JPWO2009008474A1 - プラズマ処理方法およびプラズマ処理装置 - Google Patents
プラズマ処理方法およびプラズマ処理装置 Download PDFInfo
- Publication number
- JPWO2009008474A1 JPWO2009008474A1 JP2009522669A JP2009522669A JPWO2009008474A1 JP WO2009008474 A1 JPWO2009008474 A1 JP WO2009008474A1 JP 2009522669 A JP2009522669 A JP 2009522669A JP 2009522669 A JP2009522669 A JP 2009522669A JP WO2009008474 A1 JPWO2009008474 A1 JP WO2009008474A1
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing
- processed
- wafer
- microwave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000012545 processing Methods 0.000 title claims abstract description 181
- 238000003672 processing method Methods 0.000 title claims description 15
- 238000009832 plasma treatment Methods 0.000 claims abstract description 11
- 239000007789 gas Substances 0.000 claims description 68
- 238000005121 nitriding Methods 0.000 claims description 68
- 230000002093 peripheral effect Effects 0.000 claims description 64
- 238000000034 method Methods 0.000 claims description 45
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 230000007246 mechanism Effects 0.000 claims description 14
- 239000010453 quartz Substances 0.000 claims description 11
- 230000003028 elevating effect Effects 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 8
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 4
- 230000001174 ascending effect Effects 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 162
- 235000012431 wafers Nutrition 0.000 description 143
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 68
- 230000008569 process Effects 0.000 description 41
- 229910052757 nitrogen Inorganic materials 0.000 description 34
- 230000001965 increasing effect Effects 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 239000004020 conductor Substances 0.000 description 11
- 230000007423 decrease Effects 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 230000005855 radiation Effects 0.000 description 10
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- 230000000694 effects Effects 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000009616 inductively coupled plasma Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 230000000644 propagated effect Effects 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 230000001976 improved effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/3143—Inorganic layers composed of alternated layers or of mixtures of nitrides and oxides or of oxinitrides, e.g. formation of oxinitride by oxidation of nitride layers
- H01L21/3145—Inorganic layers composed of alternated layers or of mixtures of nitrides and oxides or of oxinitrides, e.g. formation of oxinitride by oxidation of nitride layers formed by deposition from a gas or vapour
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02312—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour
- H01L21/02315—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour treatment by exposure to a plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02318—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
- H01L21/02321—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer
- H01L21/02329—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen
- H01L21/02332—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment introduction of substances into an already existing insulating layer introduction of nitrogen into an oxide layer, e.g. changing SiO to SiON
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/314—Inorganic layers
- H01L21/318—Inorganic layers composed of nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02247—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by nitridation, e.g. nitridation of the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
- H01L21/02252—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by plasma treatment, e.g. plasma oxidation of the substrate
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Formation Of Insulating Films (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Abstract
Description
本発明の他の目的は、面内均一性の高いプラズマ処理が可能なプラズマ処理方法の実施に用いるプログラムを記憶した記憶媒体を提供することにある。
また、被処理体の周縁部の外方部分にプラズマを遮る部材が実質的に存在せず、被処理体の外方部分においてプラズマが被処理体の表面よりも下方に存在する状態で前記プラズマ処理を施すことにより、プラズマ中の活性種がウエハWの周縁部分に到達することができ、ウエハW表面外周部における窒素導入量の低下を解消することができる。このため、面内均一性の高いプラズマ処理を行うことができる。
まず、本発明の第1の実施形態について説明する。図1は、第1の実施形態に係るプラズマ処理装置を示す断面図である。このプラズマ処理装置は、複数のスロットを有する平面アンテナ、特にRLSA(Radial Line Slot Antenna;ラジアルラインスロットアンテナ)にて処理室内にマイクロ波を導入してプラズマを発生させることにより、高密度かつ低電子温度のマイクロ波プラズマを発生させ得るRLSAマイクロ波プラズマ処理装置として構成されており、プラズマ窒化処理を行うものである。
まず、ウエハ支持ピンによるウエハアップによる外周部分の窒化レート上昇が空間を形成したことによるものであることを確認した実験について説明する。
この際の窒化処理条件は、以下に示す通りとした。
チャンバー内圧力:20Pa
処理ガスの流量:Ar/N2=1000/200mL/min(sccm)
マイクロ波パワー:2300W
処理温度:常温
処理時間:35sec
ここでは、同じく図1の装置を用いて、ウエハ支持ピンの突出高さを調整することにより、ウエハのサセプタからの高さを0〜12mmの間で変化させてプラズマ窒化処理を行った。
<シリコンに対する直窒化処理>
チャンバー内圧力:20Pa
処理ガスの流量:Ar/N2=1000/200mL/min(sccm)
マイクロ波パワー:2500W
処理温度:400℃
処理時間:35sec
<シリコン酸化膜の窒化処理>
チャンバー内圧力:20Pa
処理ガスの流量:Ar/N2=1000/200mL/min(sccm)
マイクロ波パワー:2300W
処理温度:400℃
処理時間:35sec
図1のようにサセプタ2上にリング状をなすサセプタカバー4が存在する従来タイプの装置において、図5に示すようにウエハWをサセプタ2に載置した状態を図16Aに拡大して示すと、ウエハWの外周部にリング状のサセプタカバー4がウエハWよりも距離hだけ高い位置に存在しているため、ウエハWの存在位置よりも外方部分ではプラズマの下端位置がウエハW上よりも距離hだけ高い位置に押し上げられて存在することとなる。このため、ウエハWの周縁部では、サセプタカバー4の存在によりウエハWの外方部分のプラズマの存在位置がウエハW周縁部から遠くなり、ウエハWの外側部分からウエハW表面の外周部へ供給されるプラズマ中の活性種の量が、中心部へ供給されるプラズマの活性種よりも低い。つまりプラズマ中の活性種の量が少なくなる。
例えば、上記実施形態ではマイクロ波プラズマ窒化処理を例にとって説明したが、プラズマ処理はマイクロ波プラズマに限らず、他のプラズマであってもよく、特に、マイクロ波プラズマと同様に自己生成的なプラズマである、上述した誘導結合プラズマ、表面波プラズマ、表面反射波プラズマ、マグネトロンプラズマ等を例示することができる。
Claims (22)
- 処理容器内に被処理体を配置することと、
前記処理容器内にプラズマ生成空間を形成することと、
そのプラズマ生成空間に少なくとも被処理体の表面を接触させた状態で被処理体の表面にプラズマ処理を施すことと
を含み、
前記プラズマ処理を施す際には、被処理体の裏面側の少なくとも外周部分にプラズマ生成空間が接触するようにするプラズマ処理方法。 - 前記処理容器内には、プレートと該プレートに対して突没可能に設けられた被処理体昇降部材とを有する被処理体載置部を有し、前記被処理体昇降部材を前記プレートから所定距離突出させた状態で前記被処理体昇降部材上に被処理体を載置し、これによりプレートと被処理体との間に所定距離のプラズマ生成空間が形成され、被処理体の裏面側の少なくとも外周部分にプラズマ生成空間が接触する状態が形成される請求項1に記載のプラズマ処理方法。
- 前記プレートと被処理体との距離が0.3mm以上である請求項2に記載のプラズマ処理方法。
- 前記処理容器内には被処理体を載置する被処理体よりも小径の載置台が設けられ、この載置台にその端部から外周部分が突出した状態で被処理体を載置し、この状態でプラズマを形成することにより被処理体の裏面側の少なくとも外周部分にプラズマ生成空間が接触する状態が形成される請求項1に記載のプラズマ処理方法。
- 前記プラズマ処理はプラズマ窒化処理である請求項1に記載のプラズマ処理方法。
- 前記プラズマ処理は、マイクロ波プラズマによって行われる請求項1に記載のプラズマ処理方法。
- 処理容器内に被処理体を配置することと、
前記処理容器内にプラズマ生成空間を形成することと、
そのプラズマ生成空間に少なくとも被処理体の表面を接触させた状態で被処理体の表面にプラズマ処理を施すことと
を含み、
被処理体の周縁部の外方部分にプラズマを遮る部材が実質的に存在せず、被処理体の外方部分においてプラズマが被処理体の表面よりも下方に存在する状態で前記プラズマ処理を施すプラズマ処理方法。 - 被処理体の外方部分において、プラズマが被処理体の表面より2〜12mm下方に存在する請求項7に記載のプラズマ処理方法。
- 前記プラズマ処理はプラズマ窒化処理である請求項7に記載のプラズマ処理方法。
- 前記プラズマ処理は、マイクロ波プラズマによって行われる請求項7に記載のプラズマ処理方法。
- 被処理体を収容する処理容器と、
前記処理容器内で被処理体を載置する被処理体載置部と、
前記処理容器内に処理ガスを供給する処理ガス供給機構と、
前記処理容器内に処理ガスのプラズマを形成するプラズマ形成手段と、
前記被処理体載置部を制御する制御部と
を具備し、
前記被処理体載置部は、プレートと該プレートに対して突没可能に設けられ、その上に被処理体を支持して昇降させる被処理体昇降部材と、前記被処理体昇降部材を昇降駆動する昇降機構とを有し、
前記制御部は、前記被処理体昇降部材が前記サセプタから所定距離突出させた状態になるように前記昇降機構を制御し、前記被処理体昇降部材上に載置された被処理体とプレートと被処理体との間に所定距離のプラズマ生成空間を形成して、被処理体の裏面側の少なくとも外周部分にプラズマ生成空間が接触する状態が形成されるようにするプラズマ処理装置。 - 前記制御部は、前記プレートと被処理体との距離が0.3mm以上となるように前記昇降機構を制御する請求項11に記載のプラズマ処理装置。
- 前記処理ガスは窒素含有ガスを含み、これによりプラズマ窒化処理が行われる請求項11に記載のプラズマ処理装置。
- 前記プラズマ形成手段は、複数のスロットを有する平面アンテナを有し、該平面アンテナを介して前記処理容器内にマイクロ波を導くマイクロ波導入手段を有し、導入されたマイクロ波により処理ガスをプラズマ化する請求項11に記載のプラズマ処理装置。
- 被処理体を収容する処理容器と、
前記処理容器内で被処理体を載置する被処理体載置部と、
前記処理容器内に処理ガスを供給する処理ガス供給機構と、
前記処理容器内に処理ガスのプラズマを形成するプラズマ形成手段と
を具備し、
前記被処理体載置部は、被処理体の径よりも小径の載置台を有し、この載置台にその端部から外周部分が突出した状態で被処理体が載置され、この状態でプラズマを生成することにより被処理体の裏面側の少なくとも外周部分にプラズマ生成空間が接触する状態が形成されるプラズマ処理装置。 - 前記処理ガスは窒素含有ガスを含み、これによりプラズマ窒化処理が行われる請求項15に記載のプラズマ処理装置。
- 前記プラズマ形成手段は、複数のスロットを有する平面アンテナを有し、該平面アンテナを介して前記処理容器内にマイクロ波を導くマイクロ波導入手段を有し、導入されたマイクロ波により処理ガスをプラズマ化する請求項15に記載のプラズマ処理装置。
- 被処理体を収容する処理容器と、
前記処理容器内で被処理体を載置する被処理体載置部と、
前記処理容器内に処理ガスを供給する処理ガス供給機構と、
前記処理容器内に処理ガスのプラズマを形成するプラズマ形成手段と、
前記被処理体載置部を制御する制御部と
を具備し、
前記被処理体載置部は、被処理体が載置された際に、被処理体の周縁部の外方部分にプラズマを遮る部材が実質的に存在せず、被処理体の外方部分においてプラズマが被処理体の表面よりも下方に存在するプラズマ処理装置。 - 前記被処理体載置部は、セラミックスからなるサセプタと、その上の全面を覆う石英からなるサセプタカバーを有し、前記サセプタカバーは平坦な被処理体を載置する載置面を有する請求項18に記載のプラズマ処理装置。
- 前記サセプタカバーは、載置面の外方部分に載置面よりも2〜12mm低い位置に存在する段部を有する請求項18に記載のプラズマ処理装置。
- 前記処理ガスは窒素含有ガスを含み、これによりプラズマ窒化処理が行われる請求項18に記載のプラズマ処理装置。
- 前記プラズマ形成手段は、複数のスロットを有する平面アンテナを有し、該平面アンテナを介して前記処理容器内にマイクロ波を導くマイクロ波導入手段を有し、導入されたマイクロ波により処理ガスをプラズマ化する請求項18に記載のプラズマ処理装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009522669A JP5358436B2 (ja) | 2007-07-11 | 2008-07-10 | プラズマ処理方法およびプラズマ処理装置 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007182030 | 2007-07-11 | ||
JP2007182030 | 2007-07-11 | ||
PCT/JP2008/062477 WO2009008474A1 (ja) | 2007-07-11 | 2008-07-10 | プラズマ処理方法およびプラズマ処理装置 |
JP2009522669A JP5358436B2 (ja) | 2007-07-11 | 2008-07-10 | プラズマ処理方法およびプラズマ処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009008474A1 true JPWO2009008474A1 (ja) | 2010-09-09 |
JP5358436B2 JP5358436B2 (ja) | 2013-12-04 |
Family
ID=40228645
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009522669A Expired - Fee Related JP5358436B2 (ja) | 2007-07-11 | 2008-07-10 | プラズマ処理方法およびプラズマ処理装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20110017706A1 (ja) |
JP (1) | JP5358436B2 (ja) |
KR (1) | KR101257985B1 (ja) |
CN (2) | CN101802986B (ja) |
WO (1) | WO2009008474A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012216631A (ja) * | 2011-03-31 | 2012-11-08 | Tokyo Electron Ltd | プラズマ窒化処理方法 |
JP6215104B2 (ja) * | 2014-03-20 | 2017-10-18 | 新光電気工業株式会社 | 温度調整装置 |
JP6492736B2 (ja) * | 2015-02-17 | 2019-04-03 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法並びに記憶媒体 |
JP6682870B2 (ja) * | 2016-01-19 | 2020-04-15 | 富士通株式会社 | マイクロ波照射装置、排気浄化装置、加熱装置及び化学反応装置 |
US9953843B2 (en) * | 2016-02-05 | 2018-04-24 | Lam Research Corporation | Chamber for patterning non-volatile metals |
CN107304475B (zh) * | 2016-04-21 | 2019-09-27 | 中国科学院半导体研究所 | 用于微波等离子体化学气相沉积设备的组合式衬底基座 |
JP6700118B2 (ja) | 2016-06-24 | 2020-05-27 | 東京エレクトロン株式会社 | プラズマ成膜装置および基板載置台 |
JP6880848B2 (ja) | 2017-03-10 | 2021-06-02 | 富士通株式会社 | マイクロ波照射装置、排気浄化装置、自動車及び管理システム |
KR102253808B1 (ko) | 2019-01-18 | 2021-05-20 | 주식회사 유진테크 | 기판 처리 장치 |
KR102396431B1 (ko) * | 2020-08-14 | 2022-05-10 | 피에스케이 주식회사 | 기판 처리 장치 및 기판 반송 방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05206069A (ja) * | 1992-01-29 | 1993-08-13 | Fujitsu Ltd | プラズマエッチング法及びプラズマエッチング装置 |
JP3258839B2 (ja) * | 1994-11-24 | 2002-02-18 | 東京エレクトロン株式会社 | プラズマ処理方法 |
JP3530021B2 (ja) * | 1998-05-25 | 2004-05-24 | 株式会社日立製作所 | 真空処理装置及びその処理台 |
JP2000100791A (ja) * | 1998-09-24 | 2000-04-07 | Sony Corp | レジスト除去装置 |
KR100745495B1 (ko) * | 1999-03-10 | 2007-08-03 | 동경 엘렉트론 주식회사 | 반도체 제조방법 및 반도체 제조장치 |
JP4203206B2 (ja) * | 2000-03-24 | 2008-12-24 | 株式会社日立国際電気 | 基板処理装置 |
US6660659B1 (en) * | 2002-06-12 | 2003-12-09 | Applied Materials, Inc. | Plasma method and apparatus for processing a substrate |
US7524774B2 (en) * | 2003-09-26 | 2009-04-28 | Tokyo Electron Limited | Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program |
US20050189068A1 (en) * | 2004-02-27 | 2005-09-01 | Kawasaki Microelectronics, Inc. | Plasma processing apparatus and method of plasma processing |
JP4398802B2 (ja) * | 2004-06-17 | 2010-01-13 | 東京エレクトロン株式会社 | 基板処理装置 |
JP4149427B2 (ja) * | 2004-10-07 | 2008-09-10 | 東京エレクトロン株式会社 | マイクロ波プラズマ処理装置 |
KR20060041497A (ko) * | 2004-11-09 | 2006-05-12 | 동부일렉트로닉스 주식회사 | 건식 식각장치 |
-
2008
- 2008-07-10 US US12/668,106 patent/US20110017706A1/en not_active Abandoned
- 2008-07-10 CN CN2008800242107A patent/CN101802986B/zh not_active Expired - Fee Related
- 2008-07-10 JP JP2009522669A patent/JP5358436B2/ja not_active Expired - Fee Related
- 2008-07-10 KR KR1020107000195A patent/KR101257985B1/ko not_active IP Right Cessation
- 2008-07-10 CN CN2012102763060A patent/CN102789951A/zh active Pending
- 2008-07-10 WO PCT/JP2008/062477 patent/WO2009008474A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP5358436B2 (ja) | 2013-12-04 |
KR101257985B1 (ko) | 2013-04-24 |
US20110017706A1 (en) | 2011-01-27 |
KR20100031720A (ko) | 2010-03-24 |
CN102789951A (zh) | 2012-11-21 |
WO2009008474A1 (ja) | 2009-01-15 |
CN101802986B (zh) | 2012-09-26 |
CN101802986A (zh) | 2010-08-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5358436B2 (ja) | プラズマ処理方法およびプラズマ処理装置 | |
JP5008562B2 (ja) | 基板処理方法および基板処理装置 | |
KR101020334B1 (ko) | 마이크로파 플라즈마 처리 장치 | |
JP4979389B2 (ja) | プラズマ処理装置 | |
JP2007042951A (ja) | プラズマ処理装置 | |
JP5390379B2 (ja) | プラズマ窒化処理におけるチャンバ内の前処理方法、プラズマ処理方法、および記憶媒体 | |
JPWO2006106665A1 (ja) | 基板の窒化処理方法および絶縁膜の形成方法 | |
JP5096047B2 (ja) | マイクロ波プラズマ処理装置およびマイクロ波透過板 | |
JP4906659B2 (ja) | シリコン酸化膜の形成方法 | |
JP5231232B2 (ja) | プラズマ酸化処理方法、プラズマ処理装置、及び、記憶媒体 | |
JP5425361B2 (ja) | プラズマ表面処理方法、プラズマ処理方法およびプラズマ処理装置 | |
JP5422396B2 (ja) | マイクロ波プラズマ処理装置 | |
JP5479013B2 (ja) | プラズマ処理装置及びこれに用いる遅波板 | |
WO2011013633A1 (ja) | 平面アンテナ部材およびこれを備えたプラズマ処理装置 | |
WO2009113680A1 (ja) | 平面アンテナ部材、及び、これを備えたプラズマ処理装置 | |
JPWO2008041599A1 (ja) | プラズマ酸化処理方法、記憶媒体、及び、プラズマ処理装置 | |
JP5728565B2 (ja) | プラズマ処理装置及びこれに用いる遅波板 | |
JP2010238739A (ja) | プラズマ処理方法 | |
JP2013033979A (ja) | マイクロ波プラズマ処理装置 | |
KR101123538B1 (ko) | 석영제부재 | |
JP2011029250A (ja) | マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110602 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110602 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130604 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130726 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130820 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130902 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5358436 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |