JPS6456873A - Microwave plasma cvd device having improved microwave introducing window - Google Patents

Microwave plasma cvd device having improved microwave introducing window

Info

Publication number
JPS6456873A
JPS6456873A JP5729688A JP5729688A JPS6456873A JP S6456873 A JPS6456873 A JP S6456873A JP 5729688 A JP5729688 A JP 5729688A JP 5729688 A JP5729688 A JP 5729688A JP S6456873 A JPS6456873 A JP S6456873A
Authority
JP
Japan
Prior art keywords
microwave
introducing window
introducing
deposited film
alumina
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5729688A
Other languages
Japanese (ja)
Other versions
JPH055897B2 (en
Inventor
Shigehira Iida
Takashi Arai
Junichiro Hashizume
Tetsuya Takei
Keishi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5729688A priority Critical patent/JPS6456873A/en
Publication of JPS6456873A publication Critical patent/JPS6456873A/en
Publication of JPH055897B2 publication Critical patent/JPH055897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photovoltaic Devices (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To perform formation of a deposited film continuously and stably by constituting a microwave introducing window of alpha-alumina contg. specified amount of a vitreous component in a microwave plasma CVD device. CONSTITUTION:The inside of a reaction vessel 101 is vacuumized and exhausted via an exhaust pipe 104 and a base body 105 is heated and held at prescribed temp. with a built-in heater and a gaseous raw material is introduced through a gas introducing pipe 108 and the inside of the reaction vessel is maintained at about <=1X10<-2>Torr degree of vacuum. Then a deposited film is formed on the electrically-conductive base body 105 by introducing microwave into a discharge space 106 via a waveguide 103 and a microwave introducing window 102. At this time, the introducing window 102 is constituted of alumina ceramics in which 1-10% vitreous component such as SiO2, CaO and MgO is incorporated and the other components substantially are alpha-alumina. Thereby the introducing window 102 excellent in durability and transmission efficiency is obtained and a deposited film is formed continuously and stably.
JP5729688A 1988-03-10 1988-03-10 Microwave plasma cvd device having improved microwave introducing window Granted JPS6456873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5729688A JPS6456873A (en) 1988-03-10 1988-03-10 Microwave plasma cvd device having improved microwave introducing window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5729688A JPS6456873A (en) 1988-03-10 1988-03-10 Microwave plasma cvd device having improved microwave introducing window

Publications (2)

Publication Number Publication Date
JPS6456873A true JPS6456873A (en) 1989-03-03
JPH055897B2 JPH055897B2 (en) 1993-01-25

Family

ID=13051590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5729688A Granted JPS6456873A (en) 1988-03-10 1988-03-10 Microwave plasma cvd device having improved microwave introducing window

Country Status (1)

Country Link
JP (1) JPS6456873A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5129359A (en) * 1988-11-15 1992-07-14 Canon Kabushiki Kaisha Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate
JPH0613197A (en) * 1992-06-15 1994-01-21 Nippon Koshuha Kk High frequency electric power introducing passage

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5129359A (en) * 1988-11-15 1992-07-14 Canon Kabushiki Kaisha Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate
JPH0613197A (en) * 1992-06-15 1994-01-21 Nippon Koshuha Kk High frequency electric power introducing passage

Also Published As

Publication number Publication date
JPH055897B2 (en) 1993-01-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees