KR100272515B1 - Reflection panel manufacturing method of reflecting type lcd - Google Patents

Reflection panel manufacturing method of reflecting type lcd Download PDF

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Publication number
KR100272515B1
KR100272515B1 KR1019980001149A KR19980001149A KR100272515B1 KR 100272515 B1 KR100272515 B1 KR 100272515B1 KR 1019980001149 A KR1019980001149 A KR 1019980001149A KR 19980001149 A KR19980001149 A KR 19980001149A KR 100272515 B1 KR100272515 B1 KR 100272515B1
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substrate
photosensitive resin
liquid crystal
crystal display
resin film
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KR1019980001149A
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Korean (ko)
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KR19990065724A (en
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배성준
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구본준
엘지.필립스 엘시디주식회사
론 위라하디락사
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Priority to KR1019980001149A priority Critical patent/KR100272515B1/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Liquid Crystal (AREA)

Abstract

PURPOSE: A method for manufacturing a reflective plate is to reduce a number of process by removing a process of forming an overcoat layer. CONSTITUTION: A photoresist resin is coated on a substrate(11) to form a photoresist resin film(12). After the entire surface of the substrate is covered by a mask(13), a front surface and a rear surface of the substrate are exposed to a light. The mask has a number of circular opening holes. Except for the opening holes of the mask, the substrate is not exposed. The photoresist resin film is dissolved in a developer to form a recessed layer on the substrate. After annealing the substrate, metal such as Al, Mo, Ta or Al alloy is deposited on the recessed layer to form a metallic film. The exposure of the rear surface results from an insulating film having a constant thickness, and the insulating film has a recessed portion to the metallic film.

Description

반사형 액정표시소자의 반사판 제조방법Method for manufacturing reflector of reflective liquid crystal display device

본 발명은 반사형 액정표시소자 반사판에 관한 것으로, 특히 배면노광에 의해 요철공정을 단순화한 반사형 액정표시소자의 반사판 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reflective liquid crystal display element reflection plate, and more particularly, to a method of manufacturing a reflective plate of a reflective liquid crystal display element in which the uneven process is simplified by back exposure.

액정표시소자는 동작모드에 따라, 개략적으로 TN(Twisted Nematic)형, GH(Guest Host)형, ECB(Electrically Controlled Birefringence)형 및 OCB(Optically Compensated Birefringence)형 등으로 나눌 수 있고, 광원의 이용방법에 따라, 백라이트를 이용하는 투과형 액정표시소자와, 외부의 광원을 이용하는 반사형 액정표시소자의 두종류로 분류할 수 있다. 근래에는 백라이트(back light)를 광원으로 사용하는 투과형 액정표시소자가 널리 이용되고 있으나, 이러한 백라이트의 사용은 액정표시소자의 무게와 부피를 증가시킬 뿐만 아니라, 소비전력이 높다는 문제점을 가진다. 백라이트가 내장된 액정표시소자의 상기한 문제점들을 극복하고자, 최근에는 백라이트를 사용하지 않는 반사형 액정표시소자에 대한 연구가 활발하게 진행되고 있다.The liquid crystal display device can be roughly divided into twisted nematic (TN) type, guest host (GH) type, electrically controlled birefringence type (ECB) type, and optically compensated birefringence type (OCB) type according to the operation mode. Accordingly, the present invention can be classified into two types, a transmissive liquid crystal display element using a backlight and a reflective liquid crystal display element using an external light source. Recently, a transmissive liquid crystal display device using a backlight as a light source has been widely used, but the use of such a backlight not only increases the weight and volume of the liquid crystal display device but also has a problem in that power consumption is high. In order to overcome the above-mentioned problems of the liquid crystal display device with a built-in backlight, research on a reflective liquid crystal display device without a backlight has been actively conducted in recent years.

반사형 액정표시소자는 우수한 시야각 특성을 갖기 위해 표면이 요철형상인 반사판을 이용하는데, 도 1a∼1f는 종래의 표면이 요철형상인 반사판 제조방법을 나타낸 도면으로서, 도 1a에 나타내듯이, 기판(1) 위에 스핀코팅(spin coating)에 의해 감광성수지막(2)을 형성하고, 도 1b에 나타내듯이, 감광성수지막(2)을 마스크(3)로 차단하고 감광성수지막(2)의 전면에 자외선을 조사한다. 그 후, 도 1c에 나타내듯이, 감광성수지막(2)을 현상액에 용해시켜 기판(1) 위에 볼록부(4)를 형성한다. 이어서, 도 1d에 나타내듯이, 볼록부(4)에 열처리를 실시하여 표면을 둥글게 형성한다. 그 후, 도 1e에 나타내듯이, 스핀코팅법으로 오버코팅층(5)을 형성하여 연속된 요철 표면을 갖게 한다. 마지막으로, 도 1f에 나타내듯이, Al, Mo, Ta 또는 Al합금 등과 같은 금속을 스퍼터링(sputtering)법으로 적층하여 금속막(6)을 형성한다. 표면이 요철형상으로 된 금속막(6)은 입사광을 여러각으로 산란시키는 역할을 하여 반사판의 산란특성을 향상시킨다.The reflective liquid crystal display device uses a reflective plate having a concave-convex surface in order to have excellent viewing angle characteristics. FIGS. 1A to 1F illustrate a conventional method of manufacturing a reflecting plate having a concave-convex surface, and as shown in FIG. 1) The photosensitive resin film 2 is formed by spin coating on it, and as shown in FIG. 1B, the photosensitive resin film 2 is blocked by the mask 3 and the front surface of the photosensitive resin film 2 is formed. Irradiate UV light. Thereafter, as shown in FIG. 1C, the photosensitive resin film 2 is dissolved in a developing solution to form the convex portion 4 on the substrate 1. Subsequently, as shown in FIG. 1D, the convex portion 4 is subjected to a heat treatment to form a rounded surface. Thereafter, as shown in Fig. 1E, the overcoating layer 5 is formed by spin coating to have a continuous uneven surface. Finally, as shown in Fig. 1F, metals such as Al, Mo, Ta, or Al alloys are laminated by sputtering to form the metal film 6. The metal film 6 having a concave-convex shape on the surface serves to scatter incident light at various angles, thereby improving scattering characteristics of the reflecting plate.

이러한 종래의 반사형 액정표시소자의 반사판 제조방법은 우수한 산란특성을 갖고 재현성이 좋은 반사판을 형성할 수 있다는 장점이 있지만, 연속된 요철면을 갖기 위해 볼록부(4)를 형성한 후 그 위에 오버코트층(5)을 형성하는 단계를 필요로 한다.The reflective plate manufacturing method of the conventional reflective liquid crystal display device has an advantage of forming a reflective plate having excellent scattering characteristics and good reproducibility, but after forming the convex portion 4 to have a continuous uneven surface, the overcoat is formed thereon. Forming layer 5 is required.

본 발명은 상기한 종래기술의 문제점을 감안하여 이루어진 것으로, 배면노광에 의해 종래의 오버코트층을 형성하는 단계를 제거함으로써 공정이 단순화된 반사형 액정표시소자의 반사판 제조방법을 제공하는 것을 목적으로 한다.SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems of the prior art, and an object thereof is to provide a method of manufacturing a reflection plate of a reflective liquid crystal display device by which a process is simplified by eliminating the step of forming a conventional overcoat layer by back exposure. .

상기한 목적을 달성하기 위한 본 발명에 따른 반사형 액정표시소자의 반사판 제조방법은 기판을 준비하는 단계와, 상기 기판 위에 감광성수지막을 형성하는 단계와, 상기 감광성수지막의 기판과 접하지 않은 면을 마스크로 차단한 후 전면노광을 실시하는 단계와, 상기 감광성수지막에 배면노광을 실시하는 단계와, 상기 감광성수지막을 현상액에 용해시켜 요철층을 형성하는 단계와, 상기 요철층 위에 금속막을 형성하는 단계로 이루어진다.Reflective plate manufacturing method of a reflective liquid crystal display device according to the present invention for achieving the above object comprises the steps of preparing a substrate, forming a photosensitive resin film on the substrate, the surface of the photosensitive resin film is not in contact with the substrate Performing front exposure after blocking with a mask; performing back exposure on the photosensitive resin film; dissolving the photosensitive resin film in a developer to form an uneven layer; and forming a metal film on the uneven layer. Consists of steps.

상기 전면노광 및 배면노광은 동시에 실시될 수 있으며, 시간의 전후에 무관하게 실시될 수도 있다.The front exposure and back exposure may be carried out at the same time, it may be carried out irrespective of before and after time.

마스크는 복수의 원모양을 한 개방홀을 가지며 개방홀을 제외한 영역에 의해 전면노광이 차단되게 된다.The mask has a plurality of circular open holes and the front surface exposure is blocked by the area excluding the open holes.

본 발명은 배면노광에 의해 감광성수지막의 밑면에 일정 두께의 절연층을 형성하며 연속된 요철면을 형성함으로써 오버코트층을 형성할 필요가 없다.The present invention does not need to form an overcoat layer by forming an insulating layer having a predetermined thickness on the bottom surface of the photosensitive resin film by back exposure and forming a continuous uneven surface.

도 1a∼도 1f는 종래기술의 반사형 액정표시소자의 반사판 제조방법.1A to 1F illustrate a method of manufacturing a reflecting plate of a reflective liquid crystal display device of the prior art.

도 2a∼도 2e는 본 발명의 반사형 액정표시소자의 반사판 제조방법.2A to 2E illustrate a method of manufacturing a reflecting plate of a reflective liquid crystal display device of the present invention.

-도면의 주요부분에 대한 간단한 설명-Brief description of the main parts of the drawing

11: 기판 12: 감광성수지막11: substrate 12: photosensitive resin film

13: 마스크 13a:개방홀13: mask 13a: opening hole

14: 요철층 15: 금속막14: uneven layer 15: metal film

이하, 본 발명에 따른 반사형 액정표시소자의 반사판 제조방법을 상세히 설명한다.Hereinafter, a method of manufacturing a reflecting plate of a reflective liquid crystal display device according to the present invention will be described in detail.

도 2는 본 발명에 따른 반사형 액정표시소자의 반사판 제조방법을 나타낸 도면으로서, 우선, 도 2a에 나타내듯이, 기판(11) 위에 음성 감광성수지를 스핀코팅하여 감광성수지막(12)을 형성한다.FIG. 2 is a view illustrating a method of manufacturing a reflective plate of a reflective liquid crystal display device according to the present invention. First, as shown in FIG. 2A, a photosensitive resin film 12 is formed by spin coating a negative photosensitive resin on a substrate 11. .

이어서, 도 2b에 나타내듯이, 기판(11)의 전(前)면을 마스크(13)로 차단한 후 전(前)면노광 및 배면노광을 실시한다. 마스크(13)는 복수의 원모양을 한 개방홀(13a)을 가지며, 마스크(13)의 개방홀(13a)을 제외한 영역에서는 전면노광이 차단되게 된다. 배면노광 및 전면노광은 동시에 실시될 수 있고, 시간의 전후에 무관하게 실시될 수도 있으며, 감광성수지막(12)의 빗금친 영역은 노광에 반응한 영역을 나타낸다.Next, as shown in FIG. 2B, the front surface exposure and the back exposure are performed after the front surface of the substrate 11 is blocked by the mask 13. The mask 13 has a plurality of circular openings 13a, and the entire surface of the mask 13 is blocked except for the openings 13a. The back exposure and the front exposure may be performed simultaneously, or may be carried out irrespective of time and time, and the hatched area of the photosensitive resin film 12 represents an area in response to exposure.

이어서, 도 2c에 나타내듯이, 감광성수지막(12)을 현상액에 용해시켜 기판(11) 위에 요철층(14)을 형성한다. 감광성수지막은 음성 감광성수지로 이루어지기 때문에 노광되지 않은 영역은 현상액에 용해되어 제거되게 된다.Subsequently, as shown in FIG. 2C, the photosensitive resin film 12 is dissolved in a developing solution to form the uneven layer 14 on the substrate 11. Since the photosensitive resin film is made of negative photosensitive resin, the unexposed areas are dissolved in the developer and removed.

그 후, 열처리를 실시하여 도 2d에 나타낸 바와 같은 연속된 표면을 갖는 요철층(14)을 형성한다. 이어서, 도 2d에 나타내듯이, Al, Mo, Ta 또는 Al합금 등과 같은 금속을 스퍼터링(sputtering)법으로 적층하여 금속막(15)을 형성한다.Thereafter, heat treatment is performed to form an uneven layer 14 having a continuous surface as shown in FIG. 2D. Subsequently, as shown in FIG. 2D, metals such as Al, Mo, Ta or Al alloys are laminated by sputtering to form a metal film 15.

요철층에 의해 표면이 요철형상으로 된 금속막(15)은 입사광을 여러각으로 산란시키는 역할을 하며, 도면에는 나타내지 않았지만, 박막트랜지스터의 드레인전극과 연결되어 화소전극 역할을 겸한다.The metal film 15 having a concave-convex surface by the concave-convex layer serves to scatter incident light at various angles, and although not shown in the drawing, is connected to the drain electrode of the thin film transistor to serve as a pixel electrode.

배면노광은 요철층(14)의 밑면에 일정한 두께의 절연막을 형성하여, 도면에는 나타내지 않았지만, 금속막(15)과 데이터배선과의 단락을 방지하며 연속된 요철면을 갖게 한다.The back exposure forms an insulating film of a constant thickness on the underside of the uneven layer 14, and although not shown in the figure, prevents short circuit between the metal film 15 and the data wiring and has a continuous uneven surface.

본 발명에 따른 반사형 액정표시소자의 반사판 제조방법은 전면노광과 함께 배면노광을 실시함으로써 오버코트층을 형성하는 공정이 불필요하게 되어, 공정이 단순하게 되고 오버코트층을 위한 추가비용을 절감할 수 있는 장점을 갖는다.In the reflective plate manufacturing method of the reflective liquid crystal display device according to the present invention, the process of forming the overcoat layer is unnecessary by performing the back exposure together with the front exposure, thereby simplifying the process and reducing the additional cost for the overcoat layer. Has an advantage.

Claims (5)

기판을 준비하는 단계와,Preparing a substrate; 상기 기판 위에 감광성수지막을 형성하는 단계와,Forming a photosensitive resin film on the substrate; 상기 감광성수지막의 기판과 접하지 않은 면을 마스크로 차단한 후 전면노광을 실시하는 단계와,Performing a front exposure after blocking the surface not in contact with the substrate of the photosensitive resin film with a mask; 상기 감광성수지막에 배면노광을 실시하는 단계와,Performing a back exposure on the photosensitive resin film; 상기 감광성수지막을 현상액에 용해시켜 요철층을 형성하는 단계와,Dissolving the photosensitive resin film in a developer to form an uneven layer; 상기 요철층 위에 금속막을 형성하는 단계로 이루어진 반사형 액정표시소자의 반사판 제조방법.A reflective plate manufacturing method of a reflective liquid crystal display device comprising the step of forming a metal film on the uneven layer. 제1항에 있어서, 상기 감광성수지막이 음성 감광성수지인 것을 특징으로 하는 반사형 액정표시소자의 반사판 제조방법.The method of manufacturing a reflective plate of a reflective liquid crystal display device according to claim 1, wherein the photosensitive resin film is a negative photosensitive resin. 제1항에 있어서, 상기 요철층을 열처리하는 단계가 추가로 포함된 것을 특징으로 하는 반사형 액정표시소자의 반사판 제조방법.The method of claim 1, further comprising the step of heat-treating the uneven layer. 제1항에 있어서, 상기 전면노광 및 배면노광이 동시에 실시되는 것을 특징으로 하는 반사형 액정표시소자의 반사판 제조방법.The method of manufacturing a reflective plate of a reflective liquid crystal display device according to claim 1, wherein the front exposure and the back exposure are performed simultaneously. 제1항에 있어서, 상기 금속막이 Al, Mo, Ta 또는 Al합금으로 이루어진 것을 특징으로 하는 반사형 액정표시소자의 반사판 제조방법.The method of manufacturing a reflective plate of a reflective liquid crystal display device according to claim 1, wherein the metal film is made of Al, Mo, Ta or Al alloy.
KR1019980001149A 1998-01-16 1998-01-16 Reflection panel manufacturing method of reflecting type lcd KR100272515B1 (en)

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