KR100753959B1 - 기판 건조장치를 이용한 기판 건조방법 - Google Patents
기판 건조장치를 이용한 기판 건조방법 Download PDFInfo
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- KR100753959B1 KR100753959B1 KR1020060003412A KR20060003412A KR100753959B1 KR 100753959 B1 KR100753959 B1 KR 100753959B1 KR 1020060003412 A KR1020060003412 A KR 1020060003412A KR 20060003412 A KR20060003412 A KR 20060003412A KR 100753959 B1 KR100753959 B1 KR 100753959B1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C18/00—Disintegrating by knives or other cutting or tearing members which chop material into fragments
- B02C18/06—Disintegrating by knives or other cutting or tearing members which chop material into fragments with rotating knives
- B02C18/16—Details
- B02C18/18—Knives; Mountings thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C18/00—Disintegrating by knives or other cutting or tearing members which chop material into fragments
- B02C18/0084—Disintegrating by knives or other cutting or tearing members which chop material into fragments specially adapted for disintegrating garbage, waste or sewage
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B02—CRUSHING, PULVERISING, OR DISINTEGRATING; PREPARATORY TREATMENT OF GRAIN FOR MILLING
- B02C—CRUSHING, PULVERISING, OR DISINTEGRATING IN GENERAL; MILLING GRAIN
- B02C18/00—Disintegrating by knives or other cutting or tearing members which chop material into fragments
- B02C18/06—Disintegrating by knives or other cutting or tearing members which chop material into fragments with rotating knives
- B02C18/16—Details
- B02C18/24—Drives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Abstract
Description
Claims (24)
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- 기판 건조장치의 세정조에서 순수에 의해서 세정된 기판을 건조조에서 건조하는 방법에 있어서,상기 순수에 의해서 세정된 후, 상기 세정조에서 상기 건조조로 이송되는 상기 기판에 극성유기용매와 불활성 가스의 혼합기체를 여러 방향에서 공급하여 상기 기판을 건조시키는 제1건조단계;상기 기판이 상기 건조조에 이송된 후, 상기 혼합기체의 공급을 중단하고, 상기 불활성 가스를 여러 방향에서 공급하여 상기 기판을 건조시키는 제2건조단계;상기 불활성 가스의 공급을 중단하고, 상기 혼합기체를 여러 방향에서 공급하여 상기 기판을 건조시키는 제3건조단계; 및상기 혼합기체의 공급을 중단하고, 상기 불활성 가스를 여러 방향에서 공급하여 상기 기판을 건조시키는 제4건조단계;를 포함하여 이루어지는 기판 건조장치를 이용한 기판 건조방법.
- 제20항에 있어서,상기 제1건조단계 내지 제4건조단계는 각각 10~120 초 동안 수행되는 기판 건조장치를 이용한 기판 건조방법.
- 제20항에 있어서,상기 제1건조단계 및 제3건조단계에서의 혼합기체와 제2건조단계 및 제4건조단계에서의 불활성 가스는 20~200 ℓ/min.의 유량으로서 공급되는 기판 건조장치를 이용한 기판 건조방법.
- 제20항에 있어서,상기 제1건조단계 및 제3건조단계에서의 혼합기체와 제2건조단계 및 제4건조단계에서의 불활성 가스는 20~250℃의 온도로 유지되어 있는 기판 건조장치를 이용한 기판 건조방법.
- 제20항에 있어서,상기 제3건조단계와 제4건조단계는 적어도 2회 수행되는 기판 건조장치를 이용한 기판 건조방법.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060003412A KR100753959B1 (ko) | 2006-01-12 | 2006-01-12 | 기판 건조장치를 이용한 기판 건조방법 |
TW095121597A TWI304609B (en) | 2006-01-12 | 2006-06-16 | Substrate drying apparatus and method of drying substrate using the same |
JP2006187180A JP2007189186A (ja) | 2006-01-12 | 2006-07-06 | 基板乾燥装置及びこれを利用した基板乾燥方法 |
US11/648,553 US20070157947A1 (en) | 2006-01-12 | 2007-01-03 | Substrate drying apparatus and method of substrate drying using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060003412A KR100753959B1 (ko) | 2006-01-12 | 2006-01-12 | 기판 건조장치를 이용한 기판 건조방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100753959B1 true KR100753959B1 (ko) | 2007-08-31 |
Family
ID=38231586
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060003412A KR100753959B1 (ko) | 2006-01-12 | 2006-01-12 | 기판 건조장치를 이용한 기판 건조방법 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20070157947A1 (ko) |
JP (1) | JP2007189186A (ko) |
KR (1) | KR100753959B1 (ko) |
TW (1) | TWI304609B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101373748B1 (ko) * | 2010-04-19 | 2014-03-14 | 세메스 주식회사 | 기판 세정 방법 |
WO2016099064A1 (ko) * | 2014-12-19 | 2016-06-23 | 주식회사 엘지화학 | 필름 건조 장치 및 이를 포함하는 필름 제조 시스템 |
Families Citing this family (2)
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TWI410600B (zh) * | 2008-01-31 | 2013-10-01 | Univ Southern Taiwan Tech | 內部噴擊型殼管式熱交換器 |
US11923210B2 (en) * | 2018-08-30 | 2024-03-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Systems and methods for in-situ Marangoni cleaning |
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2007
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101373748B1 (ko) * | 2010-04-19 | 2014-03-14 | 세메스 주식회사 | 기판 세정 방법 |
WO2016099064A1 (ko) * | 2014-12-19 | 2016-06-23 | 주식회사 엘지화학 | 필름 건조 장치 및 이를 포함하는 필름 제조 시스템 |
KR101767632B1 (ko) * | 2014-12-19 | 2017-08-11 | 주식회사 엘지화학 | 필름 건조 장치 및 이를 포함하는 필름 제조 시스템 |
Also Published As
Publication number | Publication date |
---|---|
JP2007189186A (ja) | 2007-07-26 |
US20070157947A1 (en) | 2007-07-12 |
TWI304609B (en) | 2008-12-21 |
TW200735194A (en) | 2007-09-16 |
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