JPS6489328A - Aligner - Google Patents
AlignerInfo
- Publication number
- JPS6489328A JPS6489328A JP62245208A JP24520887A JPS6489328A JP S6489328 A JPS6489328 A JP S6489328A JP 62245208 A JP62245208 A JP 62245208A JP 24520887 A JP24520887 A JP 24520887A JP S6489328 A JPS6489328 A JP S6489328A
- Authority
- JP
- Japan
- Prior art keywords
- aligning
- mask
- incident
- light
- optical system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245208A JPS6489328A (en) | 1987-09-29 | 1987-09-29 | Aligner |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62245208A JPS6489328A (en) | 1987-09-29 | 1987-09-29 | Aligner |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489328A true JPS6489328A (en) | 1989-04-03 |
Family
ID=17130233
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62245208A Pending JPS6489328A (en) | 1987-09-29 | 1987-09-29 | Aligner |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489328A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994028374A1 (en) * | 1993-06-01 | 1994-12-08 | Massachusetts Institute Of Technology | On-axis interferometric alignment |
WO2003094212A1 (fr) * | 2002-05-01 | 2003-11-13 | Sony Corporation | Systeme d'alignement, procede d'alignement et procede de production pour dispositif semi-conducteur |
JP2014119446A (ja) * | 2012-12-17 | 2014-06-30 | Mitsutoyo Corp | 光学エンコーダ用の照明部 |
-
1987
- 1987-09-29 JP JP62245208A patent/JPS6489328A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994028374A1 (en) * | 1993-06-01 | 1994-12-08 | Massachusetts Institute Of Technology | On-axis interferometric alignment |
US5414514A (en) * | 1993-06-01 | 1995-05-09 | Massachusetts Institute Of Technology | On-axis interferometric alignment of plates using the spatial phase of interference patterns |
WO2003094212A1 (fr) * | 2002-05-01 | 2003-11-13 | Sony Corporation | Systeme d'alignement, procede d'alignement et procede de production pour dispositif semi-conducteur |
JP2014119446A (ja) * | 2012-12-17 | 2014-06-30 | Mitsutoyo Corp | 光学エンコーダ用の照明部 |
JP2014119445A (ja) * | 2012-12-17 | 2014-06-30 | Mitsutoyo Corp | 光学エンコーダ用の照明部 |
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