JPS6457774A - Controlling method for output of excimer laser - Google Patents
Controlling method for output of excimer laserInfo
- Publication number
- JPS6457774A JPS6457774A JP62214398A JP21439887A JPS6457774A JP S6457774 A JPS6457774 A JP S6457774A JP 62214398 A JP62214398 A JP 62214398A JP 21439887 A JP21439887 A JP 21439887A JP S6457774 A JPS6457774 A JP S6457774A
- Authority
- JP
- Japan
- Prior art keywords
- control
- superposing
- laser power
- exciting intensity
- exciting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
Abstract
PURPOSE:To stably control a laser power and a wavelength without confusion in control by executing a superposing control and exciting intensity control to eliminate influences of the superposing control and the exciting intensity control at different timing. CONSTITUTION:A superposing controller 4 which receives a superposing control execution command 41 from a main CPU 1 transmits a superposing regulation signal 43 to etalons 7, 7' and returns a superposing control completion signal 44 to the CPU 1. An exciting intensity controller 3 transmits an exciting intensity regulation signal 33 to a laser power source 10, raises or lowers a discharge voltage, and then returns an exciting intensity control completion signal 34 to the CPU 1. Since next control is started after receiving the control completion signal, the cause of varying the laser power during controlling can be easily recognized, thereby preventing the controls due to competition between both the controls from confusing.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62214398A JPS6457774A (en) | 1987-08-28 | 1987-08-28 | Controlling method for output of excimer laser |
US07/465,184 US5081635A (en) | 1987-08-25 | 1988-08-25 | Apparatus for controlling output from an excimer laser device |
DE19883890693 DE3890693T1 (en) | 1987-08-25 | 1988-08-25 | METHOD FOR REGULATING THE OUTPUT OF AN EXCIMER LASER DEVICE |
PCT/JP1988/000841 WO1989002175A1 (en) | 1987-08-25 | 1988-08-25 | Device for controlling the output of excimer laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62214398A JPS6457774A (en) | 1987-08-28 | 1987-08-28 | Controlling method for output of excimer laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457774A true JPS6457774A (en) | 1989-03-06 |
Family
ID=16655127
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62214398A Pending JPS6457774A (en) | 1987-08-25 | 1987-08-28 | Controlling method for output of excimer laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457774A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09214028A (en) * | 1996-01-23 | 1997-08-15 | Cymer Inc | Gas discharge laser control system using a plurality of cpu having shared memory on common bus |
JPH09232659A (en) * | 1996-02-15 | 1997-09-05 | Cymer Inc | Gas discharge control system for laser |
-
1987
- 1987-08-28 JP JP62214398A patent/JPS6457774A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09214028A (en) * | 1996-01-23 | 1997-08-15 | Cymer Inc | Gas discharge laser control system using a plurality of cpu having shared memory on common bus |
JPH09232659A (en) * | 1996-02-15 | 1997-09-05 | Cymer Inc | Gas discharge control system for laser |
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