JPS648266A - Laser beam vapor deposition method - Google Patents
Laser beam vapor deposition methodInfo
- Publication number
- JPS648266A JPS648266A JP16329787A JP16329787A JPS648266A JP S648266 A JPS648266 A JP S648266A JP 16329787 A JP16329787 A JP 16329787A JP 16329787 A JP16329787 A JP 16329787A JP S648266 A JPS648266 A JP S648266A
- Authority
- JP
- Japan
- Prior art keywords
- work
- evaporated
- materials
- laser beam
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To easily form a uniformly vapor-deposited film on an object having an intricate shape as well by projecting laser beams respectively to materials to be evaporated disposed on the right and left of a work to evaporate particles and sticking the evaporated particles to the work at the center from the right and left. CONSTITUTION:The work 5 of a cylindrical shape, etc., is disposed in a vacuum vessel 10 and at least the two materials 4, 4 to be evaporated such as ceramics are disposed on the right and left thereof. The laser beam 1 from a laser beam oscillator 20 is introduced through a window 8 into the vacuum vessel 10. This laser beam 1 is bisected by a split mirror 2 and the split beams are further condensed and projected respectively to the above-mentioned materials 4, 4 by condenser mirrors 3, 3. The particles of the materials 4 are thereby evaporated. The evaporated particles are stuck to the work 5 disposed at the center of the materials 4, 4 from both the right and left sides. The vapor-deposited film is thereby uniformly formed even on the inside, etc., of the cylindrical work which is liable to be shadowed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62163297A JPH0819517B2 (en) | 1987-06-30 | 1987-06-30 | Laser vapor deposition method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62163297A JPH0819517B2 (en) | 1987-06-30 | 1987-06-30 | Laser vapor deposition method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS648266A true JPS648266A (en) | 1989-01-12 |
JPH0819517B2 JPH0819517B2 (en) | 1996-02-28 |
Family
ID=15771150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62163297A Expired - Lifetime JPH0819517B2 (en) | 1987-06-30 | 1987-06-30 | Laser vapor deposition method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0819517B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03191055A (en) * | 1989-12-13 | 1991-08-21 | Internatl Business Mach Corp <Ibm> | Adhesion method using high energy source |
US5411772A (en) * | 1994-01-25 | 1995-05-02 | Rockwell International Corporation | Method of laser ablation for uniform thin film deposition |
US6534134B1 (en) * | 1998-11-20 | 2003-03-18 | University Of Puerto Rico | Apparatus and method for pulsed laser deposition of materials on wires and pipes |
CN100455975C (en) * | 2002-07-08 | 2009-01-28 | 华南理工大学 | High-temperature superconductive element based on nano material and its prepn. |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63137163A (en) * | 1986-11-28 | 1988-06-09 | Mitsubishi Electric Corp | Apparatus for forming composite film by vapor deposition with laser |
-
1987
- 1987-06-30 JP JP62163297A patent/JPH0819517B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63137163A (en) * | 1986-11-28 | 1988-06-09 | Mitsubishi Electric Corp | Apparatus for forming composite film by vapor deposition with laser |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03191055A (en) * | 1989-12-13 | 1991-08-21 | Internatl Business Mach Corp <Ibm> | Adhesion method using high energy source |
US5411772A (en) * | 1994-01-25 | 1995-05-02 | Rockwell International Corporation | Method of laser ablation for uniform thin film deposition |
US6534134B1 (en) * | 1998-11-20 | 2003-03-18 | University Of Puerto Rico | Apparatus and method for pulsed laser deposition of materials on wires and pipes |
CN100455975C (en) * | 2002-07-08 | 2009-01-28 | 华南理工大学 | High-temperature superconductive element based on nano material and its prepn. |
Also Published As
Publication number | Publication date |
---|---|
JPH0819517B2 (en) | 1996-02-28 |
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