JPS6469011A - Electron beam exposure method - Google Patents
Electron beam exposure methodInfo
- Publication number
- JPS6469011A JPS6469011A JP22700987A JP22700987A JPS6469011A JP S6469011 A JPS6469011 A JP S6469011A JP 22700987 A JP22700987 A JP 22700987A JP 22700987 A JP22700987 A JP 22700987A JP S6469011 A JPS6469011 A JP S6469011A
- Authority
- JP
- Japan
- Prior art keywords
- exposure
- oscillation
- accelerometer
- allowable value
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To prevent oscillation to be superposed on an exposure pattern for making it possible to photoengrave a fine pattern, by employing an accelerometer as a pickup for monitoring oscillation and by controlling beam radiation according to a prediction value calculated based on accumulated data. CONSTITUTION:An exposure apparatus adapted such hat exposure is performed by moving a stage 3 comprises a column 1, the stage 3 and a holder 4 holding an object to be exposed, and an accelerometer 7 is attached to at least one of these components. A signal from the accelerometer 7 is passed through a sampling circuit 8 and a prediction circuit 9 so that oscillation in the various components of the apparatus is monitored. A CPU 10 determines whether a predicted value of oscillation obtained by the prediction circuit 9 exceeds an allowable value or not. If it is below the allowable value, the exposure is continued. lf it is determined to be over the allowable value, on the contrary, the exposure is stopped while the pattern at which the exposure is stopped is recorded.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62227009A JP2560745B2 (en) | 1987-09-10 | 1987-09-10 | Electron beam exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62227009A JP2560745B2 (en) | 1987-09-10 | 1987-09-10 | Electron beam exposure method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6469011A true JPS6469011A (en) | 1989-03-15 |
JP2560745B2 JP2560745B2 (en) | 1996-12-04 |
Family
ID=16854082
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62227009A Expired - Fee Related JP2560745B2 (en) | 1987-09-10 | 1987-09-10 | Electron beam exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2560745B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03290919A (en) * | 1990-04-06 | 1991-12-20 | Fujitsu Ltd | Semiconductor manufacturing apparatus and exposure method |
EP0530957A1 (en) | 1991-07-10 | 1993-03-10 | Fuji Photo Film Co., Ltd. | A lithographic printing plate precursor of direct image type |
WO1999030346A1 (en) * | 1997-12-11 | 1999-06-17 | Philips Electron Optics B.V. | Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations |
US6043490A (en) * | 1997-01-27 | 2000-03-28 | Hitachi, Ltd. | Vibration cancellation system for a charged particle beam apparatus |
KR100478527B1 (en) * | 1996-02-29 | 2005-07-12 | 가부시키가이샤 니콘 | Dustproof device |
JP2006093455A (en) * | 2004-09-24 | 2006-04-06 | Toshiba Corp | Pattern drawing device, pattern tester and pattern drawing system |
JP2007043083A (en) * | 2005-07-04 | 2007-02-15 | Nuflare Technology Inc | Method for correcting beam drift of electron beam, and method for drawing electron beam |
JP2011221555A (en) * | 2011-07-22 | 2011-11-04 | Toshiba Corp | Pattern inspection device and pattern drawing system |
JP2013038397A (en) * | 2011-07-08 | 2013-02-21 | Nuflare Technology Inc | Charged particle beam lithography device and charged particle beam lithography method |
JP2016001761A (en) * | 2015-09-24 | 2016-01-07 | 大日本印刷株式会社 | Semiconductor manufacturing system |
-
1987
- 1987-09-10 JP JP62227009A patent/JP2560745B2/en not_active Expired - Fee Related
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03290919A (en) * | 1990-04-06 | 1991-12-20 | Fujitsu Ltd | Semiconductor manufacturing apparatus and exposure method |
EP0530957A1 (en) | 1991-07-10 | 1993-03-10 | Fuji Photo Film Co., Ltd. | A lithographic printing plate precursor of direct image type |
KR100478527B1 (en) * | 1996-02-29 | 2005-07-12 | 가부시키가이샤 니콘 | Dustproof device |
US6043490A (en) * | 1997-01-27 | 2000-03-28 | Hitachi, Ltd. | Vibration cancellation system for a charged particle beam apparatus |
WO1999030346A1 (en) * | 1997-12-11 | 1999-06-17 | Philips Electron Optics B.V. | Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations |
JP2006093455A (en) * | 2004-09-24 | 2006-04-06 | Toshiba Corp | Pattern drawing device, pattern tester and pattern drawing system |
JP2007043083A (en) * | 2005-07-04 | 2007-02-15 | Nuflare Technology Inc | Method for correcting beam drift of electron beam, and method for drawing electron beam |
JP2013038397A (en) * | 2011-07-08 | 2013-02-21 | Nuflare Technology Inc | Charged particle beam lithography device and charged particle beam lithography method |
JP2011221555A (en) * | 2011-07-22 | 2011-11-04 | Toshiba Corp | Pattern inspection device and pattern drawing system |
JP2016001761A (en) * | 2015-09-24 | 2016-01-07 | 大日本印刷株式会社 | Semiconductor manufacturing system |
Also Published As
Publication number | Publication date |
---|---|
JP2560745B2 (en) | 1996-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |