KR100392563B1 - 주변노광장치의 광학계 - Google Patents

주변노광장치의 광학계 Download PDF

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Publication number
KR100392563B1
KR100392563B1 KR10-2000-0058510A KR20000058510A KR100392563B1 KR 100392563 B1 KR100392563 B1 KR 100392563B1 KR 20000058510 A KR20000058510 A KR 20000058510A KR 100392563 B1 KR100392563 B1 KR 100392563B1
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KR
South Korea
Prior art keywords
light
optical system
lens
workpiece
exposure apparatus
Prior art date
Application number
KR10-2000-0058510A
Other languages
English (en)
Korean (ko)
Other versions
KR20010040008A (ko
Inventor
요시다유스케
Original Assignee
가부시키가이샤 오크세이사꾸쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of KR20010040008A publication Critical patent/KR20010040008A/ko
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Publication of KR100392563B1 publication Critical patent/KR100392563B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR10-2000-0058510A 1999-10-08 2000-10-05 주변노광장치의 광학계 KR100392563B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28763399A JP2001110707A (ja) 1999-10-08 1999-10-08 周辺露光装置の光学系
JP11-287633 1999-10-08

Publications (2)

Publication Number Publication Date
KR20010040008A KR20010040008A (ko) 2001-05-15
KR100392563B1 true KR100392563B1 (ko) 2003-07-28

Family

ID=17719767

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2000-0058510A KR100392563B1 (ko) 1999-10-08 2000-10-05 주변노광장치의 광학계

Country Status (3)

Country Link
JP (1) JP2001110707A (ja)
KR (1) KR100392563B1 (ja)
TW (1) TW509974B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001326171A (ja) * 2000-05-18 2001-11-22 Canon Inc 照明装置
KR100437021B1 (ko) * 2001-09-28 2004-06-23 엘지전자 주식회사 기울지 않은 광원을 가지는 노광장치
KR100437022B1 (ko) * 2001-09-28 2004-06-23 엘지전자 주식회사 기울지 않은 광원을 가지는 노광장치
KR100437020B1 (ko) * 2001-09-28 2004-06-23 엘지전자 주식회사 기울지 않은 광원을 가지는 노광장치
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI437618B (zh) 2004-02-06 2014-05-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1881521B1 (en) 2005-05-12 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus and exposure method
WO2007119514A1 (ja) * 2006-04-17 2007-10-25 Nikon Corporation 照明光学装置、露光装置、およびデバイス製造方法
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
KR102627988B1 (ko) 2021-07-28 2024-01-23 유버 주식회사 주변 노광 장치 및 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05347239A (ja) * 1992-06-12 1993-12-27 Canon Inc 投影露光装置及びそれを用いた半導体素子の製造方法
JPH10289865A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置及び投影露光方法
JPH1138341A (ja) * 1997-07-22 1999-02-12 Ricoh Co Ltd マルチビーム走査装置およびマルチビーム走査装置の走査結像光学系

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05347239A (ja) * 1992-06-12 1993-12-27 Canon Inc 投影露光装置及びそれを用いた半導体素子の製造方法
JPH10289865A (ja) * 1997-04-11 1998-10-27 Nikon Corp 投影露光装置及び投影露光方法
JPH1138341A (ja) * 1997-07-22 1999-02-12 Ricoh Co Ltd マルチビーム走査装置およびマルチビーム走査装置の走査結像光学系

Also Published As

Publication number Publication date
KR20010040008A (ko) 2001-05-15
JP2001110707A (ja) 2001-04-20
TW509974B (en) 2002-11-11

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