JPS6481320A - Plasma processing device - Google Patents

Abstract

PURPOSE:To easily disconnect middle electrodes and enable setting of the position in accordance with a treated material by performing fixity of the plate-shaped middle electrodes positioned just above the treated material on the circumference of the middle electrodes extended out of a chamber. CONSTITUTION:Middle electrodes 16 is provided right above wafers 11 on a stage 12 which are spaced at fixed intervals and set in parallel with wafers 11. The circumference of the middle electrodes 16 is supported on the lower end edge of a chamber 3 and the upper surface of a device body 2 through seal material 17, its outside is extended out of the chamber 3, the middle electrodes 16 are fixed on the body 2 by screws 18 composed of electrically conductive materials in the neighborhood of the circumference end thereof. In a resist removing process of the wafers 11 the screws 18 do not because they are not exposed at high temperature in the treating space 8, and the disconnection of the middle electrodes 16 is easily performed. Further, if plural kinds of exchangeable middle electrodes different in diameter (m) of projected part 16a and a projected quantity l are prepared and exchanged in accordance with the diameter of the wafers 11 and treatment performance whenever occasion arises, the optimum position of the middle electrodes 16 in the chamber 3 is realized.