JPS6483504A - Production of ultrafine silicon nitride powder - Google Patents
Production of ultrafine silicon nitride powderInfo
- Publication number
- JPS6483504A JPS6483504A JP23867087A JP23867087A JPS6483504A JP S6483504 A JPS6483504 A JP S6483504A JP 23867087 A JP23867087 A JP 23867087A JP 23867087 A JP23867087 A JP 23867087A JP S6483504 A JPS6483504 A JP S6483504A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- raw material
- nitride powder
- silicon nitride
- silicon tetrachloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/121—Coherent waves, e.g. laser beams
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
PURPOSE:To obtain ultrafine silicon nitride powder from an inexpensive and safely handleable silicon tetrachloride gas as a raw material, by using a mixed gas obtained by adding hydrogenated chlorosilane to silicon tetrachloride and ammonia as a raw material gas and irradiating the mixed gas with laser beam of carbon dioxide gas. CONSTITUTION:In producing silicon nitride powder by feeding a raw material gas to a reactor and irradiating the raw material gas with laser beam of carbon dioxide gas, the following method is used. Namely, a mixed gas of silicon tetrachloride containing 0.5-20mol.% hydrogenated chlorosilane and ammonia is used as the raw material gas. Trichlorosilane or dichlorosilane may be cited as the hydrogenated chlorosilane. These silanes have economical merits wherein contents of the silanes can be industrially controlled in synthesis of SiCl4.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23867087A JPS6483504A (en) | 1987-09-25 | 1987-09-25 | Production of ultrafine silicon nitride powder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23867087A JPS6483504A (en) | 1987-09-25 | 1987-09-25 | Production of ultrafine silicon nitride powder |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6483504A true JPS6483504A (en) | 1989-03-29 |
Family
ID=17033572
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23867087A Pending JPS6483504A (en) | 1987-09-25 | 1987-09-25 | Production of ultrafine silicon nitride powder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6483504A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5470446A (en) * | 1993-04-01 | 1995-11-28 | Tioxide Specialties Limited | Process for the production of silicon nitride |
-
1987
- 1987-09-25 JP JP23867087A patent/JPS6483504A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5470446A (en) * | 1993-04-01 | 1995-11-28 | Tioxide Specialties Limited | Process for the production of silicon nitride |
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