KR100606571B1 - 플라즈마 처리장치 - Google Patents
플라즈마 처리장치 Download PDFInfo
- Publication number
- KR100606571B1 KR100606571B1 KR1020040079419A KR20040079419A KR100606571B1 KR 100606571 B1 KR100606571 B1 KR 100606571B1 KR 1020040079419 A KR1020040079419 A KR 1020040079419A KR 20040079419 A KR20040079419 A KR 20040079419A KR 100606571 B1 KR100606571 B1 KR 100606571B1
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- KR
- South Korea
- Prior art keywords
- electrode
- processing apparatus
- plasma processing
- insulating member
- ceramic plate
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Abstract
Description
Claims (3)
- 플라즈마 처리장치에 있어서,상기 플라즈마 처리장치내 상부 영역에 마련되는 상부 전극;상기 상부 전극과 대향된 하부 영역에 마련되되 최하부에 구비된 제 1세라믹판과 제 1절연부재와 냉각판과 전극이 순차적으로 적층되게 형성된 전극부;상기 전극부의 양측면과 전극의 가장자리 부근에 마련되는 제 2절연부재;상기 제 2절연부재의 상부 영역 모서리와 양측면에 각각 마련되어 체결하는 제 2세라믹판;을 구비한 것을 특징으로 하는 플라즈마 처리장치.
- 제 1항에 있어서,상기 제 2절연부재는 그 단면 형상이 일체형의 "ㄱ"자로 형성된 것을 특징으로 하는 플라즈마 처리장치.
- 제 1항에 있어서,상기 제 2절연부재는 그 단면 형상이 "ㄱ"자 형상이면서 수평부와, 상기 수평부의 일측에서 하방으로 연장되는 연장부로 이루어져 결합되는 것을 특징으로 하는 플라즈마 처리장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040079419A KR100606571B1 (ko) | 2004-10-06 | 2004-10-06 | 플라즈마 처리장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020040079419A KR100606571B1 (ko) | 2004-10-06 | 2004-10-06 | 플라즈마 처리장치 |
Publications (2)
Publication Number | Publication Date |
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KR20060030586A KR20060030586A (ko) | 2006-04-11 |
KR100606571B1 true KR100606571B1 (ko) | 2006-07-28 |
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KR1020040079419A KR100606571B1 (ko) | 2004-10-06 | 2004-10-06 | 플라즈마 처리장치 |
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KR (1) | KR100606571B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023034480A1 (en) * | 2021-09-03 | 2023-03-09 | Applied Materials, Inc. | Shutter disk for physical vapor deposition (pvd) chamber |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101367920B1 (ko) * | 2007-05-18 | 2014-03-03 | 엘아이지에이디피 주식회사 | 플라즈마 처리장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05114583A (ja) * | 1991-10-22 | 1993-05-07 | Anelva Corp | ドライエツチング装置 |
JP2000173988A (ja) | 1998-12-01 | 2000-06-23 | Sumitomo Metal Ind Ltd | 基板保持台、及びプラズマ処理装置 |
JP2005136350A (ja) | 2003-10-31 | 2005-05-26 | Tokyo Electron Ltd | 静電吸着装置、プラズマ処理装置及びプラズマ処理方法 |
-
2004
- 2004-10-06 KR KR1020040079419A patent/KR100606571B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05114583A (ja) * | 1991-10-22 | 1993-05-07 | Anelva Corp | ドライエツチング装置 |
JP2000173988A (ja) | 1998-12-01 | 2000-06-23 | Sumitomo Metal Ind Ltd | 基板保持台、及びプラズマ処理装置 |
JP2005136350A (ja) | 2003-10-31 | 2005-05-26 | Tokyo Electron Ltd | 静電吸着装置、プラズマ処理装置及びプラズマ処理方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2023034480A1 (en) * | 2021-09-03 | 2023-03-09 | Applied Materials, Inc. | Shutter disk for physical vapor deposition (pvd) chamber |
Also Published As
Publication number | Publication date |
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KR20060030586A (ko) | 2006-04-11 |
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