JPS6489518A - Parallel flat board electrode type plasma etching device - Google Patents
Parallel flat board electrode type plasma etching deviceInfo
- Publication number
- JPS6489518A JPS6489518A JP24831787A JP24831787A JPS6489518A JP S6489518 A JPS6489518 A JP S6489518A JP 24831787 A JP24831787 A JP 24831787A JP 24831787 A JP24831787 A JP 24831787A JP S6489518 A JPS6489518 A JP S6489518A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- lower electrode
- flat board
- plasma etching
- electrode type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To allow little polymerization to occur and to minimize charging up of electron by covering with carbon at least a surface facing flat electrodes other than a sample depositing section. CONSTITUTION:An upper electrode 1 and a lower electrode 2, both of which are made of stainless steel, are formed in a chamber 10, the lower electrode 2 being connected to an RF power supply 4. The surfaces facing the upper and lower electrodes, respectively, are covered with carbon 3 except for an area where a silicon substrate of the lower electrode 2 is to be mounted. An etching gas 5 to be supplied is made to be exhausted from an exhaust outlet 6. When etching the silicon substrate 7 using an etching gas containing halogen, excessive halogen is transformed into carbon and low molecular halogen carbide, which are exhausted efficiently from the exhaust outlet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24831787A JPS6489518A (en) | 1987-09-30 | 1987-09-30 | Parallel flat board electrode type plasma etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24831787A JPS6489518A (en) | 1987-09-30 | 1987-09-30 | Parallel flat board electrode type plasma etching device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489518A true JPS6489518A (en) | 1989-04-04 |
Family
ID=17176281
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24831787A Pending JPS6489518A (en) | 1987-09-30 | 1987-09-30 | Parallel flat board electrode type plasma etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489518A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03138381A (en) * | 1989-10-20 | 1991-06-12 | Ibiden Co Ltd | Electrode plate for plasma etching |
US5556500A (en) * | 1994-03-03 | 1996-09-17 | Tokyo Electron Limited | Plasma etching apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52114444A (en) * | 1976-03-22 | 1977-09-26 | Nippon Telegraph & Telephone | Plasma etching method |
JPS5687667A (en) * | 1979-12-20 | 1981-07-16 | Toshiba Corp | Reactive ion etching method |
JPS5989774A (en) * | 1982-11-10 | 1984-05-24 | Mitsubishi Electric Corp | Dry etching device |
JPS6159833A (en) * | 1984-08-31 | 1986-03-27 | Hitachi Ltd | Plasma treater |
-
1987
- 1987-09-30 JP JP24831787A patent/JPS6489518A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52114444A (en) * | 1976-03-22 | 1977-09-26 | Nippon Telegraph & Telephone | Plasma etching method |
JPS5687667A (en) * | 1979-12-20 | 1981-07-16 | Toshiba Corp | Reactive ion etching method |
JPS5989774A (en) * | 1982-11-10 | 1984-05-24 | Mitsubishi Electric Corp | Dry etching device |
JPS6159833A (en) * | 1984-08-31 | 1986-03-27 | Hitachi Ltd | Plasma treater |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03138381A (en) * | 1989-10-20 | 1991-06-12 | Ibiden Co Ltd | Electrode plate for plasma etching |
US5556500A (en) * | 1994-03-03 | 1996-09-17 | Tokyo Electron Limited | Plasma etching apparatus |
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