KR100582900B1 - 금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 - Google Patents
금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 Download PDFInfo
- Publication number
- KR100582900B1 KR100582900B1 KR1020040041679A KR20040041679A KR100582900B1 KR 100582900 B1 KR100582900 B1 KR 100582900B1 KR 1020040041679 A KR1020040041679 A KR 1020040041679A KR 20040041679 A KR20040041679 A KR 20040041679A KR 100582900 B1 KR100582900 B1 KR 100582900B1
- Authority
- KR
- South Korea
- Prior art keywords
- thin film
- metal thin
- oxide layer
- black oxide
- solution
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B25/00—Phosphorus; Compounds thereof
- C01B25/16—Oxyacids of phosphorus; Salts thereof
- C01B25/26—Phosphates
- C01B25/38—Condensed phosphates
- C01B25/42—Pyrophosphates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/07—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Chemical Treatment Of Metals (AREA)
Abstract
Description
또한, 금속박막에 흑색산화층을 형성하기 위한 용액은 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g, 아미노산류(Amino Acids) 0.2 ∼10g 및 피로인산계(Copper Pyrophosphate) 0.1∼10g을 혼합한다.
Claims (6)
- 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g 및 아미노산류(Amino Acids) 0.2 ∼10g을 혼합한 것을 특징으로 하는 금속박막에 흑색산화층을 형성하기 위한 용액.
- 물 1ℓ에 대하여 아염소산염류(Alkali Metal Chlorite) 30∼100g, 수산화나트륨(Sodium Hydroxide) 10∼30g, 인산소다류(Trialkali Metal Phosphate) 0.1∼10g, 에틸렌 글리콜류(Ethlene Glycol) 0.1∼0.4g, 염산(Hydrochloric Acid) 0.01∼10g, 아미노산류(Amino Acids) 0.2 ∼10g 및 피로인산계(Copper Pyrophosphate) 0.1∼10g을 혼합한 것을 특징으로 하는 금속박막에 흑색산화층을 형성하기 위한 용액.
- 삭제
- 제 1 항 또는 제 2 항에 따른 용액을 40∼90℃로 유지한 후, 메쉬가 형성된 Cu제의 금속박막을 상기 용액에 30초∼10분 동안 침적시켜 상기 금속박막의 상,하면 및 상기 메쉬를 형성하는 상기 금속박막의 측면 중 어느 한면 이상에 흑색산화층을 형성하는 것을 특징으로 하는 전자파 차폐필터의 금속박막에 흑색산화층을 형성하는 방법.
- 제 4 항에 따른 방법에 의하여 제조된 흑색산화층을 구비하는 것을 특징으로 하는 전자파 차폐필터의 금속박막.
- 삭제
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040041679A KR100582900B1 (ko) | 2004-06-08 | 2004-06-08 | 금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 |
JP2005121852A JP4053055B2 (ja) | 2004-06-08 | 2005-04-20 | 金属薄膜に黒色酸化層を形成させるための溶液、その溶液を用いた電磁波遮蔽フィルターの金属薄膜に黒色酸化層を形成させる方法、及び、その方法により形成された黒色酸化層を備えた電磁波遮蔽フィルター |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040041679A KR100582900B1 (ko) | 2004-06-08 | 2004-06-08 | 금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050116570A KR20050116570A (ko) | 2005-12-13 |
KR100582900B1 true KR100582900B1 (ko) | 2006-05-25 |
Family
ID=35585481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020040041679A KR100582900B1 (ko) | 2004-06-08 | 2004-06-08 | 금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4053055B2 (ko) |
KR (1) | KR100582900B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101432144B1 (ko) * | 2013-01-16 | 2014-08-20 | 박범호 | 터치패널용 메탈메쉬의 금속 표면을 흑화 처리하기 위한 흡광층 조성물 및 흡광층 형성방법 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101360606B (zh) * | 2005-12-16 | 2011-04-20 | Lg化学株式会社 | 制备导电图的方法及使用该方法制备的导电图 |
JP2009097034A (ja) * | 2007-10-16 | 2009-05-07 | Hitachi Chem Co Ltd | 銅の表面処理法 |
JP6220145B2 (ja) * | 2013-04-11 | 2017-10-25 | 日本ニュークローム株式会社 | 銅系金属表面の青色着色処理方法 |
DE102021206711A1 (de) * | 2021-06-29 | 2022-12-29 | Aktiebolaget Skf | Bauteil |
-
2004
- 2004-06-08 KR KR1020040041679A patent/KR100582900B1/ko active IP Right Grant
-
2005
- 2005-04-20 JP JP2005121852A patent/JP4053055B2/ja not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101432144B1 (ko) * | 2013-01-16 | 2014-08-20 | 박범호 | 터치패널용 메탈메쉬의 금속 표면을 흑화 처리하기 위한 흡광층 조성물 및 흡광층 형성방법 |
Also Published As
Publication number | Publication date |
---|---|
KR20050116570A (ko) | 2005-12-13 |
JP4053055B2 (ja) | 2008-02-27 |
JP2005350767A (ja) | 2005-12-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69630004T2 (de) | Plasmaanzeigetafel geeignet für Anzeige hoher Qualität | |
KR100582900B1 (ko) | 금속박막에 흑색산화층을 형성하기 위한 용액, 이를이용한 전자파 차폐필터의 금속박막에 흑색산화층을형성하는 방법 및 이에 의해 형성된 전자파 차폐필터의금속박막 | |
CN104002515B (zh) | 复合式双面黑色铜箔及其制造方法 | |
KR20050044319A (ko) | 도전막 및 그 제조방법, 그리고 그것을 구비한 기재 | |
KR100581856B1 (ko) | 다용도 필터를 구비한 플라즈마 디스플레이 패널 | |
US6084343A (en) | Display device comprising an anti-static, anti-reflection filter and a method of manufacturing an anti-reflection filter on a cathode ray tube | |
US20020155390A1 (en) | Method for manufacturing black matrix of plasma display panel | |
KR100397076B1 (ko) | 발광형 평판표시소자용 고분자 칼라필터 필름제조방법 | |
KR20020007872A (ko) | 전자파차폐용 투광성 도전막 및 그 제조방법 | |
JP4168715B2 (ja) | 表示装置 | |
KR20070052520A (ko) | 디스플레이 장치용 필터 및 이를 구비한 플라즈마디스플레이 패널 | |
JPWO2005067362A1 (ja) | 電磁波シールドフィルタ用銅箔及び電磁波シールドフィルタ | |
KR20050106622A (ko) | 플라즈마 표시장치 및 그 제조방법 | |
KR100705809B1 (ko) | 플라즈마 디스플레이 패널 | |
JP3397680B2 (ja) | 導電性反射防止膜の製造方法と陰極線管の製造方法 | |
CN101271815A (zh) | 平板显示面板及其驱动方法 | |
KR100744741B1 (ko) | 플라즈마 디스플레이 패널 | |
KR102344396B1 (ko) | 흑화 흡광층용 조성물 | |
JPH11307017A (ja) | 陰極線管及びその製造方法 | |
KR101233590B1 (ko) | 교류형 플라즈마 디스플레이 패널용 전면판 | |
KR100320475B1 (ko) | 플라즈마 디스플레이 패널의 보호막 형성방법 | |
KR20070037273A (ko) | 플라즈마 디스플레이 패널과 그 제조 방법 | |
JP3982568B2 (ja) | プラズマディスプレイパネルの製造方法 | |
JP2010039310A (ja) | プラズマディスプレイパネル及びプラズマディスプレイ装置 | |
KR200262588Y1 (ko) | 전광판용 교류구동형 플라즈마 표시소자의 다기능 상판구조 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130222 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20140407 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20150310 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20160510 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20180510 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20190510 Year of fee payment: 14 |