JPS6469011A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS6469011A
JPS6469011A JP22700987A JP22700987A JPS6469011A JP S6469011 A JPS6469011 A JP S6469011A JP 22700987 A JP22700987 A JP 22700987A JP 22700987 A JP22700987 A JP 22700987A JP S6469011 A JPS6469011 A JP S6469011A
Authority
JP
Japan
Prior art keywords
exposure
oscillation
accelerometer
allowable value
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22700987A
Other languages
Japanese (ja)
Other versions
JP2560745B2 (en
Inventor
Masahiko Suzuki
Hitoshi Miyazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62227009A priority Critical patent/JP2560745B2/en
Publication of JPS6469011A publication Critical patent/JPS6469011A/en
Application granted granted Critical
Publication of JP2560745B2 publication Critical patent/JP2560745B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent oscillation to be superposed on an exposure pattern for making it possible to photoengrave a fine pattern, by employing an accelerometer as a pickup for monitoring oscillation and by controlling beam radiation according to a prediction value calculated based on accumulated data. CONSTITUTION:An exposure apparatus adapted such hat exposure is performed by moving a stage 3 comprises a column 1, the stage 3 and a holder 4 holding an object to be exposed, and an accelerometer 7 is attached to at least one of these components. A signal from the accelerometer 7 is passed through a sampling circuit 8 and a prediction circuit 9 so that oscillation in the various components of the apparatus is monitored. A CPU 10 determines whether a predicted value of oscillation obtained by the prediction circuit 9 exceeds an allowable value or not. If it is below the allowable value, the exposure is continued. lf it is determined to be over the allowable value, on the contrary, the exposure is stopped while the pattern at which the exposure is stopped is recorded.
JP62227009A 1987-09-10 1987-09-10 Electron beam exposure method Expired - Fee Related JP2560745B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62227009A JP2560745B2 (en) 1987-09-10 1987-09-10 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62227009A JP2560745B2 (en) 1987-09-10 1987-09-10 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS6469011A true JPS6469011A (en) 1989-03-15
JP2560745B2 JP2560745B2 (en) 1996-12-04

Family

ID=16854082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62227009A Expired - Fee Related JP2560745B2 (en) 1987-09-10 1987-09-10 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JP2560745B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03290919A (en) * 1990-04-06 1991-12-20 Fujitsu Ltd Semiconductor manufacturing apparatus and exposure method
EP0530957A1 (en) 1991-07-10 1993-03-10 Fuji Photo Film Co., Ltd. A lithographic printing plate precursor of direct image type
WO1999030346A1 (en) * 1997-12-11 1999-06-17 Philips Electron Optics B.V. Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations
US6043490A (en) * 1997-01-27 2000-03-28 Hitachi, Ltd. Vibration cancellation system for a charged particle beam apparatus
KR100478527B1 (en) * 1996-02-29 2005-07-12 가부시키가이샤 니콘 Dustproof device
JP2006093455A (en) * 2004-09-24 2006-04-06 Toshiba Corp Pattern drawing device, pattern tester and pattern drawing system
JP2007043083A (en) * 2005-07-04 2007-02-15 Nuflare Technology Inc Method for correcting beam drift of electron beam, and method for drawing electron beam
JP2011221555A (en) * 2011-07-22 2011-11-04 Toshiba Corp Pattern inspection device and pattern drawing system
JP2013038397A (en) * 2011-07-08 2013-02-21 Nuflare Technology Inc Charged particle beam lithography device and charged particle beam lithography method
JP2016001761A (en) * 2015-09-24 2016-01-07 大日本印刷株式会社 Semiconductor manufacturing system

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03290919A (en) * 1990-04-06 1991-12-20 Fujitsu Ltd Semiconductor manufacturing apparatus and exposure method
EP0530957A1 (en) 1991-07-10 1993-03-10 Fuji Photo Film Co., Ltd. A lithographic printing plate precursor of direct image type
KR100478527B1 (en) * 1996-02-29 2005-07-12 가부시키가이샤 니콘 Dustproof device
US6043490A (en) * 1997-01-27 2000-03-28 Hitachi, Ltd. Vibration cancellation system for a charged particle beam apparatus
WO1999030346A1 (en) * 1997-12-11 1999-06-17 Philips Electron Optics B.V. Particle-optical apparatus provided with an acceleration sensor for the compensation of specimen vibrations
JP2006093455A (en) * 2004-09-24 2006-04-06 Toshiba Corp Pattern drawing device, pattern tester and pattern drawing system
JP2007043083A (en) * 2005-07-04 2007-02-15 Nuflare Technology Inc Method for correcting beam drift of electron beam, and method for drawing electron beam
JP2013038397A (en) * 2011-07-08 2013-02-21 Nuflare Technology Inc Charged particle beam lithography device and charged particle beam lithography method
JP2011221555A (en) * 2011-07-22 2011-11-04 Toshiba Corp Pattern inspection device and pattern drawing system
JP2016001761A (en) * 2015-09-24 2016-01-07 大日本印刷株式会社 Semiconductor manufacturing system

Also Published As

Publication number Publication date
JP2560745B2 (en) 1996-12-04

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees