KR100553245B1 - 감광성 수지 조성물 - Google Patents
감광성 수지 조성물 Download PDFInfo
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- KR100553245B1 KR100553245B1 KR1020010043145A KR20010043145A KR100553245B1 KR 100553245 B1 KR100553245 B1 KR 100553245B1 KR 1020010043145 A KR1020010043145 A KR 1020010043145A KR 20010043145 A KR20010043145 A KR 20010043145A KR 100553245 B1 KR100553245 B1 KR 100553245B1
- Authority
- KR
- South Korea
- Prior art keywords
- derivative
- resin composition
- photosensitive resin
- formula
- photopolymerizable monomer
- Prior art date
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- 239000000203 mixture Substances 0.000 title description 6
- 239000000178 monomer Substances 0.000 claims abstract description 44
- -1 β-unsaturated carbonyl derivative compound Chemical class 0.000 claims abstract description 36
- 229920000642 polymer Polymers 0.000 claims abstract description 31
- 239000011230 binding agent Substances 0.000 claims abstract description 30
- 239000011342 resin composition Substances 0.000 claims abstract description 30
- 229920000570 polyether Polymers 0.000 claims abstract description 19
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 claims abstract description 18
- 125000005359 phenoxyalkyl group Chemical group 0.000 claims abstract description 15
- 229920002635 polyurethane Polymers 0.000 claims abstract description 13
- 239000004814 polyurethane Substances 0.000 claims abstract description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 11
- 239000002202 Polyethylene glycol Substances 0.000 claims abstract description 8
- 229920001223 polyethylene glycol Polymers 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 5
- 229920001577 copolymer Polymers 0.000 claims abstract description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims abstract description 5
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 claims abstract description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004698 Polyethylene Substances 0.000 claims abstract description 3
- 239000004743 Polypropylene Substances 0.000 claims abstract description 3
- 150000002334 glycols Chemical group 0.000 claims abstract description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 3
- 239000001257 hydrogen Substances 0.000 claims abstract description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229920000573 polyethylene Polymers 0.000 claims abstract description 3
- 229920001155 polypropylene Polymers 0.000 claims abstract description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 19
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 10
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 125000000524 functional group Chemical group 0.000 claims description 5
- 229920000728 polyester Polymers 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- GDOBGDUGIFUCJV-UHFFFAOYSA-N 2,2-dimethylbutane;2-methylprop-2-enoic acid Chemical class CCC(C)(C)C.CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O GDOBGDUGIFUCJV-UHFFFAOYSA-N 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000005442 diisocyanate group Chemical group 0.000 claims description 2
- 238000002425 crystallisation Methods 0.000 claims 1
- 230000008025 crystallization Effects 0.000 claims 1
- 125000004386 diacrylate group Chemical group 0.000 abstract description 10
- 230000007423 decrease Effects 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 description 17
- 230000008569 process Effects 0.000 description 17
- 150000001875 compounds Chemical class 0.000 description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 15
- 239000010949 copper Substances 0.000 description 14
- 230000035945 sensitivity Effects 0.000 description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 13
- 229910052802 copper Inorganic materials 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 11
- 239000012965 benzophenone Substances 0.000 description 11
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- VNJOEUSYAMPBAK-UHFFFAOYSA-N 2-methylbenzenesulfonic acid;hydrate Chemical compound O.CC1=CC=CC=C1S(O)(=O)=O VNJOEUSYAMPBAK-UHFFFAOYSA-N 0.000 description 5
- OAZWDJGLIYNYMU-UHFFFAOYSA-N Leucocrystal Violet Chemical compound C1=CC(N(C)C)=CC=C1C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 OAZWDJGLIYNYMU-UHFFFAOYSA-N 0.000 description 5
- NNBFNNNWANBMTI-UHFFFAOYSA-M brilliant green Chemical compound OS([O-])(=O)=O.C1=CC(N(CC)CC)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](CC)CC)C=C1 NNBFNNNWANBMTI-UHFFFAOYSA-M 0.000 description 5
- 229910003460 diamond Inorganic materials 0.000 description 5
- 239000010432 diamond Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 229920005596 polymer binder Polymers 0.000 description 5
- 239000002491 polymer binding agent Substances 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- 239000001294 propane Substances 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 4
- 229920002125 Sokalan® Polymers 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229940043375 1,5-pentanediol Drugs 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- LLQHSBBZNDXTIV-UHFFFAOYSA-N 6-[5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-4,5-dihydro-1,2-oxazol-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC1CC(=NO1)C1=CC2=C(NC(O2)=O)C=C1 LLQHSBBZNDXTIV-UHFFFAOYSA-N 0.000 description 2
- TVEXGJYMHHTVKP-UHFFFAOYSA-N 6-oxabicyclo[3.2.1]oct-3-en-7-one Chemical compound C1C2C(=O)OC1C=CC2 TVEXGJYMHHTVKP-UHFFFAOYSA-N 0.000 description 2
- DSNYFFJTZPIKFZ-UHFFFAOYSA-N CCCOc1ccccc1 Chemical compound CCCOc1ccccc1 DSNYFFJTZPIKFZ-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- WCVRQHFDJLLWFE-UHFFFAOYSA-N pentane-1,2-diol Chemical compound CCCC(O)CO WCVRQHFDJLLWFE-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 0 C*Oc1ccccc1 Chemical compound C*Oc1ccccc1 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 125000006575 electron-withdrawing group Chemical group 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 238000011165 process development Methods 0.000 description 1
- 239000008262 pumice Substances 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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Abstract
Description
조 성 | 실시예 | 비교예 | |||
1 | 2 | 1 | 2 | ||
바인더 폴리머 | 바인더 폴리머 A | 60 | - | 60 | - |
바인더 폴리머 B | - | 60 | - | 60 | |
광개시제 | 벤조페논 | 2.0 | 2.0 | 2.0 | 2.0 |
4,4'-(비스디에틸아미노)벤조페논 | 1.0 | 1.0 | 1.0 | 1.0 | |
루코 크리스탈 바이올렛 | 3.0 | 3.0 | 3.0 | 3.0 | |
톨루엔 술폰산 1수화물 | 0.5 | 0.5 | 0.5 | 0.5 | |
다이아몬드 그린 GH | 0.5 | 0.5 | 0.5 | 0.5 | |
광중합성 단량체 | 9G | 5.0 | 5.0 | 20.0/3 | 20.0/3 |
APG-400 | 5.0 | 5.0 | 20.0/3 | 20.0/3 | |
BPE-500 | 5.0 | 5.0 | 20.0/3 | 20.0/3 | |
PA-1 | 5.0 | 5.0 | - | - | |
용매 | 메틸에틸케톤 | 13.0 | 13.0 | 13.0 | 13.0 |
(주) 바인더 폴리머 A: KOLON KBIP-3, 바인더 폴리머 B: KOLON KBIP-7 루코 크리스탈 바이올렛: 4,4',4''-트리스(디메틸아미노)트리페닐메탄, Hodogaya Chemical Co., Ltd 제품 다이아몬드 그린 GH: Hodogaya Chemical Co., Ltd 제품 9G: 폴리에틸렌 글리콜 #400 디메타크릴레이트, 신나카무라 케미컬사 제품 APG-400: 폴리프로필렌 글리콜 #400 디아크릴레이트, 신나카무라 케미컬사 제품 BPE-500: 2-2, 비스[4-(메타크릴옥시 폴리에톡시)페닐]프로판, 신나카무라 케미컬사 제품 PA-1: 중 Y가 이고, R1, R2는 CH3인 화합물 |
조 성 | 실시예 | 비교예 | |||
3 | 4 | 1 | 2 | ||
바인더 폴리머 | 바인더 폴리머 A | 60 | - | 60 | - |
바인더 폴리머 B | - | 60 | - | 60 | |
광개시제 | 벤조페논 | 2.0 | 2.0 | 2.0 | 2.0 |
4,4'-(비스디에틸아미노)벤조페논 | 1.0 | 1.0 | 1.0 | 1.0 | |
루코 크리스탈 바이올렛 | 3.0 | 3.0 | 3.0 | 3.0 | |
톨루엔 술폰산 1수화물 | 0.5 | 0.5 | 0.5 | 0.5 | |
다이아몬드 그린 GH | 0.5 | 0.5 | 0.5 | 0.5 | |
광중합성 단량체 | 9G | 5.0 | 5.0 | 20.0/3 | 20.0/3 |
APG-400 | 5.0 | 5.0 | 20.0/3 | 20.0/3 | |
BPE-500 | 5.0 | 5.0 | 20.0/3 | 20.0/3 | |
PA-2 | 5.0 | 5.0 | - | - | |
용매 | 메틸에틸케톤 | 13.0 | 13.0 | 13.0 | 13.0 |
(주) 바인더 폴리머 A: KOLON KBIP-3, 바인더 폴리머 B: KOLON KBIP-7 루코 크리스탈 바이올렛: 4,4',4''-트리스(디메틸아미노)트리페닐메탄, Hodogaya Chemical Co., Ltd 제품 다이아몬드 그린 GH: Hodogaya Chemical Co., Ltd 제품 9G: 폴리에틸렌 글리콜 #400 디메타크릴레이트, 신나카무라 케미컬사 제품 APG-400: 폴리프로필렌 글리콜 #400 디아크릴레이트, 신나카무라 케미컬사 제품 BPE-500: 2-2, 비스[4-(메타크릴옥시 폴리에톡시)페닐]프로판, 신나카무라 케미컬사 제품 PA-2: 중 Y가 (m=9, n=6)이고, R1, R2는 CH3인 화합물 |
조 성 | 실시예 | 비교예 | |||
5 | 6 | 7 | 1 | ||
바인더 폴리머 | 바인더 폴리머 A | 60 | 60 | 60 | 60 |
광개시제 | 벤조페논 | 2.0 | 2.0 | 2.0 | 2.0 |
4,4'-(비스디에틸아미노)벤조페논 | 1.0 | 1.0 | 1.0 | 1.0 | |
루코 크리스탈 바이올렛 | 3.0 | 3.0 | 3.0 | 3.0 | |
톨루엔 술폰산 1수화물 | 0.5 | 0.5 | 0.5 | 0.5 | |
다이아몬드 그린 GH | 0.5 | 0.5 | 0.5 | 0.5 | |
광중합성 단량체 | 9G | 5.0 | 5.0 | 5.0 | 20.0/3 |
APG-400 | 5.0 | 5.0 | 5.0 | 20.0/3 | |
BPE-500 | 5.0 | 5.0 | 5.0 | 20.0/3 | |
PA-3 | 5.0 | - | - | - | |
PA-4 | - | 5.0 | - | - | |
PA-5 | - | - | 5.0 | - | |
용매 | 메틸에틸케톤 | 13.0 | 13.0 | 13.0 | 13.0 |
(주) 바인더 폴리머 A: KOLON KBIP-3, 바인더 폴리머 B: KOLON KBIP-7 루코 크리스탈 바이올렛: 4,4',4''-트리스(디메틸아미노)트리페닐메탄, Hodogaya Chemical Co., Ltd 제품 다이아몬드 그린 GH: Hodogaya Chemical Co., Ltd 제품 9G: 폴리에틸렌 글리콜 #400 디메타크릴레이트, 신나카무라 케미컬사 제품 APG-400: 폴리프로필렌 글리콜 #400 디아크릴레이트, 신나카무라 케미컬사 제품 BPE-500: 2-2, 비스[4-(메타크릴옥시 폴리에톡시)페닐]프로판, 신나카무라 케미컬사 제품 PA-3: 중 Y가 (m=9,n=6)이고, R1, R2는 CH3인 화합물 PA-4: 중 Y가 (m=9,n=6)이고, R1, R2는 CH3인 화합물 PA-5: 중 Y가 (l=3,m=1,n=3)이고, R1, R2는 CH3인 화합물 |
조 성 | 실시예 | 비교예 | |||
8 | 9 | 10 | 1 | ||
바인더 폴리머 | 바인더 폴리머 A | 60 | 60 | 60 | 60 |
광개시제 | 벤조페논 | 2.0 | 2.0 | 2.0 | 2.0 |
4,4'-(비스디에틸아미노)벤조페논 | 1.0 | 1.0 | 1.0 | 1.0 | |
루코 크리스탈 바이올렛 | 3.0 | 3.0 | 3.0 | 3.0 | |
톨루엔 술폰산 1수화물 | 0.5 | 0.5 | 0.5 | 0.5 | |
다이아몬드 그린 GH | 0.5 | 0.5 | 0.5 | 0.5 | |
광중합성 단량체 | 9G | 5.0 | 5.0 | 5.0 | 20.0/3 |
APG-400 | 5.0 | 5.0 | 5.0 | 20.0/3 | |
BPE-500 | 5.0 | 5.0 | 5.0 | 20.0/3 | |
PA-6 | 5.0 | - | - | - | |
PA-7 | - | 5.0 | - | - | |
PA-8 | - | 5.0 | - | ||
용매 | 메틸에틸케톤 | 13.0 | 13.0 | 13.0 | 13.0 |
(주) 바인더 폴리머 A: KOLON KBIP-3, 바인더 폴리머 B: KOLON KBIP-7 루코 크리스탈 바이올렛: 4,4',4''-트리스(디메틸아미노)트리페닐메탄, Hodogaya Chemical Co., Ltd 제품 다이아몬드 그린 GH: Hodogaya Chemical Co., Ltd 제품 9G: 폴리에틸렌 글리콜 #400 디메타크릴레이트, 신나카무라 케미컬사 제품 APG-400: 폴리프로필렌 글리콜 #400 디아크릴레이트, 신나카무라 케미컬사 제품 BPE-500: 2-2, 비스[4-(메타크릴옥시 폴리에톡시)페닐]프로판, 신나카무라 케미컬사 제품 PA-6, 7, 8: 중 Y가 (m=9, n=5)이며, 페닐기의 수소원자 중 하나가 -OCH3로 치환된 화합물(PA-6), -NO3로 치환된 화합물(PA-7), -NH2로 치환된 화합물(PA-8) |
조 성 | 실시예 11 | 비교예 1 | |
바인더 폴리머 | 바인더 폴리머 A | 60 | 60 |
광개시제 | 벤조페논 | 2.0 | 2.0 |
4,4'-(비스디에틸아미노)벤조페논 | 1.0 | 1.0 | |
루코 크리스탈 바이올렛 | 3.0 | 3.0 | |
톨루엔 술폰산 1수화물 | 0.5 | 0.5 | |
다이아몬드 그린 GH | 0.5 | 0.5 | |
광중합성 단량체 | 9G | 5.0 | 20.0/3 |
APG-400 | 5.0 | 20.0/3 | |
BPE-500 | 5.0 | 20.0/3 | |
PA-9 | 5.0 | - | |
용매 | 메틸에틸케톤 | 13.0 | 13.0 |
(주) 바인더 폴리머 A: KOLON KBIP-3, 바인더 폴리머 B: KOLON KBIP-7 루코 크리스탈 바이올렛: 4,4',4''-트리스(디메틸아미노)트리페닐메탄, Hodogaya Chemical Co., Ltd 제품 다이아몬드 그린 GH: Hodogaya Chemical Co., Ltd 제품 9G: 폴리에틸렌 글리콜 #400 디메타크릴레이트, 신나카무라 케미컬사 제품 APG-400: 폴리프로필렌 글리콜 #400 디아크릴레이트, 신나카무라 케미컬사 제품 BPE-500: 2-2, 비스[4-(메타크릴옥시 폴리에톡시)페닐]프로판, 신나카무라 케미컬사 제품 PA-9: 중 Y가 (여기서 R4는 (X=5), R5는 -(CH2)4-, R6는 -(CH2)6-이고, R1, R2는 CH3인 화합물 |
노광량(1) (mJ/㎠) | 실 시 예 | 비 교 예 | |||
1 | 2 | 1 | 2 | ||
감도(2) (Stouffer 21) | 30 | 7.5 | 7.5 | 8.0 | 8.0 |
50 | 8.5 | 8.7 | 9.0 | 9.0 | |
70 | 9.5 | 9.8 | 10.0 | 10.0 | |
해상도(㎛) (Line/Space=1/1) | 30 | 57 | 60 | 57 | 57 |
50 | 60 | 65 | 62 | 63 | |
70 | 65 | 70 | 65 | 70 | |
세선밀착력(㎛) | 30 | 35 | 33 | 40 | 40 |
50 | 28 | 25 | 35 | 35 | |
70 | 22 | 23 | 30 | 30 | |
최소현상시간(sec) | 20 | 22 | 17 | 19 | |
포토레지스트의 두께: 30㎛ 현상시 조건: 현상액 Na2CO3 농도 1중량%, 30℃, 스프레이 압력 1.5kg/㎠, 파단점 50% (1)아트워크 밑에서 포토레지스트가 받는 노광량(mJ/㎠) (2)감도는 Stouffer 21단 Step tablet을 사용하여 평가하였으며, 평가기준은 Clear Copper 기준이다. |
노광량(1) (mJ/㎠) | 실 시 예 | 비 교 예 | |||
3 | 4 | 1 | 2 | ||
감도(2) (Stouffer 21) | 30 | 7.7 | 7.5 | 8.0 | 8.0 |
50 | 9.0 | 9.0 | 9.0 | 9.0 | |
70 | 9.8 | 9.7 | 10.0 | 10.0 | |
해상도(㎛) (Line/Space=1/1) | 30 | 59 | 57 | 57 | 57 |
50 | 60 | 63 | 62 | 63 | |
70 | 65 | 72 | 65 | 70 | |
세선밀착력(㎛) | 30 | 33 | 31 | 40 | 40 |
50 | 26 | 23 | 35 | 35 | |
70 | 20 | 18 | 30 | 30 | |
최소현상시간(sec) | 25 | 27 | 17 | 19 | |
포토레지스트의 두께: 30㎛ 현상시 조건: 현상액 Na2CO3 농도 1중량%, 30℃, 스프레이 압력 1.5kg/㎠, 파단점 50% (1)아트워크 밑에서 포토레지스트가 받는 노광량(mJ/㎠) (2)감도는 Stouffer 21단 Step tablet을 사용하여 평가하였으며, 평가기준은 Clear Copper 기준이다. |
노광량(1) (mJ/㎠) | 실 시 예 | 비 교 예 | |||
5 | 6 | 7 | 1 | ||
감도(2) (Stouffer 21) | 30 | 7.5 | 7.7 | 8.2 | 8.0 |
50 | 9.0 | 8.8 | 9.0 | 9.0 | |
70 | 10.0 | 9.8 | 10.3 | 10.0 | |
해상도(㎛) (Line/Space=1/1) | 30 | 58 | 58 | 60 | 57 |
50 | 62 | 60 | 62 | 62 | |
70 | 65 | 68 | 70 | 65 | |
세선밀착력(㎛) | 30 | 33 | 33 | 30 | 40 |
50 | 25 | 26 | 23 | 35 | |
70 | 23 | 25 | 18 | 30 | |
최소현상시간(sec) | 20 | 22 | 25 | 17 | |
포토레지스트의 두께: 30㎛ 현상시 조건: 현상액 Na2CO3 농도 1중량%, 30℃, 스프레이 압력 1.5kg/㎠, 파단점 50% (1)아트워크 밑에서 포토레지스트가 받는 노광량(mJ/㎠) (2)감도는 Stouffer 21단 Step tablet을 사용하여 평가하였으며, 평가기준은 Clear Copper 기준이다. |
노광량(1) (mJ/㎠) | 실 시 예 | 비 교 예 | |||
8 | 9 | 10 | 1 | ||
감도(2) (Stouffer 21) | 30 | 8.2 | 7.0 | 7.2 | 8.0 |
50 | 9.3 | 8.2 | 7.8 | 9.0 | |
70 | 10.0 | 9.3 | 9.0 | 10.0 | |
해상도(㎛) (Line/Space=1/1) | 30 | 57 | 52 | 54 | 57 |
50 | 65 | 57 | 58 | 62 | |
70 | 67 | 62 | 62 | 65 | |
세선밀착력(㎛) | 30 | 33 | 33 | 30 | 40 |
50 | 26 | 28 | 27 | 35 | |
70 | 24 | 26 | 20 | 30 | |
최소현상시간(sec) | 23 | 25 | 24 | 17 | |
포토레지스트의 두께: 30㎛ 현상시 조건: 현상액 Na2CO3 농도 1중량%, 30℃, 스프레이 압력 1.5kg/㎠, 파단점 50% (1)아트워크 밑에서 포토레지스트가 받는 노광량(mJ/㎠) (2)감도는 Stouffer 21단 Step tablet을 사용하여 평가하였으며, 평가기준은 Clear Copper 기준이다. |
노광량(1) (mJ/㎠) | 실시예 11 | 비교예 1 | |
감도(2) (Stouffer 21) | 30 | 8.0 | 8.0 |
50 | 9.0 | 9.0 | |
70 | 10.2 | 10.0 | |
해상도(㎛) (Line/Space=1/1) | 30 | 55 | 57 |
50 | 60 | 62 | |
70 | 67 | 65 | |
세선밀착력(㎛) | 30 | 30 | 40 |
50 | 27 | 35 | |
70 | 18 | 30 | |
최소현상시간(sec) | 23 | 17 | |
포토레지스트의 두께: 30㎛ 현상시 조건: 현상액 Na2CO3 농도 1중량%, 30℃, 스프레이 압력 1.5kg/㎠, 파단점 50% (1)아트워크 밑에서 포토레지스트가 받는 노광량(mJ/㎠) (2)감도는 Stouffer 21단 Step tablet을 사용하여 평가하였으며, 평가기준은 Clear Copper 기준이다. |
Claims (7)
- 바인더 폴리머, 다관능성 α,β-불포화 카르보닐 유도체 화합물을 포함하는 광중합성 모노머 및 광개시제를 포함하는 감광성 수지조성물에 있어서,상기 다관능성 α,β-불포화 카르보닐 유도체 화합물은 다음 화학식 1 또는 2로 표시되는 페녹시 알킬류 또는 페녹시 폴리에테르류를 포함하며 말단에 메타크릴레이트기를 갖는 디아크릴레이트 또는 트리아크릴레이트, 또는 폴리우레탄 아크릴레이트인 것임을 특징으로 하는 감광성 수지조성물.화학식 1상기 식에서, R1, R2는 서로 같거나 다른 것으로서 수소원자 또는 메틸기이고, Y는 페녹시알킬 또는 페녹시폴리에틸렌글리콜이 치환된 폴리에틸렌 글리콜 유도체, 폴리프로필렌 유도체, 폴리에틸렌과 프로필렌의 공중합 유도체, 알킬, 그리고 폴리우레탄 유도체를 나타낸다.화학식 2상기 식에서, R3는 수소원자 또는 메틸기이고, Y는 상기 화학식 1에서 정의된 바와 같다.
- 제 1 항에 있어서, 광중합성 모노머는 주사슬 구조가 폴리에테르디메타크릴레이트 유도체, 에톡시레이티드 비스페놀 디메타크릴레이트 유도체, 에톡시레이티드 트리메틸 프로판 트리메타크릴레이트 및 알킬 디메타크릴레이트 유도체로 이루어진 군으로부터 선택된 것임을 특징으로 하는 감광성 수지조성물.
- (정정)제 1 항에 있어서, 광중합성 모노머와 바인더 폴리머는 10:90∼60:40중량비로 포함되는 것임을 특징으로 하는 감광성 수지조성물.
- (정정)제 1 항에 있어서, 화학식 1 또는 2로 표시되는 다관능성 α,β-불포화 카르보닐 유도체 화합물을 포함하는 광중합성 모노머는 전체 감광성 수지조성물 중 10∼35중량%로 함유되는 것임을 특징으로 하는 감광성 수지조성물.
- (2회정정)제 1 항에 있어서, 페녹시는 페닐기에 있어서 C-O 결합을 갖는 1번 위치를 제외한 2~6번 위치의 수소원자 중의 적어도 하나가 C,N,O 또는 S 원소를 포함하는 작용기로 치환된 것임을 특징으로 하는 감광성 수지조성물.
- (신설)제 1 항 또는 제 2 항에 있어서, 광중합성 모노머는 화학식 1 또는 2로 표시되는 다관능성 α,β-불포화 카르보닐 유도체 화합물을 전체 광중합성 모노머 중 2 내지 98중량% 되도록 포함하는 것임을 특징으로 하는 감광성 수지조성물.
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