JPWO2021054136A1 - - Google Patents
Info
- Publication number
- JPWO2021054136A1 JPWO2021054136A1 JP2021546593A JP2021546593A JPWO2021054136A1 JP WO2021054136 A1 JPWO2021054136 A1 JP WO2021054136A1 JP 2021546593 A JP2021546593 A JP 2021546593A JP 2021546593 A JP2021546593 A JP 2021546593A JP WO2021054136 A1 JPWO2021054136 A1 JP WO2021054136A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Valve Device For Special Equipments (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019170522 | 2019-09-19 | ||
PCT/JP2020/033403 WO2021054136A1 (en) | 2019-09-19 | 2020-09-03 | Target |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2021054136A1 true JPWO2021054136A1 (en) | 2021-03-25 |
Family
ID=74883653
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021546593A Pending JPWO2021054136A1 (en) | 2019-09-19 | 2020-09-03 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2021054136A1 (en) |
TW (1) | TWI803774B (en) |
WO (1) | WO2021054136A1 (en) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3666853B2 (en) * | 2001-01-25 | 2005-06-29 | 高橋 研 | Magnetic recording medium, method for manufacturing the same, and magnetic recording apparatus |
US20070253103A1 (en) * | 2006-04-27 | 2007-11-01 | Heraeus, Inc. | Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target |
JP4647724B2 (en) * | 2009-04-17 | 2011-03-09 | Jx日鉱日石金属株式会社 | Barrier film for semiconductor wiring, sintered sputtering target, and sputtering target manufacturing method |
TWI387661B (en) * | 2009-07-22 | 2013-03-01 | China Steel Corp | Manufacturing method of nickel alloy target |
CN104651788B (en) * | 2013-11-21 | 2017-03-15 | 安泰科技股份有限公司 | Ni Fe W alloys targets and its manufacture method |
JP6581780B2 (en) * | 2015-02-09 | 2019-09-25 | 山陽特殊製鋼株式会社 | Ni-based target material with excellent sputtering properties |
MY185510A (en) * | 2015-03-12 | 2021-05-19 | Sanyo Special Steel Co Ltd | Ni-based sputtering target material and magnetic recording medium |
JP7385370B2 (en) * | 2019-05-07 | 2023-11-22 | 山陽特殊製鋼株式会社 | Ni-based sputtering target and magnetic recording medium |
-
2020
- 2020-09-03 WO PCT/JP2020/033403 patent/WO2021054136A1/en active Application Filing
- 2020-09-03 JP JP2021546593A patent/JPWO2021054136A1/ja active Pending
- 2020-09-11 TW TW109131300A patent/TWI803774B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI803774B (en) | 2023-06-01 |
TW202113112A (en) | 2021-04-01 |
WO2021054136A1 (en) | 2021-03-25 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230710 |