JPS648266A - Laser beam vapor deposition method - Google Patents

Laser beam vapor deposition method

Info

Publication number
JPS648266A
JPS648266A JP16329787A JP16329787A JPS648266A JP S648266 A JPS648266 A JP S648266A JP 16329787 A JP16329787 A JP 16329787A JP 16329787 A JP16329787 A JP 16329787A JP S648266 A JPS648266 A JP S648266A
Authority
JP
Japan
Prior art keywords
work
evaporated
materials
laser beam
disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16329787A
Other languages
Japanese (ja)
Other versions
JPH0819517B2 (en
Inventor
Kohei Murakami
Kazuhiro Oka
Osamu Hamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP62163297A priority Critical patent/JPH0819517B2/en
Publication of JPS648266A publication Critical patent/JPS648266A/en
Publication of JPH0819517B2 publication Critical patent/JPH0819517B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To easily form a uniformly vapor-deposited film on an object having an intricate shape as well by projecting laser beams respectively to materials to be evaporated disposed on the right and left of a work to evaporate particles and sticking the evaporated particles to the work at the center from the right and left. CONSTITUTION:The work 5 of a cylindrical shape, etc., is disposed in a vacuum vessel 10 and at least the two materials 4, 4 to be evaporated such as ceramics are disposed on the right and left thereof. The laser beam 1 from a laser beam oscillator 20 is introduced through a window 8 into the vacuum vessel 10. This laser beam 1 is bisected by a split mirror 2 and the split beams are further condensed and projected respectively to the above-mentioned materials 4, 4 by condenser mirrors 3, 3. The particles of the materials 4 are thereby evaporated. The evaporated particles are stuck to the work 5 disposed at the center of the materials 4, 4 from both the right and left sides. The vapor-deposited film is thereby uniformly formed even on the inside, etc., of the cylindrical work which is liable to be shadowed.
JP62163297A 1987-06-30 1987-06-30 Laser vapor deposition method Expired - Lifetime JPH0819517B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62163297A JPH0819517B2 (en) 1987-06-30 1987-06-30 Laser vapor deposition method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62163297A JPH0819517B2 (en) 1987-06-30 1987-06-30 Laser vapor deposition method

Publications (2)

Publication Number Publication Date
JPS648266A true JPS648266A (en) 1989-01-12
JPH0819517B2 JPH0819517B2 (en) 1996-02-28

Family

ID=15771150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62163297A Expired - Lifetime JPH0819517B2 (en) 1987-06-30 1987-06-30 Laser vapor deposition method

Country Status (1)

Country Link
JP (1) JPH0819517B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191055A (en) * 1989-12-13 1991-08-21 Internatl Business Mach Corp <Ibm> Adhesion method using high energy source
US5411772A (en) * 1994-01-25 1995-05-02 Rockwell International Corporation Method of laser ablation for uniform thin film deposition
US6534134B1 (en) * 1998-11-20 2003-03-18 University Of Puerto Rico Apparatus and method for pulsed laser deposition of materials on wires and pipes
CN100455975C (en) * 2002-07-08 2009-01-28 华南理工大学 High-temperature superconductive element based on nano material and its prepn.

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63137163A (en) * 1986-11-28 1988-06-09 Mitsubishi Electric Corp Apparatus for forming composite film by vapor deposition with laser

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63137163A (en) * 1986-11-28 1988-06-09 Mitsubishi Electric Corp Apparatus for forming composite film by vapor deposition with laser

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03191055A (en) * 1989-12-13 1991-08-21 Internatl Business Mach Corp <Ibm> Adhesion method using high energy source
US5411772A (en) * 1994-01-25 1995-05-02 Rockwell International Corporation Method of laser ablation for uniform thin film deposition
US6534134B1 (en) * 1998-11-20 2003-03-18 University Of Puerto Rico Apparatus and method for pulsed laser deposition of materials on wires and pipes
CN100455975C (en) * 2002-07-08 2009-01-28 华南理工大学 High-temperature superconductive element based on nano material and its prepn.

Also Published As

Publication number Publication date
JPH0819517B2 (en) 1996-02-28

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