 노광기.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020013189A KR100806810B1 (ko) | 2002-03-12 | 2002-03-12 | 노광기 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020020013189A KR100806810B1 (ko) | 2002-03-12 | 2002-03-12 | 노광기 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030073560A KR20030073560A (ko) | 2003-09-19 |
KR100806810B1 true KR100806810B1 (ko) | 2008-02-25 |
Family
ID=32224383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020013189A KR100806810B1 (ko) | 2002-03-12 | 2002-03-12 | 노광기 |
Country Status (1)
Country | Link |
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KR (1) | KR100806810B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008065223A (ja) * | 2006-09-11 | 2008-03-21 | Fujitsu Ltd | パターン形成方法、パターン形成装置、記録媒体の製造方法および部材の製造方法 |
KR102242562B1 (ko) * | 2014-09-04 | 2021-04-20 | 삼성전자주식회사 | 극자외선(euv) 마스크 보호장치 및 그 보호장치를 포함한 euv 노광 장치 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05281412A (ja) * | 1992-03-31 | 1993-10-29 | Toshiba Corp | カラーフィルタの製造方法及びその製造装置 |
JPH07263474A (ja) * | 1994-03-22 | 1995-10-13 | Toshiba Corp | 半導体ウェーハの塗布装置 |
KR19990018142A (ko) * | 1997-08-26 | 1999-03-15 | 윤종용 | 웨이퍼 라벨 마킹을 위한 타이틀러의 노광장치 |
US5909266A (en) * | 1996-09-11 | 1999-06-01 | Canon Kabushiki Kaisha | Process and apparatus for producing electrode plate and process for producing liquid crystal device including the plate |
JP2001183636A (ja) * | 1999-12-24 | 2001-07-06 | Fuji Photo Film Co Ltd | 樹脂層付基板の形成方法並びにこれを用いた基板、液晶素子 |
KR20020034286A (ko) * | 2000-10-31 | 2002-05-09 | 윤종용 | 액정 표시 장치의 제조 방법 |
KR20030034417A (ko) * | 2001-10-23 | 2003-05-09 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 필름 타입 기판 이동방법 |
-
2002
- 2002-03-12 KR KR1020020013189A patent/KR100806810B1/ko active IP Right Grant
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05281412A (ja) * | 1992-03-31 | 1993-10-29 | Toshiba Corp | カラーフィルタの製造方法及びその製造装置 |
JPH07263474A (ja) * | 1994-03-22 | 1995-10-13 | Toshiba Corp | 半導体ウェーハの塗布装置 |
US5909266A (en) * | 1996-09-11 | 1999-06-01 | Canon Kabushiki Kaisha | Process and apparatus for producing electrode plate and process for producing liquid crystal device including the plate |
KR19990018142A (ko) * | 1997-08-26 | 1999-03-15 | 윤종용 | 웨이퍼 라벨 마킹을 위한 타이틀러의 노광장치 |
JP2001183636A (ja) * | 1999-12-24 | 2001-07-06 | Fuji Photo Film Co Ltd | 樹脂層付基板の形成方法並びにこれを用いた基板、液晶素子 |
KR20020034286A (ko) * | 2000-10-31 | 2002-05-09 | 윤종용 | 액정 표시 장치의 제조 방법 |
KR20030034417A (ko) * | 2001-10-23 | 2003-05-09 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 필름 타입 기판 이동방법 |
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Publication number | Publication date |
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KR20030073560A (ko) | 2003-09-19 |
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