JPS6457154A - Defect inspecting apparatus - Google Patents

Defect inspecting apparatus

Info

Publication number
JPS6457154A
JPS6457154A JP62213137A JP21313787A JPS6457154A JP S6457154 A JPS6457154 A JP S6457154A JP 62213137 A JP62213137 A JP 62213137A JP 21313787 A JP21313787 A JP 21313787A JP S6457154 A JPS6457154 A JP S6457154A
Authority
JP
Japan
Prior art keywords
light
defects
substrate
scattered
inspected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62213137A
Other languages
Japanese (ja)
Other versions
JPH0833354B2 (en
Inventor
Fumitomo Hayano
Kazunori Imamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62213137A priority Critical patent/JPH0833354B2/en
Publication of JPS6457154A publication Critical patent/JPS6457154A/en
Publication of JPH0833354B2 publication Critical patent/JPH0833354B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9506—Optical discs

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To make it possible to inspect the kinds of defects on a transparent body automatically and highly accurately, by receiving forward scattering light, which arrives from a surface to be inspected directly, and end surface light, which is scattered in the inside of the material to be inspected, among the scattered lights of a light beam, which are caused by the defects. CONSTITUTION:A light beam 26 is projected on a disc substrate 20, which is the surface to be inspected, through condenser lenses 28 and 30. The light beam 26 is scanned on the surface of the substrate 20 with a resonant scanner mirror 32. Of the scattered lights, which are caused by defects, the forward scattering light, which directly arrives from the surface of the substrate 20, is received with a photodetector 42 through a light receiving lens 34 and a mirror 36 having a hole 36. Of the scattered lights, which are caused by the defects, the end surface light, which is scattered in the inside of the substrate 20, is received with a photodetector 48 through a light receiving lens 46. The output signals of the forward scattering light and the end surface light, which are obtained with the photodetectors 42 and 48, are compared in a comparator. The kinds of the defects are judged in a judging part. Thus, whether the defects are flaws or foreign materials can be automatically judged.
JP62213137A 1987-08-28 1987-08-28 Defect inspection equipment Expired - Fee Related JPH0833354B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62213137A JPH0833354B2 (en) 1987-08-28 1987-08-28 Defect inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62213137A JPH0833354B2 (en) 1987-08-28 1987-08-28 Defect inspection equipment

Publications (2)

Publication Number Publication Date
JPS6457154A true JPS6457154A (en) 1989-03-03
JPH0833354B2 JPH0833354B2 (en) 1996-03-29

Family

ID=16634188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62213137A Expired - Fee Related JPH0833354B2 (en) 1987-08-28 1987-08-28 Defect inspection equipment

Country Status (1)

Country Link
JP (1) JPH0833354B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0577746U (en) * 1992-03-19 1993-10-22 太陽誘電株式会社 Optical disk inspection device
EP0644588A1 (en) * 1993-08-23 1995-03-22 Komatsu Electronic Metals Co., Ltd Wafer with epitaxial layer having a low defect density
WO2002054392A1 (en) * 2000-12-28 2002-07-11 Showa Denko K.K. Apparatus and method for inspecting chamfer angle of memory disc substrate and manufacturing the substrate, memory disc substrate set and method for inspecting and manufacturing the set
WO2003010526A1 (en) * 2001-07-26 2003-02-06 Steag Hamatech Ag Device and method for scanning data carriers
JP2007163227A (en) * 2005-12-12 2007-06-28 Ricoh Co Ltd Optical characteristics measuring apparatus and optical characteristics measuring method for laser scanning optical system
JP2008111830A (en) * 2006-10-02 2008-05-15 Hitachi High-Technologies Corp Method and device for detecting peripheral surface defect of disk
JP2008122365A (en) * 2006-10-16 2008-05-29 Hitachi High-Technologies Corp Optical system for detecting peripheral surface defect of glass disk, and device for detecting peripheral surface defect thereof
JP2009115753A (en) * 2007-11-09 2009-05-28 Hitachi High-Technologies Corp Detection circuit and foreign matter inspection apparatus for semiconductor wafer
JP2012150024A (en) * 2011-01-20 2012-08-09 Hitachi High-Technologies Corp Surface defect inspection device and method
JP2017107082A (en) * 2015-12-10 2017-06-15 システム精工株式会社 Optical scanning device, optical scanning method and surface inspection device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837551A (en) * 1981-07-29 1983-03-04 フエルトミユ−レ・アクチエンゲゼルシヤフト Method and device for inspecting material web
JPS6353453A (en) * 1986-08-25 1988-03-07 Tdk Corp Defect inspecting device for disc

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837551A (en) * 1981-07-29 1983-03-04 フエルトミユ−レ・アクチエンゲゼルシヤフト Method and device for inspecting material web
JPS6353453A (en) * 1986-08-25 1988-03-07 Tdk Corp Defect inspecting device for disc

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0577746U (en) * 1992-03-19 1993-10-22 太陽誘電株式会社 Optical disk inspection device
EP0644588A1 (en) * 1993-08-23 1995-03-22 Komatsu Electronic Metals Co., Ltd Wafer with epitaxial layer having a low defect density
WO2002054392A1 (en) * 2000-12-28 2002-07-11 Showa Denko K.K. Apparatus and method for inspecting chamfer angle of memory disc substrate and manufacturing the substrate, memory disc substrate set and method for inspecting and manufacturing the set
WO2003010526A1 (en) * 2001-07-26 2003-02-06 Steag Hamatech Ag Device and method for scanning data carriers
JP2007163227A (en) * 2005-12-12 2007-06-28 Ricoh Co Ltd Optical characteristics measuring apparatus and optical characteristics measuring method for laser scanning optical system
JP2008111830A (en) * 2006-10-02 2008-05-15 Hitachi High-Technologies Corp Method and device for detecting peripheral surface defect of disk
JP2008122365A (en) * 2006-10-16 2008-05-29 Hitachi High-Technologies Corp Optical system for detecting peripheral surface defect of glass disk, and device for detecting peripheral surface defect thereof
JP2009115753A (en) * 2007-11-09 2009-05-28 Hitachi High-Technologies Corp Detection circuit and foreign matter inspection apparatus for semiconductor wafer
JP2012150024A (en) * 2011-01-20 2012-08-09 Hitachi High-Technologies Corp Surface defect inspection device and method
JP2017107082A (en) * 2015-12-10 2017-06-15 システム精工株式会社 Optical scanning device, optical scanning method and surface inspection device

Also Published As

Publication number Publication date
JPH0833354B2 (en) 1996-03-29

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees