KR100739310B1 - 도포장치 및 도포방법 - Google Patents
도포장치 및 도포방법 Download PDFInfo
- Publication number
- KR100739310B1 KR100739310B1 KR1020060091423A KR20060091423A KR100739310B1 KR 100739310 B1 KR100739310 B1 KR 100739310B1 KR 1020060091423 A KR1020060091423 A KR 1020060091423A KR 20060091423 A KR20060091423 A KR 20060091423A KR 100739310 B1 KR100739310 B1 KR 100739310B1
- Authority
- KR
- South Korea
- Prior art keywords
- slit nozzle
- substrate
- coating
- board
- height
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
- B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
- B05C11/1018—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to distance of target
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Engineering & Computer Science (AREA)
- Coating Apparatus (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
Claims (4)
- 기판 재치부 상에 올려놓여진 기판에, 상기 기판과 비접촉이고 상대적으로 이동 가능한 슬릿노즐로부터 도포액을 토출하여, 상기 기판 상에 도막을 형성하는 도포장치에 있어서,상기 기판 재치부의 도포 개시측 폭방향의 양단부에, 상기 슬릿노즐의 수평기준 및 높이기준을 결정하기 위한 기준치구가 설치되고, 상기 기준치구는 승강 가능한 측장자를 가지며, 상기 측장자는, 그의 윗면이 상기 기판 재치부면과 동일한 면 높이에서 정지하도록 제어되어 있는 것을 특징으로 하는 도포장치.
- 제1항의 도포장치에 있어서, 상기 슬릿노즐의 도포시의 이동방향을 기준으로 하여 상기 슬릿노즐의 앞면에, 상기 기판 재치부 상에 올려놓여진 상기 기판 윗면과, 상기 슬릿노즐 하단의 간격을 측정하는 비접촉식 거리 측정 센서가 장착되어 있는 것을 특징으로 하는 도포장치.
- 제1항의 도포장치에 있어서 제어된 기판 재치부면과 동일한 면 높이위치를 기준으로 슬릿노즐의 대기위치를 결정하고, 상기 대기위치를 기준으로 하여 기판과 슬릿노즐의 간격을 결정하여 도포를 개시하는 것을 특징으로 하는 도포방법.
- 제3항의 도포방법에 있어서, 도포 개시부터 도포 종료까지의 사이에는, 거리 측정 센서에 의해, 상기 기판 윗면과 상기 슬릿노즐 하단의 간격 변동을 감시하고, 상기 간격의 이상(異常)상태를 경보나 램프 점등에 의해 알리는 것을 특징으로 하는 도포방법.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005273083A JP4803714B2 (ja) | 2005-09-21 | 2005-09-21 | 塗布装置及び塗布方法 |
JPJP-P-2005-00273083 | 2005-09-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070033279A KR20070033279A (ko) | 2007-03-26 |
KR100739310B1 true KR100739310B1 (ko) | 2007-07-12 |
Family
ID=37953496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060091423A KR100739310B1 (ko) | 2005-09-21 | 2006-09-20 | 도포장치 및 도포방법 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4803714B2 (ko) |
KR (1) | KR100739310B1 (ko) |
CN (1) | CN100569686C (ko) |
TW (1) | TW200716264A (ko) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5416925B2 (ja) * | 2008-06-24 | 2014-02-12 | 東京応化工業株式会社 | 塗布装置 |
JP5621486B2 (ja) * | 2009-10-06 | 2014-11-12 | 三菱化学株式会社 | シリカ系多孔質体の製造方法 |
JP5470474B2 (ja) * | 2013-02-04 | 2014-04-16 | 東京応化工業株式会社 | 塗布装置 |
CN104138825B (zh) * | 2013-05-08 | 2016-05-04 | 冠伟科技股份有限公司 | 点胶机定位方法 |
CN103771719B (zh) * | 2014-01-16 | 2015-09-09 | 北京京东方光电科技有限公司 | 一种涂布装置 |
KR102641446B1 (ko) * | 2017-07-19 | 2024-02-28 | 주식회사 탑 엔지니어링 | 디스펜싱 장치 |
CN109293251B (zh) * | 2018-09-29 | 2021-06-18 | 芜湖中义玻璃有限公司 | 一种玻璃表面高效喷涂装置 |
JP7077994B2 (ja) * | 2019-02-28 | 2022-05-31 | 株式会社豊田自動織機 | 塗工装置及び塗工装置の位置合わせ方法 |
JP7344533B2 (ja) * | 2019-05-14 | 2023-09-14 | Aiメカテック株式会社 | 塗布装置及び塗布方法 |
JP6775907B1 (ja) * | 2019-08-08 | 2020-10-28 | 中外炉工業株式会社 | 塗布装置及び塗布方法 |
CN113083616B (zh) * | 2021-04-07 | 2022-07-26 | 深圳市曼恩斯特科技股份有限公司 | 一种涂布挤压模头面密度外部调节装置 |
CN113534112B (zh) * | 2021-09-16 | 2022-01-14 | 常州铭赛机器人科技股份有限公司 | 一种弧形透明工件激光测高校准方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07328513A (ja) * | 1994-06-08 | 1995-12-19 | Dainippon Screen Mfg Co Ltd | 処理液塗布装置 |
JP2003093946A (ja) | 2001-09-25 | 2003-04-02 | Shimadzu Corp | 液体コーティング装置 |
KR20040095727A (ko) * | 2003-05-07 | 2004-11-15 | 호야 가부시키가이샤 | 기판도포장치 및 기판도포방법 |
JP2005296907A (ja) | 2004-04-16 | 2005-10-27 | Tokyo Electron Ltd | 塗布膜形成装置 |
JP2006218408A (ja) | 2005-02-10 | 2006-08-24 | Tokyo Electron Ltd | 塗布膜形成装置および塗布膜形成方法、コンピュータプログラム |
US20060292295A1 (en) | 2005-06-25 | 2006-12-28 | O-Jun Kwon | Coating apparatus and method of fabricating liquid crystal display device using the same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06343912A (ja) * | 1993-06-10 | 1994-12-20 | Seikosha Co Ltd | ディスペンサの駆動方法 |
JP2000167467A (ja) * | 1998-12-02 | 2000-06-20 | Sanken Electric Co Ltd | ディスペンサ移動制御装置 |
JP3022562B1 (ja) * | 1999-06-25 | 2000-03-21 | 中外炉工業株式会社 | テ―ブル型ダイコ―タ |
JP2004351261A (ja) * | 2003-05-27 | 2004-12-16 | Canon Inc | 塗布装置および塗布方法 |
JP4105613B2 (ja) * | 2003-09-04 | 2008-06-25 | 大日本スクリーン製造株式会社 | 基板処理装置 |
-
2005
- 2005-09-21 JP JP2005273083A patent/JP4803714B2/ja active Active
-
2006
- 2006-08-04 TW TW095128700A patent/TW200716264A/zh unknown
- 2006-09-19 CN CNB2006101270041A patent/CN100569686C/zh active Active
- 2006-09-20 KR KR1020060091423A patent/KR100739310B1/ko active IP Right Grant
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07328513A (ja) * | 1994-06-08 | 1995-12-19 | Dainippon Screen Mfg Co Ltd | 処理液塗布装置 |
JP2003093946A (ja) | 2001-09-25 | 2003-04-02 | Shimadzu Corp | 液体コーティング装置 |
KR20040095727A (ko) * | 2003-05-07 | 2004-11-15 | 호야 가부시키가이샤 | 기판도포장치 및 기판도포방법 |
JP2005296907A (ja) | 2004-04-16 | 2005-10-27 | Tokyo Electron Ltd | 塗布膜形成装置 |
JP2006218408A (ja) | 2005-02-10 | 2006-08-24 | Tokyo Electron Ltd | 塗布膜形成装置および塗布膜形成方法、コンピュータプログラム |
US20060292295A1 (en) | 2005-06-25 | 2006-12-28 | O-Jun Kwon | Coating apparatus and method of fabricating liquid crystal display device using the same |
Also Published As
Publication number | Publication date |
---|---|
TWI308085B (ko) | 2009-04-01 |
KR20070033279A (ko) | 2007-03-26 |
CN100569686C (zh) | 2009-12-16 |
JP2007083131A (ja) | 2007-04-05 |
JP4803714B2 (ja) | 2011-10-26 |
CN1935722A (zh) | 2007-03-28 |
TW200716264A (en) | 2007-05-01 |
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