JPS6457774A - Controlling method for output of excimer laser - Google Patents

Controlling method for output of excimer laser

Info

Publication number
JPS6457774A
JPS6457774A JP62214398A JP21439887A JPS6457774A JP S6457774 A JPS6457774 A JP S6457774A JP 62214398 A JP62214398 A JP 62214398A JP 21439887 A JP21439887 A JP 21439887A JP S6457774 A JPS6457774 A JP S6457774A
Authority
JP
Japan
Prior art keywords
control
superposing
laser power
exciting intensity
exciting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62214398A
Other languages
Japanese (ja)
Inventor
Noriaki Itou
Osamu Wakabayashi
Masahiko Kowaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP62214398A priority Critical patent/JPS6457774A/en
Priority to US07/465,184 priority patent/US5081635A/en
Priority to DE19883890693 priority patent/DE3890693T1/en
Priority to PCT/JP1988/000841 priority patent/WO1989002175A1/en
Publication of JPS6457774A publication Critical patent/JPS6457774A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
    • H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To stably control a laser power and a wavelength without confusion in control by executing a superposing control and exciting intensity control to eliminate influences of the superposing control and the exciting intensity control at different timing. CONSTITUTION:A superposing controller 4 which receives a superposing control execution command 41 from a main CPU 1 transmits a superposing regulation signal 43 to etalons 7, 7' and returns a superposing control completion signal 44 to the CPU 1. An exciting intensity controller 3 transmits an exciting intensity regulation signal 33 to a laser power source 10, raises or lowers a discharge voltage, and then returns an exciting intensity control completion signal 34 to the CPU 1. Since next control is started after receiving the control completion signal, the cause of varying the laser power during controlling can be easily recognized, thereby preventing the controls due to competition between both the controls from confusing.
JP62214398A 1987-08-25 1987-08-28 Controlling method for output of excimer laser Pending JPS6457774A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62214398A JPS6457774A (en) 1987-08-28 1987-08-28 Controlling method for output of excimer laser
US07/465,184 US5081635A (en) 1987-08-25 1988-08-25 Apparatus for controlling output from an excimer laser device
DE19883890693 DE3890693T1 (en) 1987-08-25 1988-08-25 METHOD FOR REGULATING THE OUTPUT OF AN EXCIMER LASER DEVICE
PCT/JP1988/000841 WO1989002175A1 (en) 1987-08-25 1988-08-25 Device for controlling the output of excimer laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62214398A JPS6457774A (en) 1987-08-28 1987-08-28 Controlling method for output of excimer laser

Publications (1)

Publication Number Publication Date
JPS6457774A true JPS6457774A (en) 1989-03-06

Family

ID=16655127

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62214398A Pending JPS6457774A (en) 1987-08-25 1987-08-28 Controlling method for output of excimer laser

Country Status (1)

Country Link
JP (1) JPS6457774A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09214028A (en) * 1996-01-23 1997-08-15 Cymer Inc Gas discharge laser control system using a plurality of cpu having shared memory on common bus
JPH09232659A (en) * 1996-02-15 1997-09-05 Cymer Inc Gas discharge control system for laser

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09214028A (en) * 1996-01-23 1997-08-15 Cymer Inc Gas discharge laser control system using a plurality of cpu having shared memory on common bus
JPH09232659A (en) * 1996-02-15 1997-09-05 Cymer Inc Gas discharge control system for laser

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