JPS6484224A - Electrode forming method - Google Patents
Electrode forming methodInfo
- Publication number
- JPS6484224A JPS6484224A JP24316587A JP24316587A JPS6484224A JP S6484224 A JPS6484224 A JP S6484224A JP 24316587 A JP24316587 A JP 24316587A JP 24316587 A JP24316587 A JP 24316587A JP S6484224 A JPS6484224 A JP S6484224A
- Authority
- JP
- Japan
- Prior art keywords
- film
- metallic
- substrate
- substrate film
- metallic film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Liquid Crystal (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Electric Cables (AREA)
Abstract
PURPOSE:To form an electrode consisting of a metallic substrate film and a metallic film in a pattern with high accuracy by patterning the metallic substrate film to the formation pattern of the metallic film on a transparent substrate plane, and plating the metallic film on the surface of the substrate film. CONSTITUTION:The metallic substrate film 17 is patterned to the formation pattern of the metallic film 16 on the planes of the transparent substrates 11 and 12, and after that, the metallic film 16 is plated on the surface of a patterned substrate film 17. In other words, since the substrate film 17 is patterned to the formation pattern of the metallic film 16 before plating the metallic film 16, it is possible to prevent the over-etching of the substrate film from being generated as in a case where the etching of the metallic film 16 and the substrate film 17 are performed sequentially after plating the metallic film 16 on the substrate film 17. Therefore, it is possible to perform the patterning of the substrate film 17 with high accuracy, and also, to form the metallic film in the same shape pattern with high accuracy as that of the substrate film by plating the metallic film 16 on the surface of the patterned substrate film 17. In such a way, it is possible to form the electrode consisting of the substrate film 17 and the metallic film 16 to be formed on a prescribed pat on a transparent conductive film in the pattern with high accuracy.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24316587A JPS6484224A (en) | 1987-09-28 | 1987-09-28 | Electrode forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24316587A JPS6484224A (en) | 1987-09-28 | 1987-09-28 | Electrode forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6484224A true JPS6484224A (en) | 1989-03-29 |
Family
ID=17099775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24316587A Pending JPS6484224A (en) | 1987-09-28 | 1987-09-28 | Electrode forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6484224A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5168074A (en) * | 1989-09-20 | 1992-12-01 | Honeywell Inc. | Active matrix liquid crystal display fabrication for grayscale |
US7760317B2 (en) | 2003-10-14 | 2010-07-20 | Lg Display Co., Ltd. | Thin film transistor array substrate and fabricating method thereof, liquid crystal display using the same and fabricating method thereof, and method of inspecting liquid crystal display |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60143315A (en) * | 1983-12-29 | 1985-07-29 | Hitachi Ltd | Liquid-crystal optical switch array |
JPS60200968A (en) * | 1984-03-27 | 1985-10-11 | Toshiba Corp | Electroless plating method |
JPS60245782A (en) * | 1984-05-21 | 1985-12-05 | Mitsubishi Electric Corp | Plating method onto transparent conductive film pattern |
-
1987
- 1987-09-28 JP JP24316587A patent/JPS6484224A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60143315A (en) * | 1983-12-29 | 1985-07-29 | Hitachi Ltd | Liquid-crystal optical switch array |
JPS60200968A (en) * | 1984-03-27 | 1985-10-11 | Toshiba Corp | Electroless plating method |
JPS60245782A (en) * | 1984-05-21 | 1985-12-05 | Mitsubishi Electric Corp | Plating method onto transparent conductive film pattern |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5168074A (en) * | 1989-09-20 | 1992-12-01 | Honeywell Inc. | Active matrix liquid crystal display fabrication for grayscale |
US7760317B2 (en) | 2003-10-14 | 2010-07-20 | Lg Display Co., Ltd. | Thin film transistor array substrate and fabricating method thereof, liquid crystal display using the same and fabricating method thereof, and method of inspecting liquid crystal display |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5548935A (en) | Forming of electrode pattern | |
SE8105918L (en) | SET TO MAKE A METALLIZED DIELECTRIC CONSTRUCTION | |
JPS6484224A (en) | Electrode forming method | |
JPS55138864A (en) | Method of fabricating semiconductor assembling substrate | |
JPS5240968A (en) | Process for production of semiconductor device | |
JPS6414710A (en) | Production of thin film magnetic head | |
JPS5427368A (en) | Manufacture of microwave circuit pattern | |
JPS5398096A (en) | Production of thin film metal resistor | |
JPS6481296A (en) | Manufacture of printed-circuit board | |
SU815979A1 (en) | Printed circuit board manufacturing method | |
ES2006071A6 (en) | Cladding of substrates with thick metal circuit patterns | |
JPS5219297A (en) | Method of manufacturing a metal film resistor | |
JPS647528A (en) | Manufacture of semiconductor device | |
JPS55141569A (en) | Manufacture of dial plate of watch | |
JPS5421272A (en) | Metal photo mask | |
JPS5240962A (en) | Fluorescent tube | |
JPS5711450A (en) | Manufacture of fluorescent display tube | |
JPS641215A (en) | Manufacture of magnetic thin film | |
JPS6411399A (en) | Etching of thin film pattern | |
JPS52146564A (en) | Production of extra-high-frequency integrated circuit substrates | |
JPS53112054A (en) | Gas discharging panel | |
JPS6480097A (en) | Manufacture of printed wiring board | |
JPS5291193A (en) | Forming method of conductor pattern | |
JPS5612743A (en) | Processing method of projection for conductive layer of substrate | |
JPS53106577A (en) | Production of semiconductor device |