TWI387661B - Manufacturing method of nickel alloy target - Google Patents
Manufacturing method of nickel alloy target Download PDFInfo
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- TWI387661B TWI387661B TW98124764A TW98124764A TWI387661B TW I387661 B TWI387661 B TW I387661B TW 98124764 A TW98124764 A TW 98124764A TW 98124764 A TW98124764 A TW 98124764A TW I387661 B TWI387661 B TW I387661B
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本發明係有關於一種靶材之製造方法，詳言之，係關於一種鎳合金靶材之製造方法。The present invention relates to a method for producing a target, and more particularly to a method for producing a nickel alloy target.
參考中國大陸專利第200510104828.2號及第200610076274.4號，其揭示一種粉末冶金的製造技術，其係先以球磨方式將高純度之鎳(Ni)粉及鎢(W)粉混合後，裝入石墨模具中，利用放電等離子燒結法於800~1200℃、壓力控制在30~80MPa、持溫10分鐘，將粉末燒結緻密製得Ni-W合金。該等專利雖能製作出緻密之Ni-W合金，但其採用傳統的粉末混合方式來混合Ni粉與W粉，因Ni密度為8.9g/cm3 ，W密度為19.3g/cm3 ，二者密度相差一倍以上，在利用球磨混粉過程中，密度較大之W粉易與密度較小Ni粉分離，造成粉末混合不均，進一步影響燒結後合金之成分均勻性。Referring to the Chinese Patent No. 200510104828.2 and No. 200610076274.4, it discloses a manufacturing technique of powder metallurgy, which firstly mixes high-purity nickel (Ni) powder and tungsten (W) powder by ball milling, and then loads it into a graphite mold. The Ni-W alloy is obtained by sintering plasma sintering at 800 to 1200 ° C, pressure control at 30 to 80 MPa, and holding temperature for 10 minutes. Although these patents can produce a dense Ni-W alloy, they are mixed with Ni powder and W powder by a conventional powder mixing method because the density of Ni is 8.9 g/cm 3 and the density of W is 19.3 g/cm 3 . The difference in density is more than double. In the process of ball milling, the dense powder W is easily separated from the smaller density Ni powder, resulting in uneven powder mixing, which further affects the uniformity of the alloy composition after sintering.
另外，上述二專利之方法係採用傳統粉末冶金製程，其必需使用價格昂貴之高純度(純度99.99%)且粒度細小(粒度約在3~6μm)之Ni粉及W粉，因此所製備之Ni-W合金成本較高。再者，上述二專利中僅係以球磨方式將Ni粉及W粉進行混粉，Ni粉及W粉在混合時並未合金化，經過燒結後，Ni粉及W粉雖因燒結反應而緻密，但並未完全合金化，仍可明顯觀察到Ni粉及W粉單獨存在。In addition, the method of the above two patents adopts a conventional powder metallurgy process, and it is necessary to use expensive Ni powder and W powder having high purity (purity of 99.99%) and fine particle size (having a particle size of about 3 to 6 μm), so the prepared Ni -W alloys cost more. Furthermore, in the above two patents, only the Ni powder and the W powder are mixed by ball milling, and the Ni powder and the W powder are not alloyed during mixing. After sintering, the Ni powder and the W powder are dense due to the sintering reaction. However, it is not completely alloyed, and it is still apparent that Ni powder and W powder are separately present.
此外，在一般習知粉末製程中，所需之粉末混合時間較長，約費時8~24小時不等，且粉末在混合過程中，容易因高熔點粉末密度較一般金屬粉末大，造成粉末混合不均，進而影響燒結後靶材之成分均勻性。並且，在傳統熔煉製程中，熔湯澆鑄、冷卻後，尚需再進行熱軋延以細化組織，同樣需費時數十小時。其中，在傳統鑄造製程之凝固過程中，容易有縮孔、成分偏析及組織粗大等缺點，故需再以費時之熱軋步驟消除鑄錠之偏析，並細化組織。In addition, in the conventional powder process, the required powder mixing time is long, which takes about 8 to 24 hours, and the powder is easily mixed due to the high melting point powder density compared with the general metal powder during the mixing process, resulting in powder mixing. Unevenness, which in turn affects the uniformity of the composition of the target after sintering. Moreover, in the conventional smelting process, after the molten soup is cast and cooled, it is necessary to further perform hot rolling to refine the structure, which also takes several hours. Among them, in the solidification process of the conventional casting process, there are disadvantages such as shrinkage cavities, composition segregation, and coarse structure, so it is necessary to eliminate segregation of the ingot and refine the structure by a time-consuming hot rolling step.
因此，有必要提供一創新且富有進步性之鎳合金靶材之製造方法，以解決上述問題。Therefore, it is necessary to provide an innovative and progressive method of manufacturing nickel alloy targets to solve the above problems.
本發明提供一種鎳合金靶材之製造方法，包括以下步驟：(a)提供鎳金屬及至少一第一合金元素；(b)進行一真空熔煉步驟，以形成一合金溶液；(c)霧化該合金溶液，以形成鎳合金粉體；(d)進行一篩分步驟，以選取小於一設定粒度之鎳合金粉體；及(e)成型及緻密化該鎳合金粉體，以形成鎳合金靶材。The invention provides a method for manufacturing a nickel alloy target, comprising the steps of: (a) providing a nickel metal and at least a first alloying element; (b) performing a vacuum melting step to form an alloy solution; (c) atomizing The alloy solution is formed to form a nickel alloy powder; (d) performing a sieving step to select a nickel alloy powder having a smaller than a set size; and (e) forming and densifying the nickel alloy powder to form a nickel alloy Target.
本發明鎳合金靶材之製造方法不需使用價格較為昂貴之Ni粉體及W粉體為原料、不需使用相當昂貴的電漿燒結設備進行Ni、W粉體的燒結，並且不需經冷軋製程及在氣氛保護下進行再結晶退火處理，即可快速、大量製備製得鎳合金靶材，故製造方法簡單且可減少製造時間。再者，本發明之製造方法所製得之鎳合金靶材無成分偏析、具細緻晶粒、晶粒分佈均勻且完全合金化，故具有較高之濺鍍品質。The method for manufacturing the nickel alloy target of the invention does not need to use the relatively expensive Ni powder and W powder as raw materials, does not need to use relatively expensive plasma sintering equipment for sintering of Ni and W powders, and does not need to be cooled. The rolling process and the recrystallization annealing treatment under the atmosphere protection can quickly and mass-prepare the nickel alloy target, so the manufacturing method is simple and the manufacturing time can be reduced. Furthermore, the nickel alloy target produced by the manufacturing method of the present invention has no component segregation, fine crystal grains, uniform crystal grain distribution and complete alloying, so that it has high sputtering quality.
圖1顯示本發明鎳合金靶材之製造方法流程圖。首先，參考步驟S11，提供鎳金屬及至少一第一合金元素，該第一合金元素係選自鉬(Mo)、鎢(W)、鉭(Ta)、鉿(Hf)、釕(Ru)、錸(Re)、鋯(Zr)或鈮(Nb)。其中，該鎳金屬及該第一合金元素可為塊狀或條狀，該第一合金元素亦可為片狀、粉體狀或屑狀。較佳地，該鎳金屬及該第一合金元素之純度係大於99.9%，該第一合金元素之重量百分比係為5%至20%。在本實施例中，該第一合金元素係為鎢合金元素。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a flow chart showing a method of manufacturing a nickel alloy target of the present invention. First, referring to step S11, a nickel metal and at least a first alloying element are selected, the first alloying element being selected from the group consisting of molybdenum (Mo), tungsten (W), tantalum (Ta), hafnium (Hf), ruthenium (Ru),铼 (Re), zirconium (Zr) or bismuth (Nb). The nickel metal and the first alloying element may be in the form of a block or a strip, and the first alloying element may also be in the form of a sheet, a powder or a crumb. Preferably, the nickel metal and the first alloying element have a purity greater than 99.9%, and the first alloying element has a weight percentage of 5% to 20%. In this embodiment, the first alloying element is a tungsten alloying element.
在其他應用中，除該鎳金屬及該第一合金元素外，亦可另包括一第二合金元素。該第二合金元素係選自鐵(Fe)、銅(Cu)或鋅(Zn)，其中該第二合金元素之熔點低於該第一合金元素之熔點。較佳地，該鎳金屬之重量百分比係大於50%，該第一合金元素之重量百分比係為5%至20%，其餘之重量百分比係為該第二合金元素含量。In other applications, in addition to the nickel metal and the first alloying element, a second alloying element may be included. The second alloying element is selected from the group consisting of iron (Fe), copper (Cu) or zinc (Zn), wherein the melting point of the second alloying element is lower than the melting point of the first alloying element. Preferably, the nickel metal is more than 50% by weight, the first alloying element is 5% to 20% by weight, and the remaining weight percentage is the second alloying element content.
另外，在步驟S11之前較佳係另包括以下步驟：利用酸性溶液移除(例如：利用超音波震動方式)該鎳金屬及該第一合金元素表面之氧化物及污染物；移除(例如：利用超音波震動方式)該鎳金屬及該第一合金元素表面之酸性溶液；及乾燥該鎳金屬及該第一合金元素。其中，該酸性溶液之體積濃度係為95%以上，且係以去離子水移除該鎳金屬及該第一合金元素表面之酸性溶液。較佳地，該酸性溶液係選自鹽酸或硝酸。In addition, before step S11, the method further comprises the steps of: removing (for example, using ultrasonic vibration) the oxides and contaminants of the nickel metal and the surface of the first alloy element by using an acidic solution; An ultrasonic solution of the nickel metal and the surface of the first alloy element by ultrasonic vibration; and drying the nickel metal and the first alloying element. Wherein, the acidic solution has a volume concentration of 95% or more, and the nickel metal and the acidic solution on the surface of the first alloying element are removed by deionized water. Preferably, the acidic solution is selected from the group consisting of hydrochloric acid or nitric acid.
參考步驟S12，進行一真空熔煉步驟，以使該鎳金屬及該第一合金元素熔融形成一合金溶液。在本實施例中，其係於真空感應熔煉爐或真空電弧熔煉爐中進行該真空熔煉步驟，並利用一感應線圈所提供之磁場攪拌熔融之合金溶液，使熔融合金溶液之成分均勻。較佳地，該真空熔煉之溫度係為1500℃至1750℃，該真空熔煉之之真空度係為10-3 托(torr)以上。Referring to step S12, a vacuum melting step is performed to melt the nickel metal and the first alloying element to form an alloy solution. In the present embodiment, the vacuum melting step is carried out in a vacuum induction melting furnace or a vacuum arc melting furnace, and the molten alloy solution is stirred by a magnetic field provided by an induction coil to make the composition of the molten alloy solution uniform. Preferably, the vacuum melting temperature is 1500 ° C to 1750 ° C, and the vacuum melting degree is 10 -3 torr or more.
參考步驟S13，霧化該合金溶液，以形成鎳合金粉體。在本實施例中，其係利用高壓惰性氣體(例如：氬氣(Ar)或氮氣(N2 ))以噴擊方式霧化該合金溶液。較佳地，該高壓惰性氣體之壓力為1至5MPa，流速為50至100m/s。Referring to step S13, the alloy solution is atomized to form a nickel alloy powder. In the present embodiment, the alloy solution is atomized by a high pressure inert gas such as argon (Ar) or nitrogen (N 2 ). Preferably, the high pressure inert gas has a pressure of 1 to 5 MPa and a flow rate of 50 to 100 m/s.
其中，本發明之方法在步驟S13之後另包括一冷卻步驟，以冷卻霧化後之該鎳合金粉體。舉例而言，本發明可利用氬氣或氮氣噴擊方式或自然冷卻方式，冷卻霧化後之該鎳合金粉體。Wherein, the method of the present invention further comprises a cooling step after step S13 to cool the atomized nickel alloy powder. For example, the present invention can cool the atomized nickel alloy powder by means of argon gas or nitrogen gas spraying or natural cooling.
參考步驟S14，進行一篩分步驟，以選取一設定粒度之鎳合金粉體。其中，該設定粒度較佳係小於200微米(μm)。該篩分步驟可控制鎳合金粉體具有較小及較均勻之粒度，使得鎳合金粉體成型為鎳合金靶材後，具有更細緻之晶粒及更均勻之晶粒分佈。Referring to step S14, a sieving step is performed to select a nickel alloy powder of a set size. Wherein, the set particle size is preferably less than 200 micrometers (μm). The sieving step can control the nickel alloy powder to have a smaller and more uniform particle size, so that the nickel alloy powder has a finer grain and a more uniform grain distribution after being formed into a nickel alloy target.
參考步驟S15，成型及緻密化該鎳合金粉體，以形成鎳合金靶材，其中，本發明鎳合金靶材可應用於磁記錄產業、光電產業或半導體產業之薄膜濺鍍製程。在步驟S15中，其係以熱壓製程或熱均壓製程進行該成型及緻密化步驟。較佳地，成型及緻密化之溫度較佳係為800℃至1200℃，成型及緻密化之時間較佳係為0.5至3小時。Referring to step S15, the nickel alloy powder is formed and densified to form a nickel alloy target, wherein the nickel alloy target of the present invention can be applied to a film sputtering process in the magnetic recording industry, the photovoltaic industry, or the semiconductor industry. In step S15, the forming and densification steps are carried out by a hot press process or a hot press process. Preferably, the molding and densification temperature is preferably from 800 ° C to 1200 ° C, and the molding and densification time is preferably from 0.5 to 3 hours.
根據實際試驗結果，在本發明之製造方法中，自該鎳金屬及該第一合金元素置入真空爐中至以惰性氣體噴擊該合金溶液獲得均勻之鎳合金粉體，其只約需2~3小時，並且所製得鎳合金粉體之成分與靶材成分之設定含量，誤差在0.5原子百分比(at.%)之內。接著，僅需再經1~3小時之熱壓或熱均壓即可獲得緻密之鎳合金靶材。因此，本發明之製造方法不僅能快速、大量製備含高熔點元素之鎳合金靶材，且鎳合金靶材之成分及組織，皆優於以傳統粉末冶金及熔煉製程製備之合金靶材。According to the actual test results, in the manufacturing method of the present invention, the nickel metal and the first alloy element are placed in a vacuum furnace to spray the alloy solution with an inert gas to obtain a uniform nickel alloy powder, which only requires about 2 ~3 hours, and the composition of the nickel alloy powder and the target component are set to within 0.5 atomic percent (at.%). Then, only one to three hours of hot pressing or hot equalizing can be obtained to obtain a dense nickel alloy target. Therefore, the manufacturing method of the present invention can not only rapidly and quantitatively prepare a nickel alloy target containing a high melting point element, but also the composition and structure of the nickel alloy target are superior to the alloy target prepared by the conventional powder metallurgy and smelting process.
茲以下列實例予以詳細說明本發明，唯並不意謂本發明僅侷限於此等實例所揭示之內容。The invention is illustrated by the following examples, which are not intended to be limited to the scope of the invention.
本實例係以Ni-8W(at.%)靶材之原料粉末的製作為例，其中Ni-8W(at.%)表示Ni與W之原子百分比為92：8。首先，按照Ni-8W(at.%)合金比例準備鎳塊及鎢片，接著進行鎳塊及鎢片之表面處理步驟，將鎳塊及鎢片置於體積濃度95%以上的鹽酸溶液中，以超音波震動方式去除表面氧化物及油污，再將鎳塊及鎢片置於去離子水中，以超音波震動方式去除殘留在表面的鹽酸溶液後，再予以烘乾。This example is exemplified by the preparation of a raw material powder of a Ni-8W (at.%) target, wherein Ni-8W (at.%) represents an atomic percentage of Ni and W of 92:8. First, a nickel block and a tungsten piece are prepared according to a Ni-8W (at.%) alloy ratio, followed by a surface treatment step of the nickel block and the tungsten piece, and the nickel block and the tungsten piece are placed in a hydrochloric acid solution having a volume concentration of 95% or more. The surface oxide and oil stain are removed by ultrasonic vibration, and the nickel block and the tungsten piece are placed in deionized water, and the hydrochloric acid solution remaining on the surface is removed by ultrasonic vibration, and then dried.
接著，將酸洗過後之鎳塊及鎢片放入真空感應熔煉爐之坩鍋中並抽成真空，待真空度達到10-3 torr以上後開始升溫至1500℃，當坩鍋中之鎳塊及鎢片完全熔化後，持溫5分鐘，確保高熔點之鎢片能充分熔解，並在一感應線圈所提供之磁場攪拌下使熔融金屬湯液成分均勻。Next, the acid-washed nickel block and the tungsten piece are placed in a crucible of a vacuum induction melting furnace and vacuumed, and after the vacuum reaches 10 -3 torr or more, the temperature is raised to 1500 ° C, and the nickel block in the crucible is After the tungsten sheet is completely melted, the temperature is maintained for 5 minutes to ensure that the high melting point tungsten sheet can be fully melted, and the molten metal soup liquid component is uniformly stirred under the magnetic field provided by the induction coil.
接著，將熔融Ni-8W金屬湯液自真空感應熔煉爐之坩堝中倒出，並利用流量控制在3MPa、流速控制在50m/s之Ar氣，噴擊熔融Ni-8W金屬湯液使其霧化成鎳合金粉體。Next, the molten Ni-8W metal soup liquid was poured out from the crucible of the vacuum induction melting furnace, and the flow was controlled at 3 MPa, the flow rate was controlled at 50 m/s, and the molten Ni-8W metal soup was sprayed to make the mist. Formed into nickel alloy powder.
接著，於一腔體中利用N2 氣繼續噴擊加速冷卻霧化後之鎳合金粉體，待鎳合金粉體冷卻後，再進篩分步驟。在本實施例中，篩分步驟係可利用篩分機將粒度大於150μm以上之鎳合金粉體篩分移除，留下粒度小於150μm之鎳合金粉體。Then, the N 2 gas is continuously sprayed in a cavity to accelerate the cooling of the atomized nickel alloy powder, and after the nickel alloy powder is cooled, the sieve step is further performed. In the present embodiment, the sieving step may use a sieving machine to remove the nickel alloy powder having a particle size of more than 150 μm or more, leaving a nickel alloy powder having a particle size of less than 150 μm.
其中，該等鎳合金粉體之晶粒粒徑約10μm，並且根據能量散佈光譜儀(EDS)之實際分析結果得知，本發明製作之鎳合金粉體完全合金化，成分為Ni-7.8W(at.%)。另外，由X光繞射分析結果得知，本發明所製備之鎳合金粉體只出現Ni之FCC之繞射峰，並未出現W之BCC之繞射峰，此代表Ni及W完全合金化，成分相當均勻。Wherein, the grain size of the nickel alloy powder is about 10 μm, and according to the actual analysis result of the energy dispersive spectrometer (EDS), the nickel alloy powder prepared by the invention is completely alloyed, and the composition is Ni-7.8W ( At.%). In addition, it is known from the X-ray diffraction analysis that the nickel alloy powder prepared by the present invention only exhibits a diffraction peak of FCC of Ni, and does not exhibit a diffraction peak of BCC of B, which represents complete alloying of Ni and W. The composition is quite uniform.
最後，以不銹鋼封罐後進行熱均壓製程，於900℃持溫2小時後，可製得晶粒粒度為5~50μm且完全合金化之鎳合金靶材。Finally, after the stainless steel is sealed, the hot pressing process is carried out, and after holding at 900 ° C for 2 hours, a nickel alloy target having a grain size of 5 to 50 μm and completely alloyed can be obtained.
圖2顯示以本發明製造方法所製得之Ni-8W鎳合金靶材之顯微組織結構圖，其中右下角之比例尺標為20μm，由圖2中可清楚得知，該鎳合金靶材不僅具有細緻之晶粒，且該等晶粒之分佈亦非常均勻。2 is a view showing the microstructure of a Ni-8W nickel alloy target obtained by the production method of the present invention, wherein the scale of the lower right corner is 20 μm, as is clear from FIG. 2, the nickel alloy target is not only It has fine grains and the distribution of these grains is very uniform.
本實例係以Ni-17Fe-8W(at.%)靶材之原料粉末的製作為例。首先，按照Ni-17Fe-8W(at.%)合金比例準備鎳塊、鐵塊及鎢粉，接著進行鎳塊及鐵塊之表面處理步驟，將鎳塊及鐵塊置於體積濃度95%以上的鹽酸溶液中，以超音波震動方式去除表面氧化物及油污，再將鎳塊及鐵塊置於去離子水中，以超音波震動方式去除殘留在表面的鹽酸溶液後，再予以烘乾。This example is exemplified by the production of a raw material powder of a Ni-17Fe-8W (at.%) target. First, prepare nickel block, iron block and tungsten powder according to the ratio of Ni-17Fe-8W (at.%) alloy, then carry out surface treatment steps of nickel block and iron block, and place nickel block and iron block at a volume concentration of 95% or more. In the hydrochloric acid solution, the surface oxide and oil stain are removed by ultrasonic vibration, and then the nickel block and the iron block are placed in deionized water, and the hydrochloric acid solution remaining on the surface is removed by ultrasonic vibration, and then dried.
接著，將酸洗過後之鎳塊及鐵塊以及鎢粉放入真空感應熔煉爐之坩鍋中並抽成真空，待真空度達到10-3 torr以上後開始升溫至1700℃，當坩鍋中之鎳塊、鐵塊及鎢粉完全熔化後，於1700℃持溫5分鐘，確保高熔點之鎢粉能充分熔解，並在一感應線圈所提供之磁場攪拌下使熔融金屬湯液成分均勻。Next, the acid-washed nickel block and the iron block and the tungsten powder are placed in a crucible of a vacuum induction melting furnace and evacuated, and after the vacuum reaches 10 -3 torr or more, the temperature is raised to 1700 ° C, when the crucible is After the nickel block, the iron block and the tungsten powder are completely melted, the temperature is maintained at 1700 ° C for 5 minutes to ensure that the high melting point tungsten powder can be fully melted, and the molten metal soup composition is made uniform under the magnetic field provided by the induction coil.
接著，將熔融Ni-17Fe-8W金屬湯液自真空感應熔煉爐之坩堝中倒出，並利用Ar氣噴擊熔融Ni-17Fe-8W金屬湯液使其霧化成鎳合金粉體。Next, the molten Ni-17Fe-8W metal soup liquid was poured out from the crucible of the vacuum induction melting furnace, and the Ni-17Fe-8W metal soup liquid was sprayed by Ar gas to be atomized into a nickel alloy powder.
接著，將霧化之鎳合金粉體於腔體靜置4小時，讓鎳合金粉體自然冷卻。待鎳合金粉體冷卻後，再進行篩分步驟。在本實施例中，篩分步驟係可利用篩分機將粒度大於200μm以上之鎳合金粉體篩分移除，留下粒度小於200μm之鎳合金粉體，並真空封裝保存。Next, the atomized nickel alloy powder was allowed to stand in the cavity for 4 hours to allow the nickel alloy powder to be naturally cooled. After the nickel alloy powder is cooled, a screening step is performed. In the present embodiment, the sieving step may use a sieving machine to remove the nickel alloy powder having a particle size of more than 200 μm or more, leaving a nickel alloy powder having a particle size of less than 200 μm, and storing it in a vacuum package.
其中，該等鎳合金粉體之晶粒粒徑約10μm，並且根據能量散佈光譜儀(EDS)之實際分析結果得知，本發明製作之鎳合金粉體完全合金化，成分為Ni-16.8Fe-7.9W(at.%)。The grain size of the nickel alloy powder is about 10 μm, and according to the actual analysis result of the energy dispersive spectrometer (EDS), the nickel alloy powder prepared by the invention is completely alloyed, and the composition is Ni-16.8Fe- 7.9W (at.%).
最後，進行熱壓製程，於1000℃持溫2小時後，即可製得晶粒細緻且完全合金化之鎳合金靶材。Finally, a hot pressing process is carried out, and after holding at a temperature of 1000 ° C for 2 hours, a fine and completely alloyed nickel alloy target can be obtained.
圖3顯示以本發明製造方法所製得之Ni-17Fe-8W鎳合金靶材之顯微組織結構圖，其中右下角之比例尺標為20μm，由圖3中可清楚得知，該鎳合金靶材不僅具有細緻之晶粒，且該等晶粒之分佈亦非常均勻。3 is a view showing the microstructure of a Ni-17Fe-8W nickel alloy target obtained by the manufacturing method of the present invention, wherein the scale of the lower right corner is 20 μm, as is clear from FIG. 3, the nickel alloy target The material not only has fine grains, but the distribution of the grains is also very uniform.
本發明鎳合金靶材之製造方法不需使用價格較為昂貴之Ni粉體及W粉體為原料、不需使用相當昂貴的電漿燒結設備進行Ni、W粉體的燒結，並且不需經冷軋製程及在氣氛保護下進行再結晶退火處理，即可快速、大量製備製得鎳合金靶材，故製造方法簡單且可減少製造時間。再者，本發明之製造方法所製得之鎳合金靶材無成分偏析、具細緻晶粒、晶粒分佈均勻且完全合金化，故具有較高之濺鍍品質。The method for manufacturing the nickel alloy target of the invention does not need to use the relatively expensive Ni powder and W powder as raw materials, does not need to use relatively expensive plasma sintering equipment for sintering of Ni and W powders, and does not need to be cooled. The rolling process and the recrystallization annealing treatment under the atmosphere protection can quickly and mass-prepare the nickel alloy target, so the manufacturing method is simple and the manufacturing time can be reduced. Furthermore, the nickel alloy target produced by the manufacturing method of the present invention has no component segregation, fine crystal grains, uniform crystal grain distribution and complete alloying, so that it has high sputtering quality.
上述實施例僅為說明本發明之原理及其功效，並非限制本發明。因此習於此技術之人士對上述實施例進行修改及變化仍不脫本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。The above embodiments are merely illustrative of the principles and effects of the invention and are not intended to limit the invention. Therefore, those skilled in the art can make modifications and changes to the above embodiments without departing from the spirit of the invention. The scope of the invention should be as set forth in the appended claims.
圖1顯示本發明鎳合金靶材之製造方法流程圖；Figure 1 is a flow chart showing a method of manufacturing a nickel alloy target of the present invention;
圖2顯示以本發明製造方法所製得之Ni-8W鎳合金靶材之顯微組織結構圖；及2 is a view showing the microstructure of a Ni-8W nickel alloy target obtained by the production method of the present invention;
圖3顯示以本發明製造方法所製得之Ni-17Fe-8W鎳合金靶材之顯微組織結構圖。Fig. 3 is a view showing the microstructure of a Ni-17Fe-8W nickel alloy target obtained by the production method of the present invention.
(無元件符號說明)(no component symbol description)
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| TWI558819B (en) * | 2016-01-22 | 2016-11-21 | 光洋應用材料科技股份有限公司 | Nickel alloy sputtering target and nickel alloy layer |
| TWI659119B (en) * | 2017-08-30 | 2019-05-11 | 光洋應用材料科技股份有限公司 | Nickel-rhenium alloy sputtering target and method of preparing the same |
| CN110938757B (en) * | 2018-12-27 | 2021-05-07 | 河南城建学院 | Preparation method of ultrahigh-strength texture nickel-based alloy baseband |
| WO2021054136A1 (en) * | 2019-09-19 | 2021-03-25 | 日立金属株式会社 | Target |
| CN113290427A (en) * | 2021-05-24 | 2021-08-24 | 宁波江丰电子材料股份有限公司 | Treatment method of high-purity nickel evaporation material |
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